公开(公告)号：US5949070A

公开(公告)日：1999-09-07

申请号：US783416

申请日：1997-01-14

Applicant: Ronald C. Gamble

Inventor： Ronald C. Gamble

IPC: G01Q10/00 ,  G01Q60/04 ,  G01B7/34 ,  G01Q20/02 ,  G01Q30/14 ,  G01Q70/02 ,  H01J37/352

CPC classification number: G01B7/34 ,  B82Y35/00 ,  G01Q20/02 ,  G01Q30/14 ,  G01Q70/02 ,  Y10S977/87

Abstract: A scanning force microscope is disclosed which includes integrated optics for viewing the optical lever arm, probe and sample to be examined. The scanning force microscope includes a simplified mounting of laser and related adjustments and the locating of a detector independent of the scanner, to improve ease of handling and providing convenient locations for adjustments. In one preferred embodiment of the scanning force microscope, the surface of samples may be imaged while the cantilever portion of the scanner is immersed in liquids without special set-up or special adapters.

Abstract translation: 公开了一种扫描力显微镜，其包括用于观察光学杠杆臂，待检查的探针和样品的集成光学元件。 扫描力显微镜包括简化的激光安装和相关调整以及独立于扫描仪的检测器的定位，以提高操作的便利性并提供便于调节的位置。 在扫描力显微镜的一个优选实施例中，可以将扫描仪的悬臂部分浸没在没有特殊装置或特殊适配器的液体中的同时，将样品的表面进行成像。

公开(公告)号：US07750295B2

公开(公告)日：2010-07-06

申请号：US10538284

申请日：2003-12-30

Applicant: Ho Soeb Kim ,  Seung Joon Ahn ,  Dae Wook Kim

Inventor： Ho Soeb Kim ,  Seung Joon Ahn ,  Dae Wook Kim

IPC: H01J37/352

CPC classification number: H01J3/028 ,  H01J3/10 ,  H01J37/067 ,  H01J37/15 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/24465 ,  H01J2237/24507

Abstract: The present invention provides a new extractor for a micro-column and an alignment method of the aperture of the extractor and an electron emitter for a micro-column. Further, the present invention provides a measuring system, a method for measuring, and an alignment method using the principle of the alignment.

Abstract translation: 本发明提供了用于微柱的新提取器和提取器的孔径和用于微柱的电子发射器的对准方法。 此外，本发明提供了使用对准原理的测量系统，测量方法和对准方法。

公开(公告)号：US07571639B2

公开(公告)日：2009-08-11

申请号：US11796996

申请日：2007-04-27

Applicant: Toshio Doi ,  Kazutoshi Watanabe ,  Osamu Takaoka ,  Atsushi Uemoto

Inventor： Toshio Doi ,  Kazutoshi Watanabe ,  Osamu Takaoka ,  Atsushi Uemoto

IPC: H01J37/352

CPC classification number: G03F1/72 ,  G01Q10/06 ,  G01Q30/06 ,  G01Q80/00

Abstract: An opaque defect is processed by scanning with a high load or height fixed mode using a probe harder than a pattern material of a photomask at the time of going scanning, and is observed by scanning with a low load or intermittent contact mode at the time of returning scanning so as to detect an ending point of the opaque defect by the height information. When there is a portion reaching to a glass substrate as an ending point, this portion is not scanned by the high load or height fixed mode in the next processing, and only a portion not reaching to the ending point is scanned by the high load or height fixed mode.

Abstract translation: 通过使用在扫描时比光掩模的图案材料更硬的探针，以高负载或高度固定模式进行扫描来处理不透明缺陷，并且通过在低负载或间歇接触模式下扫描来观察不透明缺陷 返回扫描，以便通过高度信息检测不透明缺陷的终点。 当到达玻璃基板的部分为终点时，在下一个处理中该部分不被高负载或高度固定模式扫描，并且只有未到达终点的部分被高负载扫描 高度固定模式。

公开(公告)号：US07107826B2

公开(公告)日：2006-09-19

申请号：US11096875

申请日：2005-04-01

Applicant: Naoya Watanabe ,  Osamu Takaoka

Inventor： Naoya Watanabe ,  Osamu Takaoka

IPC: H01J37/352

CPC classification number: G01Q60/32 ,  G01Q80/00 ,  G03F1/72

Abstract: There is provided a device in which a probe can be used for both of observation and correction, and which can, even if a next generation photomask of ultra minute structure is made an object, perform a desired processing without injuring a normal portion in a process of obtaining information of a position and a shape of a defect part, and without impairing the probe also at a processing time. It has been adapted such that, at an observation time, a contact pressure between a probe and a mask is reduced to 0.1 nN by applying a vibration of 1 kHz to 1 MHz to the probe. It has been adapted such that a cantilever used in the present invention is formed by a silicon material of 100–600 μm in length and 5–50 μm in thickness and, at the observation time, the probe contacts with the mask at the contact pressure of 0.1 nN and, at the processing time, a defect correction can be performed by causing the probe to contact with the mask at the contact pressure of 10 nN to 1 mN.

Abstract translation: 提供了一种可以将探头用于观察和校正的装置，并且即使下一代超微小结构的光掩模被制成物体也可以进行所需的处理而不损害处理中的正常部分 获得缺陷部分的位置和形状的信息，并且在处理时间也不损害探针。 已经适应使得在观察时间，通过向探针施加1kHz至1MHz的振动，将探针和掩模之间的接触压力降低至0.1nN。 已经适应使得本发明中使用的悬臂由长度为100〜600μm，厚度为5-50μm的硅材料形成，并且在观察时刻，探针以接触压力与掩模接触 0.1nN，并且在处理时间，可以通过使探针以10nN至1mN的接触压力与掩模接触来进行缺陷校正。