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公开(公告)号：US6167111A
公开(公告)日：2000-12-26
申请号：US108373
申请日：1998-07-01
Applicant: Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Shinichi Hara
Inventor： Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Shinichi Hara
CPC classification number: G03F7/70058 , G21K1/06
Abstract: An apparatus for transferring a pattern of a mask onto a substrate with radiation light from a synchrotron radiation light source, includes a first mirror for collectively reflecting radiation light from the synchrotron radiation light source, and a second mirror for reflecting radiation light from the first mirror and for projecting the same to the mask. When a light ray advancing from a light emission point of the light source toward a center of a predetermined region of the mask, to be transferred to the substrate, is taken as a chief ray, when a normal to each of the first and second mirrors at an incidence position of a corresponding chief ray is taken as a Z axis, when a direction perpendicular to a plane defined by the Z axis of each mirror and a corresponding chief ray is taken as an X axis, and when a Y axis is taken along a direction perpendicular to the Z axis and X axis of each mirror, the first mirror has a reflection surface of a shape which is concave with respect to the X axis direction and concave with respect to the Y axis direction, while the second mirror has a reflection surface of a shape which is convex with respect to the Y axis direction.
Abstract translation: 一种用于利用来自同步加速器辐射光源的辐射光将掩模图案转印到基板上的装置，包括用于共同地反射来自同步加速器辐射光源的辐射光的第一反射镜和用于反射来自第一反射镜的辐射光的第二反射镜 并将其投射到面罩。 当将从光源的发光点向掩模的预定区域的中心传播的光线作为主光线时，当第一和第二反射镜中的每一个的法线 当将相应的主光线的入射位置作为Z轴时，当将与每个反射镜的Z轴和相应的主光线所定义的平面垂直的方向作为X轴，并且当采用Y轴时 沿着与每个反射镜的Z轴和X轴垂直的方向，第一反射镜具有相对于X轴方向为凹形且相对于Y轴方向凹陷的形状的反射面，而第二反射镜具有 相对于Y轴方向凸出的形状的反射面。
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公开(公告)号：US5923719A
公开(公告)日：1999-07-13
申请号：US896961
申请日：1997-07-18
Applicant: Yutaka Watanabe
Inventor： Yutaka Watanabe
IPC: H01L21/027 , G03F7/20 , G21K1/06 , G03G15/04
CPC classification number: G03F7/70075 , G03F7/702 , G21K1/06
Abstract: An exposure apparatus for projecting radiation light from a synchrotron radiation source to an object to be illuminated. The apparatus includes at least one set of flat surface mirrors disposed along a synchrotron radiation orbital plane and opposed to each other with a principal ray interposed therebetween and also disposed in two stages with respect to a direction of the principal ray. A first-stage flat surface mirror of the flat surface mirrors receives radiation light, emitted from the radiation source along the synchrotron radiation orbital plane, and reflects the same toward a second-stage flat surface mirror of the flat surface mirrors, which opposes the first-stage mirror with the principal ray direction interposed therebetween. At least one projection mirror receives radiation light from the flat surface mirrors and reflects and projects the same toward the object to illuminate it. The radiation light reflected by the second-stage flat surface mirror is deflected by the projection mirror to illuminate an effective region on the object, and the directions of the flat surface mirrors and the direction of radiation light impinging on them are placed in a predetermined relationship regarding a plane defined by radiation light emitted along the synchrotron radiation orbital plane.
Abstract translation: 一种用于将来自同步加速器辐射源的辐射光投射到被照明物体的曝光装置。 该装置包括沿着同步加速器辐射轨道平面布置的至少一组平面反射镜，并且彼此相对地设置有主射线并且相对于主光线的方向分成两级。 平面镜的第一级平面镜接收从辐射源沿着同步加速器辐射轨道平面发射的辐射光，并将其反射到平面镜的第二级平面镜，该平面镜与第一 其中主射线方向插入其间。 至少一个投影镜接收来自平面镜的辐射光，并将其反射并投影到物体上以照亮它。 由第二级平面镜反射的辐射光被投影镜偏转以照射物体上的有效区域，并且平面反射镜的方向和照射在它们上的辐射光的方向以预定关系 关于由沿着同步加速器辐射轨道平面发射的辐射光限定的平面。
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公开(公告)号：US5740355A
公开(公告)日：1998-04-14
申请号：US661582
申请日：1996-06-04
Applicant: Yutaka Watanabe , Yasuaki Muraki , Takashi Nakagawa
Inventor： Yutaka Watanabe , Yasuaki Muraki , Takashi Nakagawa
CPC classification number: H04L43/16 , H04L43/045 , H04L43/0817
Abstract: A collection filter is created by a filter creation module according to instruction from a trace control module, and packet logs are collected by a line collection module. Further, an application log extraction module extracts application logs from packet logs by sequence matching using an extraction filter which contains a sequence filter, a performance analysis module analyzes the application logs using an analysis filter, and a graph display module displays a graph of the results.
