公开(公告)号：US4389701A

公开(公告)日：1983-06-21

申请号：US200780

申请日：1980-10-27

申请人： Edward H. Phillips

发明人： Edward H. Phillips

IPC分类号： F21S8/00 ,  F21V5/04 ,  G03B21/20 ,  F21V7/04 ,  F21V13/04

CPC分类号： F21V5/048 ,  G03B21/2026 ,  G03B21/208 ,  F21W2131/402

摘要： An illumination system having a light source disposed along a central axis of the system is provided with a conical reflector coaxially disposed about the light source for forming an annular virtual image of an arc of the light source. A toroidal lens is coaxially disposed about the central axis for forming a circular real image of the annular virtual image of the arc at the input port of a utilization device.

摘要翻译： 具有沿着系统的中心轴布置的光源的照明系统设置有围绕光源同轴设置的圆锥形反射器，用于形成光源的圆弧的环形虚像。 环形透镜围绕中心轴同轴设置，以在利用装置的输入端口处形成弧的环形虚像的圆形实像。

公开(公告)号：US4597664A

公开(公告)日：1986-07-01

申请号：US615595

申请日：1984-05-31

申请人： Karl-Heinz Johannsmeier ,  Edward H. Phillips

发明人： Karl-Heinz Johannsmeier ,  Edward H. Phillips

IPC分类号： G03F9/00 ,  G03B27/52

CPC分类号： G03F9/7069 ,  G03F9/7023

摘要： A step-and-repeat alignment and exposure system is provided with an adjustable holder for holding a main reticle, a main optical unit including a projection lens for producing an image of the main reticle at an image plane, a stage movable along coordinate axes adjacent to the image plane, and a holder rotatably mounted on the stage for holding a semiconductive wafer to be aligned with respect to the image of the main reticle. The system is further provided with an adjustable holder for holding an auxiliary reticle, a single channel auxiliary optical unit including a main objective lens for producing an image of the auxiliary reticle at the image plane, and a reference mark disposed on the stage and aligned with respect to the coordinate axes. The stage may be controlled for positioning the reference mark directly beneath either the projection lens or the main objective lens of the single channel auxiliary optical unit so that the images of both the main reticle and the auxiliary reticle may be aligned with respect to the reference mark and, hence, with respect to the coordinate axes, and so that the relative spacing between these images may be determined and checked from time to time. This permits the main optical unit and the auxiliary optical unit to be employed interchangeably in globally and precision region-by-region aligning the semiconductive wafer with respect to the coordinate axes prior to employing the projection lens in the photometric step-and-repeat printing of the image of the main reticle at each of an array of different regions on the semiconductive wafer. The system also includes a light source unit for selectively frontally illuminating the entire field of view of the main objective lens of the single channel auxiliary optical unit with white light not passing through the auxiliary reticle.

摘要翻译： 步进重复对准和曝光系统设置有用于保持主掩模的可调节保持器，包括用于在图像平面处产生主掩模版图像的投影透镜的主光学单元，沿着相邻的坐标轴可移动的台 以及保持器，其可旋转地安装在台架上，用于保持半导体晶片相对于主掩模版的图像对齐。 该系统还设置有用于保持辅助掩模版的可调节保持器，包括用于在像平面处产生辅助掩模版的图像的主物镜的单通道辅助光学单元以及设置在该平台上的基准标记，并与 相对于坐标轴。 可以控制舞台，用于将参考标记直接定位在单声道辅助光学单元的投影透镜或主物镜的下方，使得主掩模版和辅助掩模版两者的图像可以相对于参考标记 并且因此相对于坐标轴，并且因此可以不时地确定和检查这些图像之间的相对间隔。 这允许主光学单元和辅助光学单元在全球范围内可互换使用，并且在使用投影透镜进行光度分步重复打印之前，相对于坐标轴对准半导体晶片 在半导体晶片上的不同区域的阵列中的每一个处的主掩模版的图像。 该系统还包括光源单元，用于以不通过辅助掩模版的白光选择性地正面照亮单通道辅助光学单元的主物镜的整个视场。

