-
公开(公告)号:US20060033898A1
公开(公告)日:2006-02-16
申请号:US11205325
申请日:2005-08-17
申请人: Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
发明人: Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
IPC分类号: G03B27/42
CPC分类号: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译: 公开了一种光刻设备,其具有液体供应系统,其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间,布置成基本上容纳该空间内的液体的阻挡构件,以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。
-
公开(公告)号:US20060103821A1
公开(公告)日:2006-05-18
申请号:US10986185
申请日:2004-11-12
CPC分类号: G03F7/70341 , G03F7/70608 , G03F7/70808 , G03F7/70858
摘要: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
摘要翻译: 在浸没式光刻装置中,其中浸没液体被供应到局部空间,该空间基本上平行于基底平面呈多边形。 在一个实施例中,空间的两个角部具有不大于构造成容纳液体的空间与构造成不含液体的周围之间的过渡区域的宽度的曲率半径。
-
公开(公告)号:US20060268250A1
公开(公告)日:2006-11-30
申请号:US11499780
申请日:2006-08-07
申请人: Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Johannes Mulkens , Hans Jansen , Jacobus Johannus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人: Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Johannes Mulkens , Hans Jansen , Jacobus Johannus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
IPC分类号: G03B27/42
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
-
公开(公告)号:US20060119813A1
公开(公告)日:2006-06-08
申请号:US11002454
申请日:2004-12-03
IPC分类号: G03B27/42
CPC分类号: G03F7/70341 , G03F7/70866 , G03F7/70925
摘要: An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
-
-
-