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公开(公告)号：US5204887A
公开(公告)日：1993-04-20
申请号：US945578
申请日：1992-09-16
CPC分类号： B82Y10/00 , G21K1/062 , G21K7/00 , G21K2201/061 , G21K2201/064
摘要： A method and device for imaging an object illuminated by an X-ray beam, through a zone plate, is disclosed. A concave mirror with a multilayered film is disposed on a path of the X-ray beam to reflect the same and collect the same onto the object.
摘要翻译： 公开了一种用于通过区域板对由X射线束照射的物体成像的方法和装置。 具有多层膜的凹面镜设置在X射线束的路径上以反射它，并将其收集到物体上。
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公开(公告)号：US5052033A
公开(公告)日：1991-09-24
申请号：US633181
申请日：1990-12-28
申请人： Tsutomu Ikeda , Yutaka Watanabe , Masayuki Suzuki , Masami Hayashida , Yasuaki Fukuda , Shigetaro Ogura , Takashi Iizuka , Masahito Niibe
发明人： Tsutomu Ikeda , Yutaka Watanabe , Masayuki Suzuki , Masami Hayashida , Yasuaki Fukuda , Shigetaro Ogura , Takashi Iizuka , Masahito Niibe
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/58 , G03F7/70033 , G03F7/70233 , G03F7/70283 , G03F7/70875 , G03F7/70958
摘要： A reflection type mask usable to print a pattern upon a semiconductor wafer by use of soft X-rays or otherwise is disclosed. A reflective surface is formed by a multilayered film which is formed on a substrate by layering different materials having different refractive indices in consideration of Bragg diffraction and Fresnel reflection. A non-reflective portion is formed on the reflecting surface to provide a desired pattern. Alternatively, a pattern comprising a multilayered structure may be formed upon a non-reflective substrate. The mask of the present invention assures pattern printing of high contrast.
摘要翻译： 公开了一种可用于通过使用软X射线在半导体晶片上印刷图案的反射型掩模。 考虑到布拉格衍射和菲涅尔反射，通过分层折射率不同的材料形成在基板上的多层膜形成反射表面。 在反射表面上形成非反射部分以提供期望的图案。 或者，包括多层结构的图案可以形成在非反射基板上。 本发明的掩模确保高对比度的图案印刷。
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3.发明授权
公开(公告)号：US5145649A
公开(公告)日：1992-09-08
申请号：US592302
申请日：1990-10-02
CPC分类号： G03F7/70058 , B08B7/0035 , G02B27/0006 , G03F7/702 , G03F7/70841 , G03F7/70925
摘要： A method and apparatus for removing unclear matter on an optical element used with a radiation beam is disclosed. A filter is used to introduce light of a desired wavelength into a chamber in which the optical element is accommodated; a gas supplying device is used to supply a reactive gas which is reactable with the unclear matter on the surface of the optical element; and a vacuum-evacuating device is used to vacuum-evacuate the inside of the chamber.
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4.发明授权Method of and apparatus for stabilizing shapes of objects, such as optical elements, as well as exposure apparatus using same and method of manufacturing semiconductor devices 失效用于稳定诸如光学元件的物体形状的方法和装置，以及使用其的曝光装置和制造半导体器件的方法
公开(公告)号：US5390228A
公开(公告)日：1995-02-14
申请号：US270794
申请日：1994-07-05
申请人： Masahito Niibe , Yasuaki Fukuda , Masami Hayashida
发明人： Masahito Niibe , Yasuaki Fukuda , Masami Hayashida
CPC分类号： G03F7/70008 , G03F7/20 , G03F7/702 , G03F7/70233 , G03F7/70266 , G03F7/70866 , G03F7/70875 , G03F7/70891
摘要： A temperature distribution of an object, such as an optical element, onto which radiation energy is irradiated, is measured. The change of the shape of the object is controlled by varying the temperature of a part of the object on the basis of the measured temperature distribution to stabilize the shape of the object. Also, the shape of the object being irradiated is stabilized by causing the same temperature distribution in the object when in the thermally stable condition to be generated in the object while it is being irradiated. If the shapes of masks used to manufacture semiconductor devices are stabilized by using the above methods, highly integrated semiconductor devices can be manufactured.
摘要翻译： 测量照射有辐射能量的物体（例如光学元件）的温度分布。 通过基于测量的温度分布改变物体的一部分的温度来控制物体的形状的变化，以稳定物体的形状。 此外，当被照射时，当在物体中产生热稳定状态时，通过引起物体中相同的温度分布来稳定被照射物体的形状。 如果通过使用上述方法使用于制造半导体器件的掩模的形状稳定，则可以制造高度集成的半导体器件。
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公开(公告)号：US5335259A
公开(公告)日：1994-08-02
申请号：US15434
申请日：1993-02-09
IPC分类号： G03F7/20 , G21K1/10 , H01L21/027 , G21K1/00
CPC分类号： G03F7/70808 , G21K1/10
摘要： An X-ray apparatus includes an X-ray pickup window through which synchrotron radiation light is projected, the X-ray pickup window having an X-ray transmission film; and a correcting system for correcting an intensity distribution of the synchrotron radiation light; wherein the X-ray transmission film has at least one of a film thickness distribution and a transmissivity distribution changing substantially in a predetermined direction; and wherein the X-ray transmission film is so disposed that the predetermined direction is substantially aligned with the direction of change of the intensity distribution of the synchrotron radiation light.
