公开(公告)号：US20060093971A1

公开(公告)日：2006-05-04

申请号：US11303301

申请日：2005-12-16

Applicant: Hang Liu ,  Sebastian Schmidt ,  Benjamin Lin

Inventor： Hang Liu ,  Sebastian Schmidt ,  Benjamin Lin

IPC: G03F7/00

CPC classification number: G03F1/36 ,  G03F1/50 ,  G03F7/70283

Abstract: An apparatus, system and method to compensate for the proximity effects in the imaging of patterns in a photolithography process. A light exposure of a photoresist layer is effectuated in predetermined patterns through an exposure mask having light-transmissive openings in correspondence to the predetermined patterns. The exposure mask has areas densely populated with the light-transmissive openings and areas sparsely populated with the light-transmissive openings. Light is attenuated through the densely populated light-transmissive openings by a different amount than through the sparsely populated light-transmissive openings.

公开(公告)号：US20050250019A1

公开(公告)日：2005-11-10

申请号：US10837638

申请日：2004-05-04

Applicant: Benjamin Lin

Inventor： Benjamin Lin

IPC: G03C5/00 ,  G03F1/14 ,  G03F9/00 ,  G21K1/06 ,  G21K5/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G21K1/06

Abstract: A mask device includes a single layer of reflection mask on a transparent substrate to simply the growth fabricating of the reflection mask, therefore, using single layer of reflection mask can easier control the defect. Furthermore, a pattern-transferring method for a photolithography process is to utilize the incident exposing radiation with a grazing incident angle to illuminate the photolithography mask, such that the pattern can be transferred onto the wafer clearly, and the resolution of the photolithography would be improved.

Abstract translation: 掩模装置在透明基板上包括单层反射掩模，仅仅是反射掩模的生长制造，因此使用单层反射掩模可以更容易地控制缺陷。 此外，用于光刻工艺的图案转印方法是利用具有掠入射角的入射曝光辐射来照射光刻掩模，使得图案可以清楚地转印到晶片上，并且可以提高光刻的分辨率 。

公开(公告)号：US5929997A

公开(公告)日：1999-07-27

申请号：US887245

申请日：1997-07-02

Applicant: S. Benjamin Lin

Inventor： S. Benjamin Lin

IPC: G03F9/00 ,  G01B11/00

CPC classification number: G03F9/7084

Abstract: The present invention discloses a method for aligning a reticle with a semiconductor wafer. The method includes the steps of (a) applying a light source and an optical system for directing an incident light beam to a plurality of reticle alignment marks on the reticle to project a reticle-mark beam to an alignment detector therefrom; (b) applying the light source and the optical system for directing the incident light beam to a plurality of wafer alignment marks on a second surface of the wafer for projecting a wafer-mark beam therefrom wherein the second surface opposite a first surface of the wafer facing the reticle; and (c)applying the optical system for directing the wafer-mark beam to the alignment detector for precisely aligning the reticle and the wafer.

Abstract translation: 本发明公开了一种用于将掩模版与半导体晶片对准的方法。 该方法包括以下步骤：（a）应用光源和光学系统，用于将入射光束引导到光罩上的多个标线对准标记，以将标线光标投射到对准检测器; （b）施加光源和光学系统，用于将入射光束引导到晶片的第二表面上的多个晶片对准标记，用于从其中投射晶片标记光束，其中与晶片的第一表面相对的第二表面 面对光罩; 和（c）应用光学系统将晶片标记光束引导到对准检测器，以精确对准标线片和晶片。

公开(公告)号：US20050136336A1

公开(公告)日：2005-06-23

申请号：US10739423

申请日：2003-12-18

Applicant: Jochen Schacht ,  Uwe Schroeder ,  Benjamin Lin

Inventor： Jochen Schacht ,  Uwe Schroeder ,  Benjamin Lin

IPC: G03F1/14 ,  G03F9/00

CPC classification number: G03F1/36

Abstract: A photomask with desired illumination conditions can be constructed by combining a base pattern of openings with an assist pattern which includes openings that are offset from respectively corresponding openings of the base pattern by a preset angular distance.

