公开(公告)号：US07399409B2

公开(公告)日：2008-07-15

申请号：US10398937

申请日：2001-10-12

申请人： Atsushi Onishi ,  Koichi Murazumi ,  Kozo Tachibana

发明人： Atsushi Onishi ,  Koichi Murazumi ,  Kozo Tachibana

IPC分类号： B01D15/08

CPC分类号： B01J20/29 ,  B01D15/1821 ,  B01D15/185 ,  B01D15/3833 ,  B01D2215/023 ,  B01J20/286 ,  B01J20/327 ,  B01J20/3274 ,  B01J20/328 ,  C07B57/00

摘要： The objectives of this invention are to provide a filler for separating optical isomers, capable of efficiently carrying out optical resolution of optical isomer mixtures, and to provide a process for separating optical isomers by a simulated moving bed chromatography utilizing the filler. This invention provides a filler made of a carrier supporting a specific amount of an optically active high molecular weight compound. Separation by the simulated moving bed chromatography using the filler is carried out under the condition that the capacity factors have specific values.

摘要翻译： 本发明的目的是提供一种用于分离光学异构体的填料，其能够有效地进行光学异构体混合物的光学拆分，并提供通过使用填料的模拟移动床色谱分离光学异构体的方法。 本发明提供了由支持特定量的光学活性高分子量化合物的载体制成的填料。 在容量因子具有特定值的条件下，通过使用填料的模拟移动床层析法进行分离。

公开(公告)号：US20070200569A1

公开(公告)日：2007-08-30

申请号：US11723591

申请日：2007-03-21

申请人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

发明人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

IPC分类号： G01R31/305

CPC分类号： G01R31/305

摘要： Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.

公开(公告)号：US20070194232A1

公开(公告)日：2007-08-23

申请号：US11698132

申请日：2007-01-26

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Atsushi Onishi

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Atsushi Onishi

IPC分类号： G21K7/00

CPC分类号： H01J37/026 ,  H01J37/26 ,  H01J2237/0044 ,  H01J2237/0048

摘要： A substrate inspection apparatus includes: an electron gun which generates an electron beam to irradiate the electron beam to a substrate; an electron detection unit which detects at least one of a secondary electron, a reflection electron and a back scattering electron generated from a surface of the substrate by the irradiation of the electron beam to output signals constituting an image showing a state of the substrate surface; and a surface potential uniformizing unit which generates ions, and irradiates the ions to the substrate before the irradiation of the electron beam to uniformize a surface potential of the substrate.

摘要翻译： 基板检查装置包括：电子枪，其产生电子束以将电子束照射到基板; 电子检测单元，其通过电子束的照射检测从基板的表面产生的二次电子，反射电子和背散射电子中的至少一个，以输出构成表示基板表面的状态的图像的信号; 以及产生离子的表面电位均匀化单元，并且在照射电子束之前将离子照射到基板上以使基板的表面电位均匀化。

公开(公告)号：US07258794B2

公开(公告)日：2007-08-21

申请号：US10529698

申请日：2003-10-09

申请人： Hirokazu Ikeda ,  Atsushi Onishi ,  Koichi Murazumi

发明人： Hirokazu Ikeda ,  Atsushi Onishi ,  Koichi Murazumi

IPC分类号： B01D15/08

CPC分类号： B01J20/3272 ,  B01D15/1821 ,  B01J20/26 ,  B01J20/262 ,  B01J20/265 ,  B01J20/28004 ,  B01J20/28078 ,  B01J20/286 ,  B01J20/29 ,  B01J20/3204 ,  B01J20/3274 ,  B01J20/328 ,  B01J2220/54 ,  B01J2220/56 ,  B01J2220/58

摘要： The present invention provides a production method with which a porous carrier can be allowed to evenly carry a polysaccharide derivative. That is, the present invention provides a method of producing an enantiomeric isomer-separating filler, including bringing a porous carrier and a solution of a polysaccharide derivative into contact with each other through a stirring operation in a stirring device, to allow the porous carrier to carry an optically active polymer compound, in which: a two-axis vertical stirring device is used as the stirring device; and the porous carrier is allowed to carry the polysaccharide derivative in a carrying amount of 23 mass % or more.

