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1.发明公开公开(公告)号：US20230260855A1
公开(公告)日：2023-08-17
申请号：US18014431
申请日：2021-06-21
Applicant: ASML NETHERLANDS B. V.
Inventor： Andriy Vasyliovich HLOD , Arnaud HUBAUX
CPC classification number: H01L22/26 , G03F7/7065 , G03F7/70525
Abstract: A method of determining a correction strategy in a semiconductor manufacturing process. The method can include obtaining functional indicator data relating to functional indicators associated with one or more process parameters of each of a plurality of different control regimes of the semiconductor manufacturing process and/or a tool associated with the semiconductor manufacturing process and using the functional indicator data as an input to a trained model to determine for which of the control regimes should a correction be determined so as to improve performance of the semiconductor manufacturing process according to at least one quality metric being representative of a quality of the semiconductor manufacturing process. The correction is then calculated for the determined control regime(s).
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公开(公告)号：US11474435B2
公开(公告)日：2022-10-18
申请号：US17415671
申请日：2019-11-19
Applicant: ASML Netherlands B. V.
Inventor： Sebastianus Adrianus Goorden , Simon Reinald Huisman , Sergei Sokolov
Abstract: Disclosed is an illumination system for delivering incoherent radiation to a metrology sensor system. Also disclosed is an associated metrology system and method. The illumination system comprises a spatial filter system for selective spatial filtering of a beam of said incoherent radiation outside of a module housing of the metrology sensor system. At least one optical guide is provided for guiding the spatially filtered beam of incoherent radiation to the metrology sensor system, the at least one optical guide being such that the radiation guided has a substantially similar output angle as input angle.
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公开(公告)号：US20220317368A1
公开(公告)日：2022-10-06
申请号：US17836537
申请日：2022-06-09
Applicant: ASML NETHERLANDS B. V.
Abstract: A mounted hollow-core fiber arrangement includes a hollow-core fiber having a microstructure, and a mount arrangement including a plurality of mounting contacts configured to apply a force to an outer layer of the hollow-core fiber. A portion of the hollow-core fiber is located in a receiving region of the mount arrangement. The plurality of mounting contacts are positioned around the receiving region. The mounting contacts are distributed around the receiving region, the distribution of the mounting contacts corresponding to a distribution of features of the microstructure of the hollow-core fiber. The mounted hollow core fiber can be used in a radiation source apparatus for providing broadband radiation.
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公开(公告)号：US20220171298A1
公开(公告)日：2022-06-02
申请号：US17600340
申请日：2020-03-10
Applicant: ASML Netherlands B,V.
Inventor： Alisia Mariska WILLEMS - PETERS , Sander BALTUSSEN , Zhuangxiong HUANG , Reinier Theodorus Martinus JILISEN , Sietse WIJTVLIET
IPC: G03F7/20
Abstract: An apparatus comprising: a position monitoring system configured to determine the position of the substrate with respect to a projection system configured to project a radiation beam through an opening in the projection system and onto a substrate, wherein a component of the position monitoring system is located beneath the projection system in use; and a baffle disposed between the opening and the component.
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公开(公告)号：US20220163895A1
公开(公告)日：2022-05-26
申请号：US17441168
申请日：2020-02-20
Applicant: ASML Netherlands B,V.
Inventor： Oscar Franciscus Jozephus NOORDMAN , Antonius Theodorus Wilhelmu KEMPEN , Jan Bernard Plechelmus VAN SCHOOT , Marinus Aart VAN DEN BRINK
IPC: G03F7/20
Abstract: A lithographic system comprises a radiation source and a lithographic apparatus. The radiation source provides radiation to the lithographic apparatus. The lithographic apparatus uses the radiation for imaging a pattern onto multiple target areas on a layer of photo-resist on a semiconductor substrate. The imaging requires a pre-determined dose of radiation. The system is controlled so as to set a level of a power of the radiation in dependence on a magnitude of the pre-determined dose.
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Patent Agency Ranking
公开(公告)号：US20210311400A1
公开(公告)日：2021-10-07
申请号：US17264023
申请日：2019-07-03
Applicant: ASML NETHERLANDS B,V.
