公开(公告)号：US06078380A

公开(公告)日：2000-06-20

申请号：US338535

申请日：1999-06-23

申请人： Tetsuo Taniguchi ,  Nobutaka Magome ,  Naomasa Shiraishi

发明人： Tetsuo Taniguchi ,  Nobutaka Magome ,  Naomasa Shiraishi

IPC分类号： G03B27/68 ,  G03F7/20

CPC分类号： G03F7/70091 ,  G03B27/68 ,  G03F7/70108 ,  G03F7/7025

摘要： In a projection exposure apparatus and method, the intensity distribution of illumination light for detecting an imaging characteristic of a projection optical system is set substantially equal to the intensity distribution of exposure illumination light. The intensity distribution of a secondary light source in an exposure illumination optical system is changed in accordance with a pattern of a mask. Magnification and aberration of the projection optical system are adjusted in accordance with the changed intensity distribution of the secondary light source. A substrate stage is moved along an optical axis of the projection optical system to compensate movement of the image plane of the projection optical system caused by a change in the intensity distribution of the secondary light source. An exposure operation is interrupted when a light amount distribution is changed. Exposure control is also responsive to thermal accumulation in the projection optical system.

摘要翻译： 在投影曝光装置和方法中，用于检测投影光学系统的成像特性的照明光的强度分布被设定为基本上等于曝光照明光的强度分布。 曝光照明光学系统中的次级光源的强度分布根据掩模的图案而改变。 根据二次光源的强度分布变化来调整投影光学系统的放大率和像差。 衬底台沿着投影光学系统的光轴移动以补偿由二次光源的强度分布的变化引起的投影光学系统的像平面的移动。 当光量分布改变时，曝光操作中断。 曝光控制也对投影光学系统中的热积累有反应。

公开(公告)号：US5903356A

公开(公告)日：1999-05-11

申请号：US937523

申请日：1997-09-25

申请人： Naomasa Shiraishi

发明人： Naomasa Shiraishi

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B9/02

CPC分类号： G03F9/7088 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70191 ,  G03F9/70

摘要： Illuminating light at a pupil plane of an illumination optical system for illuminating a position detection mark on a substrate is limited to an annular area centered at an optical axis, and a member substantially blocks an image-forming light beam distributed over an area on a pupil plane of an image-forming optical system for forming an image of the position detection mark on an imaging device by receiving light generated from the mark, the area being in image-forming relation to the annular area on the pupil plane of the illumination optical system. Alternatively, a member gives a phase difference of approximately .pi./2 �rad! between the image-forming light beam distributed over the area which is in image-forming relation to the annular area on the pupil plane of the illumination optical system and the image-forming light beam distributed over the area other than that area. The outer radius r.sub.o and inner radius r.sub.i of the annular area on the pupil plane of the illumination optical system are determined so as to satisfy the following conditions: ##EQU1## where .lambda.1 is the shortest wavelength in the wave band of illuminating light contributing to the formation of an image signal, .lambda.2 is the longest wavelength in the wave band, and P is the period of the position detection mark.

摘要翻译： 用于照射基板上的位置检测标记的照明光学系统的光瞳平面处的照明光被限制在以光轴为中心的环形区域，并且构件基本上阻挡分布在瞳孔上的区域上的图像形成光束 平面，用于通过接收从标记产生的光来形成成像装置上的位置检测标记的图像的图像形成光学系统，该区域与照明光学系统的光瞳平面上的环形区域呈成像形成关系 。 或者，成员给出分布在与照明光学系统的光瞳平面上的环形区域成像关系的区域上的图像形成光束之间的近似π/ 2 [rad]的相位差，以及图像 形成的光束分布在该区域以外的区域上。 确定照明光学系统的光瞳面上的环形区域的外半径ro和内半径ri，以满足以下条件：其中λ1是有助于形成的照明光的波段中的最短波长 图像信号，λ2是波段中最长的波长，P是位置检测标记的周期。

公开(公告)号：US5815248A

公开(公告)日：1998-09-29

申请号：US921311

申请日：1997-08-29

申请人： Kenji Nishi ,  Naomasa Shiraishi

发明人： Kenji Nishi ,  Naomasa Shiraishi

IPC分类号： G03F7/20 ,  G03B27/32

CPC分类号： G03F7/7005 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70358

摘要： A diffraction grating is set between a light source and a fly-eye lens composed of a plurality of lens elements rectangular in cross section, and using the zeroth order diffraction beam and .+-.first order diffraction beams emergent from the diffraction grating, a plurality of light source images are formed along the longitudinal direction on the exit plane of each lens element in the fly-eye lens. In a preferred mode the intensity of illumination light on a mask is increased using first and second light sources, and a first illumination beam, which is obtained by combining a beam emitted from the first light source and passing through a half prism with a beam emitted from the second light source and reflected by the half prism on a same axis, and a second illumination beam, which is obtained by combining a beam emitted from the first light source and reflected by the half prism with a beam emitted from the second light source and passing through the half prism on a same axis, are made incident into the fly-eye lens as being inclined symmetrically with each other with respect to the optical axis of illumination optical system.

