公开(公告)号：US20020176096A1

公开(公告)日：2002-11-28

申请号：US10150154

申请日：2002-05-20

申请人： Canon Kabushiki Kaisha

发明人： Koichi Sentoku ,  Hideki Ina ,  Takehiko Suzuki ,  Satoru Oishi

IPC分类号： G01B011/14

CPC分类号： G03F9/7015 ,  G03F7/70233 ,  G03F9/7011 ,  G03F9/7065 ,  G03F9/7088

摘要： A position detector suitable for an exposure apparatus includes a reticle stage on which is provided a reticle-stage reference mark constituted by a substrate that exhibits a transmitting property with respect to alignment light. In alignment measurement, the relative position of the reticle-stage reference mark and a wafer alignment mark is detected. The relative position of a reticle reference mark and reticle alignment mark is measured beforehand using a separate detection mechanism, and the relative position of a reticle and wafer is decided from the relative position of the reticle-stage reference mark and wafer alignment mark.

摘要翻译： 适用于曝光装置的位置检测器包括标线台，在该标线台上设置由基板构成的标线片基准标记，所述基板具有相对于取向光的透射特性。 在对准测量中，检测标线片级参考标记和晶片对准标记的相对位置。 使用单独的检测机构预先测定掩模版基准标记和标线片对准标记的相对位置，并根据标线片基准标记和晶片对准标记的相对位置来确定标线片和晶片的相对位置。

公开(公告)号：US5952135A

公开(公告)日：1999-09-14

申请号：US974203

申请日：1997-11-19

申请人： Kouros Ghandehari ,  Satyendra S. Sethi ,  Daniel C. Baker

发明人： Kouros Ghandehari ,  Satyendra S. Sethi ,  Daniel C. Baker

IPC分类号： G03F9/00

CPC分类号： G03F9/7065 ,  G03F9/70

摘要： A method and apparatus for the alignment of a semiconductor device in preparation for patterning a layer of the device includes using an alignment apparatus which has one or more light sources for producing light at two or more alignment wavelengths. Typically, the semiconductor device will include alignment structures that are to be aligned with corresponding alignment markers on a photomask which contains the desired pattern. The alignment structures on the semiconductor device are often depressions or trenches in a layer of the device. The alignment apparatus determines the position of the alignment structures by observing the contrast in the intensity of light reflected off the region of the device containing the alignment structure and the region of the device adjacent to the alignment structure. This contrast in the intensity of light is wavelength dependent. By providing an alignment apparatus with multiple alignment wavelengths, it is likely that at least one of those wavelengths will provide sufficient contrast to accurately resolve the alignment structures.

摘要翻译： 用于准备图案化该器件的层的半导体器件的对准的方法和装置包括使用具有一个或多个光源以用于产生两个或更多个取向波长的光的对准装置。 通常，半导体器件将包括对准结构，其将与包含期望图案的光掩模上的对应对准标记对准。 半导体器件上的对准结构通常是器件层中的凹陷或沟槽。 对准装置通过观察从包含对准结构的装置的区域和与对准结构相邻的装置的区域反射的光的强度的对比度来确定对准结构的位置。 光的强度对比度依赖于波长。 通过提供具有多个取向波长的对准装置，这些波长中的至少一个可能提供足够的对比度以精确地解析对准结构。

公开(公告)号：US5703685A

公开(公告)日：1997-12-30

申请号：US508879

申请日：1995-07-20

申请人： Shinya Senda ,  Hiroshi Haraguchi

发明人： Shinya Senda ,  Hiroshi Haraguchi

IPC分类号： G01B11/00 ,  G03B27/32 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/70 ,  G03F9/7065

摘要： An alignment method is provided for determining a mark position by using any of a first method for determining a mark position with one of photodiodes for colors which shows a maximal contrast between a mark area and a non-mark area, a second method for determining a mark position by detecting mark positions with photodiodes for colors and taking an average for these positions and a third method for determining a mark position by determining a ratio for determining that mark position, through the photodiodes for colors, by using different contrast levels between a mark area and a non-mark area and a CCD color area sensor.

摘要翻译： 提供了一种对准方法，用于通过使用用于确定标记位置的第一方法中的任何一种来确定标记位置，所述第一方法中的一个用于显示标记区域和非标记区域之间的最大对比度的颜色的光电二极管，第二确定方法 通过利用用于颜色的光电二极管检测标记位置并对这些位置取平均值来标记位置，以及通过使用颜色的光电二极管，通过使用标记之间的不同对比度水平确定用于确定该标记位置的比例来确定标记位置的第三方法 区域和非标记区域和CCD颜色区域传感器。

