公开(公告)号：US20090202138A1

公开(公告)日：2009-08-13

申请号：US12361954

申请日：2009-01-29

申请人： Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

发明人： Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

IPC分类号： G06K9/00

CPC分类号： G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G06K9/74

摘要： The present invention provides an inspection apparatus having a high throughput and high sensitivity with respect to a number of various manufacturing processes and defects of interest in inspection of a specimen such as a semiconductor wafer on which a pattern is formed. The apparatus illuminates with light the specimen having the pattern formed thereon, forms an image of the specimen on an image sensor through a reflective optics, and determines the existence/nonexistence of a defect. The reflective optics has a conjugate pair of Fourier transform optics. An aberration of the reflective optics is corrected off-axis. The reflective optics has a field of view in non-straight-line slit form on the specimen surface. Also, the optics is of a reflection type, includes a conjugate pair of Fourier transform optics and has a field of view in non-straight-line slit form. An optimum wavelength band is selected according to the specimen (FIG. 1).

摘要翻译： 本发明提供了一种检测装置，其相对于在其上形成有图案的半导体晶片的样本的检查中的多种制造工艺和多个不同的制造工艺和缺陷而具有高生产率和高灵敏度。 该装置用光照射具有形成在其上的图案的样本，通过反射光学元件在图像传感器上形成样本的图像，并且确定缺陷的存在/不存在。 反射光学器件具有傅立叶变换光学器件的共轭对。 反射光学器件的像差被偏离校正。 反射光学元件在样品表面上具有非直线狭缝形式的视场。 此外，光学器件是反射型的，包括傅立叶变换光学器件的共轭对，并且具有非直线狭缝形式的视场。 根据样品选择最佳波长带（图1）。

公开(公告)号：US08542354B2

公开(公告)日：2013-09-24

申请号：US12361954

申请日：2009-01-29

申请人： Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

发明人： Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G06K9/74

摘要： The present invention provides an inspection apparatus having a high throughput and high sensitivity with respect to a number of various manufacturing processes and defects of interest in inspection of a specimen such as a semiconductor wafer on which a pattern is formed. The apparatus illuminates with light the specimen having the pattern formed thereon, forms an image of the specimen on an image sensor through a reflective optics, and determines the existence/nonexistence of a defect. The reflective optics has a conjugate pair of Fourier transform optics. An aberration of the reflective optics is corrected off-axis. The reflective optics has a field of view in non-straight-line slit form on the specimen surface. Also, the optics is of a reflection type, includes a conjugate pair of Fourier transform optics and has a field of view in non-straight-line slit form. An optimum wavelength band is selected according to the specimen (FIG. 1).

摘要翻译： 本发明提供了一种检测装置，其相对于在其上形成有图案的半导体晶片的样本的检查中的多种制造工艺和多个不同的制造工艺和缺陷而具有高生产率和高灵敏度。 该装置用光照射具有形成在其上的图案的样本，通过反射光学元件在图像传感器上形成样本的图像，并且确定缺陷的存在/不存在。 反射光学器件具有傅立叶变换光学器件的共轭对。 反射光学器件的像差被偏离校正。 反射光学元件在样品表面上具有非直线狭缝形式的视场。 此外，光学器件是反射型的，包括傅立叶变换光学器件的共轭对，并且具有非直线狭缝形式的视场。 根据样品选择最佳波长带（图1）。

公开(公告)号：US20130250297A1

公开(公告)日：2013-09-26

申请号：US13990103

申请日：2011-10-11

申请人： Masaaki Ito ,  Minori Noguchi

发明人： Masaaki Ito ,  Minori Noguchi

IPC分类号： G01N21/95

CPC分类号： G01N21/9501 ,  G01N21/95607

摘要： Disclosed here is a macro inspection apparatus for a sample such as a semiconductor wafer having a pattern formed thereon, the apparatus being capable of detecting abnormalities in dimension and size with high sensitivity.The inspection apparatus for a sample having pattern formed thereon includes: an illumination optical system which illuminates the sample having the pattern formed thereon; a detection optical system which receives scattered light from the pattern; an imaging device which is disposed over a pupil plane of the detection optical system, the imaging device acquiring Fourier images of the pattern; and a processing unit which compares the Fourier images with the Fourier image of the normal pattern to detect an irregularity of the pattern.

摘要翻译： 这里公开了一种用于诸如其上形成有图案的半导体晶片的样品的宏观检查装置，该装置能够以高灵敏度检测尺寸和尺寸的异常。 用于其上形成有图案的样品的检查装置包括：照射具有形成在其上的图案的样品的照明光学系统; 检测光学系统，其接收来自图案的散射光; 成像装置，其设置在所述检测光学系统的光瞳平面上，所述成像装置获取所述图案的付里叶图像; 以及处理单元，其将傅立叶图像与正常图案的傅里叶图像进行比较，以检测图案的不规则性。

公开(公告)号：US20100106443A1

公开(公告)日：2010-04-29

申请号：US12683455

申请日：2010-01-07

申请人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

发明人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC分类号： G06F19/00 ,  G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

摘要翻译： 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US20080059094A1

公开(公告)日：2008-03-06

申请号：US11846829

申请日：2007-08-29

申请人： Kei SHIMURA ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

发明人： Kei SHIMURA ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC分类号： G06F19/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

