公开(公告)号：US20030055855A1

公开(公告)日：2003-03-20

申请号：US09757622

申请日：2001-01-11

申请人： Silicon Valley Group, Inc.

发明人： Roberto B. Wiener

IPC分类号： G06F017/17

CPC分类号： H03H17/0657 ,  G03F7/70725 ,  H03H17/0235 ,  H03H17/0621

摘要： The present invention is directed to efficient and accurate filtering and interpolation techniques. Methods of the present invention reduce the number of required operations and reduce computational errors in the filtering and interpolation of discrete input signals.

摘要翻译： 本发明涉及有效和准确的滤波和插值技术。 本发明的方法减少了所需操作的数量，并减少了离散输入信号的滤波和内插中的计算误差。

公开(公告)号：US5733096A

公开(公告)日：1998-03-31

申请号：US527798

申请日：1995-09-13

申请人： Matthew J. Van Doren ,  Alexander H. Slocum ,  Don Sauer

发明人： Matthew J. Van Doren ,  Alexander H. Slocum ,  Don Sauer

IPC分类号： B25J18/02 ,  G25J18/04

CPC分类号： B25J18/025 ,  Y10T74/18672

摘要： A multi-stage telescoping tube structure and a robot including a multi-stage telescoping tube structure. The multi-stage telescoping tube structure includes an outer tube, an intermediate tube, and an inner tube. The intermediate tube is slidably received in the outer tube, and the inner tube is slidably received in the intermediate tube. It further includes a multi-stage screw for arrangement translating rotary motion into linear movement of the tubes, and a drive means coupled to the screw arrangement. The robot further includes a support bracket, rotatably supporting the multi-stage telescoping tube structure, and an electric motor for rotating the arrangement. The structure further includes rail guides engagable with complimentary horizontally extending rails for horizontal movement of the robot.

摘要翻译： 多级伸缩管结构和包括多级伸缩管结构的机器人。 多级伸缩管结构包括外管，中间管和内管。 中间管可滑动地容纳在外管中，并且内管可滑动地容纳在中间管中。 它还包括用于将旋转运动转换成管的线性运动的多级螺杆，以及联接到螺杆装置的驱动装置。 机器人还包括可旋转地支撑多级伸缩管结构的支撑支架和用于旋转该装置的电动马达。 该结构还包括可引导机器人水平移动的互补水平延伸轨道的轨道导轨。

公开(公告)号：US4313266A

公开(公告)日：1982-02-02

申请号：US145867

申请日：1980-05-01

申请人： Johann Tam

发明人： Johann Tam

IPC分类号： C30B33/00 ,  F26B5/08 ,  H01L21/00

CPC分类号： H01L21/67034 ,  C30B33/00 ,  F26B5/08 ,  Y10S269/902 ,  Y10S269/903 ,  Y10S414/138 ,  Y10S414/141

摘要： A method and apparatus for drying a wafer at a drying station includes a wafer holder which grips the wafer on its edge so that there is no contact with a face of the wafer. This eliminates contact areas which could cause stains on the face. A carriage mechanism brings a wet wafer into the drying station at one level and takes the dry wafer out of the drying station at a different level to prevent any contact between the dry wafer and residual moisture at the incoming level.

摘要翻译： 用于在干燥站干燥晶片的方法和装置包括：晶片保持器，其在晶片的边缘处握住晶片，使得不与晶片的表面接触。 这消除了可能导致脸部污渍的接触区域。 滑架机构将湿的晶片在一个水平面上带入干燥站，并将干燥的晶片从干燥站排出到不同的水平，以防止干燥晶片与进入水平的残留水分之间的任何接触。

公开(公告)号：US20040205425A1

公开(公告)日：2004-10-14

申请号：US10806325

申请日：2004-03-23

申请人： Silicon Valley Group, Inc. ,  ASML Holding N.V.

发明人： Roberto B. Wiener

IPC分类号： G06F017/17 ,  G11B005/00 ,  G06K005/04 ,  G11B020/20

CPC分类号： H03H17/0657 ,  G03F7/70725 ,  H03H17/0235 ,  H03H17/0621

摘要： A method and system of accurately processing a discrete time input signal having a first clock rate into a discrete time output signal having a second clock rate is presented. The method includes delta filtering the input signal to produce an intermediate signal having the first clock rate and delta interpolating the intermediate signal to produce the output signal. Delta filtering includes calculating an input delta signal by subtracting an initial value from the input signal, generating a filtered delta signal, and adding the initial value to the filtered delta signal. Delta interpolating includes upsampling the intermediate signal to the second clock rate, calculating an upsampled intermediate delta signal by subtracting an initial value from the upsampled intermediate signal, filtering the intermediate delta signal, and adding the initial value to the filtered intermediate delta signal. The method reduces the number of required operations and reduces computational errors in the filtering and interpolation of discrete input signals.