公开(公告)号：US4573791A

公开(公告)日：1986-03-04

申请号：US649767

申请日：1984-09-12

申请人： Edward H. Phillips

发明人： Edward H. Phillips

IPC分类号： G03F9/00 ,  G03B27/32 ,  G03B27/42

CPC分类号： G03F9/70

摘要： An alignment and exposure system is provided with a main stage movable along orthogonal axes to position either a reference mark, aligned with one of those axes, or a semiconductive wafer directly beneath a projection lens. Another stage is disposed above the projection lens to position a reticle, selectively illuminated by a light source unit, with respect to the reference mark. The light source unit includes a lamp for directing illumination and exposure light along an optical path extending through the reticle and projection lens, a pair of filters for selectively controlling whether illumination or exposure light passes along that optical path to the reticle, a pair of shutters for selectively controlling passage of the selected light along that optical path to the reticle, and a plurality of different mask plates for selectively controlling the portions of the reticle illuminated by the selected light when one of the shutters is opened. Images of the illuminated portions of the reticle are projected onto the reference mark or semiconductive wafer by the projection lens. A beam splitter is disposed between the projection lens and reticle to provide a port for viewing aerial images of the portions of the reference mark or semiconductive wafer illuminated by the projected images of the illuminated portions of the reticle. While employing a microscope to view those aerial images, either stage may be controlled to directly align either the semiconductive wafer with respect to the reticle or the reticle with respect to the reference mark.

摘要翻译： 对准和曝光系统设置有主平台，其可沿正交轴线移动以定位与这些轴中的一个对准的参考标记，或直接位于投影透镜下方的半导体晶片。 另一级设置在投影透镜上方，以相对于参考标记定位由光源单元选择性照明的光罩。 光源单元包括用于沿着延伸通过掩模版和投影透镜的光路引导照明和曝光光的灯，用于选择性地控制照明光或曝光光是否沿着该光路通向光罩的一对滤光器，一对光闸 用于选择性地控制沿着该光路的所选择的光的通过到掩模版，以及多个不同的掩模板，用于当其中一个挡板打开时，选择性地控制由所选择的光照亮的掩模版的部分。 通过投影透镜将掩模版的照明部分的图像投射到参考标记或半导体晶片上。 分束器设置在投影透镜和标线板之间，以提供用于观察由掩模版的照射部分的投影图像照射的参考标记或半导体晶片的部分的空间图像的端口。 当使用显微镜观察那些空中图像时，可以控制任一阶段以相对于参考标记直接对准半导体晶片相对于掩模版或标线。

公开(公告)号：US4328941A

公开(公告)日：1982-05-11

申请号：US83770

申请日：1979-10-11

申请人： Edward H. Phillips ,  Lawrence A. Wise

发明人： Edward H. Phillips ,  Lawrence A. Wise

IPC分类号： F16F15/04 ,  F16M7/00 ,  G03F7/20 ,  G12B5/00 ,  F16M13/00

CPC分类号： G03F7/70691 ,  F16F15/04 ,  F16M7/00 ,  G03F7/709 ,  G12B5/00

摘要： A shock and vibration isolation system having a plurality of isolators supporting a utilization device is disclosed. Each isolator has two gas driven pistons, pivotally mounted in a frame and is connected to an accumulator/controller that supplies controlled amounts of pressurized gas. A sensor in each isolator senses the position of the utilization device with respect to a base sitting on the ground, and the accumulator/controller adds gas to or exhausts gas from the pistons to counteract changes in position detected by the sensor. An electronic control circuit is connected between the sensor and the accumulator/controller to supply a properly compensated signal from the sensor to control the accumulator/controller.

公开(公告)号：US4425537A

公开(公告)日：1984-01-10

申请号：US198364

申请日：1980-10-20

申请人： Edward H. Phillips ,  Karl-Heinz Johannsmeier

发明人： Edward H. Phillips ,  Karl-Heinz Johannsmeier

IPC分类号： G03F9/00 ,  G06T3/00 ,  G05B1/06

CPC分类号： G06T3/0068 ,  G03F9/70

摘要： In an X-Y addressable workpiece positioner the workpiece to be positioned, such as a semiconductive wafer to be aligned with a mask image, is coupled to move with a work stage moveable in the X-Y direction and having a two-dimensional array of positioning indicia affixed thereto for movement therewith. An enlarged image of a portion of the positioning array is projected onto a relatively stationary sensor stage to derive an output determinative of the X and Y coordinates of the positioning array relative to the position of the sensor. The sensed X and Y coordinates of the positioning array are compared with the X and Y coordinates of a reference positioning address to derive an error output. The work stage is moved in response to the error output for causing the workpiece to be positioned to the reference address. In a preferred embodiment of a mask aligner, the approximately stationary sensing stage is moved relative to the enlarged image of the positioning array for interpolating the X and Y coordinates of the sensed address. A viewing system is arranged for permitting the operator to superimpose the image of a pattern on the reference addressed position of the semiconductive wafer with a mask image. The sensing stage is moved by the operator to obtain precise registration of the images, thereby zeroing the reference position address to the interpolated value. The machine then sequentially steps the interpolated (zeroed) reference position address by predetermined increments, related to the size mask pattern to be projected onto the wafer, to cause the wafer to be sequentially exposed to the mask pattern in different regions thereof.

