-
公开(公告)号：US20060033898A1
公开(公告)日：2006-02-16
申请号：US11205325
申请日：2005-08-17
申请人： Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
发明人： Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
IPC分类号： G03B27/42
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译： 公开了一种光刻设备，其具有液体供应系统，其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。
-
公开(公告)号：US20070070315A1
公开(公告)日：2007-03-29
申请号：US11454129
申请日：2006-06-16
申请人： Johannes Jacobs , Igor Bouchoms , Nicolaas Kate , Nicolaas Kemper , Martinus Leenders , Erik Loopstra , Joost Ottens , Martinus Verhagen , Yucel Kok , Johannes Van Es , Herman Boom , Franciscus Janssen
发明人： Johannes Jacobs , Igor Bouchoms , Nicolaas Kate , Nicolaas Kemper , Martinus Leenders , Erik Loopstra , Joost Ottens , Martinus Verhagen , Yucel Kok , Johannes Van Es , Herman Boom , Franciscus Janssen
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
摘要翻译： 使用或具有包括关于衬底的位置，速度和/或加速度的信息的时间表来公开用于维持衬底和浸没式光刻设备的热平衡的方法和设备; 以及响应于时间表中的信息，用于减少局部蒸发和/或增加局部冷凝的蒸发控制器和/或冷凝控制器。 从基材表面蒸发液体将其冷却下来，同时在其底部表面上冷凝液体局部加热基材。
-
3.发明申请公开(公告)号：US20070146664A1
公开(公告)日：2007-06-28
申请号：US11314157
申请日：2005-12-22
IPC分类号： G03B27/42
CPC分类号： G03F7/70716 , G03F7/70341
摘要： An immersion lithographic apparatus has a plurality of substrate holders arranged to hold substrates, each substrate holder having a conduit therein for passing a temperature control fluid. The thermal responses of the different substrate holders are calibrated and flow rates calculated and used so that all the holders return to a predetermined temperature in the same time.
摘要翻译： 浸没式光刻设备具有布置成保持基板的多个基板保持器，每个基板保持器具有用于使温度控制流体通过的导管。 对不同衬底保持器的热响应进行校准，并计算和使用流量，以便所有保持器在同一时间内恢复到预定温度。
-
公开(公告)号：US20060187427A1
公开(公告)日：2006-08-24
申请号：US11062763
申请日：2005-02-22
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/709
摘要： Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.
摘要翻译： 公开了各种类型的压力调节装置，以减少光刻设备的液体供应系统中的压力梯度，液体供应系统具有液体限制结构，其被配置为至少部分地限制液体在投影系统和基板台之间的液体 光刻设备 高压梯度可能导致液体供应系统和/或液体限制结构中的颗粒污染。 压力梯度可以通过例如在一个或多个阀门中使用缓慢的切换，绕过或通过一个或多个阀门的泄放流量来减少，而不是或者除了切换阀门之外将液体转移到排水管， 用于防止冲击波的压力调节器或限流器，以及用于补偿压力波动的缓冲体积/阻尼器。
-
公开(公告)号：US20070146665A1
公开(公告)日：2007-06-28
申请号：US11317259
申请日：2005-12-27
CPC分类号： G03F7/70341
摘要： A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.
摘要翻译： 公开了一种有助于防止液体到达衬底的方法，其包括在衬底的底部边缘处引入气体，使得在衬底的边缘产生缓冲液，有助于保持存在于顶部的浸没液体，以及 衬底的边缘远离衬底的底表面。
-
6.发明申请Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid 有权平版印刷设备，装置制造方法以及用于对液体进行排气的装置公开(公告)号：US20060192929A1
公开(公告)日：2006-08-31
申请号：US11067492
申请日：2005-02-28
申请人： Martinus Verhagen , Roelof De Graaf , Johannes Jacobs , Franciscus Maria Teunissen , Jurgen Benischek
发明人： Martinus Verhagen , Roelof De Graaf , Johannes Jacobs , Franciscus Maria Teunissen , Jurgen Benischek
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithographic apparatus is disclosed that has a semi-permeable membrane, a liquid inlet adapted to supply liquid to a first side of the membrane, and a gas inlet adapted to supply to a second side of the membrane either: (a) a vapor of the liquid, or (b) a gas which dissociates when dissolved in the liquid.
