公开(公告)号：US07983360B2

公开(公告)日：2011-07-19

申请号：US12955603

申请日：2010-11-29

申请人： Masato Tanaka ,  Hiroji Akahori

发明人： Masato Tanaka ,  Hiroji Akahori

IPC分类号： H03K9/00 ,  H04L27/00

CPC分类号： H04L27/2647 ,  H03G3/3052 ,  H03G3/3078 ,  H04L25/03159 ,  H04L27/2657

摘要： A radiofrequency signal is converted to an intermediate frequency signal by a tuner, which is amplified by a variable gain amplifier. The so-amplified signal is converted into a digital signal by an ADC, which is supplied to an FFT, where it is separated into signals set every carrier, followed by being supplied to equalizers different in characteristic. The digital signal outputted from the ADC is further supplied to a level converting circuit from which a control signal is generated. The control signal is supplied to a DAC and a Doppler frequency detector. The DAC generates a gain control signal and supplies the same to the variable gain amplifier. The Doppler frequency detector outputs a frequency component of the control signal as a Doppler detection signal. The Doppler detection signal is compared with a threshold value by a comparator. A selector selects one of signals outputted from the equalizers, in accordance with a select signal indicative of the result of comparison.

摘要翻译： 射频信号由调谐器转换成中频信号，该调谐器由可变增益放大器放大。 被放大的信号被ADC转换成数字信号，ADC被提供给FFT，其中被分离成每个载波设置的信号，随后被提供给不同特性的均衡器。 从ADC输出的数字信号进一步提供给产生控制信号的电平转换电路。 控制信号被提供给DAC和多普勒频率检测器。 DAC产生增益控制信号并将其提供给可变增益放大器。 多普勒频率检测器输出控制信号的频率分量作为多普勒检测信号。 通过比较器将多普勒检测信号与阈值进行比较。 选择器根据表示比较结果的选择信号来选择从均衡器输出的信号之一。

公开(公告)号：US20110129768A1

公开(公告)日：2011-06-02

申请号：US12912675

申请日：2010-10-26

申请人： Masaki Nonaka ,  Masato Tanaka ,  Masataka Kawahara ,  Michiyo Sekiya ,  Akira Yoshida

发明人： Masaki Nonaka ,  Masato Tanaka ,  Masataka Kawahara ,  Michiyo Sekiya ,  Akira Yoshida

IPC分类号： G03G15/00 ,  G03G21/18

CPC分类号： G03G21/1814 ,  G03G5/0542 ,  G03G5/0546 ,  G03G5/0592 ,  G03G5/0614 ,  G03G5/071 ,  G03G5/1473 ,  G03G5/14734 ,  G03G5/14791 ,  G03G5/14795 ,  G03G2215/00957

摘要： According to aspects of the present invention, an electrophotographic photosensitive member includes a surface layer comprising a cured resin obtained by polymerizing a compound having at least one polymerizable functional group. Aspects of the present invention provide an electrophotographic photosensitive member whose surface layer comprises a compound (urea derivative) having a certain structure, a method for producing the electrophotographic photosensitive member, and a process cartridge and an electrophotographic apparatus including the electrophotographic photosensitive member.

摘要翻译： 根据本发明的方面，电子照相感光构件包括包含通过聚合具有至少一个可聚合官能团的化合物而获得的固化树脂的表面层。 本发明的方面提供了一种电子照相感光构件，其表面层包含具有一定结构的化合物（脲衍生物），一种用于制造电子照相感光构件的方法，以及一种处理盒和包括该电照相感光构件的电子照相设备。

公开(公告)号：US20110076614A1

公开(公告)日：2011-03-31

申请号：US12891468

申请日：2010-09-27

申请人： Masato Tanaka

发明人： Masato Tanaka

IPC分类号： G03F7/004 ,  F26B3/347

CPC分类号： F26B5/048 ,  C09B23/04 ,  C09B35/023 ,  C09B47/067 ,  C09B57/008 ,  C09B67/0003 ,  G03G5/0679

摘要： A method of drying an organic pigment is provided which includes an under-depressurization microwave drying step of irradiating the organic pigment with microwaves under depressurization and drying the organic pigment. A method of processing a phthalocyanine pigment and a method of manufacturing an electrophotographic photosensitive member are also provided each of which utilizes the drying method.