Abstract translation: 收集过滤器由过滤器创建模块根据跟踪控制模块的指令创建，包日志由线路收集模块收集。 此外，应用日志提取模块通过使用包含序列过滤器的提取过滤器通过序列匹配从分组日志中提取应用程序日志，性能分析模块使用分析过滤器分析应用程序日志，图形显示模块显示结果图 。
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公开(公告)号：US5519321A
公开(公告)日：1996-05-21
申请号：US252220
申请日：1994-06-01
Applicant: Juergen Hagen , Yutaka Watanabe
Inventor： Juergen Hagen , Yutaka Watanabe
CPC classification number: G01R33/34084 , A61B5/0555 , G01R33/3415 , G01R33/3678 , H01Q7/00
Abstract: A circularly polarizing local antenna for use in a magnetic resonance apparatus is formed by first and second antennae, which are in turn respectively formed by first and second coils. The second coil has an opening surrounding an examination region, through which an examination subject can be introduced. The arrangement includes a coil holder, to which the first coil is attached so as to be movable between first and second positions and to which the second coil is rigidly attached. When the first coil is oriented in the first position, it also surrounds the examination region, with the respective coil axes of the first and second coils being disposed substantially perpendicular to each other. In the first position, the first coil obstructs the opening of the second coil. By moving the first coil from the first position to the second position, the first coil becomes oriented so as to leave the opening of the second coil unobstructed, permitting unimpeded introduction of the examination subject into the examination region.
Abstract translation: 用于磁共振装置的圆偏振局部天线由第一和第二天线形成，第一和第二天线又分别由第一和第二线圈形成。 第二线圈具有围绕检查区域的开口，通过该开口可以引入检查对象。 该装置包括线圈保持器，第一线圈被附接到线圈架，以便能够在第一和第二位置之间移动，并且第二线圈刚性地附接到线圈架。 当第一线圈定向在第一位置时，其也包围检查区域，第一和第二线圈的相应线圈轴线基本上彼此垂直地设置。 在第一位置，第一线圈阻挡第二线圈的开口。 通过将第一线圈从第一位置移动到第二位置，第一线圈被定向成使得第二线圈的开口不被阻挡，允许不受阻碍地将检查对象引入检查区域。
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85.发明授权
公开(公告)号：US5444753A
公开(公告)日：1995-08-22
申请号：US203752
申请日：1994-03-01
Applicant: Masami Hayashida , Yutaka Watanabe
Inventor： Masami Hayashida , Yutaka Watanabe
IPC: G03F1/22 , G03F7/20 , H01L21/027 , G21K5/00
CPC classification number: G03F7/70075 , G03F7/702
Abstract: Disclosed are an X-ray lithography mask, an exposure apparatus and an exposure process such as an X-ray lithography exposure apparatus and an X-ray lithography exposure process. An X-ray lithography mask includes an X-ray transmission membrane, a transfer pattern depicted on the X-ray transmission membrane and a frame for supporting the X-ray transmission membrane. The transfer pattern is depicted on the basis of a changing direction of a film thickness profile of the X-ray transmission membrane. In the exposure apparatus and process, a changing direction of an intensity profile of a radiation light illuminated on an exposure area of a mask is coincident with a changing direction of a film thickness profile of a light transmission membrane on the mask and an illumination time of the radiation light for the exposure area is changed on the basis of the intensity profile of the radiation light and the thickness profile of the light transmission membrane so that the intensity of a transfer patter image formed by the transmission of the radiation light through the light transmission membrane is rendered uniform.
Abstract translation: 公开了X射线光刻掩模，曝光装置和曝光处理，例如X射线光刻曝光装置和X射线光刻曝光工艺。 X射线光刻掩模包括X射线透射膜，X射线透射膜上所示的转印图案和用于支撑X射线透过膜的框架。 基于X射线透过膜的膜厚分布的变化方向来描绘转印图案。 在曝光装置和处理中，照射在掩模的曝光区域上的辐射光的强度分布的改变方向与掩模上的透光膜的膜厚分布的变化方向一致，并且照射时间 基于辐射光的强度分布和透光膜的厚度分布来改变曝光区域的辐射光，使得通过透射光透过而形成的转印图案图像的强度 膜均匀。
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Patent Agency Ranking
公开(公告)号：US5394451A
公开(公告)日：1995-02-28
申请号：US955433
申请日：1992-10-02
Applicant: Akira Miyake , Yutaka Watanabe
Inventor： Akira Miyake , Yutaka Watanabe
CPC classification number: G03F7/702 , G03F7/70991
Abstract: An optical arrangement includes an optical system for transforming synchrotron radiation light emitted from an emission point of a synchrotron ring into a substantially parallel beam, with respect to a first direction which is parallel to an orbit plane of the synchrotron ring and with respect to a second direction which is perpendicular to the orbit plane, wherein an absolute value of a focal length of the optical system in the first direction is smaller than that in the second direction.