摘要翻译： 提出了一种将具有第一时钟速率的离散时间输入信号精确地处理成具有第二时钟速率的离散时间输出信号的方法和系统。 该方法包括对输入信号进行增量滤波以产生具有第一时钟速率的中间信号，并且对中间信号进行Δ内插以产生输出信号。 增量滤波包括通过从输入信号中减去初始值来计算输入增量信号，生成经滤波的增量信号，以及将初始值与滤波的增量信号相加。 增量插值包括将中间信号上采样到第二时钟速率，通过从上采样的中间信号中减去初始值，对中间增量信号进行滤波，并将初始值加到滤波后的中间增量信号上，计算上采样的中间增量信号。 该方法减少了所需操作的数量，并减少了离散输入信号的滤波和内插中的计算误差。

公开(公告)号：US20030060921A1

公开(公告)日：2003-03-27

申请号：US09923397

申请日：2001-08-08

申请人： Silicon Valley Group, Inc.

发明人： Roberto B. Wiener

IPC分类号： G06F019/00

CPC分类号： G03F7/705 ,  G03F7/70725

摘要： A lithography system and method for calculating an optimal discrete time trajectory for a movable device is described. A trajectory planner of the lithography system calculates an optimal discrete time trajectory subject to maximum velocity and maximum acceleration constraints. The trajectory planner begins by calculating a continuous time, three-segment trajectory for a reticle stage, a wafer stage or a framing blade, including a first phase for acceleration at the maximum acceleration to the maximum velocity, a second phase for travel at the maximum velocity and a third phase for deceleration at the negative maximum acceleration to a final velocity. Next, the trajectory planner converts said continuous time, three-segment trajectory to a discrete time trajectory. The time of execution of the resulting trajectory is at most three quanta greater than the time of execution of the continuous time trajectory. One advantage of the system is the reduction of scanning times of a lithography system. This advantage increases throughput and reduces manufacturing costs for a lithography system.

摘要翻译： 描述了一种用于计算可移动装置的最佳离散时间轨迹的光刻系统和方法。 光刻系统的轨迹计划器计算出最大速度和最大加速度约束条件下的最佳离散时间轨迹。 轨迹计划器通过计算分划板平台，晶片台或框架叶片的连续时间，三段轨迹开始，包括在最大加速度至最大速度时加速的第一阶段，最大行程的第二阶段 速度和第三相用于在负最大加速度处减速至最终速度。 接下来，轨迹计划器将所述连续时间，三段轨迹转换为离散时间轨迹。 所产生的轨迹的执行时间比执行连续时间轨迹的时间多至多三个量子。 该系统的一个优点是降低光刻系统的扫描时间。 这个优势增加了光刻系统的生产量并降低了制造成本。

公开(公告)号：US20020085185A1

公开(公告)日：2002-07-04

申请号：US09986106

申请日：2001-11-07

申请人： Silicon Valley Group, Inc.

发明人： June L. Helmus ,  Andrew W. McCullough

IPC分类号： G03B027/52

CPC分类号： G03F7/70258 ,  G03F7/70883 ,  G03F7/70933

摘要： The present invention provides a method and system for controlling the refractive index of gaseous mixture of the projection optics of a lithographic tool. In one embodiment, the present invention corrects projection optic aberrations due to altitude specific barometric pressure variations. Furthermore, the present invention provides control over the aberrations of an optical system, the ability to compensate for altitude changes, the ability to compensate for pressure changes, and the ability to purge gases from the optical system. In an embodiment, the system of the present invention includes at least one gas supply to provide a gas for a mixture, at least one mass flow controller associated with each gas supply, where the mass flow controller measures and controls the quantity of a respective gas for the mixture, and at least one flow gauge to substantially maintain laminar flow within the lithography apparatus. According to another embodiment of the present invention, the system further includes at least one filter to purify each gas for each gas supply, and at least one temperature control unit to maintain the temperature of the mixture at predetermined thermal specifications.

摘要翻译： 本发明提供了一种用于控制光刻工具的投影光学器件的气体混合物的折射率的方法和系统。 在一个实施例中，本发明由于高度特异性气压变化而校正投影光学像差。 此外，本发明提供对光学系统的像差的控制，补偿高度变化的能力，补偿压力变化的能力以及从光学系统吹扫气体的能力。 在一个实施例中，本发明的系统包括至少一个气体供应以提供用于混合物的气体，至少一个与每个气体供应相关联的质量流量控制器，其中质量流量控制器测量和控制相应气体的量 以及至少一个流量计，以基本维持光刻设备内的层流。 根据本发明的另一个实施例，系统还包括至少一个净化每个气体供应源的气体的过滤器和至少一个温度控制单元，以将混合物的温度保持在预定的热规格。

公开(公告)号：US20020027718A1

公开(公告)日：2002-03-07

申请号：US09841166

申请日：2001-04-25

申请人： Silicon Valley Group, Inc.

