公开(公告)号：US20030184869A1

公开(公告)日：2003-10-02

申请号：US10109890

申请日：2002-04-01

发明人： Chen-Ho Lee ,  Tsung-Yin Chen ,  Chun-I Hsiao

IPC分类号： G02B027/14 ,  G02B027/12 ,  G02B005/04 ,  G02B007/18

CPC分类号： G02B27/1013 ,  G02B26/123 ,  G02B26/124 ,  G02B27/1006 ,  G02B27/126

摘要： A light focusing and dispersing apparatus of a light source module is disclosed. The light focusing and dispersing apparatus is particularly used in image scanners such as a single pass color scanner. The light focusing and dispersing apparatus concentrates light from a light source to form a light beam so as to upgrade the use efficiency of light energy. The light focusing and dispersing apparatus disperses the light beam from the light source to form red, green and blue light beams to illuminate a document to be scanned. The red, green and blue light beams reflected from the scanned document emit onto array of image sensors comprising red, green and blue light sensitive regions respectively.

摘要翻译： 公开了一种光源模块的聚光分散装置。 光聚焦分散装置特别用于像单色彩扫描仪等图像扫描仪中。 光聚焦分散装置集中来自光源的光以形成光束，从而提高光能的使用效率。 光聚焦分散装置将来自光源的光束分散，形成红色，绿色和蓝色光束，以照射待扫描的文件。 从扫描文件反射的红色，绿色和蓝色光束分别发射到包括红，绿和蓝光敏感区域的图像传感器阵列上。

公开(公告)号：US20040032666A1

公开(公告)日：2004-02-19

申请号：US10606784

申请日：2003-06-27

发明人： Tomoyuki Baba

IPC分类号： G02B027/12

CPC分类号： G02B17/086 ,  G02B13/16 ,  G02B17/0848

摘要： Small projection optical systems and projection-type image display apparatuses use a plurality of prisms with internally reflecting surfaces with optical power, an incident light refracting surface, and an exit light refracting surface in order to project an image of an image display element on a nearby screen. The ratio of the distance to the screen from the exit light refracting surface of the projection optical system and the distance to the image display apparatus from the incident light refracting surface of the projection optical system satisfies a condition that the ratio be less than twenty. A diaphragm that serves as an aperture stop is placed between two of the prisms. The internally reflecting surfaces may be free-form surfaces or simpler rotationally symmetric aspheric surfaces. Six internally reflecting surfaces of free-form shape are disclosed in a preferred embodiment.

摘要翻译： 小投影光学系统和投影型图像显示装置使用具有光学功率的内反射面的多个棱镜，入射光折射面和出射光折射面，以将图像显示元件的图像投影在附近 屏幕。 与投影光学系统的出射光折射面的距离与屏幕的距离与从投影光学系统的入射光折射面到图像显示装置的距离的比率满足比例小于二十的条件。 用作孔径光阑的隔膜放置在两个棱镜之间。 内部反射表面可以是自由曲面或更简单的旋转对称非球面表面。 在优选实施例中公开了自由形状的六个内部反射表面。

公开(公告)号：US20020080497A1

公开(公告)日：2002-06-27

申请号：US10026340

申请日：2001-12-21

申请人： Semiconductor Energy Laboratory Co., Ltd.

发明人： Koichiro Tanaka ,  Setsuo Nakajima ,  Takehito Yagi ,  Mikito Ishii ,  Kenichiro Nishida ,  Norihito Kawaguchi ,  Miyuki Masaki ,  Atsushi Yoshinouchi

IPC分类号： G02B027/14 ,  G02B027/12

CPC分类号： G02B27/108 ,  G02B27/145

摘要： A laser irradiation apparatus having a low running cost compared to the conventional, and a laser irradiation method using the laser irradiation apparatus, are provided. Crystal grains having a size in the same order as, or greater than, conventional grains are formed. The cooling speed of a semiconductor film is made slower, and it becomes possible to form crystal grains having a grain size in the same order as, or greater than, the size of grains formed in the case of irradiating laser light having a long output time to the semiconductor film. This is achieved by delaying one laser light with respect to another laser light, combining the laser lights, and performing irradiation to the semiconductor film in the case of irradiating laser light using a solid state laser as a light source, which has a short output time.

