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公开(公告)号：US20080112841A1
公开(公告)日：2008-05-15
申请号：US11983208
申请日：2007-11-07
摘要： A soft-magnetic FeCo based target material is provided which has a high saturation magnetic flux density and superior atmospheric corrosion resistance. The target material is a soft-magnetic FeCo based target material made of an FeCo based alloy. The FeCo based alloy comprises 0 to 30 at. % of one or more metal elements selected from the group consisting of B, Nb, Zr, Ta, Hf, Ti and V; and the balance being Fe and Co with unavoidable impurities. The Fe:Co atomic ratio ranges from 10:90 to 70:30. The FeCo based alloy may further comprise 0.2 at. % to 5.0 at. % of Al and/or Cr.
摘要翻译： 提供了一种具有高饱和磁通密度和优异的耐大气腐蚀性的软磁性FeCo基靶材。 目标材料是由FeCo基合金制成的软磁性FeCo基靶材料。 FeCo基合金包含0至30at。 ％的选自B，Nb，Zr，Ta，Hf，Ti和V的一种或多种金属元素; 余量为Fe和Co与不可避免的杂质。 Fe：Co原子比范围为10:90至70:30。 FeCo基合金可以进一步包含0.2at。 ％至5.0 at。 Al和/或Cr的％。
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公开(公告)号：US5108698A
公开(公告)日：1992-04-28
申请号：US630491
申请日：1990-12-20
CPC分类号： H01F1/22 , B22F3/1208 , B22F3/14 , B22F3/20 , H01F1/14791 , Y10T428/12097
摘要： A method of making a disc-shaped or plate-shaped sintered body from powdered material of poor ductility, such as Sendust alloy, wherein the powdered material is filled in a dish-like metallic vessel having a thick bottom wall and a low side wall, a plurality of such filled vessels are piled up and put in a cylindrical capsule made of hot-workable metal, the capsule is charged in a container of a hot extrusion press whose outlet is closed and it is then heated and compressed. The resultant compressed product is taken out and cooled and metallic parts resulted from the vessels and capsule are removed from the compressed product, thereby obtaining plate-shaped sintered bodies as wanted.
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3.发明授权公开(公告)号：US07757396B2
公开(公告)日：2010-07-20
申请号：US11881396
申请日：2007-07-26
申请人： Toshiyuki Sawada , Akihiko Yanagitani , Shingo Fukumoto , Tomoki Okita , Takashi Tsuyumu , Makoto Asami , Nobuki Matsuo , Shogo Matsuki , Yoshitaka Tsujii
发明人： Toshiyuki Sawada , Akihiko Yanagitani , Shingo Fukumoto , Tomoki Okita , Takashi Tsuyumu , Makoto Asami , Nobuki Matsuo , Shogo Matsuki , Yoshitaka Tsujii
IPC分类号： F01L3/04
CPC分类号： C23C26/02 , B22F1/0003 , B22F2998/00 , C22C9/00 , C22C9/06 , C23C24/10 , F01L3/02 , F01L2101/00 , F01L2103/00 , Y10T29/49306 , B22F1/02 , B22F9/082
摘要： There are disclosed a laser clad valve seat raw-material powder superior in productivity, cladding property, wear resistance and finishing property, and a laser clad valve seat using the same superior in wear resistance. The row-material powder comprises a powder mixture comprising: 80 to 99% by weight of a Cu-based alloy powder comprising 0.5 to 5% by weight of B, 0 to 20% by weight of Ni, 0 to 10% by weight of Fe plus Co, 0 to 5% by weight of Si, 0 to 3% by weight of Al, and the balance Cu and unavoidable impurities; and 1-20% by weight of an Fe or Co based alloy powder having a Vickers hardness of 500 HV or higher and an average particle diameter of 50 to 200 μm of and comprising 5 to 40% by weight of Mo, 0 to 25% by weight of Cr, 0 to 5% by weight of Si, and the balance Fe or Co and unavoidable impurities.