摘要翻译： 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US07953567B2

公开(公告)日：2011-05-31

申请号：US12683455

申请日：2010-01-07

申请人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

发明人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC分类号： G06F19/00 ,  G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

摘要翻译： 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US07672799B2

公开(公告)日：2010-03-02

申请号：US11846829

申请日：2007-08-29

申请人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

发明人： Kei Shimura ,  Minori Noguchi ,  Masaaki Ito ,  Kenji Aiko ,  Shuichi Chikamatsu ,  Shigeo Otsuki ,  Shigeru Abe ,  Masayuki Ochi ,  Takuaki Sekiguchi ,  Hiroyuki Yamashita

IPC分类号： G06F19/00 ,  G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/95607 ,  G01N21/95623 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/0006 ,  G06T2207/30148

摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.

摘要翻译： 缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角 并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线， 空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。 此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

公开(公告)号：US07535562B2

公开(公告)日：2009-05-19

申请号：US11437643

申请日：2006-05-22

申请人： Shigeru Matsui ,  Masaaki Ito

发明人： Shigeru Matsui ,  Masaaki Ito

IPC分类号： G01N21/00

CPC分类号： G01N21/8806 ,  G01N21/956

摘要： In the conventional methods for enhancing defect detection sensitivity by improving the resolving power, if a microscopic pattern, which is a high spatial-frequency structure as is the case with a microscopic defect, has become the brightest portion, the gray-scale contrast of the microscopic defect will be enhanced. At the same time, however, the gray-scale contrast of the microscopic pattern will also be enhanced simultaneously. Consequently, there has existed a problem that it is impossible to enhance the microscopic-defect detection sensitivity further than that. In the present invention, an aperture stop which is divided into a plurality of small apertures is located on an illumination pupil plane. Then, light-shield/light-transmission for each small aperture is controlled independently of each other. This control allows an inspection-target object to be illuminated at only an incident angle at which the gray-scale contrast of the microscopic defect will be emphasized more sharply.

摘要翻译： 在通过提高分辨能力来提高缺陷检测灵敏度的常规方法中，如果与微观缺陷一样的高空间频率结构的微观图案已经成为最亮部分，则灰度对比度 微观缺陷将得到加强。 然而，同时，微观图案的灰度对比度也将同时提高。 因此，存在不可能进一步提高微观缺陷检测灵敏度的问题。 在本发明中，分割成多个小孔的孔径光阑位于照明光瞳平面上。 然后，彼此独立地控制每个小孔的遮光/透光。 该控制允许仅在更明显地强调微观缺陷的灰度对比度的入射角度照射检查对象物体。

公开(公告)号：US20060262297A1

公开(公告)日：2006-11-23

申请号：US11437643

申请日：2006-05-22

申请人： Shigeru Matsui ,  Masaaki Ito

发明人： Shigeru Matsui ,  Masaaki Ito

IPC分类号： G01N21/88

CPC分类号： G01N21/8806 ,  G01N21/956

摘要： In the conventional methods for enhancing defect detection sensitivity by improving the resolving power, if a microscopic pattern, which is a high spatial-frequency structure as is the case with a microscopic defect, has become the brightest portion, the gray-scale contrast of the microscopic defect will be enhanced. At the same time, however, the gray-scale contrast of the microscopic pattern will also be enhanced simultaneously. Consequently, there has existed a problem that it is impossible to enhance the microscopic-defect detection sensitivity further than that. In the present invention, an aperture stop which is divided into a plurality of small apertures is located on an illumination pupil plane. Then, light-shield/light-transmission for each small aperture is controlled independently of each other. This control allows an inspection-target object to be illuminated at only an incident angle at which the gray-scale contrast of the microscopic defect will be emphasized more sharply.

公开(公告)号：US20140198321A1

公开(公告)日：2014-07-17

申请号：US14240669

申请日：2012-07-27

申请人： Masaaki Ito ,  Takahiro Jingu ,  Hisashi Hatano

发明人： Masaaki Ito ,  Takahiro Jingu ,  Hisashi Hatano

IPC分类号： G01B11/24 ,  G01N21/55

CPC分类号： G01B11/303 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/4738 ,  G01N21/55 ,  G01N21/9501 ,  G01N2201/12

摘要： In related art, consideration is not given to that a spatial distribution of scattered light changes in various direction such as forward/backward/sideways according to a difference in micro roughness. Particularly, although a step-terrace structure appearing on an epitaxial growth wafer produces anisotropy in the scattered light distribution, consideration is not given to this point in the related art. The invention includes a process in which light is illuminated to a sample surface, plural detection optical systems mutually different in directions of optical axes detect a spatial distribution of scattered light, and a spatial frequency spectrum of the sample surface is calculated.

摘要翻译： 在现有技术中，不考虑散射光的空间分布根据微粗糙度的差异而在各种方向如前后/侧面变化。 特别地，虽然出现在外延生长晶片上的台阶平台结构在散射光分布中产生各向异性，但是在现有技术中没有考虑到这一点。 本发明包括将光照射到样品表面的方法，在光轴方向上彼此不同的多个检测光学系统检测散射光的空间分布，并且计算样品表面的空间频谱。