摘要:
A resin composite is provided, which comprises: a first resin layer including a first rubber modified styrene-based resin composition; and a second resin layer including a second rubber modified styrene-based resin composition. The first and second rubber modified styrene-based resin compositions respectively comprise: a styrene-based copolymer; and rubber particles. In the first rubber modified styrene-based resin composition, on the basis of a total weight of all monomer units of the styrene-based copolymer being 100 wt %, the styrene-based copolymer comprises more than or equal to 21.0 wt % to less than or equal to 31.0 wt % of an acrylonitrile-based monomer unit. In the second rubber modified styrene-based resin composition, on the basis of a total weight of all monomer units of the styrene-based copolymer being 100 wt %, the styrene-based copolymer comprises more than or equal to 12.0 wt % to less than 21.0 wt % of an acrylonitrile-based monomer unit.
摘要:
The present invention describes a manufacturing method for a glycol-modified polyethylene terephthalate and an application for which. The manufacturing method includes the following steps. A reaction mixture is provided. The reaction mixture includes terephthalic acid, ethylene glycol, 1,4-cyclohexanedimethanol and an aqueous titanium-based catalyst. An esterification reaction and a polycondensation reaction is performed to the reaction mixture to obtain the glycol-modified polyethylene terephthalate.
摘要:
A manufacturing method of a quantum dot, a light-emitting material, a light-emitting device, and a display apparatus are provided. The manufacturing method of a quantum dot includes the following steps. A first solution including at least one element selected from the group consisting of an element in Group XII and an element in Group XIII is provided. A second solution including at least one element selected from the group consisting of an element in Group XV and an element in Group XVI is provided. The first solution and the second solution are mixed. A thermal treatment is performed on the mixed solution. A range of the heating rate of the thermal treatment is 2° C./min to 10° C./min.
摘要:
A quantum dot, a light emitting material, and a manufacturing method of quantum dot are provided. A ratio of an emission intensity to an absorption intensity of the quantum dot at a characteristic wavelength ranges from 1.5×108 CPS/Abs. to 2.0×109 CPS/Abs. The characteristic wavelength is a shorter wavelength of two wavelengths corresponding to half of a maximum intensity of an emission peak of the quantum dot.
摘要:
A liquid crystal alignment agent capable of forming a liquid crystal display element having good resistance to ultraviolet decay and no mura effect, a liquid crystal alignment film, and a liquid crystal display element having the same are provided. The liquid crystal alignment agent includes a polymer (A), a polysiloxane (B), a polymerizable compound (C) containing a benzophenone structure, and a solvent (D). The polymer (A) is obtained by reacting a mixture. The mixture includes a tetracarboxylic dianhydride component (a1) and a diamine component (a2). The polysiloxane (B) contains a polymerizable unsaturated group, wherein the polymerizable unsaturated group includes a group represented by formula (1-1), a group represented by formula (1-2), or a combination of the two.
摘要:
A liquid crystal alignment agent of the present invention includes a polymer composition (A) synthesized by tetracarboxylic dianhydride compound (a) and diamine compound (b), and a solvent (B). The diamine compound (b) includes diamine (b-1) shown as following formula (I) and diamine (b-2): in formula (I), R1 represents a linear or branched alkyl of 1 to 6 carbons, a linear or branched hydroxyl alkyl of 1 to 6 carbons, an alkoxy of 1 to 6 carbons, an alkylthio of 1 to 6 carbons, a halogen atom, an amino group or a nitro group; R2 represents a methylene group, a divalent alkyl of 2 to 10 carbons, a divalent alkenyl of 2 to 7 carbons or a divalent alkynyl of 2 to 6 carbons; and a represents an integer of 0 to 3.
摘要:
The invention relates to a photosensitive polysiloxane composition and a thin film formed by the aforementioned photosensitive polysiloxane composition. The thin film is a planarization film of a TFT substrate, an interlayer insulating film or an overcoat of a core material or a protective material in a waveguide. The invention is to provide a photosensitive polysiloxane composition having excellent surface flatness and high tapered angle of a pattern. The photosensitive polysiloxane composition comprises a polysiloxane (A), an o-naphthoquinone diazide sulfonic acid ester (B), an alkali-soluble resin containing a silyl group (C) and a solvent (D).
摘要:
A photosensitive resin composition includes an alkali-soluble resin (A), a compound having an unsaturated vinyl group (B), a photo initiator (C), solvent (D) and a silane compound (E) having a structure shown as formula (I): in the formula (I), A individually and independently represents a single bond, an alkylene group, or an arylene group, B individually and independently represents an organic group having diphenyl phosphine, hydrogen atom, an alkyl group, an aryl group, or —OR, in which R is a C1-C6 alkyl group or a phenyl group, at least one B is the organic group having diphenyl phosphine and at least one B is —OR. When B is —OR, A connected to B is the single bond. A film formed by the photosensitive resin composition has good refractivity and adhesivity to molybdenum.
摘要:
A liquid crystal alignment agent capable of forming a liquid crystal alignment film having good environmental resistance, the liquid crystal alignment film, and a liquid crystal display element having the liquid crystal alignment film are provided. The liquid crystal alignment agent includes a polymer (A), a benzotriazole compound (B) containing an epoxy group, and a solvent (C). The polymer (A) is obtained by reacting a mixture including a tetracarboxylic dianhydride component (a1) and a diamine component (a2).
摘要:
A photosensitive resin composition and application of the same are provided. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound (B) containing vinyl unsaturated group(s), a photo initiator (C), an organic solvent (D), a pigment (E) and a metal chelating agent (F). During a pixel process with an omission of a prebake step, the photosensitive resin composition, which is added with the metal chelating agent (F), can be formed to pixels that is adhered tightly to a substrate.