Abstract translation: 光学装置包括光学系统，用于相对于平行于同步加速器环的轨道平面的第一方向，并相对于第二方向将从同步加速器环的发射点发射的同步加速度辐射光转换为基本平行的光束 方向垂直于所述轨道平面，其中所述光学系统在所述第一方向上的焦距的绝对值小于所述第二方向上的焦距的绝对值。
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公开(公告)号：US5204887A
公开(公告)日：1993-04-20
申请号：US945578
申请日：1992-09-16
Applicant: Masami Hayashida , Yutaka Watanabe , Masahito Niibe , Takashi Iizuka , Yasuaki Fukuda
Inventor： Masami Hayashida , Yutaka Watanabe , Masahito Niibe , Takashi Iizuka , Yasuaki Fukuda
CPC classification number: B82Y10/00 , G21K1/062 , G21K7/00 , G21K2201/061 , G21K2201/064
Abstract: A method and device for imaging an object illuminated by an X-ray beam, through a zone plate, is disclosed. A concave mirror with a multilayered film is disposed on a path of the X-ray beam to reflect the same and collect the same onto the object.
Abstract translation: 公开了一种用于通过区域板对由X射线束照射的物体成像的方法和装置。 具有多层膜的凹面镜设置在X射线束的路径上以反射它，并将其收集到物体上。
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公开(公告)号：US5153898A
公开(公告)日：1992-10-06
申请号：US841298
申请日：1992-02-28
Applicant: Masayuki Suzuki , Noritaka Mochizuki , Setsuo Minami , Shigetaro Ogura , Yasuaki Fukuda , Yutaka Watanabe , Yasuo Kawai , Takao Kariya
Inventor： Masayuki Suzuki , Noritaka Mochizuki , Setsuo Minami , Shigetaro Ogura , Yasuaki Fukuda , Yutaka Watanabe , Yasuo Kawai , Takao Kariya
CPC classification number: B82Y10/00 , G02B17/0636 , G03F7/2039 , G03F7/70033 , G03F7/70233 , G03F7/7025 , G03F7/70691 , G03F7/70866 , G03F7/70875 , G03F7/70883 , G03F7/70891
Abstract: An X-ray exposure apparatus includes a stage for holding a mask having a pattern for circuit manufacturing, a stage for holding a wafer to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing at least three, but not more than five, reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
Abstract translation: X射线曝光装置包括：用于保持具有用于电路制造的图案的掩模的台，用于将要暴露于掩模的图案的晶片用X射线保持的晶片的台，以及设置在该掩模之间的反射减少成像系统 掩模台和晶片台，包括反射镜装置，其包含涂覆有多层膜的至少三个但不多于五个的反射镜，用于从掩模接收X射线并将其引导到晶片以暴露晶片 以减小的X射线的掩模图案。
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公开(公告)号：US5125185A
公开(公告)日：1992-06-30
申请号：US676694
申请日：1991-03-29
Applicant: Akihito Shiota , Yutaka Watanabe , Kiyotaka Nakai
Inventor： Akihito Shiota , Yutaka Watanabe , Kiyotaka Nakai
Abstract: A weather strip for a door belt-molding disposed for sliding contact with a window glass to prevent water leakage between the door belt-molding and the window glass, comprising a root portion of which at least one portion is made of a material having a high coefficient of elasticity and resistance to permanent strain. The preferred materials are ethylene propylene rubber or a thermoplastic elastomer resin.
Abstract translation: 一种用于与窗玻璃滑动接触的门带模制件的防风条，用于防止门带成型件和窗玻璃之间的水泄漏，其包括根部，其至少一部分由具有高的材料制成 弹性系数和抗永久性应变。 优选的材料是乙丙橡胶或热塑性弹性体树脂。
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公开(公告)号：US5125014A
公开(公告)日：1992-06-23
申请号：US578268
申请日：1990-09-06
Applicant: Yutaka Watanabe , Shinichiro Uno , Ryuichi Ebinuma , Nobutoshi Mitzusawa , Shunichi Uzawa
Inventor： Yutaka Watanabe , Shinichiro Uno , Ryuichi Ebinuma , Nobutoshi Mitzusawa , Shunichi Uzawa
IPC: G21K5/02 , G03F7/20 , H01L21/027 , H01L21/30
CPC classification number: G03F7/702 , G03F7/2039
Abstract: An exposure apparatus for exposing a substrate with X-rays is disclosed. The apparatus includes a radiation source for providing X-rays; and a convex mirror for reflecting the X-rays from the radiation source toward the substrate to expose a zone of the substrate with the X-rays; wherein the convex mirror and the substrate are so interrelated that a peak position of intensity distribution of the X-rays upon the zone deviates from the center of the zone.
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