摘要翻译： 公开了一种生产率，包层性，耐磨性和精加工性优异的激光复合阀座原料粉末和耐磨性优异的激光复合阀座。 行料粉末包含粉末混合物，其包含：80至99重量％的包含0.5至5重量％的B，0至20重量％的Ni，0至10重量％的Ni的Cu基合金粉末 Fe加Co，0〜5重量％的Si，0〜3重量％的Al，余量为Cu和不可避免的杂质; 和维氏硬度为500HV以上，平均粒径为50〜200μm，含有5〜40重量％的Mo，0〜25重量％的Fe或Co系合金粉末， 的Cr，0〜5重量％的Si，余量为Fe或Co和不可避免的杂质。
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4.发明申请公开(公告)号：US20090022614A1
公开(公告)日：2009-01-22
申请号：US12173337
申请日：2008-07-15
IPC分类号： B22F1/00
CPC分类号： B22F1/00 , B22F2998/10 , C22C1/0433 , C22C19/05 , B22F9/082 , B22F3/15
摘要： There is provided a method for producing sputtering target materials which are used for a Ni—W based interlayer in a perpendicular magnetic recording medium. In this producing method, a Ni—W based alloy powder is prepared as a raw material powder. The alloy powder comprises 5 to 20 at % of W and the balance Ni and unavoidable impurities and is produced by gas atomization. The raw material powder is consolidated at a temperature ranging from 900 to 1150° C. This producing method makes it possible to significantly restrain expansion of the powder-filled billet in the consolidation step, thus efficiently producing Ni—W based sputtering target materials with stable qualities.
摘要翻译： 提供了用于制造用于垂直磁记录介质中的Ni-W系夹层的溅射靶材的方法。 在该制造方法中，制作Ni-W系合金粉末作为原料粉末。 合金粉末含有5〜20原子％的W，余量为Ni和不可避免的杂质，通过气体雾化法制造。 原料粉末在900〜1150℃的温度下固化。该制造方法可以显着地抑制固结步骤中填充粉末的坯料的膨胀，从而有效地生产具有稳定的Ni-W系溅射靶材料 品质
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5.发明授权公开(公告)号：US09293166B2
公开(公告)日：2016-03-22
申请号：US12934387
申请日：2009-04-30
CPC分类号： G11B5/667 , C22C1/0433 , C22C19/03 , C22C19/058 , C23C14/3414 , G11B5/8404 , G11B5/851
摘要： There is disclosed a sputtering target material for producing an intermediate layer film of a perpendicular magnetic recording medium, which is capable of dramatically reducing the crystal grain size of a thin film formed by sputtering. The sputtering target material comprises, in at %, 1 to 20% of W; 0.1 to 10% in total of one or more elements selected from the group consisting of P, Zr, Si and B; and balance Ni.
摘要翻译： 公开了一种用于制造垂直磁记录介质的中间层膜的溅射靶材料，其能够显着降低由溅射形成的薄膜的晶粒尺寸。 溅射靶材料以％计含有1％至20％的W; 总共0.1〜10％的选自P，Zr，Si和B的一种或多种元素; 并平衡Ni。
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6.发明授权公开(公告)号：US08080201B2
公开(公告)日：2011-12-20
申请号：US12173337
申请日：2008-07-15
IPC分类号： B22F3/15
CPC分类号： B22F1/00 , B22F2998/10 , C22C1/0433 , C22C19/05 , B22F9/082 , B22F3/15
摘要： There is provided a method for producing sputtering target materials which are used for a Ni—W based interlayer in a perpendicular magnetic recording medium. In this producing method, a Ni—W based alloy powder is prepared as a raw material powder. The alloy powder comprises 5 to 20 at % of W and the balance Ni and unavoidable impurities and is produced by gas atomization. The raw material powder is consolidated at a temperature ranging from 900 to 1150° C. This producing method makes it possible to significantly restrain expansion of the powder-filled billet in the consolidation step, thus efficiently producing Ni—W based sputtering target materials with stable qualities.
