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447 条记录 (耗时 0.063 秒)

    Method and apparatus for face-up substrate polishing
    82.
    发明授权
    Method and apparatus for face-up substrate polishing 失效
    面朝上衬底抛光的方法和装置

    公开(公告)号：US06776693B2

    公开(公告)日：2004-08-17

    申请号：US10163796

    申请日：2002-06-04

    申请人： Alain Duboust ,  Shou-Sung Chang ,  Liang-Yuh Chen ,  Yan Wang ,  Siew Neo ,  Lizhong Sun ,  Feng Q. Liu

    发明人： Alain Duboust ,  Shou-Sung Chang ,  Liang-Yuh Chen ,  Yan Wang ,  Siew Neo ,  Lizhong Sun ,  Feng Q. Liu

    IPC分类号： B24B100

    CPC分类号： B24B37/046 ,  B23H5/08 ,  B24B37/042

    摘要： A method and apparatus are provided for polishing a substrate surface. In one aspect, an apparatus for polishing a substrate includes a basin and a polishing head. A carrier is disposed in the basin and has a substrate supporting surface. A retaining ring is disposed on the carrier and at least partially circumscribes the substrate supporting surface. The polishing head is supported above the basin and includes a conductive polishing pad. Embodiments may further include a vent to allow gas to escape through the polishing head. Embodiments may further include an electrolyte supply that flows electrolyte into the polishing head and out through a permeable electrode and the conductive pad to the substrate. Embodiments may also be configured with a polishing head diameter smaller than the substrate supported by the carrier.

    摘要翻译： 提供了一种用于抛光衬底表面的方法和装置。 一方面，用于抛光衬底的装置包括盆和抛光头。 载体布置在盆中并具有基底支撑表面。 保持环设置在载体上并且至少部分地限定基板支撑表面。 抛光头支撑在盆面上方，并包括导电抛光垫。 实施例还可包括通气孔，以允许气体通过抛光头逸出。 实施例还可以包括将电解质流入抛光头并通过可渗透电极流出并将导电垫流到基底的电解质供应。 实施例还可以被配置为具有小于由载体支撑的基板的抛光头直径。

    Method and system for designing and analyzing optical application specific integrated circuits
    90.
    发明授权
    Method and system for designing and analyzing optical application specific integrated circuits 失效
    光电专用集成电路设计与分析方法与系统

    公开(公告)号：US5930150A

    公开(公告)日：1999-07-27

    申请号：US716660

    申请日：1996-09-06

    申请人： Leonard George Cohen ,  Morton I. Schwartz ,  Yan Wang ,  Henry Howard Yaffe

    发明人： Leonard George Cohen ,  Morton I. Schwartz ,  Yan Wang ,  Henry Howard Yaffe

    IPC分类号： G02B6/12 ,  G06F17/50 ,  G06F15/60

    CPC分类号： G02B6/12 ,  G02B6/12004 ,  G06F17/5036 ,  G06F17/5045

    摘要： A computer system and method provide a CAD tool by which application specific optical integrated circuits may be easily and quickly designed. The computer system has a graphical user interface which provides the designer with an empty canvas upon which the user may place selected icons of any one of a plurality of optical devices. The designer can select from any one of a number of interconnects to place an icon of the selected interconnect between two of the optical devices. The characteristics of each optical device or interconnect may be varied from default settings to a desired group of settings. To verify the operation of a designed circuit, the user simply clicks each icon along an optical path and the computer system provides a spectral analysis of optical power versus wavelength for the defied optical path. The user can also design optical chips by selecting and placing end ports into an optical circuit and can then clump or group the entire optical circuit into a single icon representing the chip. The computer system also provides the designer with the ability to group optical chips together to form wafers. The optical circuits, as well as the chips and wafers, may be designed in any one of several manufacturing standards.

    摘要翻译： 计算机系统和方法提供可以容易且快速地设计专用光学集成电路的CAD工具。 计算机系统具有图形用户界面，其向设计者提供空画布，用户可以在其上放置多个光学设备中的任何一个的所选图标。 设计者可以从多个互连中的任何一个中选择，以在两个光学设备之间放置所选互连的图标。 每个光学设备或互连的特性可以从默认设置变化到期望的一组设置。 为了验证设计的电路的操作，用户简单地沿着光学路径点击每个图标，并且计算机系统提供对于反射光路的光功率对波长的光谱分析。 用户还可以通过选择并将端口放置在光学电路中来设计光学芯片，然后可以将整个光学电路聚集或分组成表示芯片的单个图标。 计算机系统还为设计者提供将光学芯片组合在一起以形成晶片的能力。 光学电路以及芯片和晶片可以以几种制造标准中的任何一种来设计。