摘要翻译： 提供了一种与以往相比具有低运行成本的激光照射装置和使用该激光照射装置的激光照射方法。 形成具有与常规晶粒相同或更大的尺寸的晶粒。 半导体膜的冷却速度变慢，可以形成具有与照射具有长输出时间的激光的情况下形成的晶粒尺寸相同或更大的晶粒尺寸的晶粒 到半导体膜。 这是通过相对于另一激光器延迟一个激光，组合激光，并且在使用固态激光器作为光源照射激光的情况下对半导体膜进行照射，其具有短的输出时间 。

公开(公告)号：US20020027718A1

公开(公告)日：2002-03-07

申请号：US09841166

申请日：2001-04-25

申请人： Silicon Valley Group, Inc.

发明人： Justin L. Kreuzer

IPC分类号： G02B027/14 ,  G02B027/12

CPC分类号： G03F7/70566 ,  G03F7/70225 ,  G03F7/70308 ,  G03F7/70358

摘要： An optical reduction system for use in the photolithographic manufacture of semiconductor devices having one or more quarter-wave plates operating near the long conjugate end. A quarter-wave plate after the reticle provides linearly polarized light at or near the beamsplitter. A quarter-wave plate before the reticle provides circularly polarized or generally unpolarized light at or near the reticle. Additional quarter-wave plates are used to further reduce transmission loss and asymmetries from feature orientation. The optical reduction system provides a relatively high numerical aperture of 0.7 capable of patterning features smaller than 0.25 microns over a 26 mmnull5 mm field. The optical reduction system is thereby well adapted to a step and scan microlithographic exposure tool as used in semiconductor manufacturing. Several other embodiments combine elements of different refracting power to widen the spectral bandwidth which can be achieved.

摘要翻译： 一种用于光刻制造半导体器件的光学还原系统，其具有在长的共轭端附近操作的一个或多个四分之一波片。 光栅后面的四分之一波片提供线偏振光。 光罩之前的四分之一波片在分划板处或附近提供圆偏振或一般非偏振光。 额外的四分之一波片用于进一步降低传输损耗和不对称性。 光学还原系统提供了相对较高的数值孔径0.7，能够在26mm×5mm的场上图形化小于0.25微米的特征。 因此，光学还原系统很好地适用于在半导体制造中使用的步进和扫描微光刻曝光工具。 其它几个实施例组合了不同屈光力的元件以扩大可实现的光谱带宽。

公开(公告)号：US20020024742A1

公开(公告)日：2002-02-28

申请号：US09821937

申请日：2001-03-30

发明人： Steven R. Sedlmayr

IPC分类号： G02B027/12 ,  G02B027/30

CPC分类号： G02B26/02 ,  G02B27/1006 ,  G02B27/1046 ,  G02B27/1053 ,  G02B27/1073 ,  G02B27/142 ,  G02B27/143 ,  G02B27/144 ,  G02B27/145 ,  G02B27/149 ,  G02B27/283 ,  G03B33/06 ,  G03B35/26 ,  H04N5/7441 ,  H04N9/3105 ,  H04N9/3152 ,  H04N9/3167 ,  H04N9/317 ,  H04N13/239 ,  H04N13/334 ,  H04N13/337 ,  H04N13/341 ,  H04N13/361 ,  H04N13/363

摘要： This invention relates to electromagnetic wave beam paths, formation of the beam, illumination of programmable electromagnetic wave field vector orientation rotating devices (nullPEMFVORDnull) with an electromagnetic beam, and the technique of projection of the modulated beam. This invention also relates to a unique light path and method of forming the light into a rectangular beam to be used for optical projection systems and, more particularly, in a color and/or black and white liquid crystal device (LCD) projectors that produce high resolution, which brightness and/or three-dimensional images. This invention further relates to a device capable of receiving and displaying two-dimensional and three-dimensional images.