公开(公告)号：US5801390A

公开(公告)日：1998-09-01

申请号：US797632

申请日：1997-02-07

申请人： Naomasa Shiraishi

发明人： Naomasa Shiraishi

IPC分类号： G03F9/00 ,  G01N21/86

CPC分类号： G03F9/7065 ,  G03F9/70

摘要： Methods and apparatus are disclosed for performing detection of the position of a substrate, such as used in photolithography, with high precision by zero Nth-order detection. Alignment marks (grating marks) on the substrate are illuminated by coherent light beams comprising multiple wavelength components. Reflected light forms diffraction patterns that are detected by appropriate detectors. At least one level-difference detection circuit and at least one detected-position-correction circuit are provided, the former detecting grating-mark positions grating mark positions .DELTA.Xn' at respective wavelengths from light-quantity signals produced from the detectors, and the latter calculating relative level differences .delta..sub.n for the respective wavelengths at each grating mark, based on changes in the light-quantity signals accompanying relative scanning and based on design data for the grating marks. The apparatus also comprises a third circuit that calculates "final" positions of the grating marks by applying a factor corresponding to a situation resulting in the least amount of positional error to the positional determination as would otherwise be affected by asymmetry or resist-thickness variations of the grating mark.

摘要翻译： 公开了用于通过零次N次检测以高精度执行用于光刻中的基板的位置的检测的方法和装置。 衬底上的对准标记（光栅标记）由包括多个波长分量的相干光束照射。 反射光形成由适当的检测器检测的衍射图案。 提供了至少一个电平差检测电路和至少一个检测位置校正电路，前者的检测光栅标记从各检测器产生的光量信号将各波长的光栅标记位置DELTA Xn'，后者 基于伴随相关扫描的光量信号的变化，并且基于光栅标记的设计数据，计算每个光栅标记处的各个波长的相对电平差Δn。 该装置还包括第三电路，其通过将与导致最少量的位置误差的情况相对应的因子应用于位置确定来计算光栅标记的“最终”位置，否则将受到不对称或抗蚀剂厚度变化的影响 光栅标记。

公开(公告)号：US5677757A

公开(公告)日：1997-10-14

申请号：US411306

申请日：1995-03-27

申请人： Tetsuo Taniguchi ,  Naomasa Shiraishi

发明人： Tetsuo Taniguchi ,  Naomasa Shiraishi

IPC分类号： G03F7/20 ,  H01L21/30

CPC分类号： G03F7/70566 ,  G03F7/701 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/70333 ,  G03F7/70358 ,  G03F7/70858

摘要： A projection exposure apparatus having an illuminating system for irradiating a mask, which has a pattern, with illuminating light for exposure, and a projection optical system for projecting an image of the mask pattern onto a photosensitive substrate with predetermined image-forming characteristics under the illuminating light. The apparatus is provided with an optical filter changing member for selecting one of a plurality of optical filters that change at least one of optical characteristics of light from the mask by respective amounts which are different from each other. The optical characteristics include an amplitude distribution, a phase distribution and a condition of polarization. The optical filter changing member further disposes the selected optical filter on a pupil plane in the projection optical system or on a plane in the neighborhood of the pupil plane. The apparatus is further provided with a correcting member-changing member for selecting one of a plurality of image-forming characteristic correcting members that correct the image-forming characteristics of the projection optical system by respective amounts which are different from each other in accordance with the optical filter selected by the optical filter changing member, and for disposing the selected image-forming characteristic correcting member between the mask and the substrate.

摘要翻译： 一种具有用于照射具有图案的掩模和用于曝光的照明光的照明系统的投影曝光装置，以及投影光学系统，用于在照明下具有预定的图像形成特性将掩模图案的图像投影到感光基板上 光。 该装置设置有用于选择多个滤光器中的一个的滤光器改变构件，该多个滤光器改变彼此不同的相应量的来自掩模的光的光学特性中的至少一种。 光学特性包括振幅分布，相位分布和偏振条件。 光学滤波器改变构件还将所选择的滤光器放置在投影光学系统中的瞳孔平面上或者在瞳孔平面附近的平面上。 该装置还设置有校正构件改变构件，用于选择多个图像形成特性校正构件中的一个，其根据该装置来校正投影光学系统的图像形成特性，其各自的量彼此不同 由滤光器改变构件选择的光学滤波器，并且用于将所选择的图像形成特性校正构件设置在掩模和基板之间。

