-
公开(公告)号：US10095112B2
公开(公告)日：2018-10-09
申请号：US15441919
申请日：2017-02-24
申请人： Alex Phillip Graham Robinson , Alexandra McClelland , Andreas Frommhold , Dongxu Yang , John Roth
发明人： Alex Phillip Graham Robinson , Alexandra McClelland , Andreas Frommhold , Dongxu Yang , John Roth
摘要： The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
-
公开(公告)号：US09632409B2
公开(公告)日：2017-04-25
申请号：US14899278
申请日：2014-05-21
IPC分类号： G03F7/027 , G03F7/004 , C07C69/753 , C07C69/96 , H01L51/00 , G03F7/038 , G03F7/039 , C07D401/14 , C07D401/04
CPC分类号： G03F7/0042 , C07C69/753 , C07C69/96 , C07C2604/00 , C07D401/04 , C07D401/14 , G03F7/0043 , G03F7/0045 , G03F7/0046 , G03F7/027 , G03F7/0382 , G03F7/0392 , H01L51/0047
摘要： The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays.
-
公开(公告)号：US09229322B2
公开(公告)日：2016-01-05
申请号：US14520037
申请日：2014-10-21
申请人： Alex Phillip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
发明人： Alex Phillip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
IPC分类号： G03F7/004 , C07D223/00 , G03F7/027 , C07D487/14 , C07D498/14 , C07D245/02 , G03F7/20 , G03F7/38 , H01L51/00
CPC分类号： G03F7/027 , C07D245/02 , C07D487/14 , C07D498/14 , G03F7/0045 , G03F7/0392 , G03F7/20 , G03F7/38 , H01L51/0018 , H01L51/0047
摘要： Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.
摘要翻译： 本文公开和要求保护的是具有选自（I），（II），（III）或（IV））的一般结构的物质组合物; 其中X和Y相同或不同，其中X和Y中的至少一个包含酸不稳定基团，其中R1是具有1-4个碳原子的饱和或不饱和基团，R2选自氢或饱和或不饱和的 具有1-4个碳原子的基团，R3是具有1-4个碳原子的饱和或不饱和基团，R4是具有1-4个碳原子的饱和或不饱和基团。
-
公开(公告)号：US09519215B2
公开(公告)日：2016-12-13
申请号：US14977520
申请日：2015-12-21
申请人： Alex Phillip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
发明人： Alex Phillip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
IPC分类号： G03F7/004 , C07D223/00 , C07D245/02 , C07D487/14 , C07D498/14 , G03F7/027 , H01L51/00 , G03F7/38
CPC分类号： G03F7/0045 , C07D245/02 , C07D487/04 , C07D487/08 , C07D487/14 , C07D498/14 , G03F7/027 , G03F7/0382 , G03F7/0392 , G03F7/38 , H01L51/0018 , H01L51/0047
摘要： The present application for patent discloses a composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms and A− is an anion.
摘要翻译： 本专利申请公开了一种物质组合物，包括：包含溶剂; 和具有选自（I），（II）或（III）的化学结构的酯; 其中X和Y相同或不同，其中X和Y中的至少一个包含酸不稳定基团，其中R1是具有1-4个碳原子的饱和或不饱和基团，R2选自氢或饱和或不饱和的 具有1-4个碳原子的基团，R3是具有1-4个碳原子的饱和或不饱和基团，R4是具有1-4个碳原子的饱和或不饱和基团，A-是阴离子。
-
公开(公告)号：US10290500B2
公开(公告)日：2019-05-14
申请号：US15511416
申请日：2015-12-04
IPC分类号： H01L21/027 , H01L21/02 , H01L21/3065 , H01L21/308 , H01L21/311 , B05D1/00 , B05D3/00 , B05D3/02 , C09D163/04 , C09D177/00 , C01B32/152
摘要： Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
-
公开(公告)号：US20180246408A1
公开(公告)日：2018-08-30
申请号：US15441919
申请日：2017-02-24
申请人： Alex Phillip Graham Robinson , Alexandra McClelland , Andreas Frommhold , Dongxu Yang , John Roth
发明人： Alex Phillip Graham Robinson , Alexandra McClelland , Andreas Frommhold , Dongxu Yang , John Roth
CPC分类号： G03F7/0382 , C07C2604/00 , C08G83/008 , G03F7/0045 , G03F7/0046 , G03F7/162 , G03F7/168 , G03F7/2004 , G03F7/2037 , G03F7/325 , G03F7/38 , H01L21/0274
摘要： The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
-
公开(公告)号：US20160246173A1
公开(公告)日：2016-08-25
申请号：US14977520
申请日：2015-12-21
申请人： Alex Phillip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
发明人： Alex Phillip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , C07D245/02 , C07D487/04 , C07D487/08 , C07D487/14 , C07D498/14 , G03F7/027 , G03F7/0382 , G03F7/0392 , G03F7/38 , H01L51/0018 , H01L51/0047
摘要： The present application for patent discloses a composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms and A− is an anion.
摘要翻译： 本专利申请公开了一种物质组合物，包括：包含溶剂; 和具有选自（I），（II）或（III）的化学结构的酯; 其中X和Y相同或不同，其中X和Y中的至少一个包含酸不稳定基团，其中R1是具有1-4个碳原子的饱和或不饱和基团，R2选自氢或饱和或不饱和的 具有1-4个碳原子的基团，R3是具有1-4个碳原子的饱和或不饱和基团，R4是具有1-4个碳原子的饱和或不饱和基团，A-是阴离子。
-
-
-
-
-
-
搜索结果
7 条记录 (耗时 0.031 秒)
