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    X-Ray diffraction imaging detector having multiple angled input faces
    1.
    发明公开
    X-Ray diffraction imaging detector having multiple angled input faces 审中-公开

    公开(公告)号：US20240361259A1

    公开(公告)日：2024-10-31

    申请号：US18307834

    申请日：2023-04-27

    Applicant: BRUKER TECHNOLOGIES LTD.

    Inventor： Richard Thake Bytheway

    IPC: G01N23/20008 ,  G01N23/207 ,  G01T1/20

    CPC classification number: G01N23/20008 ,  G01N23/207 ,  G01T1/2002 ,  G01T1/20185

    Abstract: A detector assembly of an X-ray system, the detector assembly includes: (a) an optical sensor having a first surface, the optical sensor configured to receive optical radiation impinging on the first surface, and to produce an electrical signal responsively to the optical radiation, (b) a fiber optic plate (FOP) disposed over the first surface of the optical sensor, the FOP includes: (i) one or more optical fibers disposed at an acute angle relative to a normal to the first surface, the one or more optical fibers are configured to convey the optical radiation to the optical sensor, and (ii) a second surface, which is oblique to the first surface, and (c) a scintillator layer disposed on the second surface of the FOP and configured to convert an X-ray beam into the optical radiation.

    Spot-size control in reflection-based and scatterometry-based X-ray metrology systems
    2.
    发明申请
    Spot-size control in reflection-based and scatterometry-based X-ray metrology systems 有权

    公开(公告)号：US20230075421A1

    公开(公告)日：2023-03-09

    申请号：US17830389

    申请日：2022-06-02

    Applicant: BRUKER TECHNOLOGIES LTD.

    Inventor： Alexander Krokhmal

    IPC: G01N23/201 ,  G01N23/207

    Abstract: An X-ray system includes, first and second X-ray channels (XCs), a spot sizer and a processor. The first XC is configured to: (i) direct a first X-ray beam for producing a spot on a surface of a sample, and (ii) produce a first signal responsively to a first X-ray radiation received from the surface. The spot sizer is positioned at a distance from the surface and is shaped and positioned to set the spot size by passing to the surface a portion of the first X-ray beam. The second XC is configured to: (i) direct a second X-ray beam to the surface, and (ii) produce a second signal responsively to a second X-ray radiation received from the surface, and the processor is configured to: (i) perform an analysis of the sample based on the first signal, and (ii) estimate the size of the spot based on the second signal.

    X-ray tube
    3.
    发明授权
    X-ray tube 有权

    公开(公告)号：US11302508B2

    公开(公告)日：2022-04-12

    申请号：US16676553

    申请日：2019-11-07

    Applicant: BRUKER TECHNOLOGIES LTD.

    Inventor： Alexander Krokhmal ,  John Wall

    IPC: H01J35/08 ,  H01J35/14 ,  H01J35/06

    Abstract: An X-ray tube that may include a cathode that is configured to generate an electron beam; an anode having a cavity that has an opening; wherein the anode is configured to receive the electron beam through the opening and to emit, through the opening, in response to the receiving of the electron beam, an X-ray beam from the opening; and electron optics that are configured to direct the electron beam towards the opening following a path that outside the cavity and in a vicinity of the opening, differs from a path of propagation the X-ray beam.

    Monitoring properties of X-ray beam during X-ray analysis
    5.
    发明授权
    Monitoring properties of X-ray beam during X-ray analysis 有权

    公开(公告)号：US12078604B2

    公开(公告)日：2024-09-03

    申请号：US17902926

    申请日：2022-09-05

    Applicant: BRUKER TECHNOLOGIES LTD.

    Inventor： Alexander Krokhmal ,  Asher Peled

    IPC: G01N23/223

    CPC classification number: G01N23/223 ,  G01N2223/076 ,  G01N2223/3032 ,  G01N2223/3037 ,  G01N2223/306 ,  G01N2223/321 ,  G01N2223/6116

    Abstract: A system for X-ray analysis, includes: (a) an X-ray analysis assembly configured to (i) direct an X-ray beam to impinge on a surface of a sample, and (ii) receive fluorescence radiation excited from the sample in response to the impinged X-ray beam, (b) a target assembly including measurement targets: placed in an optical path between the X-ray analysis assembly and the sample, and configured to move between (i) one or more first positions in which one or more of the measurement targets are positioned in the X-ray beam, and (ii) one or more second positions in which the optical path is unobstructed by the target assembly, and (c) a processor, configured to control movement of the target assembly between the first and second positions, for alternately, (i) monitoring properties of the X-ray beam using the measurement targets, and (ii) performing the X-ray analysis at a measurement site of the sample.

    Spot-size control in reflection-based and scatterometry-based X-ray metrology systems
    6.
    发明授权
    Spot-size control in reflection-based and scatterometry-based X-ray metrology systems 有权

    公开(公告)号：US11781999B2

    公开(公告)日：2023-10-10

    申请号：US17830389

    申请日：2022-06-02

    Applicant: BRUKER TECHNOLOGIES LTD.

    Inventor： Alexander Krokhmal

    IPC: G01N23/201 ,  G01N23/207

    CPC classification number: G01N23/201 ,  G01N23/207 ,  G01N2223/045 ,  G01N2223/6116

    Abstract: An X-ray system includes, first and second X-ray channels (XCs), a spot sizer and a processor. The first XC is configured to: (i) direct a first X-ray beam for producing a spot on a surface of a sample, and (ii) produce a first signal responsively to a first X-ray radiation received from the surface. The spot sizer is positioned at a distance from the surface and is shaped and positioned to set the spot size by passing to the surface a portion of the first X-ray beam. The second XC is configured to: (i) direct a second X-ray beam to the surface, and (ii) produce a second signal responsively to a second X-ray radiation received from the surface, and the processor is configured to: (i) perform an analysis of the sample based on the first signal, and (ii) estimate the size of the spot based on the second signal.

    Small-angle x-ray scatterometry
    8.
    发明授权
    Small-angle x-ray scatterometry 有权

    公开(公告)号：US11181490B2

    公开(公告)日：2021-11-23

    申请号：US17254281

    申请日：2019-07-04

    Applicant: BRUKER TECHNOLOGIES LTD.

    Inventor： Alex Dikopoltsev ,  Matthew Wormington ,  Yuri Vinshtein ,  Alexander Krokhmal

    IPC: G01N23/201 ,  G01N23/207 ,  G01T1/166 ,  G01N23/223

    Abstract: An x-ray apparatus, that may include a mount that is configured to hold a sample; an x-ray source, that is configured to direct an x-ray beam toward a first side of the sample; a detector, positioned downstream to a second side of the sample, the detector is configured to detect, during a sample measurement period, at least a part of x-rays that have been transmitted through the sample; and an x-ray intensity detector that is positioned, during a beam intensity monitoring period at a measurement position that is located between the x-ray source and the first side of the sample, so as to detect at least a part of the x-ray beam before the x-ray beam reaches the sample.

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