公开(公告)号：US20070115445A1

公开(公告)日：2007-05-24

申请号：US11602475

申请日：2006-11-21

Applicant: Wilhelmus Box ,  Derk Klunder ,  Maarten Marinus Johannes Van Herpen ,  Niels Driessen ,  Hendrikus Schimmel

Inventor： Wilhelmus Box ,  Derk Klunder ,  Maarten Marinus Johannes Van Herpen ,  Niels Driessen ,  Hendrikus Schimmel

IPC: G03B27/52

CPC classification number: G03F7/70916 ,  G03F7/70858

Abstract: The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source constructed and arranged to generate extreme ultraviolet radiation, a contamination barrier constructed and arranged to trap contamination from the radiation source, and a temperature sensor constructed and arranged to sense a temperature of the contamination barrier.

Abstract translation: 本发明涉及一种用于产生辐射束的辐射系统。 辐射系统包括构造和布置成产生极紫外辐射的极紫外光源，构造和布置成污染辐射源的污染物的污染屏障，以及构造和布置成感测污染屏障温度的温度传感器。

公开(公告)号：US20060028627A1

公开(公告)日：2006-02-09

申请号：US10910792

申请日：2004-08-04

Applicant: Wilhelmus Box

Inventor： Wilhelmus Box

IPC: G03B27/52

CPC classification number: G03F7/708

Abstract: A lithographic apparatus is disclosed. The apparatus includes the following components: an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. At least one of the components that experiences a heat load in use is provided with an integrally mounted heating element arranged to maintain the component at a substantially constant temperature.

Abstract translation: 公开了一种光刻设备。 该装置包括以下组件：被配置为调节辐射束的照明系统，被构造成支撑图案形成装置的支撑件，被构造成保持衬底的衬底支撑件以及配置成将图案化的辐射束投影到目标部分上的投影系统 的基底。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 在使用中经受热负荷的部件中的至少一个设置有被整体安装的加热元件，其布置成将部件保持在基本恒定的温度。

公开(公告)号：US20070222956A1

公开(公告)日：2007-09-27

申请号：US11798710

申请日：2007-05-16

Applicant: Levinus Bakker ,  Marcel Marie Dierichs ,  Johannes Freriks ,  Frank Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Box

Inventor： Levinus Bakker ,  Marcel Marie Dierichs ,  Johannes Freriks ,  Frank Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Box

IPC: G03B27/52

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

Abstract: A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.

Abstract translation: 被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎屑的污染屏障。 污染屏障包括支撑结构，布置在支撑结构上并沿着径向方向从支撑结构的轴线延伸的多个板构件以及被构造成阻挡支撑结构的至少一部分被辐射撞击的屏蔽 或来自辐射源的碎片。

公开(公告)号：US20050248739A1

公开(公告)日：2005-11-10

申请号：US10838525

申请日：2004-05-05

Applicant: Wilhelmus Box ,  Bernardus Antonius Luttikhuis ,  Thomas Henricus Verhagen

Inventor： Wilhelmus Box ,  Bernardus Antonius Luttikhuis ,  Thomas Henricus Verhagen

IPC: G03F7/20 ,  G03B27/52 ,  H01L21/027

CPC classification number: G03F7/70833 ,  G03F7/70891

Abstract: A lithographic apparatus having an illumination system configured to provide a radiation beam; a support structure configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section, thus providing a patterned radiation beam; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, and a projection system support configured to support the projection system on a reference frame. The lithographic apparatus further includes a thermal conditioning system configured to thermally condition the projection system support. The invention further relates to a thermal conditioning system constructed and arranged to thermally condition a projection system support. The invention further relates to a device manufacturing method and a method for manufacturing a device.

Abstract translation: 一种具有被配置为提供辐射束的照明系统的光刻设备; 构造成支撑图案形成装置的支撑结构，所述图案形成装置能够在其横截面中赋予所述辐射束图案，从而提供图案化的辐射束; 被配置为保持基板的基板台; 投影系统，布置成将图案化的辐射束投影到基板的目标部分上;以及投影系统支撑件，被配置为将投影系统支撑在参考系上。 光刻设备还包括被配置为热调节投影系统支撑件的热调节系统。 本发明还涉及一种构造和布置成对投影系统支撑件进行热调节的热调节系统。 本发明还涉及一种用于制造器件的器件制造方法和方法。

公开(公告)号：US20050105070A1

公开(公告)日：2005-05-19

申请号：US10735847

申请日：2003-12-16

Applicant: Pertrus Bartray ,  Wilhelmus Box ,  Bernardus Antonius Luttikhuis ,  Michael Ten Bhomer

Inventor： Pertrus Bartray ,  Wilhelmus Box ,  Bernardus Antonius Luttikhuis ,  Michael Ten Bhomer

IPC: H01L21/027 ,  G02B7/02 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/7095 ,  G02B7/028 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/709

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame that provides a reference surface with respect to which a position of at least one of the substrate and the patterning structure is measured. The reference frame includes a material that has a coefficient of thermal expansion of greater than about 2.9×10−6/K.

