Abstract:
A method for manufacturing a metal-oxide-semico nductor field effect transistor (MOSFET) having a drain and a source each of which has a lightly doped area, an enhanced lightly doped area and a heavily doped area is disclosed. The method includes steps of lightly doping the silicon substrate having a gate structure to form the lightly doped areas of the source and the drain; forming a first non-conductive layer covering the silicon substrate and the gate, forming a second non-conductive layer covering the first non-conductive layer, forming a duple-sidewall including a side-wall-spacer of the first non-conductive layer and an inner spacer, heavily doping the silicon substrate to form the heavily doped areas of the source and the drain respectively, removing the side-wall-spacer of the first non-conductive layer, executing an anisotropic etching on the inner spacer to form a cascade-shaped spacer of the gate, and doping the silicon substrate to form the enhanced lightly doped area and thus forming the extension area of the heavily doped area.
Abstract:
Disclosed is a digital filter having phase-adjustment ability, and more particularly to a digital filter system which can restore the phase of data transmitted via digital radio communication and thereby enhances the noise-immunity of data and the correct bit decision. The digital filter mainly includes a hold back data unit, a digital filter unit, and a signal phase modify unit to remove noises in the signals and to modify and restore correct digital wave-form signals. The digital filter having phase-adjustment ability is suitable for use in digital radio phones, pagers, etc. commonly found in the radio communication systems.
Abstract:
The present invention is related to an enhanced high density Read-Only-Memory (ROM) device with select gate. A thin oxide layer is deposited on the ROM cell matrix and it is extended to the select lines which is on the top and bottom side of the ROM cell matrix to form the select gate. The ROM cell matrix can be organized more flexible by using the buried layers to pick out the unwanted gates. The metal contact can be directly made in this extended region too. Thereafter it reduces the manufacturing cost and achieves a high speed and density and simple process device.
Abstract:
A memory table look-up method for executing a table look-up instruction in an active program uses an instruction buffer executing device, a controller and a data register to output table look-up data from a memory to the data register. The method includes causing an instruction buffer executing device to execute a table look-up instruction obtained from the memory and pre-stored in the instruction buffer executing device in a first cycle to generate and output a table look-up signal, and to cause the controller to output a next instruction being an instruction next to the table look-up instruction in the active program from the memory to the instruction buffer executing device in response to the table look-up signal. The method further includes the step of causing the controller to generate a forbidding signal in a second cycle for latching the next instruction located in the instruction buffer executing device, and to generate and output a write-in instruction to the instruction buffer executing device for generating a write-in signal in order to output said table look-up data to the data register.
Abstract:
A cost effective waveform-generating apparatus that generates accurate and precise waveforms is disclosed. The present waveform-generating apparatus includes a memory for storing a sequence of sampled amplitudes of a waveform, said sampled amplitudes constituting at least two periods of said waveform; a counting circuit, electrically connected to the memory, responsive to a clock signal for generating counting signals; a controlling circuit, electrically connected to the memory and the counting circuit, responsive to the counting signals for controlling the memory to output the sampled amplitudes recurrently; and a digital to analog converter, electrically connected to the memory, for converting the recurrent sampled amplitudes into an analog output.
Abstract:
A method of fabricating a twin-well integrated circuit device to implant the dopants directly through the nitride layer including steps of: The pad oxide layer and nitride layer are formed on a P-type semiconductor silicon wafer. Then, the alignment mark photoresist pattern is formed by the conventional lithography technique, where the alignment mark region is in clear field, while other regions are in dark field. Next, the nitride layer is patterned by plasma-etching technique to form the nitride alignment mark. The N-well region is formed by lithography and ion-implantation techniques. Thereafter, the P-well region is formed by lithography and ion-implantation methods again. Next, the active device region photoresist is formed by lithography technique. The nitride layer is partially etched to open the windows by plasma-etching technique. The P-well region photoresist is then formed, followed by the deep-implantation process. The second P-well region photoresist is then formed, followed by the deep-implantation process. The field oxide regions for isolation are also grown in the window openings during the P-field drive-in step. Finally, the remaining of nitride layer is removed. This new process can reduce the number of processing steps so as to decrease the production cost.
Abstract:
An intelligent bias voltage generating circuit capable of providing an electronic device with a reliable bias signal includes a power input terminal which is electrically connected to a power generating device for providing a power input, and a bias voltage generating circuit which is electrically connected to the power input terminal for responding to power fluctuations and generating a bias voltage signal output by a multi-section linear variation method.
Abstract:
A method is provided for manufacturing a polysilicon with a relatively small line width. The method includes steps of: a) forming a first layer of photoresist with a line pattern having a first line interval and a first line width over the polysilicon; b) etching a portion of the polysilicon for forming the polysilicon with a second line interval x and a second line width y respectively equal to the first line interval and the first line width; c) forming a second layer of photoresist with a third line interval and a third line width over the polysilicon; d) etching another portion of the polysilicon for forming the polysilicon with a fourth line interval x`, equal to the third line interval, and a fourth line width y`; e) depositing a polysilicon film over the polysilicon with the relatively small line width; and f) etching a portion of the polysilicon film to form sidewalls of the polysilicon with the relatively small line width for adjusting the relatively small line width of the polysilicon.
Abstract:
A sensing circuit for detecting data stored in a memory cell of an EEPROM by current detecting method is disclosed. The sensing circuit includes a constant current source supplying circuit for supplying a constant current. A loading circuit generates a current the same as the constant current generated by the current source supplying circuit when the memory cell sends out a logic low state signal, so that the data accessing speed during reading the data stored in the memory cell is increased.
Abstract:
The present invention is related to an interface circuit for transmitting data corresponding to a specific address from/to a decoding memory unit, includes a bit-selection circuit pre-set therein a transmission mode, and a processing circuit electrically connected to the bit-selection circuit for transmitting the data according to the transmission mode. The present invention also relates to methods for reading out and writing in data corresponding to a specific address from/to a decoding memory unit.