摘要翻译： 本发明提供可以使多孔载体均匀地携带多糖衍生物的制备方法。 也就是说，本发明提供一种制备对映体异构体分离填料的方法，包括使多糖载体和多糖衍生物的溶液通过搅拌装置中的搅拌操作彼此接触，以使多孔载体 携带光学活性高分子化合物，其中使用两轴垂直搅拌装置作为搅拌装置; 允许多孔载体携带23质量％以上的载体量的多糖衍生物。

公开(公告)号：US06991729B2

公开(公告)日：2006-01-31

申请号：US10474438

申请日：2002-04-12

申请人： Hirokazu Ikeda ,  Atsushi Onishi ,  Koichi Murazumi

发明人： Hirokazu Ikeda ,  Atsushi Onishi ,  Koichi Murazumi

IPC分类号： B01D15/08

CPC分类号： B01D15/3833 ,  B01D15/1821 ,  B01J20/103 ,  B01J20/28004 ,  B01J20/28078 ,  B01J20/286 ,  B01J20/29 ,  B01J20/3204 ,  B01J20/3219 ,  B01J20/3257 ,  B01J20/3274 ,  B01J20/328 ,  B01J2220/54 ,  B01J2220/56 ,  B01J2220/58

摘要： The objectives of this invention are to provide a filler for separating optical isomers, capable of efficiently carrying out optical resolution of optical isomer mixtures, a process for producing the filler, and a method for using the filler.The present invention provides a process for producing a filler for separating optical isomers which process comprises stirring a carrier and a solution including an optically active polymer compound with a double spindle vertical mixer. The present invention further provides a filler produced by the process and a method for using the filler in liquid chromatographic separation methods and simulated moving bed chromatographic separation methods.

摘要翻译： 本发明的目的是提供一种能够有效地进行光学异构体混合物的光学拆分的光学异构体的分离装置，填料的制造方法和使用该填料的方法。 本发明提供了一种用于分离光学异构体的填料的制备方法，该方法包括用双轴立式混合器搅拌载体和包含光学活性聚合物化合物的溶液。 本发明还提供了一种通过该方法制备的填料，以及在液相色谱分离方法和模拟移动床色谱分离方法中使用填料的方法。

公开(公告)号：US20050199807A1

公开(公告)日：2005-09-15

申请号：US11019111

申请日：2004-12-22

申请人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

发明人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

IPC分类号： G01N23/00 ,  G01R31/305 ,  G21K7/00

CPC分类号： G01R31/305

摘要： Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.

摘要翻译： 提供了通过使用同一电子束装置对样品进行详细观察的样本观察方法。 该方法使用电子束装置1，其包括用于将电子束照射到样品表面上的主要光学系统10和用于检测从所述样品表面发出的二次电子以形成样品表面的图像的二次光学系统30。 通过向样品表面照射电子束，在样品表面S上进行检查，并且在基于检查提取样品中的缺陷区域之后，再次施加提取的缺陷区域 电子束，以便提供缺陷区域的放大或详细观察。

公开(公告)号：US07645988B2

公开(公告)日：2010-01-12

申请号：US11137473

申请日：2005-05-26

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Atsushi Onishi

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Atsushi Onishi

IPC分类号： G21K7/00

CPC分类号： H01J37/26 ,  H01J2237/04735 ,  H01J2237/1538

摘要： A substrate inspection method includes: generating an electron beam and irradiating the electron beam as a primary electron beam to a substrate as a specimen; inducing at least any of a secondary electron, a reflected electron and a backscattering electron which are emitted from the substrate receiving the primary electron beam, and magnifying and projecting the induced electron as a secondary electron beam so as to form an image of the secondary electron beam; a trajectory of the primary electron beam and a trajectory of the secondary electron beam having an overlapping space and space charge effect of the secondary electron beam occurring in the overlapping space, detecting the image of the secondary electron beam to output a signal representing a state of the substrate; and suppressing aberration caused by the space charge effect in the overlapping space.

摘要翻译： 基板检查方法包括：产生电子束并将作为一次电子束的电子束照射到作为检体的基板; 诱导从接收一次电子束的基板发射的二次电子，反射电子和后向散射电子中的任一种，并且将感应电子放大并投影为二次电子束，以形成二次电子的图像 光束; 一次电子束的轨迹和二次电子束的轨迹具有在重叠空间中发生的二次电子束的重叠的空间和空间电荷效应，检测二次电子束的图像以输出表示状态的信号 基材; 并且抑制由重叠空间中的空间电荷效应引起的像差。

公开(公告)号：US07512501B2

公开(公告)日：2009-03-31

申请号：US11889765

申请日：2007-08-16

申请人： Hiroyuki Morinaga ,  Atsushi Onishi ,  Masayoshi Yamasaki ,  Takema Ito ,  Yasuhiro Kaga