发明人： Justin L. Kreuzer

IPC分类号： G02B027/14 ,  G02B027/12

CPC分类号： G03F7/70566 ,  G03F7/70225 ,  G03F7/70308 ,  G03F7/70358

摘要： An optical reduction system for use in the photolithographic manufacture of semiconductor devices having one or more quarter-wave plates operating near the long conjugate end. A quarter-wave plate after the reticle provides linearly polarized light at or near the beamsplitter. A quarter-wave plate before the reticle provides circularly polarized or generally unpolarized light at or near the reticle. Additional quarter-wave plates are used to further reduce transmission loss and asymmetries from feature orientation. The optical reduction system provides a relatively high numerical aperture of 0.7 capable of patterning features smaller than 0.25 microns over a 26 mmnull5 mm field. The optical reduction system is thereby well adapted to a step and scan microlithographic exposure tool as used in semiconductor manufacturing. Several other embodiments combine elements of different refracting power to widen the spectral bandwidth which can be achieved.

摘要翻译： 一种用于光刻制造半导体器件的光学还原系统，其具有在长的共轭端附近操作的一个或多个四分之一波片。 光栅后面的四分之一波片提供线偏振光。 光罩之前的四分之一波片在分划板处或附近提供圆偏振或一般非偏振光。 额外的四分之一波片用于进一步降低传输损耗和不对称性。 光学还原系统提供了相对较高的数值孔径0.7，能够在26mm×5mm的场上图形化小于0.25微米的特征。 因此，光学还原系统很好地适用于在半导体制造中使用的步进和扫描微光刻曝光工具。 其它几个实施例组合了不同屈光力的元件以扩大可实现的光谱带宽。

公开(公告)号：US20020021460A1

公开(公告)日：2002-02-21

申请号：US09907902

申请日：2001-07-19

申请人： Silicon Valley Group, Inc.

发明人： Matthew E. Hansen

IPC分类号： G03H001/00

CPC分类号： G03F7/706 ,  G03F7/70375 ,  G03F7/70616

摘要： Characterization of an optical system is quickly and easily obtained in a single acquisition step by obtaining image data within a volume of image space. A reticle and image plane are positioned obliquely with respect to each other such that a reticle having a plurality of feature sets thereon, including periodic patterns or gratings, is imaged in a volume of space, including the depth of focus. Metrology tools are used to analyze the detected or recorded image in the volume of space through the depth of focus in a single step or exposure to determine the imaging characteristics of an optical system. Focus, field curvature, astigmatism, spherical, coma, and/or focal plane deviations can be determined. The present invention is particularly applicable to semiconductor manufacturing and photolithographic techniques used therein, and is able to quickly characterize an optical system in a single exposure with dramatically increased data quality and continuous coverage of the full parameter space. In embodiments, the test reticle is holographically generated by interfering two or more beams of optical radiation. The resulting interference pattern is recorded on a reticle and used for testing the optical system. The geometry of the holographic interference pattern is tightly controlled by the properties of the interfering beams and is therefore more accurate than conventional reticle writing techniques.

摘要翻译： 通过在图像空间的体积内获得图像数据，在单个采集步骤中快速且容易地获得光学系统的表征。 掩模版和图像平面相对于彼此倾斜地定位，使得其上包括周期性图案或光栅的具有多个特征集的掩模版被成像在包括焦深的空间体积中。 计量工具用于通过单步骤或曝光中的焦点深度来分析检测或记录的空间体积，以确定光学系统的成像特性。 可以确定焦点，场曲率，散光，球面，彗差和/或焦平面偏差。 本发明特别适用于其中使用的半导体制造和光刻技术，并且能够以单一曝光快速表征光学系统，并以显着增加的数据质量和全参数空间的连续覆盖。 在实施例中，通过干扰两个或更多个光辐射束来全息地产生测试掩模版。 所得到的干涉图案被记录在掩模版上并用于测试光学系统。 全息干涉图案的几何形状受到干涉光束的特性的严格控制，因此比传统的掩模版书写技术更精确。

公开(公告)号：US20010033437A1

公开(公告)日：2001-10-25

申请号：US09841108

申请日：2001-04-25

申请人： Silicon Valley Group, Inc.