摘要翻译： 提供了一种干燥有机颜料的方法，其包括在减压下微波干燥步骤，在减压下用微波照射有机颜料并干燥有机颜料。 还提供了处理酞菁颜料的方法和制造电子照相感光构件的方法，每种方法利用干燥方法。

公开(公告)号：US20100178620A1

公开(公告)日：2010-07-15

申请号：US12624427

申请日：2009-11-24

申请人： Satoshi DEI ,  Kyoyu Yasuda ,  Koichi Hasegawa ,  Fumihiro Toyokawa ,  Masato Tanaka ,  Keiji Konno

发明人： Satoshi DEI ,  Kyoyu Yasuda ,  Koichi Hasegawa ,  Fumihiro Toyokawa ,  Masato Tanaka ,  Keiji Konno

IPC分类号： B05D1/32 ,  G03F7/20 ,  C09D183/04

CPC分类号： G03F7/0757 ,  C09D183/04 ,  G03F7/0035 ,  G03F7/0048 ,  G03F7/40

摘要： A method for forming an inverted pattern includes forming a photoresist pattern on a substrate, filling a space formed by the photoresist pattern with a resin composition including a polysiloxane and a solvent, and removing the photoresist pattern to form an inverted pattern. The resin composition includes (A) a polysiloxane obtained by hydrolysis and condensation of two types of hydrolysable silane compounds having a specific structure, and (B) an organic solvent containing an alcohol or ether having a specific structure.

摘要翻译： 形成反转图案的方法包括在基板上形成光致抗蚀剂图案，用由聚硅氧烷和溶剂的树脂组合物填充由光致抗蚀剂图案形成的空间，并除去光致抗蚀剂图案以形成倒置图案。 树脂组合物包含（A）通过水解和缩合具有特定结构的两种类型的可水解硅烷化合物获得的聚硅氧烷，和（B）含有特定结构的醇或醚的有机溶剂。

公开(公告)号：US20100151384A1

公开(公告)日：2010-06-17

申请号：US12715406

申请日：2010-03-02

申请人： Keiji Konno ,  Masato Tanaka ,  Momoko Ishii ,  Junichi Takahashi ,  Tomoki Nagai

发明人： Keiji Konno ,  Masato Tanaka ,  Momoko Ishii ,  Junichi Takahashi ,  Tomoki Nagai

IPC分类号： G03F7/075 ,  C07F7/08

CPC分类号： G03F7/0752 ,  G03F7/0751 ,  G03F7/11 ,  H01L21/0274 ,  H01L21/0332 ,  Y10S430/106 ,  Y10S430/115 ,  Y10T428/31515 ,  Y10T428/31612 ,  Y10T428/31663

摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi (OR3)4-a  (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.

摘要翻译： 提供了抗蚀剂下层膜用组合物。 该组合物具有优异的储存稳定性，并且可以形成对抗蚀剂膜具有优异粘合性的抗蚀剂下层膜，可以提高抗蚀剂图案的再现性，并且耐显影用碱性液体和除去抗蚀剂期间的氧气需求。 该组合物包含下式（A）的硅烷化合物的水解产物和/或缩合物，其中R1是具有至少一个不饱和键的一价有机基团的R 1 b R 2 c Si（OR 3）4-a（A），R 2各自表示 氢原子，卤原子或一价有机基团，R 3分别表示一价有机基团，R 1为除OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c为 0〜2的整数，条件是a = b + c。

公开(公告)号：US20090050020A1

公开(公告)日：2009-02-26

申请号：US11816642

申请日：2006-02-24

申请人： Keiji Konno ,  Masato Tanaka ,  Momoko Ishii ,  Junichi Takahashi ,  Tomoki Nagai

发明人： Keiji Konno ,  Masato Tanaka ,  Momoko Ishii ,  Junichi Takahashi ,  Tomoki Nagai

IPC分类号： C09D4/00

CPC分类号： G03F7/0752 ,  G03F7/0751 ,  G03F7/11 ,  H01L21/0274 ,  H01L21/0332 ,  Y10S430/106 ,  Y10S430/115 ,  Y10T428/31515 ,  Y10T428/31612 ,  Y10T428/31663

摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen ashing during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi(OR3)4-a  (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.