公开(公告)号：US5325414A

公开(公告)日：1994-06-28

申请号：US70081

申请日：1993-05-28

申请人： Toshihiko Tanaka ,  Koichi Okada

发明人： Toshihiko Tanaka ,  Koichi Okada

IPC分类号： G03F7/20 ,  G03F9/00 ,  G21K5/00

CPC分类号： G03F9/7065 ,  G03F7/70691 ,  G03F7/70875 ,  G03F9/7049

摘要： X-ray alignment method and apparatus therefor characterized by separately irradiating alignment light to alignment patterns of an X-ray mask and detecting reflected light therefrom, and directly irradiating alignment light to alignment patterns of a wafer and detecting the reflected light therefrom, and aligning the X-ray mask and the wafer in accordance with the detecting data of the reflected light. The apparatus includes a position alignment mechanism for the mask stage and the wafer stage, which moves the X-ray mask and/or the wafer and provides the alignment therebetween. The apparatus includes independent light sources for irradiating the alignment patterns of the X-ray mask side and the wafer side, independent detectors for detecting the reflected light of the alignment patterns of the X-ray mask and the wafer, and a controller for analyzing the respective positions of the X-ray mask and the wafer in accordance with the detection data and issuing control signals to the position alignment mechanism. The X-ray mask used in the alignment method and apparatus is transparent to only X-rays.

摘要翻译： X射线取向方法及其装置的特征在于，将取向光分别照射到X射线掩模的取向图案并检测其反射光，并将对准光直接照射到晶片的取向图案并检测其反射光， X射线掩模和根据反射光的检测数据的晶片。 该装置包括用于掩模台和晶片台的位置对准机构，其移动X射线掩模和/或晶片并在其间提供对准。 该装置包括用于照射X射线掩模侧和晶片侧的对准图案的独立光源，用于检测X射线掩模和晶片的对准图案的反射光的独立检测器，以及用于分析X射线掩模 根据检测数据对X射线掩模和晶片的各个位置发出控制信号到位置对准机构。 在对准方法和装置中使用的X射线掩模仅对X射线是透明的。

公开(公告)号：US5133603A

公开(公告)日：1992-07-28

申请号：US735692

申请日：1991-07-23

申请人： Akiyoshi Suzuki ,  Hideki Ina

发明人： Akiyoshi Suzuki ,  Hideki Ina

IPC分类号： G03F9/00

CPC分类号： G03F9/7065

摘要： An observation device for use in observation of a first object and a second object onto which a pattern of the first object is to be projected, the observation device includes a light source; a polarization beam splitter provided between the light source and the first object, for receiving light from the light source and for directing the same to the first and second objects; a first phase converting element provided between the first and second objects, for changing the state of polarization of the light from the light source as incident on the first phase converting element; and a second phase converting element provided to be disposed or to be selectively disposed between the first object and the polarization beam splitter, for changing the state of polarization of reflection light from the first object as incident on the second phase converting element; wherein the first and second objects can be observed by detecting, through the polarization beam splitter, reflection light reflected by the second object ane passing through the first object or by detecting the reflection light and reflection light from the first object.

摘要翻译： 一种用于观察要投射第一物体的图案的第一物体和第二物体的观察装置，所述观察装置包括光源; 设置在光源和第一物体之间的偏振光束分离器，用于从光源接收光并将其引导到第一和第二物体; 设置在第一和第二物体之间的第一相位转换元件，用于当入射在第一相位转换元件上时改变来自光源的光的偏振状态; 以及第二相位转换元件，被设置为选择性地设置在所述第一物体和所述偏振光束分离器之间，用于改变入射在所述第二相位转换元件上的来自所述第一物体的反射光的偏振状态; 其中可以通过偏振分束器检测由第二物体通过第一物体反射的反射光或通过检测来自第一物体的反射光和反射光来观察第一和第二物体。

公开(公告)号：US5120974A

公开(公告)日：1992-06-09

申请号：US728313

申请日：1991-07-08

申请人： Masato Muraki

发明人： Masato Muraki

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7065

摘要： A position detecting method and device for detecting the position of an object to be examined, through image pickup of a mark formed on the object, is disclosed. The method includes an image forming step for illuminating the mark with a radiation beam in a first direction and a second direction different from the first direction, and for forming a first image of the mark with the illumination in the first direction and forming a second image of the mark with the illumination in the second direction; a determining step for selecting one of the first and second images; and a detecting step for detecting the position of the object on the basis of the selected image or an image of the mark formed with the illumination in the direction corresponding to the selected image. The device is adapted to execute the position detection in this manner.

摘要翻译： 公开了一种用于通过对形成在对象上的标记的图像拾取来检测待检查对象的位置的位置检测方法和装置。 该方法包括图像形成步骤，用于沿着与第一方向不同的第一方向和第二方向上的辐射束照射标记，并且用于在第一方向上形成具有照明的标记的第一图像，并形成第二图像 具有第二方向的照明的标记; 确定步骤，用于选择第一和第二图像之一; 以及检测步骤，用于基于所选择的图像或与所选图像相对应的方向上用照明形成的标记的图像来检测对象的位置。 该装置适于以这种方式执行位置检测。

公开(公告)号：US4938598A

公开(公告)日：1990-07-03

申请号：US200911

申请日：1988-06-01

申请人： Nobuyuki Akiyama ,  Yoshihiko Yamauchi

发明人： Nobuyuki Akiyama ,  Yoshihiko Yamauchi

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC分类号： G03F9/7065 ,  G03F9/7076