摘要翻译： X射线装置包括X射线拾取窗口，X射线拾取窗口通过其投影同步加速器辐射光，X射线拾取窗口具有X射线透射膜; 以及用于校正同步加速器辐射光的强度分布的校正系统; 其中所述X射线透射膜具有基本上沿预定方向改变的膜厚度分布和透射率分布中的至少一个; 并且其中所述X射线透射膜被设置成使得所述预定方向基本上与所述同步加速器辐射光的强度分布的变化方向对准。
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6.发明授权
公开(公告)号：US5433988A
公开(公告)日：1995-07-18
申请号：US323592
申请日：1994-10-17
CPC分类号： B32B15/08 , B82Y10/00 , G02B5/0833 , G02B5/0891 , G02B5/26 , G21K1/062 , G21K2201/061 , Y10S428/913 , Y10T428/24355 , Y10T428/30
摘要： A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layers primarily consists of at least one of single elements, such as ruthenium, or of a boride carbide, silicate, nitride oxide of a transition metal. The second layers primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).
摘要翻译： 用于软X射线至真空紫外线的多层反射镜包括与第一层交替地形成在基板上的基板，多个第一层和多个第二层。 第一层主要由单一元素中的至少一种组成，例如钌，或硼化物碳化物，硅酸盐，过渡金属的氮氧化物。 第二层主要由碳，硅（例如碳化物，氮化物和硅的氧化物），硼（例如碳化物，氮化物和硼的氧化物），铍（例如碳化物，氮化物和铍氧化物）的化合物中的至少一种和 铝（例如碳化物，氮化物和铝的氧化物）。
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公开(公告)号：US5182763A
公开(公告)日：1993-01-26
申请号：US888275
申请日：1992-05-26
申请人： Takashi Iizuka , Yutaka Watanabe , Yasuaki Fukuda
发明人： Takashi Iizuka , Yutaka Watanabe , Yasuaki Fukuda
CPC分类号： G21K1/062 , B82Y10/00 , G02B26/10 , G02B5/0891 , G03F7/70058 , G03F7/70958 , G21K2201/061 , G21K2201/064
摘要： Disclosed are a reflection mirror for reflecting a received radiation beam to produce a reflection beam, a reflection device with such a mirror, a scanning system with such a mirror and an exposure apparatus with such a mirror. A radiation beam is inputted to the reflection mirror with an angle of incidence which changes with position on the reflection mirror, wherein the reflection mirror has a multilayered film effective to provide an increased relative reflectivity with respect to a predetermined wavelength of the reflection beam, and wherein a layer of the multilayered film has a thickness which changes with position so as to substantially avoid a shift of the wavelength of the reflection beam dependent upon the angle of incidence.
摘要翻译： 公开了一种用于反射接收的辐射束以产生反射光束的反射镜，具有这种反射镜的反射装置，具有这种反射镜的扫描系统和具有这种反射镜的曝光装置。 辐射束以反射镜上的位置随着入射角被输入到反射镜，其中反射镜具有有效地相对于反射光束的预定波长提供增加的相对反射率的多层膜，以及 其中所述多层膜的层具有随位置而变化的厚度，以便基本上避免所述反射光束的波长相对于所述入射角的偏移。
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8.发明授权
公开(公告)号：US5310603A
公开(公告)日：1994-05-10
申请号：US75350
申请日：1993-06-14
CPC分类号： G21K1/062 , B32B15/08 , B82Y10/00 , G02B5/0891 , G02B5/26 , G21K2201/061 , Y10S428/913
摘要： A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layer primarily consists of at least one of single elements, such as ruthenium or of a boride, carbide, silicide, nitride oxide of a transition metal. The second layer primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).
摘要翻译： 用于软X射线至真空紫外线的多层反射镜包括与第一层交替地形成在基板上的基板，多个第一层和多个第二层。 第一层主要由单一元素，例如钌或硼化物，碳化物，硅化物，过渡金属的氮氧化物中的至少一种组成。 第二层主要由碳，硅（例如碳化物，氮化物和硅的氧化物），硼（例如碳化物，氮化物和硼的氧化物），铍（例如碳化物，氮化物和铍氧化物）的化合物中的至少一种和 铝（例如碳化物，氮化物和铝的氧化物）。
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公开(公告)号：US5528654A
公开(公告)日：1996-06-18
申请号：US258071
申请日：1994-06-10
申请人： Masahito Niibe , Yasuaki Fukuda
发明人： Masahito Niibe , Yasuaki Fukuda
IPC分类号： G21K1/06
CPC分类号： B82Y10/00 , G21K1/062 , G21K2201/061
摘要： A multilayer film for X-rays comprising two kinds of films having different refractive indices, deposited alternately, wherein one of said two kinds of films which has smaller refractive index consists of an alloy containing Co and Cr. The multilayer film is capable of being utilized as an optical element such as a reflection mirror or a reflection-type X-ray mask.
摘要翻译： 用于X射线的多层膜包括交替沉积的具有不同折射率的两种膜，其中折射率较小的所述两种膜中的一种由含有Co和Cr的合金构成。 多层膜能够用作反射镜或反射型X射线掩模等光学元件。
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10.发明授权Mask structure for x-ray exposure and x-ray exposure device and method using it 失效X射线曝光和X射线曝光装置的掩模结构及其使用方法
公开(公告)号：US5333167A
公开(公告)日：1994-07-26
申请号：US984527
申请日：1992-12-02
申请人： Takashi Iizuka , Yasuaki Fukuda
发明人： Takashi Iizuka , Yasuaki Fukuda
CPC分类号： G03F1/22 , G03F7/707 , G03F9/7053 , G21K1/06
摘要： A mask structure for X-ray exposure comprises a retaining frame, a supporting frame, a mask support and an absorber pattern. The mask structure possesses a function for detecting a state change of the mask structure from its steady state.
摘要翻译： 用于X射线曝光的掩模结构包括保持框架，支撑框架，掩模支撑件和吸收体图案。 掩模结构具有用于检测掩模结构从其稳定状态的状态变化的功能。
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