Abstract translation: 公开了一种光刻设备。 该装置包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统以及提供参考表面的参考框架，基准面相对于基板的至少一个基板 并且测量图案结构。 参考框架包括具有大于约2.9×10 -6 / K的热膨胀系数的材料。

公开(公告)号：US20070139629A1

公开(公告)日：2007-06-21

申请号：US11312660

申请日：2005-12-21

Applicant: Timotheus Sengers ,  Nicolaas Johannes Van Asten ,  Wilhelmus Box ,  Tjarko Van Empel ,  Leon Levasier ,  Erik Loopstra ,  Marcel Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

Inventor： Timotheus Sengers ,  Nicolaas Johannes Van Asten ,  Wilhelmus Box ,  Tjarko Van Empel ,  Leon Levasier ,  Erik Loopstra ,  Marcel Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

IPC: G03B27/42

CPC classification number: G03F7/70883 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7034

Abstract: A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

Abstract translation: 公开了一种光刻设备。 该装置包括构造成保持基板的基板台。 衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。 测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。 投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径 测量系统的测量光束和/或场来调节路径的一部分。

公开(公告)号：US20050140950A1

公开(公告)日：2005-06-30

申请号：US10932303

申请日：2004-09-02

Applicant: Dominicus Jacobus Franken ,  Wilhelmus Box

Inventor： Dominicus Jacobus Franken ,  Wilhelmus Box

IPC: G02B7/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC classification number: G03F7/70258 ,  G02B7/008 ,  G03F7/70825 ,  G03F7/70891

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a thermal compensation deformation unit for compensating for a deformation of an element caused by a thermal load. The thermal compensation deformation unit includes at least one temperature sensor for sensing a temperature in at least one location on the element, and a processing unit for calculating the deformation of the element caused by the thermal load as a function of the temperature sensed at the location. The deformation is calculated using data from a computer-generated model of the element so that an appropriate correction for the deformation can be made or taken into account.

Abstract translation: 公开了一种光刻设备。 该装置包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，用于支撑衬底的衬底支撑件，用于将图案化的辐射束投影到衬底的目标部分上的投影系统，以及 热补偿变形单元，用于补偿由热负荷引起的元件的变形。 热补偿变形单元包括至少一个温度传感器，用于感测元件上的至少一个位置的温度，以及处理单元，用于计算由热负荷引起的元件的变形作为在该位置处感测到的温度的函数 。 使用来自计算机生成的元件模型的数据计算变形，使得可以进行或考虑变形的适当校正。

公开(公告)号：US20050122490A1

公开(公告)日：2005-06-09

申请号：US10729376

申请日：2003-12-08

Applicant: Bernardus Luttikhuis ,  Pertrus Bartray ,  Wilhelmus Box ,  Martinus Hendrikus Leenders ,  Marc Maria Van Der Wijst

Inventor： Bernardus Luttikhuis ,  Pertrus Bartray ,  Wilhelmus Box ,  Martinus Hendrikus Leenders ,  Marc Maria Van Der Wijst

IPC: G21K5/02 ,  F16F15/04 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F7/70858

Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure constructed to support a patterning device, which serves to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame with a position sensor and the substrate being located thereon. The apparatus further includes a heat transport system having a heating element, in thermal interaction with at least one of the projection system and the reference frame, for heat transport to or from at least one of the projection system and the reference frame, wherein the heat transport system, is coupled to a further frame which is mechanically isolated from the reference frame.

公开(公告)号：US20050024611A1

公开(公告)日：2005-02-03

申请号：US10876786

申请日：2004-06-25

Applicant: Pertrus Bartray ,  Wilhelmus Box ,  Dominicus Jacobus Franken ,  Bernardus Luttikhuis ,  Engelbertus Van Der Pasch ,  Marc Van Der Wijst ,  Marc Engels

Inventor： Pertrus Bartray ,  Wilhelmus Box ,  Dominicus Jacobus Franken ,  Bernardus Luttikhuis ,  Engelbertus Van Der Pasch ,  Marc Van Der Wijst ,  Marc Engels

IPC: G01B11/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03C5/00 ,  G03F9/00

CPC classification number: G03F7/70716 ,  G03F7/70775

Abstract: A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.

Abstract translation: 公开了一种光刻设备。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于将图案化的辐射束投影到基板的目标部分上的投影系统和用于确定图案形成装置相对于投影系统的空间位置的组件。 组件包括具有安装在投影系统上的多个传感器的测量单元。

公开(公告)号：US20070002297A1

公开(公告)日：2007-01-04

申请号：US11169305

申请日：2005-06-29

Applicant: Bernardus Luttikhuis ,  Petrus Bartray ,  Wilhelmus Box ,  Marco Stavenga ,  Thijs Harink

Inventor： Bernardus Luttikhuis ,  Petrus Bartray ,  Wilhelmus Box ,  Marco Stavenga ,  Thijs Harink

IPC: G03B27/52

CPC classification number: G03F7/70916 ,  G03F7/7075 ,  G03F7/70791

Abstract: A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.

Abstract translation: 光刻设备包括支撑衬底的衬底台和相对于衬底台移动衬底的衬底处理器。 衬底处理器适于在曝光之前和之后将衬底加载到衬底台上并从衬底台卸载衬底。 此外，清洁气体供应系统将清洁气体提供到至少一个位置，在该位置处衬底被定位。 清洁气体供应系统可移动安装。 利用光刻设备的器件制造方法可用于制造平板显示器和集成电路器件中的至少一个。