公开(公告)号：US20060033898A1

公开(公告)日：2006-02-16

申请号：US11205325

申请日：2005-08-17

申请人： Theodorus Cadee ,  Johannes Jacobs ,  Nicolaas Kate ,  Erik Loopstra ,  Aschwin Lodewijk Vermeer ,  Jeroen Maria Mertens ,  Christianus De Mol ,  Marcel Hubertus Muitjens ,  Antonius Van Der Net ,  Joost Ottens ,  Johannes Quaedackers ,  Maria Reuhman-Huisken ,  Marco Stavenga ,  Patricius Tinnemans ,  Martinus Verhagen ,  Jacobus Johannus Hendricus Verspay ,  Frederik De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Smeets ,  Bart Schoondermark ,  Franciscus Janssen ,  Michel Riepen

发明人： Theodorus Cadee ,  Johannes Jacobs ,  Nicolaas Kate ,  Erik Loopstra ,  Aschwin Lodewijk Vermeer ,  Jeroen Maria Mertens ,  Christianus De Mol ,  Marcel Hubertus Muitjens ,  Antonius Van Der Net ,  Joost Ottens ,  Johannes Quaedackers ,  Maria Reuhman-Huisken ,  Marco Stavenga ,  Patricius Tinnemans ,  Martinus Verhagen ,  Jacobus Johannus Hendricus Verspay ,  Frederik De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Smeets ,  Bart Schoondermark ,  Franciscus Janssen ,  Michel Riepen

IPC分类号： G03B27/42

CPC分类号： G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

摘要： A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.

摘要翻译： 公开了一种光刻设备，其具有液体供应系统，其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。

公开(公告)号：US20070139629A1

公开(公告)日：2007-06-21

申请号：US11312660

申请日：2005-12-21

申请人： Timotheus Sengers ,  Nicolaas Johannes Van Asten ,  Wilhelmus Box ,  Tjarko Van Empel ,  Leon Levasier ,  Erik Loopstra ,  Marcel Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

发明人： Timotheus Sengers ,  Nicolaas Johannes Van Asten ,  Wilhelmus Box ,  Tjarko Van Empel ,  Leon Levasier ,  Erik Loopstra ,  Marcel Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

IPC分类号： G03B27/42

CPC分类号： G03F7/70883 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7034

摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

摘要翻译： 公开了一种光刻设备。 该装置包括构造成保持基板的基板台。 衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。 测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。 投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径 测量系统的测量光束和/或场来调节路径的一部分。