摘要翻译： 本发明涉及电磁波束路径，光束的形成，电磁波束的可编程电磁波场矢量取向旋转装置（“PEMFVORD”）的照明，以及投影调制束的技术。 本发明还涉及一种独特的光路和将光形成为用于光学投影系统的矩形光束的方法，更具体地说，涉及一种产生高光的彩色和/或黑白液晶装置（LCD）投影仪 分辨率，哪个亮度和/或三维图像。 本发明还涉及能够接收和显示二维和三维图像的装置。

公开(公告)号：US20010043403A1

公开(公告)日：2001-11-22

申请号：US09821286

申请日：2001-03-29

申请人： Leica Microsystems Heidelberg GmbH

发明人： Johann Engelhardt

IPC分类号： G02B027/12

CPC分类号： G02B27/126 ,  G02B21/0064 ,  G02B21/0068

摘要： An optical arrangement for at least partial spectral selection of light components from a polychromatic light beam (1) is configured, in the interest of multifarious spectral selection capabilities, with means of simple design in such a way that a dispersive medium (2) for spatial spectral spreading of the polychromatic light beam (1) into individual light bundles (3), and an attenuation means (5, 6) for at least partial attenuation of the intensity of one or more light bundles (3), are provided.

摘要翻译： 用于从多色光束（1）中的光分量的至少部分光谱选择的光学装置被配置为以多种光谱选择能力为特征，以简单设计的方式，使得用于空间的分散介质（2） 提供了多色光束（1）到各个光束（3）中的光谱扩展，以及用于至少部分衰减一个或多个光束（3）的强度的衰减装置（5,6）。

公开(公告)号：US20040246591A1

公开(公告)日：2004-12-09

申请号：US10454071

申请日：2003-06-04

发明人： William J. Kozlovsky ,  Mark McDonald

IPC分类号： G02B027/12

CPC分类号： G02B27/1073 ,  G02B27/108 ,  G02B27/142

摘要： A micromachined pellicle beam splitter and method of manufacture thereof are disclosed. In one embodiment, the beam splitter includes a silicon frame with a silicon nitride membrane attached to the frame and covering an opening through the frame. Other materials may be utilized, however, the coefficient of thermal expansion (CTE) of the membrane should be greater than that of the frame. The beam splitter may be manufactured by coating a silicon substrate with a layer of silicon nitride, patterning an opposite side of the silicon substrate with a photoresist or a metallic layer to define an opening an etching an opening through the substrate to the silicon nitride with either a dry etch or wet etch technique. An improved tunable laser module incorporating the micromachined pellicle beam splitter and a method of tuning a laser diode are also disclosed.

摘要翻译： 公开了一种微加工防护薄膜分束器及其制造方法。 在一个实施例中，分束器包括硅框架，其具有附接到框架并覆盖通过框架的开口的氮化硅膜。 可以使用其它材料，然而，膜的热膨胀系数（CTE）应该大于框架的热膨胀系数（CTE）。 分束器可以通过用氮化硅层涂覆硅衬底来制造，用光致抗蚀剂或金属层将硅衬底的相对侧图案化以限定开口，通过衬底蚀刻通过衬底到氮化硅的开口，或者 干蚀刻或湿蚀刻技术。 还公开了一种结合有微加工防护薄膜分束器的改进的可调激光器模块和调谐激光二极管的方法。

公开(公告)号：US20030090808A1

公开(公告)日：2003-05-15

申请号：US09986876

申请日：2001-11-13

申请人： THE FURUKAWA ELECTRIC CO., LTD.