公开(公告)号：US5528390A

公开(公告)日：1996-06-18

申请号：US461105

申请日：1995-06-05

申请人： Akihiro Goto ,  Takashi Genma ,  Yutaka Ichihara ,  Nobutaka Magome ,  Naomasa Shiraishi ,  Toshio Matsuura ,  Hiroshi Shirasu ,  Masami Ebi

发明人： Akihiro Goto ,  Takashi Genma ,  Yutaka Ichihara ,  Nobutaka Magome ,  Naomasa Shiraishi ,  Toshio Matsuura ,  Hiroshi Shirasu ,  Masami Ebi

IPC分类号： G03F7/20 ,  G03H1/00 ,  G03H1/04 ,  G03H1/20

CPC分类号： G03F7/70058 ,  G03H1/0005 ,  G03H1/0408 ,  G03H2001/0094 ,  G03H2001/0491 ,  G03H2260/12

摘要： An exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques. The apparatus comprises support means for holding a hologram recording plate at a predetermined position both during recording operation and reconstructing operation, a first illuminating optical system for introducing a light beam from a coherent light source to a mask and irradiating a subject beam produced from the mask into the recording plate, a second illuminating optical system for irradiating the light beam from the coherent light source as a reference beam into the recording plate, a carrier apparatus for disposing during reconstructing operation a substrate at the position of the mask in place of the mask, a third illuminating optical system for irradiating a conjugate beam with the reference beam into the recording plate, in which a hologram has been formed by recording operation, to form an image of the hologram on the photo-sensitive surface of the substrate, and a controller for selectively controlling the first, second and third illuminating optical systems to put an at least selected one of them into an operative condition so as to irradiate a fixing light beam into the recording plate in order to fix the hologram.

摘要翻译： 一种用于使用全息技术将掩模图案再现到基板的光敏表面上的曝光装置。 该装置包括用于在记录操作和重建操作期间将全息图记录板保持在预定位置的支撑装置，用于将来自相干光源的光束引入到掩模并照射由掩模产生的被摄体光束的第一照明光学系统 将用于将来自相干光源的光束作为参考光束照射到记录板中的第二照明光学系统，用于在重建操作期间在掩模的位置处置换基板以代替掩模的载体设备 第三照明光学系统，用于将具有参考光束的共轭光束照射到通过记录操作形成全息图的记录板中，以在基板的光敏表面上形成全息图像，并且 控制器，用于选择性地控制第一，第二和第三照明光学系统， 其中最少选择的一个进入操作状态，以便将固定光束照射到记录板中以固定全息图。

公开(公告)号：US5272501A

公开(公告)日：1993-12-21

申请号：US934340

申请日：1992-08-25

申请人： Kenji Nishi ,  Saburo Kamiya ,  Naomasa Shiraishi

发明人： Kenji Nishi ,  Saburo Kamiya ,  Naomasa Shiraishi

IPC分类号： G03F9/00 ,  G03B27/42

CPC分类号： G03F9/7049

摘要： A projection exposure apparatus having an irradiation optical system for irradiating a pattern formed on a mask with first irradiation light, a projection optical system for imaging and projecting the image of the pattern of the mask onto a photosensitive substrate, and a mark detection device for irradiating a predetermined mark formed on the photosensitive substrate with second irradiation light in a wavelength region which is different from that of the first irradiation light by the projection optical system and detecting light generated from the mark, the projection exposure apparatus including: a deflection member disposed on a pupil surface of the projection optical system or in a periphery in an adjacent plane of the same, shielding a beam, which is a portion of the first irradiation light generated from the mask and incident on the projection optical system, and which passes through the peripheral portion of the pupil surface of the projection optical system, deflecting the second irradiation light by a predetermined quantity and passing the deflected second irradiation light, wherein the mark detection device includes an irradiation system for emitting the second irradiation light to travel toward the deflection member.

摘要翻译： 一种投影曝光装置，具有用于用第一照射光照射形成在掩模上的图案的照射光学系统，用于将掩模图案的图像成像并投射到感光基板上的投影光学系统，以及用于照射的标记检测装置 在所述感光基板上形成有与所述投影光学系统不同于所述第一照射光的波长区域的第二照射光，并且检测从所述标记产生的光的所述感光性基板上的规定标记，所述投影曝光装置包括：偏转构件， 投影光学系统的光瞳表面或其相邻平面中的周边，屏蔽作为从掩模产生并入射在投影光学系统上的第一照射光的一部分并且穿过投影光学系统的光束 投影光学系统的光瞳表面的周边部分， 以及通过所述偏转的第二照射光，其中所述标记检测装置包括用于发射所述第二照射光以朝向所述偏转构件行进的照射系统。

