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111 条记录 (耗时 0.043 秒)

    METHOD FOR MANUFACTURING CHARGED PARTICLE BEAM LENS
    81.
    发明申请
    METHOD FOR MANUFACTURING CHARGED PARTICLE BEAM LENS 审中-公开
    制造充电颗粒光束镜的方法

    公开(公告)号：US20140190006A1

    公开(公告)日：2014-07-10

    申请号：US14005037

    申请日：2012-03-14

    申请人： Yutaka Setomoto ,  Takahisa Kato

    发明人： Yutaka Setomoto ,  Takahisa Kato

    IPC分类号： H05K3/46

    CPC分类号： H05K3/4679 ,  H01J37/12 ,  H01J2237/0437 ,  H01J2237/04924 ,  H01J2237/1205 ,  Y10T29/49165

    摘要： There is provided a method for manufacturing a charged particle beam lens having a bonded electrode obtained by bonding at least a first conductive substrate having a first through-hole and a second conductive substrate having a second through-hole. The above method includes: forming the first through-hole in the first conductive substrate; forming the second through-hole in the second conductive substrate; and bonding the first conductive substrate and the second conductive substrate so that the first through-hole and the second through-hole communicate with each other.

    摘要翻译： 提供了一种制造带电粒子束透镜的方法，该方法具有通过将至少具有第一通孔的第一导电基板和具有第二通孔的第二导电基板结合而获得的接合电极。 上述方法包括：在第一导电衬底中形成第一通孔; 在第二导电衬底中形成第二通孔; 并且将第一导电基板和第二导电基板接合，使得第一通孔和第二通孔彼此连通。

    Silicon processing method and silicon substrate with etching mask
    84.
    发明授权
    Silicon processing method and silicon substrate with etching mask 失效
    硅处理方法和硅衬底与蚀刻掩模

    公开(公告)号：US08324113B2

    公开(公告)日：2012-12-04

    申请号：US12545235

    申请日：2009-08-21

    申请人： Takahisa Kato ,  Yasuhiro Shimada

    发明人： Takahisa Kato ,  Yasuhiro Shimada

    IPC分类号： H01L21/302

    CPC分类号： B81C1/00626 ,  B81B2201/0271 ,  B81C1/00404 ,  B81C2201/0133 ,  B81C2201/0198

    摘要： A silicon processing method includes: forming a mask pattern on a principal plane of a single-crystal silicon substrate; and applying crystal anisotropic etching to the principal surface to form a structure including a (111) surface and a crystal surface equivalent thereto and having width W1 and length L1. The principal plane includes a (100) surface and a crystal surface equivalent thereto or a (110) surface and a crystal surface equivalent thereto. A determining section for determining the width W1 of the structure is formed in the mask pattern. The width of the determining section for the width W1 of the mask pattern is width W2. The width of the mask pattern other than the determining section is larger than the width W2 over a length direction of the mask pattern.

    摘要翻译： 硅处理方法包括：在单晶硅衬底的主平面上形成掩模图案; 并对主表面施加结晶各向异性蚀刻，形成包括（111）表面和与其等效的晶面的结构，并具有宽度W1和长度L1。 主平面包括（100）表面和与其等效的（110）表面和与其等效的（110）表面和晶体表面。 用于确定结构的宽度W1的确定部分形成在掩模图案中。 掩模图案的宽度W1的确定部的宽度为宽度W2。 除了确定部分之外的掩模图案的宽度大于在掩模图案的长度方向上的宽度W2。

    Processes for producing coenzyme Q10
    86.
    发明授权
    Processes for producing coenzyme Q10 有权
    生产辅酶Q10的方法

    公开(公告)号：US07910340B2

    公开(公告)日：2011-03-22

    申请号：US11981181

    申请日：2007-10-31

    申请人： Kazuyoshi Yajima ,  Takahisa Kato ,  Akihisa Kanda ,  Shiro Kitamura ,  Yasuyoshi Ueda

    发明人： Kazuyoshi Yajima ,  Takahisa Kato ,  Akihisa Kanda ,  Shiro Kitamura ,  Yasuyoshi Ueda

    IPC分类号： C12P1/00 ,  C12P7/66

    CPC分类号： C12P7/66 ,  C12P7/22

    摘要： The present invention relates to a process for producing reduced coenzyme Q10 which comprises obtaining microbial cells containing reduced coenzyme Q10 at a ratio of not less than 70 mole % among the entire coenzymes Q10, optionally disrupting the cells and recovering thus-produced reduced coenzyme Q10. The present invention also relates to a process for producing oxidized coenzyme Q10 which comprises either recovering oxidized coenzyme Q10 after oxidizing the above-mentioned microbial cells or disrupted product thereof, or recovering reduced coenzyme Q10 from the above-mentioned microbial cells or disrupted product thereof to oxidize thus-obtained reduced coenzyme Q10 thereafter. According to the processes of the present invention, reduced coenzyme Q10 and oxidized coenzyme Q10 can be produced simply on the industrial scale.

    摘要翻译： 本发明涉及还原型辅酶Q10的制备方法，其包括在整个辅酶Q10中获得含有不少于70摩尔％的还原型辅酶Q10的微生物细胞，任选地破坏细胞并回收如此生产的还原型辅酶Q10。 本发明还涉及氧化型辅酶Q10的制造方法，该方法包括在氧化上述微生物细胞或其破坏的产物后回收氧化型辅酶Q10，或将还原型辅酶Q10从上述微生物细胞或其破坏性产物回收至 此后氧化由此得到的还原型辅酶Q10。 根据本发明的方法，可以简单地在工业规模上制备还原型辅酶Q10和氧化型辅酶Q10。

    Light deflector using torsional rotation about two axes
    88.
    发明授权
    Light deflector using torsional rotation about two axes 失效
    光偏转器使用绕两个轴的扭转

    公开(公告)号：US07310176B2

    公开(公告)日：2007-12-18

    申请号：US11349922

    申请日：2006-02-09

    申请人： Takahisa Kato ,  Yukio Furukawa

    发明人： Takahisa Kato ,  Yukio Furukawa

    IPC分类号： G02B26/08

    CPC分类号： G02B26/105 ,  G02B26/085 ,  G02B26/101

    摘要： A light deflector for scanning with light from a light source comprises a support body, an oscillation system and a drive means for driving the oscillation system. The oscillation system includes a first movable element and a second movable element having a light deflecting body. The first movable element is resiliently supported by the support body by means of a single first torsion spring. The second movable element is resiliently supported by the first movable element by means of a plurality of second torsion springs located vis-à-vis with the second movable element interposed between them.

    摘要翻译： 用于从光源的光扫描的光偏转器包括支撑体，振荡系统和用于驱动振荡系统的驱动装置。 振荡系统包括具有光偏转体的第一可移动元件和第二可移动元件。 第一可移动元件通过单个第一扭转弹簧由支撑体弹性地支撑。 第二可移动元件由第一可移动元件弹性地支撑，该多个第二扭转弹簧相对于位于它们之间的第二可动元件相对设置。