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公开(公告)号：US20170345669A1
公开(公告)日：2017-11-30
申请号：US15164801
申请日：2016-05-25
申请人： Alex Philip Graham Robinson , Thomas Lada , John L. Roth , Alan G. Brown , Andreas Frommhold , Edward A. Jackson
发明人： Alex Philip Graham Robinson , Thomas Lada , John L. Roth , Alan G. Brown , Andreas Frommhold , Edward A. Jackson
IPC分类号： H01L21/308 , C08J3/28 , C09D4/06 , C09D163/00 , H01L21/3065 , C08J3/24
CPC分类号： H01L21/3081 , C08J3/24 , C08J3/28 , C08J2363/00 , C08K3/045 , C09C1/44 , C09D4/06 , C09D163/00 , H01L21/02118 , H01L21/02282 , H01L21/3065 , H01L21/3085 , H01L21/3086
摘要： Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
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公开(公告)号：US09122156B2
公开(公告)日：2015-09-01
申请号：US14519924
申请日：2014-10-21
申请人： Alex Philip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
发明人： Alex Philip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
IPC分类号： G03F7/027 , C07D487/04 , C07D223/04
CPC分类号： G03F7/027 , C07D223/04 , C07D487/04 , G03F7/0045 , G03F7/038 , G03F7/0382 , H01L51/0018
摘要： Disclosed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); at least one photo acid generator; at least one crosslinker; and at least one solvent; wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.
摘要翻译： 本文公开了具有选自（I），（II），（III）或（IV）的一般结构的物质组合物; 至少一个光产酸剂; 至少一种交联剂; 和至少一种溶剂; 其中X和Y相同或不同，其中X和Y中的至少一个包含酸不稳定基团，其中R1是具有1-4个碳原子的饱和或不饱和基团，R2选自氢或饱和或不饱和的 具有1-4个碳原子的基团，R3是具有1-4个碳原子的饱和或不饱和基团，R4是具有1-4个碳原子的饱和或不饱和基团。
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公开(公告)号：US20150241773A1
公开(公告)日：2015-08-27
申请号：US14516472
申请日：2014-10-16
CPC分类号： G03F7/38 , A61B5/042 , A61B5/065 , A61B5/6852 , A61B5/7221 , A61B34/20 , A61B2505/03 , A61B2505/05 , A61M25/01 , A61M2025/0166 , A61M2205/13 , A61M2205/18 , A61M2205/50 , A61M2210/125 , A61M2230/005 , A61M2230/04 , G03F7/038 , G03F7/0382 , G03F7/0384 , G03F7/0392 , G03F7/2024 , G06F17/18 , Y02E10/549
摘要： The present disclosure relates to novel two-step photoresist compositions and processes. The processes involve removing acid-labile groups in step one and crosslinking the remaining material with themselves or added crosslinking systems in step two. The incorporation of a multistep pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Dual functionality photosensitive compositions and methods are also disclosed.
摘要翻译： 本发明涉及新的两步光刻胶组合物和方法。 所述方法包括在步骤1中除去酸不稳定基团，并在第二步中与其自身交联剩余的材料或加入交联体系。 在抗蚀剂催化链中结合多步途径增加了接受低剂量照射的区域的化学梯度，有效地作为内置剂量依赖猝灭剂 - 类似物，从而增强了化学梯度，从而提高了分辨率。 光致抗蚀剂组合物和方法对于使用例如紫外线辐射，超过极紫外辐射，极紫外辐射，X射线和带电粒子射线的精细图案处理是理想的。 还公开了双功能光敏组合物和方法。
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公开(公告)号：US11746255B2
公开(公告)日：2023-09-05
申请号：US15904420
申请日：2018-02-25
申请人： Alex P. G. Robinson , Guy Dawson , Alan G. Brown , Thomas Lada , John Roth , Edward Jackson
发明人： Alex P. G. Robinson , Guy Dawson , Alan G. Brown , Thomas Lada , John Roth , Edward Jackson
IPC分类号： H01L21/033 , C08G59/50 , C09D163/04
CPC分类号： C09D163/04 , C08G59/5033 , H01L21/0332
摘要： Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative substituted with an amine and a crosslinking agent. The formulation is drain compatible with other solvents used in the semiconductor industry.
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公开(公告)号：US09229322B2
公开(公告)日：2016-01-05
申请号：US14520037
申请日：2014-10-21
申请人： Alex Phillip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
发明人： Alex Phillip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
IPC分类号： G03F7/004 , C07D223/00 , G03F7/027 , C07D487/14 , C07D498/14 , C07D245/02 , G03F7/20 , G03F7/38 , H01L51/00
CPC分类号： G03F7/027 , C07D245/02 , C07D487/14 , C07D498/14 , G03F7/0045 , G03F7/0392 , G03F7/20 , G03F7/38 , H01L51/0018 , H01L51/0047
摘要： Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.
摘要翻译： 本文公开和要求保护的是具有选自（I），（II），（III）或（IV））的一般结构的物质组合物; 其中X和Y相同或不同，其中X和Y中的至少一个包含酸不稳定基团，其中R1是具有1-4个碳原子的饱和或不饱和基团，R2选自氢或饱和或不饱和的 具有1-4个碳原子的基团，R3是具有1-4个碳原子的饱和或不饱和基团，R4是具有1-4个碳原子的饱和或不饱和基团。
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公开(公告)号：US20190127604A1
公开(公告)日：2019-05-02
申请号：US15904420
申请日：2018-02-25
申请人： Alex P. G. Robinson , Guy Dawson , Allan G. Brown , Thomas Lada , John Roth , Edward Jackson
发明人： Alex P. G. Robinson , Guy Dawson , Allan G. Brown , Thomas Lada , John Roth , Edward Jackson
IPC分类号： C09D163/04
摘要： Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative substituted with an amine and a crosslinking agent. The formulation is drain compatible with other solvents used in the semiconductor industry.
