公开(公告)号：US20080143981A1

公开(公告)日：2008-06-19

申请号：US11854621

申请日：2007-09-13

申请人： Dirk Heinrich EHM ,  Annemieke van de Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

发明人： Dirk Heinrich EHM ,  Annemieke van de Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/52 ,  G21K5/00

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G03F7/70316 ,  G03F7/70891 ,  G03F7/70925 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

摘要： An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.

摘要翻译： 一种用于EUV光刻的光学装置，特别是投影系统，照明系统或光束整形系统，包括布置在光学装置的光束路径中并且反射软X射线或EUV中的辐射的至少一个光学元件 波长范围，其中至少在所述光学装置的操作期间，所述光束路径中至少在所述光学表面处的所述反射光学元件中的至少一个优选地各自具有大约30℃或更高的工作温度， 优选为约100℃以上，特别优选为约150℃以上，甚至更优选为约250℃以上，并且其中选择所述至少一个反射型光学元件的光学设计 其光学特性被优化以在操作温度下操作。 还提出了一种用于提供具有这种光学设计的反射光学元件的方法。

公开(公告)号：US07959310B2

公开(公告)日：2011-06-14

申请号：US11854621

申请日：2007-09-13

申请人： Dirk Heinrich Ehm ,  Annemieke Van De Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. Van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

发明人： Dirk Heinrich Ehm ,  Annemieke Van De Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. Van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

IPC分类号： G02B5/08 ,  G02B7/182 ,  G06K7/10

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G03F7/70316 ,  G03F7/70891 ,  G03F7/70925 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

摘要： An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.

摘要翻译： 一种用于EUV光刻的光学装置，特别是投影系统，照明系统或光束整形系统，包括布置在光学装置的光束路径中并且反射软X射线或EUV中的辐射的至少一个光学元件 波长范围，其中至少在所述光学装置的操作期间，所述光束路径中至少在所述光学表面处的所述反射光学元件中的至少一个优选地各自具有大约30℃或更高的工作温度， 优选为约100℃以上，特别优选为约150℃以上，甚至更优选为约250℃以上，并且其中选择所述至少一个反射型光学元件的光学设计 其光学特性被优化以在操作温度下操作。 还提出了一种用于提供具有这种光学设计的反射光学元件的方法。

公开(公告)号：US08446560B2

公开(公告)日：2013-05-21

申请号：US12735823

申请日：2009-02-19

申请人： Johannes Hubertus Josephina Moors ,  Norbertus Benedictus Koster ,  Erik Roelo Loopstra ,  Martin Frans Pierre Smeets ,  Antonius Theodorus Wilhelmus Kempen

发明人： Johannes Hubertus Josephina Moors ,  Norbertus Benedictus Koster ,  Erik Roelo Loopstra ,  Martin Frans Pierre Smeets ,  Antonius Theodorus Wilhelmus Kempen

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70916

摘要： A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.

摘要翻译： 光刻设备包括容纳在保护壳体中的磁体，保护壳体被布置成保护磁体免受含H2或含H原子气体的接触。 外壳还可以包含氢气吸气剂，例如磁体表面改性气体或非含氢气体。 可以提供不含氢的气流，或者可以通过保护外壳的至少一部分提供非氢吸气剂气流。

公开(公告)号：US20100151394A1

公开(公告)日：2010-06-17

申请号：US12567383

申请日：2009-09-25

申请人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Norbertus Benedictus Koster ,  Johannes Hubertus Josephina Moors ,  Maarten Van Kampen ,  Ramasamy Raju ,  Wayne Mathew Lytle ,  David Neil Ruzic ,  Martin John Neumann

发明人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Norbertus Benedictus Koster ,  Johannes Hubertus Josephina Moors ,  Maarten Van Kampen ,  Ramasamy Raju ,  Wayne Mathew Lytle ,  David Neil Ruzic ,  Martin John Neumann

IPC分类号： G03F7/20 ,  G03B27/52 ,  B08B13/00

CPC分类号： G03F7/70925

摘要： Embodiments of the invention relate to a system for contactless cleaning of an object surface, a lithographic apparatus including the system, and a method of manufacturing a device. The system may include a He plasma source contained in a chamber and a control unit constructed to modify plasma parameters in use, such as the electron energy distribution of the plasma for causing an increase in formation of He metastables without modifying operational parameters of the plasma source. The control unit may include an electrical biasing unit constructed to apply a positive bias voltage to the object, for attracting free electrons from the plasma. The system may include a supplementary gas source, which may be either pre-mixed with He or be supplied from a further gas source. The supplementary gas may be selected based on a pre-knowledge on a type of particles to be expected on the surface of the object.