摘要翻译： 公开了一种光刻设备，其具有半透膜，适于向膜的第一侧供应液体的液体入口，以及适于向膜的第二侧供应气体入口的气体入口：（a） 液体，或（b）当溶解在液体中时解离的气体。
-
公开(公告)号：US20070081140A1
公开(公告)日：2007-04-12
申请号：US11244390
申请日：2005-10-06
IPC分类号： G03B27/58
CPC分类号： G03F7/70341
摘要： A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.
摘要翻译： 在阻挡构件上设置突起，所述阻挡构件至少部分地将液体限制在投影系统和基板之间。 突起比屏障部件的其它部分更靠近投影系统，以促进液体的弯液面粘附在突起和投影系统之间。
-
公开(公告)号：US20060221315A1
公开(公告)日：2006-10-05
申请号：US11098615
申请日：2005-04-05
申请人： Marcel Beckers , Sjoerd Donders , Christiaan Hoogendam , Johannes Jacobs , Nicolaas Kate , Nicolaas Kemper , Ferdy Migchelbrink , Elmar Evers
发明人： Marcel Beckers , Sjoerd Donders , Christiaan Hoogendam , Johannes Jacobs , Nicolaas Kate , Nicolaas Kemper , Ferdy Migchelbrink , Elmar Evers
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
-
公开(公告)号：US20080063846A1
公开(公告)日：2008-03-13
申请号：US11926910
申请日：2007-10-29
CPC分类号： B32B27/327 , B29C48/05 , B29C48/08 , B29C48/18 , B29C48/91 , B29C48/911 , B29C55/023 , B29C55/065 , B29K2023/00 , B29K2223/00 , B32B7/02 , B32B27/08 , B32B27/32 , B32B37/153 , B32B2250/242 , B32B2250/40 , B32B2307/516 , B32B2307/704 , B32B2323/04 , B32B2323/10 , B32B2405/00 , D01D5/253 , D01D5/426 , D01F8/06 , Y10S428/91 , Y10T428/24942 , Y10T428/2495 , Y10T428/249921 , Y10T428/2929 , Y10T428/31913 , Y10T442/3033 , Y10T442/3146 , Y10T442/3154 , Y10T442/608 , Y10T442/641 , Y10T442/656
摘要： The invention is directed to monoaxially drawn polyolefin multilayer film, tape or yarn of the AB or ABA type, having a stretch ratio of more than 12, having an E-modulus of at least 10 GPa, substantially consisting of a central layer (B) of a polyolefin selected from polyethylene and polypropylene, and one or two other layers (A) of a polyolefin from the same class as the material of the central layer B, the DSC melting point of the material of the said other layers (A) being lower than the DSC melting point of the material of the said central layer (B), wherein the central layer (B) is between 50 and 99 wt. % of the material and the other layers (A) between 1 and 50 wt. %. The present invention further relates to a method of manufacturing such a tape, film or yarn.
摘要翻译： 本发明涉及AB或ABA型的单轴拉伸聚烯烃多层膜，带或纱线，其拉伸比大于12，具有至少10GPa的E模量，基本上由中心层（B）组成， 的选自聚乙烯和聚丙烯的聚烯烃和与中心层B的材料相同类别的一个或两个其它层（A）的聚烯烃，所述其它层（A）的材料的DSC熔点为 低于所述中心层（B）的材料的DSC熔点，其中中心层（B）为50至99重量％。 材料和其它层（A）的％为1至50wt。 ％。 本发明还涉及制造这种带，膜或纱线的方法。
-
10.发明申请Lithographic device, device manufacturing method and device manufactured thereby 有权平版印刷装置，装置制造方法和由此制造的装置公开(公告)号：US20060268246A1
公开(公告)日：2006-11-30
申请号：US11391731
申请日：2006-03-29
申请人： Johannes Jacobs , Vadim Banine , Barrie Brewster , Vladimir Ivanov , Bastiaan Mertens , Johannes Moors , Robert Livesey , Baastiaan Wolschrijn
发明人： Johannes Jacobs , Vadim Banine , Barrie Brewster , Vladimir Ivanov , Bastiaan Mertens , Johannes Moors , Robert Livesey , Baastiaan Wolschrijn
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.
摘要翻译： 光刻设备被配置为将图案从图案形成装置投影到基板上。 该装置包括在装置的至少两个不同区域之间延伸的气体净化密封孔，以及构造成为密封孔提供一种或多种选自包括氢，氘，重氢，氘代氢和 氩和氢的混合物。
-
-
-
-
-
-
-
-
-
搜索结果
24 条记录 (耗时 0.075 秒)