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公开(公告)号：US20160246173A1
公开(公告)日：2016-08-25
申请号：US14977520
申请日：2015-12-21
申请人： Alex Phillip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
发明人： Alex Phillip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , C07D245/02 , C07D487/04 , C07D487/08 , C07D487/14 , C07D498/14 , G03F7/027 , G03F7/0382 , G03F7/0392 , G03F7/38 , H01L51/0018 , H01L51/0047
摘要： The present application for patent discloses a composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms and A− is an anion.
摘要翻译： 本专利申请公开了一种物质组合物，包括：包含溶剂; 和具有选自（I），（II）或（III）的化学结构的酯; 其中X和Y相同或不同，其中X和Y中的至少一个包含酸不稳定基团，其中R1是具有1-4个碳原子的饱和或不饱和基团，R2选自氢或饱和或不饱和的 具有1-4个碳原子的基团，R3是具有1-4个碳原子的饱和或不饱和基团，R4是具有1-4个碳原子的饱和或不饱和基团，A-是阴离子。
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公开(公告)号：US09383646B2
公开(公告)日：2016-07-05
申请号：US14516472
申请日：2014-10-16
CPC分类号： G03F7/38 , A61B5/042 , A61B5/065 , A61B5/6852 , A61B5/7221 , A61B34/20 , A61B2505/03 , A61B2505/05 , A61M25/01 , A61M2025/0166 , A61M2205/13 , A61M2205/18 , A61M2205/50 , A61M2210/125 , A61M2230/005 , A61M2230/04 , G03F7/038 , G03F7/0382 , G03F7/0384 , G03F7/0392 , G03F7/2024 , G06F17/18 , Y02E10/549
摘要： The present disclosure relates to novel two-step photoresist compositions and processes. The processes involve removing acid-labile groups in step one and crosslinking the remaining material with themselves or added crosslinking systems in step two. The incorporation of a multistep pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Dual functionality photosensitive compositions and methods are also disclosed.
摘要翻译： 本发明涉及新的两步光刻胶组合物和方法。 所述方法包括在步骤1中除去酸不稳定基团，并在第二步中与其自身交联剩余的材料或加入交联体系。 在抗蚀剂催化链中结合多步途径增加了接受低剂量照射的区域的化学梯度，有效地作为内置剂量依赖猝灭剂 - 类似物，从而增强了化学梯度，从而提高了分辨率。 光致抗蚀剂组合物和方法对于使用例如紫外线辐射，超过极紫外辐射，极紫外辐射，X射线和带电粒子射线的精细图案处理是理想的。 还公开了双功能光敏组合物和方法。
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公开(公告)号：US09519215B2
公开(公告)日：2016-12-13
申请号：US14977520
申请日：2015-12-21
申请人： Alex Phillip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
发明人： Alex Phillip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue , Edward A. Jackson
IPC分类号： G03F7/004 , C07D223/00 , C07D245/02 , C07D487/14 , C07D498/14 , G03F7/027 , H01L51/00 , G03F7/38
CPC分类号： G03F7/0045 , C07D245/02 , C07D487/04 , C07D487/08 , C07D487/14 , C07D498/14 , G03F7/027 , G03F7/0382 , G03F7/0392 , G03F7/38 , H01L51/0018 , H01L51/0047
摘要： The present application for patent discloses a composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms and A− is an anion.
摘要翻译： 本专利申请公开了一种物质组合物，包括：包含溶剂; 和具有选自（I），（II）或（III）的化学结构的酯; 其中X和Y相同或不同，其中X和Y中的至少一个包含酸不稳定基团，其中R1是具有1-4个碳原子的饱和或不饱和基团，R2选自氢或饱和或不饱和的 具有1-4个碳原子的基团，R3是具有1-4个碳原子的饱和或不饱和基团，R4是具有1-4个碳原子的饱和或不饱和基团，A-是阴离子。
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公开(公告)号：US20150140489A1
公开(公告)日：2015-05-21
申请号：US14520037
申请日：2014-10-21
申请人： Alex Philip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue
发明人： Alex Philip Graham Robinson , Dongxu Yang , Andreas Frommhold , Thomas Lada , John L. Roth , Xiang Xue
IPC分类号： G03F7/027 , G03F7/004 , C07D245/02 , C07D487/14 , C07D498/14
CPC分类号： G03F7/027 , C07D245/02 , C07D487/14 , C07D498/14 , G03F7/0045 , G03F7/0392 , G03F7/20 , G03F7/38 , H01L51/0018 , H01L51/0047
摘要： Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.
摘要翻译： 本文公开和要求保护的是具有选自（I），（II），（III）或（IV））的一般结构的物质组合物; 其中X和Y相同或不同，其中X和Y中的至少一个包含酸不稳定基团，其中R1是具有1-4个碳原子的饱和或不饱和基团，R2选自氢或饱和或不饱和的 具有1-4个碳原子的基团，R3是具有1-4个碳原子的饱和或不饱和基团，R4是具有1-4个碳原子的饱和或不饱和基团。
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