Disk-rotation control apparatus
    81.
    发明授权
    Disk-rotation control apparatus 失效
    盘旋转控制装置

    公开(公告)号:US6118742A

    公开(公告)日:2000-09-12

    申请号:US058844

    申请日:1998-04-13

    CPC分类号: G11B19/247

    摘要: If a determination is made that a signal is not normally detected by the pre-pit-region detection circuit 53, an error signal is obtained from a pulse generator 58 to control the rotations of the disk 50. If a determination is made that a signal is normally detected by the pre-pit-region detection circuit 53 and if the synchronizing signals are not normally detected at predetermined intervals, an error signal is obtained from the wobble signal so that the rotations of the disk 50 are controlled. If a determination is made that synchronizing signals are detected by the pre-pit-region detection circuit 53 at predetermined intervals, an error signal is obtained from clocks synchronized with the reproduced signal generated by the PLL circuit 54 so that rotations of the disk 50 are controlled.

    摘要翻译: 如果确定信号未被预凹坑区域检测电路53正常检测到,则从脉冲发生器58获得误差信号以控制盘50的旋转。如果确定信号 通常由预凹坑区域检测电路53检测到,并且如果以预定间隔不正常地检测到同步信号,则从摆动信号获得误差信号,从而控制盘50的旋转。 如果确定了预定间隔检测电路53以预定间隔检测到同步信号,则从与PLL电路54产生的再现信号同步的时钟获得误差信号,使得盘50的旋转为 受控。

    Method for measuring crystal defect and equipment using the same
    82.
    发明授权
    Method for measuring crystal defect and equipment using the same 有权
    测量晶体缺陷的方法及使用其的设备

    公开(公告)号:US6108079A

    公开(公告)日:2000-08-22

    申请号:US245195

    申请日:1999-02-05

    摘要: In order to measure an inner defect of a sample with a certain high accuracy even if the sample surface of the moved up and down by flatness irregularity of the sample and problem on accuracy of the sample movement stage, incident light beams having two wavelength and respective different penetration depths for the sample are slantingly irradiated on the surface of the moving sample 15 from irradiation optical systems 4, 8, and the inner defect of the sample is measured by detecting the scattering light occurred from the interior of the sample with a detection optical system 9 arranged over the sample surface. A distance measurement means 14 is located in an upstream of a movement direction of said sample than said irradiation optical system 4, 8 and said detection optical system 9, thereby a surface height of said sample is measured. When a measured point on sample measured by the distance measurement means 14 is arrived at a lower part of the detection optical system 9, height positions of the irradiation optical system and the detection optical system are controlled by piezo electric elements 11,12,13 so that the irradiation optical system and the detection optical system are located at predetermined positions relating to the measured point.

    摘要翻译: 为了以一定的高精度测量样品的内部缺陷,即使样品的平坦度不均匀性上下移动的样品表面和样品移动台的精度问题,具有两个波长的入射光束和相应的 样品的不同穿透深度从照射光学系统4,8倾斜地照射在移动样品15的表面上,并且通过用检测光学检测从样品内部发生的散射光来测量样品的内部缺陷 系统9布置在样品表面上。 距离测量装置14位于所述样品的移动方向的上游,比所述照射光学系统4,8和所述检测光学系统9,从而测量所述样品的表面高度。 当通过距离测量装置14测量的样品上的测量点到达检测光学系统9的下部时,照射光学系统和检测光学系统的高度位置由压电元件11,12,13所控制 照射光学系统和检测光学系统位于与测量点相关的预定位置处。

    Spectrophotometer with a system for calibrating a monochromator
    83.
    发明授权
    Spectrophotometer with a system for calibrating a monochromator 失效
    分光光度计,带有校准单色仪的系统

    公开(公告)号:US5557404A

    公开(公告)日:1996-09-17

    申请号:US405652

    申请日:1995-03-17

    CPC分类号: G01J3/18 G01J2003/2866

    摘要: Irregular mechanical imperfections caused by constituent parts of a monochromator in connection with wavelength setting are compensated by calibrating the monochromator according to the present invention. A whole measurable spectral range in the monochromator is divided into a plurality of spectral regions by a plurality of calibration wavelengths. Errors between apparent wavelengths set theoretically and their true wavelengths are obtained with respect to the respective calibration wavelengths. Error functions in connection with the respective spectral regions are calculated on the basis of the array of the obtained errors. An element to be detected in a sample is measured under a wavelength the error of which has been compensated for by use of an error function in a spectral region associated with a wavelength to be detected.