摘要翻译： 在XY可寻址的工件定位器中，待定位的工件，例如与掩模图像对准的半导体晶片，被联接以便可在XY方向上移动的工作台移动并具有固定到其上的定位标记的二维阵列 用于运动。 将定位阵列的一部分的放大图像投射到相对固定的传感器台上，以导出定位阵列相对于传感器位置的X和Y坐标的输出决定。 将感测的定位阵列的X和Y坐标与参考定位地址的X和Y坐标进行比较，以得到误差输出。 响应于使工件定位到参考地址的错误输出而移动工作台。 在掩模对准器的优选实施例中，大致静止感测级相对于定位阵列的放大图像移动，用于内插感测地址的X和Y坐标。 观察系统被布置成允许操作者用掩模图像将图案的图像叠加在半导体晶片的参考寻址位置上。 感测级由操作者移动以获得图像的精确注册，从而将参考位置地址归零到内插值。 然后，机器顺序地将内插（零）参考位置地址按预定的增量进行步进，与要投影到晶片上的尺寸掩模图案相关，以使晶片在其不同区域中顺序地暴露于掩模图案。

公开(公告)号：US4422755A

公开(公告)日：1983-12-27

申请号：US388147

申请日：1982-06-14

申请人： Edward H. Phillips

发明人： Edward H. Phillips

IPC分类号： G02B19/00 ,  G03F7/20 ,  G03B27/52 ,  G03B27/70

CPC分类号： G03F7/70058 ,  G02B19/0014 ,  G02B19/0047

摘要： A projection lens is disposed directly above a vacuum chuck for projecting an image of an illuminated portion of a semiconductive wafer held thereby to an image plane where that image may be viewed through a pair of objective lenses of a compound microscope. Microcircuitry contained on a reticle held by a holder positioned above the projection lens is photometrically printed onto the semiconductive wafer by passing exposure light through the reticle and the projection lens to the semiconductive wafer. At least one fiber optic source of illuminating light and one or more optical lenses are employed for projecting an image of the fiber optic light source through the objective lens to an entrance pupil of the projection lens without passing through the reticle to provide uniform illumination of the semiconductive wafer and facilitate direct wafer alignment prior to photometrically printing on the semiconductive wafer.

摘要翻译： 投影透镜直接设置在真空卡盘的正上方，用于通过复合显微镜的一对物镜将保持的半导体晶片的照明部分的图像投影到可以观看该图像的图像平面上。 通过将曝光光通过掩模版和投影透镜通过半导体晶片将包含在由投影透镜上方的保持器保持的微电路光学测量印刷到半导体晶片上。 使用至少一个照明光的光纤源和一个或多个光学透镜来将光纤光源的图像通过物镜投影到投影透镜的入射光瞳，而不通过掩模版以提供均匀的照明 半导体晶片，并且便于在半导体晶片上进行光度打印之前的直接晶片对准。

公开(公告)号：US4355272A

公开(公告)日：1982-10-19

申请号：US82485

申请日：1979-10-09

申请人： Lawrence A. Wise

发明人： Lawrence A. Wise

IPC分类号： G03B9/10 ,  G03B9/58 ,  G03F7/20 ,  G05B5/01

CPC分类号： G03F7/70558 ,  G03B9/10 ,  G03B9/58

摘要： A shutter is rotatably mounted in a housing for opening and closing a shutter aperture in the housing. The shutter is coupled to a drive unit for unidirectionally rotating the shutter with the same velocity profile to open and close the shutter aperture during each exposure period. This drive unit includes a drive motor and a control circuit having a source of position and velocity reference data and a feedback control loop configurable for either position or velocity control of the shutter as determined by a control command.

摘要翻译： 快门可旋转地安装在壳体中，用于打开和关闭壳体中的快门孔。 快门联接到驱动单元，用于以相同的速度分布单向旋转快门，以在每个曝光期间打开和关闭快门孔。 该驱动单元包括驱动电动机和具有位置和速度参考数据源的控制电路以及可配置用于通过控制命令确定的快门的位置或速度控制的反馈控制回路。