摘要： The present invention is of an apparatus, in a reduction-projection exposure apparatus, for reduction-projection position detection comprising illuminating means for illuminating a registration mark on a specimen with three or four wavelengths of laser beams oscillated in an Ar laser and one or two wavelengths, which are different from the aforesaid wavelengths, of laser beams oscillated in a He-Ne laser passed through a reduction-projection lens, an image forming optical system condensing, through the reductio-projection lens, reflected beams from the the registration mark on the specimen illuminated by the illuminating means and separating the beams into beams of four wavelengths, at least, out of the aforesaid wavelengths, for forming images of the separated beams, and image pick-up means for picking up the images, formed by the image forming optical system, of the registration mark on the specimen, thereby to detect the position of the registration mark, and of a relative method thereto.

摘要翻译： 本发明是一种在还原投影曝光装置中用于还原投影位置检测的装置，包括照射装置，用于照射具有在Ar激光器中振荡的三个或四个波长的激光束和一个或两个 波长不同于上述波长的激光束在通过还原投影透镜的He-Ne激光器中振荡，成像光学系统通过还原投影透镜将来自对准标记的反射光束 所述样本由所述照明装置照射并且至少在所述波长之中将所述光束分成四个波长的光束，以形成所述分离光束的图像，以及用于拾取由所述图像形成的图像的图像拾取装置 形成光学系统，将样本上的对准标记，从而检测对准标记的位置，以及相对方法th 埃雷托

公开(公告)号：US4937459A

公开(公告)日：1990-06-26

申请号：US319820

申请日：1989-03-06

申请人： Hideki Ina

发明人： Hideki Ina

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7065 ,  G03F7/70358

摘要： An alignment signal detecting device including a polarization-plane rotating element and a polarization beam splitter, co-operative to selectively define different optical paths for the same alignment beam, optical elements disposed on respective optical paths and effective to detect an alignment signal from an alignment mark with an improved detection accuracy, and a control unit for controlling the polarization plane rotating element to change the plane of polarization so as to assure detection of the alignment signal from the alignment mark in a most suitable manner.

摘要翻译： 一种对准信号检测装置，包括偏振面旋转元件和偏振光束分离器，用于选择性地限定相同对准光束的不同光路，配置在相应光路上的光学元件，并有效地检测对准信号 具有提高的检测精度的标记，以及用于控制偏振面旋转元件以改变偏振平面的控制单元，以便以最合适的方式确保来自对准标记的对准信号的检测。

公开(公告)号：US4744666A

公开(公告)日：1988-05-17

申请号：US886044

申请日：1986-07-16

申请人： Yoshitada Oshida ,  Naoto Nakashima ,  Toshihiko Nakata

发明人： Yoshitada Oshida ,  Naoto Nakashima ,  Toshihiko Nakata

IPC分类号： G01N21/88 ,  G01N21/956 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66 ,  H01L21/67 ,  H01L21/68 ,  G01B11/27

CPC分类号： G03F9/7065 ,  G03F9/7049

摘要： In an alignment detection optical system designed to observe an alignment pattern of a mask and an image of an alignment pattern of a wafer formed on the alignment pattern of the mask by a projection lens in a projection type aligner, there is provided a spatial filter designed to select only the reflected light having a desired reflection angle from the light reflected by the alignment pattern composed of steps formed on a surface of the wafer.

摘要翻译： 在设置成通过投影型对准器中的投影透镜观察掩模的对准图案和形成在掩模的取向图案上的晶片的对准图案的图像的对准检测光学系统中，设置有空间滤波器， 仅从由在晶片的表面上形成的台阶构成的对准图案反射的光仅选择具有期望的反射角的反射光。

公开(公告)号：US4659225A

公开(公告)日：1987-04-21

申请号：US722136

申请日：1985-04-11

申请人： Kazuo Takahashi

发明人： Kazuo Takahashi

IPC分类号： H01L21/30 ,  G01B9/02 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B11/02 ,  G03B27/42

CPC分类号： G03F9/7065 ,  G01B9/02002 ,  G03F7/70691

摘要： An exposure apparatus wherein a semiconductor wafer is exposed to an IC circuit pattern formed on a mask through a reduction projection optical system, and then the wafer is stepped; and these operations are alternately repeated, thereby forming a plurality of patterns on the wafer. A distance measuring system utilizing the interference between laser beams, has a first mirror fixed relative to the mask and another mirror fixed relative to the wafer, so that the relative position between the mask and the wafer is determined by a single interferometer system.

摘要翻译： 一种曝光装置，其中半导体晶片通过还原投影光学系统暴露于形成在掩模上的IC电路图案，然后晶片是阶梯状的; 并且这些操作被交替地重复，从而在晶片上形成多个图案。 使用激光束之间的干涉的距离测量系统具有相对于掩模固定的第一反射镜和相对于晶片固定的另一反射镜，使得掩模和晶片之间的相对位置由单个干涉仪系统确定。