    摘要翻译: 通过校准本发明的单色仪来补偿由与单色仪的波长设定有关的组成部分引起的不规则的机械缺陷。 单色仪中的整个可测量光谱范围被多个校准波长分成多个光谱区域。 理论上设定的表观波长与其相应校准波长之间的真实波长的误差。 基于获得的误差的阵列来计算与相应的光谱区域相关的误差函数。 通过在与要检测的波长相关联的光谱区域中使用误差函数对其误差进行了补偿的波长进行测量。

    Polarization interferometer
    85.
    发明授权
    Polarization interferometer 失效
    偏振干涉仪

    公开(公告)号:US4732481A

    公开(公告)日:1988-03-22

    申请号:US42244

    申请日:1987-04-24

    摘要: A polarization interferometer includes a light source to be measured, a Wollaston prism, a pair of polarizers arranged in such a manner that the Wollaston prism is interposed between the polarizers and the plane of polarization of each polarizer is inclined at 45.degree. to each of two crystallographic axes of the Wollaston prism, a photodetector for detecting an interference fringe which is spatially formed by two light beams separated by the Wollaston prism, changeover means for causing one of the polarizers to changeover from one of polarizing and non-polarizing states to the other state, memory means for storing a first output signal which is delivered from the photodetector in a state that one polarizer is kept at the non-polarizing state, and means for dividing a second output signal which is delivered from the photodetector in a state that one polarizer is kept at the polarizing state, by the first output signal stored in the memory means.

    摘要翻译: 偏振干涉仪包括待测量的光源,Wollaston棱镜,以这样的方式布置的一对偏振器,使得Wollaston棱镜插入在偏振器之间并且每个偏振器的偏振面之间倾斜45° Wollaston棱镜的晶轴,用于检测由由Wollaston棱镜分离的两个光束空间形成的干涉条纹的光电检测器,用于使偏振器之一从偏振和非偏振状态之一转换到另一个的转换装置 状态,用于存储在一个偏振器保持在非偏振状态的状态下从光电检测器传送的第一输出信号的存储装置,以及用于将从光电检测器传送的第二输出信号划分为一个 通过存储在存储装置中的第一输出信号将偏振器保持在偏光状态。

    Waterproof watch case
    86.
    发明授权
    Waterproof watch case 失效
    防水表壳

    公开(公告)号:US4117658A

    公开(公告)日:1978-10-03

    申请号:US721146

    申请日:1976-09-07

    IPC分类号: G04B37/08 G04B39/00

    CPC分类号: G04B37/084

    摘要: A waterproof watch case construction depends on gaskets alone for waterproofing and is free of cement. The construction is such that a broken crystal can be readily replaced, and the watch case itself can be of any shape, including square, ovoid and hexagonal, as well as circular. The watch crystal is located positively by means of a bezel and a ring which compress a gasket both axially and radially against the watch crystal.

    摘要翻译: 防水表壳的构造取决于垫片单独用于防水,并且不含水泥。 该结构使得可以容易地更换破碎的晶体,并且表壳本身可以是任何形状,包括方形,卵形和六边形以及圆形。 手表晶体通过一个边框和一个环来定位,该表圈将垫圈沿轴向和径向压靠在手表晶体上。

    Touch response sensor for an electronic musical instrument
    87.
    发明授权
    Touch response sensor for an electronic musical instrument 失效
    触摸电子乐器的响应传感器

    公开(公告)号:US4079651A

    公开(公告)日:1978-03-21

    申请号:US762558

    申请日:1977-01-25

    申请人: Shigeru Matsui

    发明人: Shigeru Matsui

    IPC分类号: G10H1/055 G10H3/00

    CPC分类号: G10H1/0558 Y10S84/07

    摘要: This invention relates to a touch response sensor for an electronic musical instrument which may control the volume, pitch, tone-color or the like of the musical tones produced by the instrument upon depression of the key responsive to the key depressing pressure. In order to detect the key depressing pressure, the touch response sensor has an electrically conductive resilient member having two legs downwardly extending therefrom for producing resistance variations between contact pieces provided on a base plate under the resilient member in response to the key depressing pressure. The contact pieces are, for example, connected via lines to a voltage-controlled variable-frequency oscillator circuit, voltage-controlled variable filter circuit, voltage-controlled variable gain amplifier circuit or the like so as to vary the volume and the like of the tones in accordance with the key depressing pressure.

    摘要翻译: 本发明涉及一种用于电子乐器的触摸响应传感器,其可以响应于按键按压而按下按键时可以控制由乐器产生的乐音的音量,音高,色调等。 为了检测键按压压力,触摸响应传感器具有导电弹性构件,其具有从其向下延伸的两个腿,用于响应于按键压力而产生设置在弹性构件下方的底板上的接触片之间的电阻变化。 接触片例如通过线路连接到压控可变频率振荡器电路,压控可变滤波器电路,压控可变增益放大器电路等,以便改变其容量等 音调按照按键压力。

    Light source device, surface inspecting apparatus using the device, and method for calibrating surface inspecting apparatus using the device
    88.
    发明授权
    Light source device, surface inspecting apparatus using the device, and method for calibrating surface inspecting apparatus using the device 有权
    光源装置,使用该装置的表面检查装置以及使用该装置校准表面检查装置的方法