发明人： Michael F. Meehan ,  David G. Taub ,  Daniel N. Galburt

IPC分类号： G02B007/02

CPC分类号： G03F7/708 ,  G02B7/023 ,  G02B7/028

摘要： An apparatus, system, and method for precision positioning and alignment of a lens in an optical system, wherein a first support for coupling to the peripheral edge of the lens is connected to a concentric second support using a plurality of positioning devices. At least one positioning device is configured to move the first support in an axial direction relative to the second support. Each positioning device comprises a lever, an actuator, and a flexure. The lever has a pivot point and is mounted on the second support. The actuator is connected to the lever and used to operate the lever about its pivot point. The flexure has a first end connected to the lever between the actuator and the pivot point. A second end of the flexure is connected to the first support. A second positioning device is used to move the first support relative to the second support in a direction substantially perpendicular to the axial direction. Additional positioning devices can be used to provide for other types of motion such as, for example, rotation and tilt. In a preferred embodiment, the actuators are pneumatic bellows. A compressible gas supply module is fluidly connected to the bellows, and a control module in communication with the compressible gas supply module is used to operate the bellows. An optional sensor module is used to provide data to the control module for positioning the first support relative to the second support.

摘要翻译： 一种用于光学系统中的透镜的精确定位和对准的装置，系统和方法，其中用于联接到透镜的周缘的第一支撑件使用多个定位装置连接到同心的第二支撑件。 至少一个定位装置构造成相对于第二支撑件在轴向上移动第一支撑件。 每个定位装置包括杠杆，致动器和挠曲件。 杠杆具有枢轴点并且安装在第二支撑件上。 执行器连接到杠杆并用于围绕其枢转点操作杠杆。 挠曲件具有连接到致动器和枢转点之间的杠杆的第一端。 挠曲件的第二端连接到第一支撑件。 第二定位装置用于沿着基本上垂直于轴向方向的方向相对于第二支撑件移动第一支撑件。 可以使用附加的定位装置来提供其他类型的运动，例如旋转和倾斜。 在优选实施例中，致动器是气动波纹管。 可压缩气体供应模块流体地连接到波纹管，并且与可压缩气体供应模块连通的控制模块用于操作波纹管。 可选的传感器模块用于向控制模块提供相对于第二支撑件定位第一支撑件的数据。

公开(公告)号：US6059567A

公开(公告)日：2000-05-09

申请号：US22057

申请日：1998-02-10

申请人： Douglas A. Bolton ,  Patrick W. Wiesen

发明人： Douglas A. Bolton ,  Patrick W. Wiesen

IPC分类号： H01L21/324 ,  H01L21/00 ,  F27D15/02

CPC分类号： H01L21/67109

摘要： In summary, the vertical rapid cooling furnace of this invention for treating semiconductor wafers with self contained gas chilling and recycling comprises a hot wall reaction tube positioned within a cylindrical array of heating coils. Space between the hot wall reaction tube and said array of heating coils provides a cooling gas passageway therebetween. The cooling gas passageway has an inlet and an outlet, a chilled gas inlet communicating with the inlet of the cooling gas passageway and a heated gas outlet communicating with the outlet of the cooling gas passageway. The furnace includes a heat exchanger having a hot gas inlet and a chilled gas outlet, the hot gas inlet thereof communicating with said heated gas outlet, and the chilled gas outlet communicating with said cooling gas passageway inlet. With this system, heated gas from the cooling gas passageway can be chilled to remove heat therefrom and returned to the cooling gas passageway to remove heat from the furnace. The furnace preferably includes a fan placed between the chilled gas outlet and the cooling gas passageway inlet and valves for isolating the heat exchanger from the furnace during its heating cycle.

摘要翻译： 总之，本发明的用于处理具有自含气体冷却和再循环的半导体晶片的立式快速冷却炉包括位于加热盘管的圆柱形阵列内的热壁反应管。 热壁反应管和所述加热线圈阵列之间的空间在它们之间提供冷却气体通路。 冷却气体通道具有入口和出口，与冷却气体通道的入口连通的冷却气体入口和与冷却气体通道的出口连通的加热气体出口。 该炉包括具有热气体入口和冷却气体出口的热交换器，其热气体入口与所述加热的气体出口连通，以及与所述冷却气体通道入口连通的冷却气体出口。 利用该系统，来自冷却气体通道的加热气体可以被冷却以从其中除去热量并返回到冷却气体通道以从炉中去除热量。 炉子优选地包括放置在冷却气体出口和冷却气体通道入口之间的风扇，以及用于在其加热循环期间将热交换器与炉隔离的阀。