摘要翻译： 本发明的实施例涉及一种用于物体表面的非接触式清洁的系统，包括该系统的光刻设备以及一种制造设备的方法。 该系统可以包括包含在腔室中的He等离子体源和构造为修改使用中的等离子体参数的控制单元，例如等离子体的电子能量分布，以引起He亚稳态的形成增加而不改变等离子体源的操作参数 。 控制单元可以包括电偏置单元，其构造成向对象施加正偏置电压，用于从等离子体吸引自由电子。 该系统可以包括辅助气体源，其可以与He预先混合或者从另外的气体源供应。 可以基于对物体表面上预期的颗粒类型的预先知识来选择补充气体。

公开(公告)号：US20110013157A1

公开(公告)日：2011-01-20

申请号：US12735823

申请日：2009-02-19

申请人： Johannes Hubertus Josephina Moors ,  Norbertus Benedictus Koster ,  Erik Roelof Loopstra ,  Martin Frans Pierre Smeets ,  Antonius Theodorus Wilhelmus Kempen

发明人： Johannes Hubertus Josephina Moors ,  Norbertus Benedictus Koster ,  Erik Roelof Loopstra ,  Martin Frans Pierre Smeets ,  Antonius Theodorus Wilhelmus Kempen

IPC分类号： G03B27/32 ,  H01F7/02

CPC分类号： G03F7/70933 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70916

摘要： A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.

摘要翻译： 光刻设备包括容纳在保护壳体中的磁体，保护壳体被布置成保护磁体免受含H2或含H原子气体的接触。 外壳还可以包含氢气吸气剂，例如磁体表面改性气体或非含氢气体。 可以提供不含氢的气流，或者可以通过保护外壳的至少一部分提供非氢吸气剂气流。

公开(公告)号：US08749245B2

公开(公告)日：2014-06-10

申请号：US12867170

申请日：2009-02-13

申请人： Norbertus Benedictus Koster

发明人： Norbertus Benedictus Koster

IPC分类号： G01N27/62

CPC分类号： H01J49/30 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/7085 ,  G03F7/70916 ,  H01J37/3174

摘要： The invention relates to anion gauge for determining a total integrated concentration of a substance having a molecular weight falling into a pre-determined range of molecular weights in a gas sample. The anion gauge includes an ionization region in a vicinity of the ionization source; an accelerator for generating a flow of ionized molecules; a mass filter for intercepting the flow for separating ions having the molecular weight falling into the pre-determined range from the ionized molecules and a detector for generating a signal representative of the total integrated concentration of such ions present in the gas sample. The invention further relates to a lithographic apparatus and a method for determining a total integrated concentration of a substance having a molecular weight falling into a pre-determined range of molecular weights in a gas sample.

摘要翻译： 本发明涉及用于确定在气体样品中分子量落入预定范围的分子量的物质的总积分浓度的阴离子计。 阴离子计包括电离源附近的电离区域; 用于产生电离分子流的加速器; 拦截用于分离离子的离子的离子的离子的分离质量离子离子化分子的预定范围内的质量过滤器和用于产生表示气体样品中存在的这种离子的总积分浓度的信号的检测器。 本发明还涉及一种光刻设备和用于确定分子量落入气体样品中预定范围的分子量的物质的总积分浓度的方法。

公开(公告)号：US08961694B2

公开(公告)日：2015-02-24

申请号：US12520327

申请日：2007-12-21

申请人： Fokko Pieter Wieringa ,  Norbertus Benedictus Koster ,  Roland van Vliet ,  Hubert Adriaan van Mierlo

发明人： Fokko Pieter Wieringa ,  Norbertus Benedictus Koster ,  Roland van Vliet ,  Hubert Adriaan van Mierlo

IPC分类号： B08B6/00 ,  B08B3/00 ,  H01L21/306 ,  H01J37/32

CPC分类号： H01J37/3266 ,  H01J37/32357 ,  H01J37/32623 ,  H01J2237/335

摘要： The invention relates to a plasma generator (1) for cleaning an object. The plasma generator (1) comprises a plasma chamber (2) and a support structure (6) arranged in the plasma chamber for supporting the object (7) to be cleaned. Further, the plasma generator comprises an electromagnetic shield (5a, 5b, 5c) counteracting a flow of charged plasma particles flowing from a plasma generating region towards the object, and a plasma source (8). In addition, the plasma generator comprises an additional plasma source (9,10) to form a composition of plasma sources that are arranged to generate in the plasma generating region plasmas, respectively, that mutually interact during operation of the plasma generator so as to force plasma particles to flow in a diffusely closed flow path.

摘要翻译： 本发明涉及一种用于清洁物体的等离子体发生器（1）。 等离子体发生器（1）包括等离子体室（2）和布置在等离子体室中的支撑结构（6），用于支撑待清洁的物体（7）。 此外，等离子体发生器包括抵抗从等离子体产生区域朝向物体流动的带电等离子体粒子的流动的电磁屏蔽（5a，5b，5c）和等离子体源（8）。 此外，等离子体发生器包括附加的等离子体源（9,10），以形成等离子体源的组成，其被布置成分别在等离子体产生区等离子体中产生，这些等离子体在等离子体发生器的操作期间相互作用，从而迫使 等离子体颗粒在弥漫闭合的流动路径中流动。

公开(公告)号：US08480807B2

公开(公告)日：2013-07-09

申请号：US13124261

申请日：2009-10-16

申请人： Norbertus Benedictus Koster ,  René Koops ,  Kemal Agovic ,  Fokko Pieter Wieringa

