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125 条记录 (耗时 0.032 秒)

    System and method to form unpolarized light
    83.
    发明授权
    System and method to form unpolarized light 有权
    系统和方法形成非偏振光

    公开(公告)号：US07649676B2

    公开(公告)日：2010-01-19

    申请号：US11452435

    申请日：2006-06-14

    申请人： Johannes Jacobus Matheus Baselmans ,  Huibert Visser

    发明人： Johannes Jacobus Matheus Baselmans ,  Huibert Visser

    IPC分类号： G02B26/08

    CPC分类号： G02B27/123 ,  G03F7/70566

    摘要： A system and method are used to form an unpolarized light beam from a polarized light beam. A system comprises a source of radiation and a unpolarizing system. The source of radiation produces a linear polarized beam. The unpolarizing system has first and second optical paths and splits the linear polarized beam. A first portion of the split beam travels along the first optical path having a first path length. A second portion of the split beam travels along the second optical path having a second, different path length. The first and second portions of the split beam are combined to form the unpolarized beam.

    摘要翻译： 使用系统和方法来形成来自偏振光束的非偏振光束。 系统包括辐射源和非偏振系统。 辐射源产生线偏振光束。 非偏振系统具有第一和第二光路，并分裂线偏振光束。 分束的第一部分沿着具有第一路径长度的第一光路行进。 分束的第二部分沿着具有第二不同路径长度的第二光路传播。 分束的第一和第二部分被组合以形成非偏振光束。

    Interferometric lithography system and method used to generate equal path lengths of interfering beams
    84.
    发明授权
    Interferometric lithography system and method used to generate equal path lengths of interfering beams 有权
    用于产生相等路径长度的干涉光束的干涉光刻系统和方法

    公开(公告)号：US07561252B2

    公开(公告)日：2009-07-14

    申请号：US11320473

    申请日：2005-12-29

    申请人： Harry Sewell ,  Johannes Jacobus Matheus Baselmans

    发明人： Harry Sewell ,  Johannes Jacobus Matheus Baselmans

    IPC分类号： G03B27/54 ,  G03B27/72

    CPC分类号： G03B27/54 ,  G03F7/70408

    摘要： A system and method are provided for writing patterns onto substrates. First and second beams are directed to converge and substantially overlap in a common region on a substrate. This can be done so that the first and second beams are mutually temporally coherent and spatially coherent in the region of overlap to form interference fringes to define a writing image. A beam width of the first and second beams is adjusted. This can be done so that respective path lengths of the beams are matched when they reach the common region to ensure the first and second beams are mutually spatially coherent and temporally coherent across an entire width of the common region. In one example, the substrate is moved with respect to the writing image, while writing patterns onto the substrate. In another example, the substrate remains stationary.

    摘要翻译： 提供了将图案写入基板的系统和方法。 引导第一和第二光束在基板上的公共区域中会聚并基本重叠。 这可以进行，使得第一和第二波束在重叠区域中相互时空相干和空间相干以形成干涉条纹以限定写入图像。 调整第一和第二光束的光束宽度。 这可以进行，使得当它们到达公共区域时，波束的相应路径长度匹配，以确保第一和第二波束在公共区域的整个宽度上相互空间相干和时间相干。 在一个示例中，当将图案写入基板时，基板相对于写入图像移动。 在另一个实例中，衬底保持静止。

    Device Manufacturing Method and Lithographic Apparatus
    85.
    发明申请
    Device Manufacturing Method and Lithographic Apparatus 有权
    设备制造方法和平版印刷设备

    公开(公告)号：US20090168039A1

    公开(公告)日：2009-07-02

    申请号：US12345105

    申请日：2008-12-29

    申请人： Haico Victor KOK ,  Johannes Jacobus Matheus Baselmans ,  Marcus Adrianus Van De Kerkhof

    发明人： Haico Victor KOK ,  Johannes Jacobus Matheus Baselmans ,  Marcus Adrianus Van De Kerkhof

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70116 ,  G03F7/70075 ,  G03F7/706

    摘要： A device manufacturing method includes a measurement phase and an exposure phase. The measurement phase includes conditioning a radiation beam with a first beam condition, forming the patterned radiation beam by imparting the radiation beam with the first beam condition with a first pattern in its cross-section, and projecting the patterned beam onto a sensor capable of providing a sensor output signal. The exposure phase includes fast switching the conditioning of the radiation beam to a second beam condition, the second beam condition being different from the first beam condition, forming the patterned radiation beam by imparting the radiation beam with the second beam condition with a second pattern in its cross-section, the second pattern being provided by a patterning device, and projecting the patterned beam onto a target portion of the substrate.

    摘要翻译： 装置制造方法包括测量阶段和曝光阶段。 测量阶段包括对具有第一光束条件的辐射束进行调节，通过在其横截面中赋予具有第一图案的第一光束条件的辐射束来形成图案化的辐射束，并且将图案化的光束投影到能够提供 传感器输出信号。 曝光阶段包括将辐射束的调理快速切换到第二光束状态，第二光束条件不同于第一光束条件，通过将第二光束条件赋予具有第二光束条件的第二光束条件来形成图案化辐射束 其横截面，第二图案由图案形成装置提供，并且将图案化的光束投影到基板的目标部分上。

    Lithographic apparatus and device manufacturing method utilizing data filtering
    90.
    发明授权
    Lithographic apparatus and device manufacturing method utilizing data filtering 有权
    利用数据滤波的平版印刷设备和器件制造方法

    公开(公告)号：US07403265B2

    公开(公告)日：2008-07-22

    申请号：US11093259

    申请日：2005-03-30

    申请人： Patricius Aloysius Jacobus Tinnemans ,  Johannes Jacobus Matheus Baselmans

    发明人： Patricius Aloysius Jacobus Tinnemans ,  Johannes Jacobus Matheus Baselmans

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G03B27/32

    CPC分类号： G03F7/70191 ,  G03F7/70291 ,  G03F7/70433 ,  G03F7/70508

    摘要： An apparatus and method are used to form patterns on a substrate. The comprise a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams of radiation. The patterning device modulates the sub-beams of radiation to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters for pattern sharpening, image log slope control, and/or CD biasing can also be used.

    摘要翻译： 使用装置和方法在基板上形成图案。 包括投影系统，图案形成装置，低通滤波器和数据操作装置。 投影系统将辐射束投射到基板上作为辐射子束阵列。 图案形成装置调制辐射的子光束以在衬底上基本上产生所要求的剂量图案。 低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。 数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。 在各种示例中，还可以使用用于图案锐化，图像对数斜率控制和/或CD偏置的滤波器。