发明人： Hiroyuki Morinaga ,  Atsushi Onishi ,  Masayoshi Yamasaki ,  Takema Ito ,  Yasuhiro Kaga

IPC分类号： G01B5/28 ,  G01B5/30

CPC分类号： G01N21/95607 ,  G01N21/8851

摘要： A defect inspecting apparatus comprising: an inspection region dividing section which divides a defect inspection region of a wafer on which a circuit pattern is formed into a plurality of inspection subregions; a pattern density calculating section which calculates the pattern density of each of the inspection subregions on the basis of design data of the circuit pattern; an inspection execution region and sensitivity rank setting section which assigns a sensitivity rank based on the pattern density to a plurality of inspection execution regions, each including a plurality of the inspection subregions; and a defect inspecting section which sets an inspection parameter on the basis of sensitivity ranks of the inspection execution regions and inspects the inspection execution regions for a defect.

摘要翻译： 一种缺陷检查装置，包括：检查区域分割部，其将形成有电路图案的晶片的缺陷检查区域分割成多个检查次数; 图案密度计算部，其基于所述电路图案的设计数据来计算所述检查子区域中的图案密度; 检查执行区域和灵敏度等级设置部分，其将多个检查执行区域分配给多个检查执行区域，每个检查执行区域包括多个检查子区域; 以及缺陷检查部，其根据检查执行区域的灵敏度等级设定检查参数，并检查检查执行区域的缺陷。

公开(公告)号：US07407576B2

公开(公告)日：2008-08-05

申请号：US10533217

申请日：2003-11-13

申请人： Shinsuke Suzuki ,  Atsushi Onishi ,  Kazumi Suzuki

发明人： Shinsuke Suzuki ,  Atsushi Onishi ,  Kazumi Suzuki

IPC分类号： B01D15/08

CPC分类号： B01J20/3272 ,  B01D15/3833 ,  B01J20/103 ,  B01J20/28004 ,  B01J20/28078 ,  B01J20/286 ,  B01J20/29 ,  B01J20/3204 ,  B01J20/3259 ,  B01J20/3274 ,  B01J20/328 ,  B01J2220/54 ,  B01J2220/58

摘要： The present invention is to provide a method of producing a separating agent for an enantiomeric isomer having a high optical resolution power together with sufficient solvent resistance. That is, a method of producing a separating agent for an enantiomeric isomer comprising the steps of allowing the porous carrier to carry the optically active polymer compound by bringing the porous carrier into contact with a dope of the optically active polymer compound and exposing a product to radiation.

摘要翻译： 本发明提供一种具有高分辨能力以及足够耐溶剂性的对映体异构体分离剂的方法。 也就是说，制备对映体异构体分离剂的方法包括以下步骤：使多孔载体通过使多孔载体与光学活性聚合物化合物的掺杂物接触并将产物暴露于 辐射。

公开(公告)号：US20080052021A1

公开(公告)日：2008-02-28

申请号：US11889765

申请日：2007-08-16

申请人： Hiroyuki Morinaga ,  Atsushi Onishi ,  Masayoshi Yamasaki ,  Takema Ito ,  Yasuhiro Kaga

发明人： Hiroyuki Morinaga ,  Atsushi Onishi ,  Masayoshi Yamasaki ,  Takema Ito ,  Yasuhiro Kaga

IPC分类号： G06F19/00

CPC分类号： G01N21/95607 ,  G01N21/8851

摘要： A defect inspecting apparatus comprising: an inspection region dividing section which divides a defect inspection region of a wafer on which a circuit pattern is formed into a plurality of inspection subregions; a pattern density calculating section which calculates the pattern density of each of the inspection subregions on the basis of design data of the circuit pattern; an inspection execution region and sensitivity rank setting section which assigns a sensitivity rank based on the pattern density to a plurality of inspection execution regions, each including a plurality of the inspection subregions; and a defect inspecting section which sets an inspection parameter on the basis of sensitivity ranks of the inspection execution regions and inspects the inspection execution regions for a defect.

摘要翻译： 1.一种缺陷检查装置，包括：检查区域分割部，其将形成有电路图案的晶片的缺陷检查区域分割成多个检查次数; 图案密度计算部，其基于所述电路图案的设计数据来计算所述检查子区域中的图案密度; 检查执行区域和灵敏度等级设置部分，其将多个检查执行区域分配给多个检查执行区域，每个检查执行区域包括多个检查子区域; 以及缺陷检查部，其根据检查执行区域的灵敏度等级设定检查参数，并检查检查执行区域的缺陷。