公开(公告)号：US5117255A

公开(公告)日：1992-05-26

申请号：US760004

申请日：1991-09-13

申请人： Naomasa Shiraishi ,  Tetsuo Taniguchi ,  Hidemi Kawai

发明人： Naomasa Shiraishi ,  Tetsuo Taniguchi ,  Hidemi Kawai

IPC分类号： G03F7/20

CPC分类号： G03F7/70458 ,  G03F7/70241 ,  G03F7/70258

摘要： An exposure apparatus for exposing on a substrate a pattern formed on a mask, comprises a projection optical system for forming the pattern on a predetermined focusing plane and projecting an image of the pattern on the substrate located to be substantially aligned with the focusing plane, driving means for three-dimensionally moving the mask or at least one of a plurality of optical system, or for inclining the mask or said at least one of the plurality of optical members with respect to a plane substantially perpendicular to an optical axis of the projection optical system and correcting means for driving the driving means to anisotropically change optical characteristics of the projection optical system so that the projected image of the pattern is matched with a pattern already formed on the substrate.

摘要翻译： 一种用于在基板上曝光形成在掩模上的图案的曝光装置，包括投影光学系统，用于在预定的聚焦平面上形成图案，并将图案的图像投影在基板上，基本上与聚焦平面对齐，驱动 用于三维地移动掩模或多个光学系统中的至少一个的装置，或用于相对于基本上垂直于投影光学的光轴的平面倾斜多个光学构件中的掩模或所述至少一个光学构件的装置 系统和校正装置，用于驱动驱动装置以各向异性地改变投影光学系统的光学特性，使得图案的投影图像与已经形成在基板上的图案相匹配。

公开(公告)号：US20090068597A1

公开(公告)日：2009-03-12

申请号：US11795198

申请日：2006-01-13

申请人： Naomasa Shiraishi

发明人： Naomasa Shiraishi

IPC分类号： G03F7/20 ,  G03B27/32 ,  G03B27/72

CPC分类号： G03B27/72 ,  G03B27/32 ,  G03F1/38 ,  G03F1/50 ,  G03F7/7035 ,  G03F7/70408

摘要： An exposure method provided is a high-resolution and inexpensive method suitable for use in formation of a fine pattern for making up an electronic device. A diffraction grating is located in proximity to a wafer or the like for making up an electronic device, and illumination light with a predetermined incidence angle property is applied onto the diffraction grating to effect exposure on the wafer. The exposure is done while changing a positional relation between the semiconductor wafer and the diffraction grating according to need.

摘要翻译： 提供的曝光方法是适用于形成用于构成电子设备的精细图案的高分辨率和便宜的方法。 衍射光栅位于靠近用于构成电子器件的晶片等上，并且具有预定入射角特性的照明光被施加到衍射光栅上以在晶片上实现曝光。 在根据需要改变半导体晶片和衍射光栅之间的位置关系的同时进行曝光。

公开(公告)号：US20090011368A1

公开(公告)日：2009-01-08

申请号：US11884891

申请日：2006-02-23

申请人： Yutaka Ichihara ,  Ayako Nakamura ,  Naomasa Shiraishi ,  Akikazu Tanimoto ,  Yuji Kudo

发明人： Yutaka Ichihara ,  Ayako Nakamura ,  Naomasa Shiraishi ,  Akikazu Tanimoto ,  Yuji Kudo

IPC分类号： G03F7/22 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F7/70408 ,  G02B5/1838 ,  G02B5/1866 ,  G02B13/143 ,  G02B27/4222 ,  G02B27/4272 ,  G02B27/4277 ,  G03B27/42 ,  G03F7/70283 ,  G03F7/7035

摘要： An object is to provide a high-resolution and economical exposure method suitable for use in formation of a fine pattern for making up an electronic device. Two diffraction gratings (P1, P2) are located in series in an optical path; the two diffraction gratings (P1, P2) and a wafer or the like (W) for making up an electronic device are arranged with a predetermined spacing; a light-dark pattern of interference fringes generated by the diffraction gratings (P1, P2) is transferred onto the wafer or the like (W) to effect exposure. The exposure is done while changing a positional relation between the wafer or the like (W) and the diffraction gratings (P1, P2) according to need.

摘要翻译： 目的是提供一种适合用于形成用于构成电子设备的精细图案的高分辨率和经济的曝光方法。 两个衍射光栅（P1，P2）串联在光路中; 用于构成电子设备的两个衍射光栅（P1，P2）和晶片等（W）以预定间隔布置; 由衍射光栅（P1，P2）产生的干涉条纹的暗暗图案被转印到晶片等（W）上以进行曝光。 在根据需要改变晶片等（W）和衍射光栅（P1，P2）之间的位置关系的同时进行曝光。