发明人： Mizuki Oike ,  Hiroshi Matsuura ,  Satoru Abe

IPC分类号： G02B027/12

CPC分类号： H01S5/0687 ,  G02B6/2848 ,  G02B6/29361 ,  G02B6/29395 ,  G02B6/4215 ,  H01S5/005 ,  H01S5/06804 ,  H01S5/06837

摘要： A wavelength controller includes a wavelength locker module, having a prism for dividing incident light into first and second branched light beams, a first light quantity detector for receiving the first branched light beam through a wavelength selective filter and a second light quantity detector for directly receiving the second branched light beam, and detects and suppresses a wavelength variation in incident light entering the module based on outputs of the light quantity detectors.

摘要翻译： 波长控制器包括波长锁定器模块，其具有用于将入射光分成第一和第二分支光束的棱镜，用于通过波长选择滤光器接收第一分支光束的第一光量检测器和用于直接接收的第二光量检测器 第二分支光束，并且基于光量检测器的输出来检测并抑制入射到模块中的入射光的波长变化。

公开(公告)号：US20020163735A1

公开(公告)日：2002-11-07

申请号：US09758594

申请日：2001-01-10

发明人： Gunther Detlef ,  Ingo Horn ,  Marcel Guillong

IPC分类号： G02B027/30 ,  G02B027/14 ,  G02B027/12

CPC分类号： B23K26/067 ,  B23K26/0604 ,  G01N1/04 ,  G01N1/22 ,  G01N21/718 ,  G01N2001/028 ,  G01N2001/045

摘要： Disclosed are systems for, and methods of forming and applying 40 micron or greater diameter, substantially radially homogeneous, relatively high, (eg. 30-60 or greater J/cm 2), energy density, preferably 200-380 nm UV wavelength, (typically Nd-YAG Iraser produced 213 nm or 266 nm wavelength), electromagnetic radiation laser pulse(s), or equivalent in a continuous wave, to uniformly substantially purely optically ablate material from sample systems; coupled with analysis thereof in (ICP-OES), (ICP-MS), (MIP-OES), (MIP-MS) or other plasma based analysis systems, with relative freedom from calibration errors arising from element fractionation. Further disclosed is methodology for uniformly ablating material from sample systems such as gem stones for high sensitivity, high acuracy analysis, the damaging effects of which are, or can be rendered undetectable; and methodology criteria for determining, accepting and applying combinations of electromagnetic radiation defining parameters for use in sample system ablation.

摘要翻译： 公开了用于形成和施加40微米或更大直径，基本上径向均匀，相对高（例如30-60或更大J / cm 2）的能量密度，优选200-380nm UV波长的系统， 通常Nd-YAG Iraser产生213nm或266nm波长），电磁辐射激光脉冲或连续波中的等效物，以均匀地基本上纯粹地从样品系统中光学地烧蚀材料; （ICP-OES），（ICP-MS），（MIP-OES），（MIP-MS）或其他基于等离子体的分析系统的分析，相对于元素分馏产生的校准误差。 进一步公开的是用于均匀地从诸如宝石的样品系统中消耗材料的方法，用于高灵敏度，高精度分析，其破坏作用或不可检测; 以及用于确定，接受和应用定义用于样本系统消融的参数的电磁辐射的组合的方法学标准。

公开(公告)号：US20020131181A1

公开(公告)日：2002-09-19

申请号：US10040717

申请日：2002-01-07

发明人： Wolfgang Singer ,  Wilhelm Ulrich ,  Martin Antoni

IPC分类号： G02B027/14 ,  G02B027/12

CPC分类号： G21K1/06 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/702 ,  G03F7/70233

摘要： There is provided an illumination system for lithography with wavelengths of null193 mn. The system comprises a first optical element, which is divided into first raster elements and lies in a first plane. The first plane defines an x-direction and a y-direction, the first raster elements each have an x-direction and a y-direction with an aspect ratio, and at least two of the first raster elements have aspect ratios of different magnitude.

摘要翻译： 提供了一种波长<= 193mn的光刻照明系统。 该系统包括第一光学元件，其被分成第一光栅元件并位于第一平面中。 第一平面限定x方向和y方向，第一光栅元件各自具有x方向和具有纵横比的y方向，并且至少两个第一光栅元素具有不同大小的纵横比。