摘要翻译： 提供了用于制造用于垂直磁记录介质中的Ni-W系夹层的溅射靶材的方法。 在该制造方法中，制作Ni-W系合金粉末作为原料粉末。 合金粉末含有5〜20原子％的W，余量为Ni和不可避免的杂质，通过气体雾化法制造。 原料粉末在900〜1150℃的温度下固化。该制造方法可以显着地抑制固结步骤中填充粉末的坯料的膨胀，从而有效地生产具有稳定的Ni-W系溅射靶材料 品质
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7.发明申请公开(公告)号：US20080083391A1
公开(公告)日：2008-04-10
申请号：US11881396
申请日：2007-07-26
申请人： Toshiyuki Sawada , Akihiko Yanagitani , Shingo Fukumoto , Tomoki Okita , Takashi Tsuyumu , Makoto Asami , Nobuki Matsuo , Shogo Matsuki , Yoshitaka Tsujii
发明人： Toshiyuki Sawada , Akihiko Yanagitani , Shingo Fukumoto , Tomoki Okita , Takashi Tsuyumu , Makoto Asami , Nobuki Matsuo , Shogo Matsuki , Yoshitaka Tsujii
CPC分类号： C23C26/02 , B22F1/0003 , B22F2998/00 , C22C9/00 , C22C9/06 , C23C24/10 , F01L3/02 , F01L2101/00 , F01L2103/00 , Y10T29/49306 , B22F1/02 , B22F9/082
摘要： There are disclosed a laser clad valve seat raw-material powder superior in productivity, cladding property, wear resistance and finishing property, and a laser clad valve seat using the same superior in wear resistance. The row-material powder comprises a powder mixture comprising: 80 to 99% by weight of a Cu-based alloy powder comprising 0.5 to 5% by weight of B, 0 to 20% by weight of Ni, 0 to 10% by weight of Fe plus Co, 0 to 5% by weight of Si, 0 to 3% by weight of Al, and the balance Cu and unavoidable impurities; and 1-20% by weight of an Fe or Co based alloy powder having a Vickers hardness of 500HV or higher and an average particle diameter of 50 to 200 μm of and comprising 5 to 40% by weight of Mo, 0 to 25% by weight of Cr, 0 to 5% by weight of Si, and the balance Fe or Co and unavoidable impurities.
摘要翻译： 公开了一种生产率，包层性，耐磨性和精加工性优异的激光复合阀座原料粉末和耐磨性优异的激光复合阀座。 行料粉末包含粉末混合物，其包含：80至99重量％的包含0.5至5重量％的B，0至20重量％的Ni，0至10重量％的Ni的Cu基合金粉末 Fe加Co，0〜5重量％的Si，0〜3重量％的Al，余量为Cu和不可避免的杂质; 和维他尼硬度为500HV以上，平均粒径为50〜200μm，含有5〜40重量％的Mo，0〜25重量％的Fe或Co系合金粉末，1-20重量％ Cr的重量，0〜5重量％的Si，余量为Fe或Co和不可避免的杂质。
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公开(公告)号：US08066825B2
公开(公告)日：2011-11-29
申请号：US11941504
申请日：2007-11-16
CPC分类号： C22C38/10 , B22F2009/0876 , B22F2998/10 , C22C1/0433 , C22C33/0285 , C22C38/12 , C22C38/14 , C22C2202/02 , C23C14/3414 , B22F9/082 , B22F3/15
摘要： A (CoFe)Zr/Nb/Ta/Hf based target material is provided which is capable of achieving a high sputtering efficiency and a high sputtering effect by increasing the leakage magnetic flux in the magnetron sputtering, and a method for producing the target material. This target material is made of an Fe—Co based alloy comprising not less than 80 atomic % in total of Fe and Co having an Fe:Co atomic ratio of 80:20 to 0:100, and less than 20 atomic % of one or more selected from the group consisting of Zr, Hf, Nb and Ta. The Fe—Co based alloy comprises a Co—Fe phase being a ferromagnetic phase, and the one or more selected from the group consisting of Zr, Hf, Nb and Ta are incorporated in solid solution form into the Co—Fe phase in a total amount of 0.5 to 2 atomic %.