Inventor： Mohammad Reza KAMALI , Brennad PETERSON
IPC: G03F7/20
Abstract: A method for controlling a manufacturing process for manufacturing semiconductor devices, the method including: obtaining performance data indicative of the performance of the manufacturing process, the performance data including values for a performance parameter across a substrate subject to the manufacturing process; and determining a process correction for the manufacturing process based on the performance data and at least one control characteristic related to a dynamic behavior of one or more control parameters of the manufacturing process, wherein the determining is further based on an expected stability of the manufacturing process when applying the process correction.
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公开(公告)号：US20050254028A1
公开(公告)日：2005-11-17
申请号：US10842636
申请日：2004-05-11
Applicant: Wilhelmus Box
Inventor： Wilhelmus Box
IPC: G03F7/20 , G03B27/42 , H01L21/027
CPC classification number: G03F7/70875 , G03F7/707 , G03F7/70783
Abstract: A lithographic apparatus includes an illumination system to provide a beam of radiation, a support to support a patterning devices, the patterning devices configured to impart the beam with a pattern in its cross-section, a substrate table to hold a substrate, a projection system to project the patterned beam onto a target portion of the substrate, and a conditioning system to condition the substrate. The conditioning system conditions a non-target portion of the substrate with a conditioning fluid. A method of manufacturing a device includes conditioning a non-target portion of a substrate.
Abstract translation: 光刻设备包括：照明系统，用于提供辐射束;支撑件，用于支撑图案形成装置;所述图案形成装置被配置成使其具有在其横截面上的图案;衬底台，用于保持衬底;投影系统 将图案化的光束投影到基板的目标部分上，以及调节系统以调节基板。 调理系统用调理流体来调节基材的非目标部分。 一种制造器件的方法包括调节衬底的非目标部分。
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8.发明申请公开(公告)号：US20050168714A1
公开(公告)日：2005-08-04
申请号：US10769992
申请日：2004-02-03
Applicant: Michael Jozef Renkens , Martinus Cornelis Verhagen , Alexander Struycken , Ruben Kok
Inventor： Michael Jozef Renkens , Martinus Cornelis Verhagen , Alexander Struycken , Ruben Kok
CPC classification number: G03F7/70775
Abstract: The invention pertains to a measurement system for measuring displacement of a moveable object relative to a base in at least a first direction of measurement, the moveable object having at least one reference part that is moveable in a plane of movement relative to the base, the actual movements of the reference part being within an area of said plane of movement that is bounded by a closed contour having a shape. The measurement system comprises a sensor head that operatively communicates with a planar element. The sensor head is mounted onto the base and the planar element being mounted onto the reference part of the moveable object or the other way around, wherein the planar element has a shape that is essentially identical to the shape of the closed contour.
Abstract translation: 本发明涉及一种用于在至少第一测量方向上测量可移动物体相对于基座的位移的测量系统，所述可移动物体具有至少一个可在相对于基座的运动平面中移动的参考部分， 参考部分的实际运动在由具有形状的封闭轮廓界定的所述运动平面的区域内。 测量系统包括与平面元件可操作地连通的传感器头。 传感器头安装在基座上，平面元件安装在可移动物体的参考部分上，或者相反地安装在其上，其中平面元件具有与封闭轮廓的形状基本相同的形状。
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公开(公告)号：US11886125B2
公开(公告)日：2024-01-30
申请号：US17800346
申请日：2021-02-02
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/00
CPC classification number: G03F7/70625
Abstract: A method of inferring a value for at least one local uniformity metric relating to a product structure, the method including: obtaining intensity data including an intensity image relating to at least one diffraction order obtained from a measurement on a target; obtaining at least one intensity distribution from the intensity image; determining, from the at least one intensity distribution, an intensity indicator expressing a variation of either intensity over the at least one diffraction order, or a difference in intensity between two complimentary diffraction orders over the intensity image; and inferring the value for the at least one local uniformity metric from the intensity indicator.
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公开(公告)号：US11656555B2
公开(公告)日：2023-05-23
申请号：US17605601
申请日：2020-04-14
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor： Janardan Nath , Kalyan Kumar Mankala , Todd R. Downey , Joseph Harry Lyons , Ozer Unluhisarcikli , Alexander Harris Ledbetter , Nicholas Stephen Apone , Tian Gang
IPC: G03F7/20
CPC classification number: G03F7/70191 , G03F7/70083 , G03F7/70133
Abstract: An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.
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