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公开(公告)号:US20060033898A1
公开(公告)日:2006-02-16
申请号:US11205325
申请日:2005-08-17
申请人: Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
发明人: Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
IPC分类号: G03B27/42
CPC分类号: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译: 公开了一种光刻设备,其具有液体供应系统,其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间,布置成基本上容纳该空间内的液体的阻挡构件,以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。