发明人： Norbertus Benedictus Koster ,  René Koops ,  Kemal Agovic ,  Fokko Pieter Wieringa

IPC分类号： C25F1/00

CPC分类号： A61L2/14 ,  A61L2/28 ,  H01J37/32431 ,  H01J2237/335

摘要： The invention relates to a method of cleaning and/or sterilization of an object provided in a hermetically sealed enclosure, providing a pressure difference between an internal volume of the enclosure and surroundings and generating a plasma solely inside the enclosure for said cleaning and/or sterilization of the object. The invention further relates to an apparatus for enabling the same. The apparatus 10 comprises a vacuum chamber 1, which can be evacuated using a vacuum pump 2, and a source 3 arranged to generate plasma of a suitable gas in an enclosure 8, which is substantially hermetically closed with respect to the atmosphere of the vacuum chamber. The enclosure 8 may be of a flexible type or may be manufactured from a rigid material. In case when the enclosure is rigid the pressure inside the enclosure may be lower than an outside pressure.

摘要翻译： 本发明涉及一种清洁和/或杀菌的方法，所述物体设置在气密密封的外壳中，在外壳的内部容积与周围环境之间提供压力差，并且仅在外壳内部产生用于所述清洁和/或灭菌的等离子体 的对象。 本发明还涉及一种用于实现该装置的装置。 设备10包括可以使用真空泵2抽真空的真空室1和排出成在外壳8中产生合适气体的等离子体的源3，该外壳8相对于真空室的气氛基本气密地闭合 。 外壳8可以是柔性类型的，或者可以由刚性材料制造。 在外壳刚性的情况下，外壳内的压力可能低于外部压力。

公开(公告)号：US20110247649A1

公开(公告)日：2011-10-13

申请号：US13124261

申请日：2009-10-16

申请人： Norbertus Benedictus Koster ,  René Koops ,  Kemal Agovic ,  Fokko Pieter Wieringa

发明人： Norbertus Benedictus Koster ,  René Koops ,  Kemal Agovic ,  Fokko Pieter Wieringa

IPC分类号： B08B7/00 ,  B08B13/00

CPC分类号： A61L2/14 ,  A61L2/28 ,  H01J37/32431 ,  H01J2237/335

摘要： The invention relates to a method of cleaning and/or sterilization of an object provided in a hermetically sealed enclosure, providing a pressure difference between an internal volume of the enclosure and surroundings and generating a plasma solely inside the enclosure for said cleaning and/or sterilization of the object. The invention further relates to an apparatus for enabling the same. The apparatus 10 comprises a vacuum chamber 1, which can be evacuated using a vacuum pump 2, and a source 3 arranged to generate plasma of a suitable gas in an enclosure 8, which is substantially hermetically closed with respect to the atmosphere of the vacuum chamber. The enclosure 8 may be of a flexible type or may be manufactured from a rigid material. In case when the enclosure is rigid the pressure inside the enclosure may be lower than an outside pressure.

摘要翻译： 本发明涉及一种清洁和/或杀菌的方法，所述物体设置在气密密封的外壳中，在外壳的内部容积与周围环境之间提供压力差，并且仅在外壳内部产生用于所述清洁和/或灭菌的等离子体 的对象。 本发明还涉及一种用于实现该装置的装置。 设备10包括可以使用真空泵2抽真空的真空室1和排出成在外壳8中产生合适气体的等离子体的源3，该外壳8相对于真空室的气氛基本气密地闭合 。 外壳8可以是柔性类型的，或者可以由刚性材料制造。 在外壳刚性的情况下，外壳内的压力可能低于外部压力。

公开(公告)号：US07963144B2

公开(公告)日：2011-06-21

申请号：US12500203

申请日：2009-07-09

申请人： Norbertus Benedictus Koster ,  Richard Versluis ,  Bart Dinand Paarhuis

发明人： Norbertus Benedictus Koster ,  Richard Versluis ,  Bart Dinand Paarhuis

IPC分类号： G01N7/00 ,  G01N37/00

CPC分类号： G03F7/70916 ,  G01N1/2273 ,  G03F7/7085

摘要： A gas analyzing system is disclosed, the system including a gas analyzer and a reduced pressure chamber in which interior the gas analyzer is arranged, the reduced pressure chamber having an inlet configuration for a gas mixture inflow and an outlet configuration for a gas mixture outflow, wherein the outlet configuration during operation is connected to a pump system to facilitate the gas mixture outflow, the outlet configuration having a channel section and a flow section, the flow section having a cross-sectional area that is smaller than the cross -sectional area of the channel section.

摘要翻译： 公开了一种气体分析系统，该系统包括气体分析器和排气室内部的减压室，减压室具有用于气体混合物流入的入口结构和用于气体混合物流出的出口构型， 其中在操作期间的出口构造连接到泵系统以便于气体混合物流出，所述出口构造具有通道部分和流动部分，所述流动部分的横截面积小于横截面面积的横截面面积 通道部分。