    公开(公告)号:US08743357B2

    公开(公告)日:2014-06-03

    申请号:US13058081

    申请日:2009-07-15

    IPC分类号: G01N21/00 G02B27/20

    摘要: A surface inspecting apparatus can inspect a smaller defect by using a PSL of a smaller particle size. However, the particle size of the PSL is restricted. In the conventional surface inspecting apparatus, therefore, no consideration has been taken as to how to inspect the defect of such a small particle size as is not set in the PSL which will be needed in the near future in an inspection of a semiconductor manufacturing step. The invention has a light source device for generating light which simulated at least one of a wavelength, a light intensity, a time-dependent change of the light intensity, and a polarization of light which was scattered, diffracted, or reflected by an inspection object, and the light is inputted to a photodetector of the surface inspecting apparatus. The smaller defect can be inspected.

    摘要翻译: 表面检查装置可以通过使用较小粒径的PSL来检查较小的缺陷。 然而,PSL的粒径受到限制。 因此,在传统的表面检查装置中,在半导体制造步骤的检查中,不考虑如何检查在不久的将来需要的PSL中未设置的这种小粒径的缺陷 。 本发明具有用于产生光的光源装置,其模拟由检查对象散射,衍射或反射的光的波长,光强度,时间依赖性变化和光的偏振中的至少一个 并且光被输入到表面检查装置的光电检测器。 可以检查较小的缺陷。

    DIFFRACTION GRATING MANUFACTURING METHOD, SPECTROPHOTOMETER, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
    89.
    发明申请
    DIFFRACTION GRATING MANUFACTURING METHOD, SPECTROPHOTOMETER, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD 审中-公开
    衍射光栅制造方法,分光光度计和半导体器件制造方法

    公开(公告)号:US20140092384A1

    公开(公告)日:2014-04-03

    申请号:US14118375

    申请日:2012-05-17

    IPC分类号: G02B5/18 H01L21/26

    摘要: The present invention has been made in view of the above, and an object thereof is to provide a manufacturing technique capable of manufacturing a diffraction grating which is suitable for use in a spectrophotometer and has an apex angle of a convex portion of about 90° and can satisfy high diffraction efficiency and a low stray light amount. A method of manufacturing a diffraction grating, the method including: setting an exposure condition such that a sectional shape of a convex portion of a resist on a substrate, which has been formed by exposure, is an asymmetric triangle with respect to an opening portion shape of a mask having an opening portion with a periodic structure and an angle formed by a long side and a short side of the triangle is about 90°; and performing exposure.

    摘要翻译: 发明内容本发明是鉴于上述问题而完成的,其目的在于提供一种制造技术,其能够制造适用于分光光度计的衍射光栅,并具有约90°的凸部的顶角和 可以满足高衍射效率和低杂散光量。 一种制造衍射光栅的方法,该方法包括:设置曝光条件,使得通过曝光形成的基板上的抗蚀剂的凸部的截面形状相对于开口部形状为不对称三角形 具有周期性结构的开口部分和由三角形的长边和短边形成的角度的面具为约90°; 并进行曝光。

    Inspection apparatus
    90.
    发明授权
    Inspection apparatus 有权
    检验仪器

    公开(公告)号:US08542354B2

    公开(公告)日:2013-09-24

    申请号:US12361954

    申请日:2009-01-29

    IPC分类号: G01N21/00

    摘要: The present invention provides an inspection apparatus having a high throughput and high sensitivity with respect to a number of various manufacturing processes and defects of interest in inspection of a specimen such as a semiconductor wafer on which a pattern is formed. The apparatus illuminates with light the specimen having the pattern formed thereon, forms an image of the specimen on an image sensor through a reflective optics, and determines the existence/nonexistence of a defect. The reflective optics has a conjugate pair of Fourier transform optics. An aberration of the reflective optics is corrected off-axis. The reflective optics has a field of view in non-straight-line slit form on the specimen surface. Also, the optics is of a reflection type, includes a conjugate pair of Fourier transform optics and has a field of view in non-straight-line slit form. An optimum wavelength band is selected according to the specimen (FIG. 1).

    摘要翻译: 本发明提供了一种检测装置,其相对于在其上形成有图案的半导体晶片的样本的检查中的多种制造工艺和多个不同的制造工艺和缺陷而具有高生产率和高灵敏度。 该装置用光照射具有形成在其上的图案的样本,通过反射光学元件在图像传感器上形成样本的图像,并且确定缺陷的存在/不存在。 反射光学器件具有傅立叶变换光学器件的共轭对。 反射光学器件的像差被偏离校正。 反射光学元件在样品表面上具有非直线狭缝形式的视场。 此外,光学器件是反射型的,包括傅立叶变换光学器件的共轭对,并且具有非直线狭缝形式的视场。 根据样品选择最佳波长带(图1)。