摘要翻译： 提供了抗蚀剂下层膜用组合物。 该组合物具有优异的储存稳定性，并且可以形成对抗蚀剂膜具有优异粘附性的抗蚀剂下层膜，可以提高抗蚀剂图案的再现性，并且耐除去抗蚀剂期间用于显影的碱性液体和氧气灰化。 组合物包含下式（A）的硅烷化合物的水解产物和/或缩合物，<？在线式描述=“在线式”末端=“铅”→> R1bR2cSi（OR3）4- a（A）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中R1是具有至少一个不饱和键的一价有机基团，R2各自表示氢原子，卤素原子 或一价有机基团，R 3分别表示一价有机基团，R 1为除OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c为0〜2的整数， 条件是a = b + c。

公开(公告)号：US07452644B2

公开(公告)日：2008-11-18

申请号：US11358204

申请日：2006-02-22

申请人： Masato Tanaka ,  Masataka Kawahara ,  Atsushi Fujii ,  Yuka Ishizuka

发明人： Masato Tanaka ,  Masataka Kawahara ,  Atsushi Fujii ,  Yuka Ishizuka

IPC分类号： G03G5/047

CPC分类号： G03G5/144 ,  G03G5/0517 ,  G03G5/0542 ,  G03G5/0571 ,  G03G5/0601 ,  G03G5/0609 ,  G03G5/0679 ,  G03G5/0696 ,  G03G5/0698 ,  G03G5/142

摘要： An electrophotographic photosensitive member capable of outputting an image in which a defect such as a ghost is suppressed even in a high-temperature-and-high-humidity environment, and in which a defect such as a change in density due to an abrupt change in light-area potential at an initial stage or a ghost due to long-term durable use is suppressed even in a low-humidity environment; and a process cartridge and an electrophotographic apparatus each having the electrophotographic photosensitive member; are provided. The electrophotographic photosensitive member has a layer which comprises a compound having a specific structure between a support and a charge-generating layer.

摘要翻译： 能够输出即使在高温高湿环境下也能抑制诸如重影等缺陷的图像的电子照相感光构件，其中由于突然变化引起的密度变化等缺陷 甚至在低湿度环境下也抑制了由于长期耐久使用而导致的初始阶段或重影的光区电位; 以及各自具有电照相感光构件的处理盒和电子照相设备; 被提供。 电子照相感光构件具有包含在载体和电荷产生层之间具有特定结构的化合物的层。

公开(公告)号：US20080091040A1

公开(公告)日：2008-04-17

申请号：US11905890

申请日：2007-10-05

申请人： Li-Biao Han ,  Chang-Qiu Zhao ,  Masato Tanaka

发明人： Li-Biao Han ,  Chang-Qiu Zhao ,  Masato Tanaka

IPC分类号： C07F9/32

CPC分类号： C07F17/02 ,  C07F9/3217

摘要： A novel, optically active alkenylphosphinic acid ester having chirality on a phosphorus atom; and a simple process for producing the ester. An optically active, hydrogen phosphinic acid ester is reacted with an acetylene compound in the presence of a catalyst containing a metal of group 9 or 10 of the periodic table to thereby obtain a novel, optically active alkenylphosphinic acid ester which has chirality on a phosphorus atom and is represented by the following general formula [1] and/or [2]. R1{CH═CR2[P(O)(OR3)Ar]}n  [1] R1{C[P(O)(OR3)Ar]═CHR2}n  [2]