公开(公告)号：US4345836A

公开(公告)日：1982-08-24

申请号：US87220

申请日：1979-10-22

申请人： Edward H. Phillips

发明人： Edward H. Phillips

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F9/7011

摘要： In an optical alignment and exposure machine, particularly suited for aligning semiconductive wafers with and exposing them to microelectronic circuit patterns, two stages of mechanical prealignment of the wafers are performed. In the first stage of mechanical prealignment a wafer is received at a prealignment station where the periphery of the wafer engages at least one of three belt-driven rollers in such a manner as to turn the wafer so as to align a flat side edge or alignment flat of the wafer with two of the three rollers. A transfer arm picks up the first-stage prealigned wafer and transfers it to a rotatable alignment and exposure chuck carried by an X-Y addressable work stage. In the second stage of mechanical prealignment two alignment members coupled to the rotatable chuck for rotation therewith index with the alignment flat of the wafer, and additional alignment members also coupled to the rotatable chuck for rotation therewith index either the center of the wafer or a rounded side edge of the wafer to a predetermined position. An optical alignment system permits rotation of the chuck to more precisely align images of alignment marks on the wafer with alignment marks on the mask. Following such precision alignment of the first wafer, the second stage of mechanical prealignment of each succeeding wafer is performed at the final angular position of the chuck during the preceding precision alignment performed with the optical alignment system. Apparatus is coupled to the chuck for selectively moving a wafer supported on the chuck into engagement with a stop to accurately position the plane of an emulsion on the wafer with respect to a focal plane of the optical alignment system.

摘要翻译： 在光学对准和曝光机中，特别适用于将半导体晶片与微电子电路图案对准并将其暴露于微电子电路图案，执行晶片机械预对准的两个阶段。 在机械预对准的第一阶段中，晶片被接收在预对准站，其中晶片的周边以三个带驱动辊中的至少一个接合，以使晶片转动以使平坦侧边缘或对准 平板的两个三辊的晶圆。 传送臂拾取第一级预对准晶片，并将其传送到由X-Y可寻址工作台承载的可旋转对准和曝光卡盘。 在机械预对准的第二阶段中，两个对准构件联接到可旋转卡盘，以便与晶片的对准平面一起转动，并且另外的对准构件也联接到可旋转的卡盘以便旋转，以指示晶片的中心或圆形 晶片的侧边缘到预定位置。 光学对准系统允许卡盘的旋转以更精确地对准在晶片上的对准标记的图像上的掩模上的对准标记。 在第一晶片的这种精确对准之后，在用光学对准系统执行的先前的精确对准期间，在卡盘的最终角位置处执行每个后续晶片的机械预对准的第二阶段。 设备耦合到卡盘，用于选择性地将支撑在卡盘上的晶片移动到与止动器接合以将乳液的平面相对于光学对准系统的焦平面精确地定位在晶片上。

公开(公告)号：US4330752A

公开(公告)日：1982-05-18

申请号：US38667

申请日：1979-05-14

申请人： Ruediger F. Rauskolb

发明人： Ruediger F. Rauskolb

IPC分类号： G03F7/20 ,  H03K5/26

CPC分类号： G03F7/70716

摘要： A pair of position control circuits is employed for controlling the position of an interferometrically controlled stage along orthogonal X and Y axes of motion of the stage. Each of these position control circuits is provided with a variable phase shifter responsive to a reference signal and a control signal for producing an output signal of the same frequency as the reference signal but shifted in phase as determined by the control signal, and with a phase detector responsive to the output signal from the variable phase shifter and to a measurement signal obtained from the interferometrically controlled stage for producing a position control signal proportional to the difference in phase between those signals. The sum and the difference of the position control signals of selected phase produced by these position control circuits are employed to extend the resolution of the position control circuits.

摘要翻译： 采用一对位置控制电路来控制沿着平台的X轴运动和Y轴运动的干涉控制台的位置。 这些位置控制电路中的每一个都具有响应于参考信号的可变移相器和用于产生与参考信号相同频率但是由控制信号确定的相位偏移的输出信号的控制信号，并且具有相位 检测器响应于来自可变移相器的输出信号和从干涉控制级获得的测量信号，以产生与这些信号之间的相位差成比例的位置控制信号。 采用由这些位置控制电路产生的所选相位置的控制信号的总和和差以扩大位置控制电路的分辨率。

公开(公告)号：US4496194A

公开(公告)日：1985-01-29

申请号：US543432

申请日：1983-10-19

申请人： Edward H. Phillips

发明人： Edward H. Phillips

IPC分类号： F16C29/02 ,  F16C32/06

CPC分类号： F16C32/06 ,  F16C29/025

摘要： A gas bearing is provided which has a spherically contoured pocket with a gas supply passage which opens in the center of the pocket. The gas bearing is coupled to the load and is supported by a stem and a ball joint through which the gas is supplied to the bearing. An additional passage allows gas to flow between the pocket and a closed chamber in the bearing.

摘要翻译： 提供了一种气体轴承，其具有球形轮廓的口袋，气袋供应通道在口袋的中心开口。 气体轴承联接到负载，并由杆和球窝接头支撑，气体通过该接头供应到轴承。 附加通道允许气体在口袋和轴承中的封闭腔室之间流动。