摘要翻译： 提供了一种能够通过增加磁控溅射中的漏磁通量而实现高溅射效率和高溅射效果的（CoFe）Zr / Nb / Ta / Hf基靶材，以及制造目标材料的方法。 该目标材料由Fe-Co系合金构成，Fe-Co系合金的Fe：Co原子比为80:20〜0:100，Fe：Co原子比为80原子％以上，Fe：Co原子比为80原子％以下，小于20原子％ 更多选自Zr，Hf，Nb和Ta。 Fe-Co基合金包含Fe-Fe相，其为铁磁相，并且选自Zr，Hf，Nb和Ta中的一种或多种，以固溶体形式并入Co-Fe相中 量为0.5〜2原子％。
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9.发明授权公开(公告)号：US07942985B2
公开(公告)日：2011-05-17
申请号：US12601655
申请日：2008-05-01
IPC分类号： H01F1/147
CPC分类号： G11B5/667 , H01F10/132
摘要： A soft magnetic alloy for perpendicular magnetic recording medium excellent in saturation magnetic flux density, amorphousness and atmospheric corrosion resistance. The alloy is an Fe—Co based alloy and comprises Fe in an amount satisfying 0.25 to 0.65 of Fe/(Fe+Co) ratio, which is an atomic ratio of Fe and Fe+Co; Zr+Hf in an amount of 6 to 100 at %; Na+Ta in an amount of 0 to 2 at %; Al and/or Cr in an amount of 0 to 5 at %; and the balance Co and unavoidable impurities. A part of Zr and/or Hf can be replaced by B, provided that the amount of B to replace Zr and/or Hf is double in at % of the total amount of Zr and Hf to be replaced and that the total amount of Zr and Hf after replacement is 4 at % or more.
摘要翻译： 用于垂直磁记录介质的软磁合金，饱和磁通密度，无定形性和耐大气腐蚀性优良。 该合金是Fe-Co系合金，Fe和Fe + Co的原子比为Fe /（Fe + Co）比为0.25〜0.65的Fe， 含量为6〜100原子％的Zr + Hf。 Na + Ta为0〜2at％ Al和/或Cr为0〜5原子％; 余量为Co和不可避免的杂质。 Zr和/或Hf的一部分可以被B代替，条件是替代Zr和/或Hf的B的量是待替代的Zr和Hf的总量的2％，Zr的总量是Zr 置换后的Hf为4原子％以上。
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10.发明申请公开(公告)号：US20110020169A1
公开(公告)日：2011-01-27
申请号：US12934387
申请日：2009-04-30
CPC分类号： G11B5/667 , C22C1/0433 , C22C19/03 , C22C19/058 , C23C14/3414 , G11B5/8404 , G11B5/851
摘要： There is disclosed a sputtering target material for producing an intermediate layer film of a perpendicular magnetic recording medium, which is capable of dramatically reducing the crystal grain size of a thin film formed by sputtering. The sputtering target material comprises, in at %, 1 to 20% of W; 0.1 to 10% in total of one or more elements selected from the group consisting of P, Zr, Si and B; and balance Ni.
摘要翻译： 公开了一种用于制造垂直磁记录介质的中间层膜的溅射靶材料，其能够显着降低由溅射形成的薄膜的晶粒尺寸。 溅射靶材料以％计含有1％至20％的W; 总共0.1〜10％的选自P，Zr，Si和B的一种或多种元素; 并平衡Ni。
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