摘要翻译： 一种在磷原子上具有手性的新型光学活性烯基次膦酸酯; 和用于生产酯的简单方法。 在含有元素周期表第9或10族金属的催化剂存在下，使光学活性氢次膦酸酯与乙炔化合物反应，从而获得在磷原子上具有手性的新的光学活性烯基次膦酸酯 并由以下通式[1]和/或[2]表示。 <？in-line-formula description =“In-line Formulas”end =“lead”？> R＆lt; 1＆gt; {CH-CR 2] [P（O） ＆lt; 3＆gt;＆gt;）Ar]} <1> 在线公式描述=“在线公式”end =“tail”？> <？in-line -formulae description =“In-line Formulas”end =“lead”？> R <1> {C [P（O）（OR 3）Ar] -CHR ^{2 } <？in-line-formula description =“In-line Formulas”end =“tail”？>}

公开(公告)号：US07346403B2

公开(公告)日：2008-03-18

申请号：US10569035

申请日：2004-08-02

申请人： Masato Tanaka ,  Seiji Kato

发明人： Masato Tanaka ,  Seiji Kato

IPC分类号： G05B13/02

CPC分类号： G05B11/42 ,  G05B13/042

摘要： A PID parameter adjustment device includes: a model storage section (1) for storing an equation model to be controlled; a PID controller storage section (2) for storing a control algorithm; a constraint condition storage section (3) for storing a constraint condition for the operation; a simulation operation section (5) for executing simulation of a control system according to the constraint condition; an ideal control result storage section (6) for storing an ideal control response characteristic; an evaluation function operation section (7) for calculating the evaluation function value indicating the closeness between the simulation result and the ideal control response characteristic; and a PID parameter search operation section (8) for executing simulation while modifying the PID parameter and searching a PID parameter at which the evaluation function value is optimal.

摘要翻译： PID参数调整装置包括：模型存储部（1），用于存储要控制的等式模型; 用于存储控制算法的PID控制器存储部分（2）; 用于存储操作的约束条件的约束条件存储部分（3） 模拟操作部（5），用于根据约束条件执行控制系统的模拟; 用于存储理想控制响应特性的理想控制结果存储部分（6）; 用于计算表示模拟结果与理想控制响应特性之间的接近度的评价函数值的评价函数运算部（7） 以及PID参数搜索操作部（8），用于在修改PID参数的同时进行仿真，并且搜索评估函数值最优的PID参数。

公开(公告)号：US20080026314A1

公开(公告)日：2008-01-31

申请号：US10576075

申请日：2004-10-14

申请人： Isao Nishimura ,  Noboru Yamahara ,  Masato Tanaka ,  Tsutomu Shimokawa

发明人： Isao Nishimura ,  Noboru Yamahara ,  Masato Tanaka ,  Tsutomu Shimokawa

IPC分类号： G03C5/00

CPC分类号： G03F7/0757 ,  C07F7/0838 ,  C07F7/1804 ,  C08G77/14 ,  C08G77/24 ,  G03F7/0045

摘要： A novel polysiloxane suitable as a resin component of a chemically-amplified resist exhibiting particularly excellent I-D bias, depth of focus (DOF), and the like, a novel silane compound useful as a raw material for synthesizing the polysiloxane, and a radiation-sensitive resin composition comprising the polysiloxane are provided.The silane compound is shown by the following formula (I), and the polysiloxane has a structural unit shown by the following formula (1), wherein R is an alkyl group, R1 and R2 individually represent a fluorine atom, lower alkyl group, or lower fluoroalkyl group, n is 0 or 1, k is 1 or 2, and i is an integer of 0 to 10.The radiation-sensitive resin composition comprises the polysiloxane and a photoacid generator.

摘要翻译： 适用作为具有特别优异的ID偏压，深度聚焦（DOF）等的化学增幅抗蚀剂的树脂组分的新型聚硅氧烷，可用作合成聚硅氧烷的原料的新型硅烷化合物和辐射敏感性 提供了包含聚硅氧烷的树脂组合物。 硅烷化合物由下式（I）表示，聚硅氧烷具有下述式（1）所示的结构单元，式中，R为烷基，R 1，R 2， 2个独立地表示氟原子，低级烷基或低级氟代烷基，n为0或1，k为1或2，i为0至10的整数。该辐射敏感性树脂组合物包含 聚硅氧烷和光致酸发生剂。