Abstract translation: 具有期望的照明条件的光掩模可以通过将开口的基本图案与辅助图案组合而构成，该辅助图案包括从底座图案的相应开口偏移预定角距离的开口。

公开(公告)号：US20090029029A1

公开(公告)日：2009-01-29

申请号：US12172477

申请日：2008-07-14

Applicant: Benjamin LIN

Inventor： Benjamin LIN

IPC: A23G3/50 ,  B29D23/00 ,  B29C33/44 ,  B29C41/32 ,  B29C41/38

CPC classification number: A23G3/0029 ,  A23G3/0019 ,  A23G3/0263 ,  A23G3/0268 ,  A23G3/0284 ,  A23G3/06 ,  A23G3/10 ,  A23G3/12 ,  A23G3/2023 ,  A23G3/2053 ,  A23G3/42 ,  A23G3/50 ,  A23G7/0018 ,  A23P20/20 ,  A47G21/183 ,  A47G2400/105

Abstract: An apparatus and method for manufacturing a candy drinking straws includes a system for arranging a soft mass of sugar composition around a solid mold having a support cord extending from an end thereof, rolling the sugar composition along a surface of the solid mold using a plurality of rotating scrolls rotating around the solid mold to shape the sugar composition into a hollow tube, the sugar composition being pushed along the solid mold onto the support cord, pulling the sugar composition along the support cord to form hollow cylindrical candy, and cutting the hollow cylindrical candy into a plurality of hollow candy segments.

Abstract translation: 用于制造糖果饮用吸管的装置和方法包括一种用于在固体模具周围布置软质糖组合物的系统，该固体模具具有从其末端延伸的支撑绳，其中使用多个 围绕固体模具旋转的旋转涡旋件将糖组合物成形为中空管，将糖组合物沿着固体模推送到支撑绳上，沿着支撑绳拉取糖组合物以形成中空圆柱形糖果，并切割中空圆柱形 糖果成多个空心糖果片段。

公开(公告)号：US20060234855A1

公开(公告)日：2006-10-19

申请号：US11247998

申请日：2005-10-12

Applicant: Raymond Gorte ,  John Vohs ,  Michael Gross ,  Benjamin Lin ,  Shung-Ik Lee

Inventor： Raymond Gorte ,  John Vohs ,  Michael Gross ,  Benjamin Lin ,  Shung-Ik Lee

IPC: H01M4/88 ,  H01M4/86 ,  C25C1/08 ,  C25C1/10 ,  C25C1/12

CPC classification number: C23C18/405 ,  C25D3/02 ,  C25D3/04 ,  C25D3/38 ,  C25D5/50 ,  H01M4/045 ,  H01M4/8621 ,  H01M4/8853 ,  H01M4/8885 ,  H01M4/90 ,  H01M4/9066 ,  H01M8/1213 ,  H01M8/1246 ,  Y02E60/525 ,  Y02P70/56

Abstract: A method for preparing an electrode for a solid oxide fuel cell, in which a conductive material, such as a metal, is electrodeposited onto a porous electrode comprising a conductive material and an electrolyte. The method allows metals to be added directly to a porous electrode without the need for subsequent reduction steps. The method also permits the conductive materials to be deposited in controlled, layered structures, thereby enabling the use of different metals to achieve desired properties.

Abstract translation: 一种固体氧化物燃料电池用电极的制造方法，其中将诸如金属的导电材料电沉积到包含导电材料和电解质的多孔电极上。 该方法允许金属直接添加到多孔电极，而不需要随后的还原步骤。 该方法还允许以受控的分层结构沉积导电材料，从而使得能够使用不同的金属来实现期望的性能。

公开(公告)号：US06211868B1

公开(公告)日：2001-04-03

申请号：US09078843

申请日：1998-05-14

Applicant: Benjamin Lin ,  Ming-Shing Su ,  Chung-Chih Lin ,  Chien-Hung Yang

Inventor： Benjamin Lin ,  Ming-Shing Su ,  Chung-Chih Lin ,  Chien-Hung Yang

IPC: G09B506

CPC classification number: G09B5/065

Abstract: A method for performing editing in a multimedia training and presentation system that substantially providing user autonomy and transparency is disclosed. The method includes inputting a basic setting used in the multimedia synchronous training system. Next, a curriculum used in the multimedia synchronous training system is input, and multimedia teaching information is then input. After inputting points of emphasis, the teaching information and the points of emphasis are synchronized. Finally, miscellaneous settings are performed in the multimedia synchronous training system.

Abstract translation: 公开了一种在基本上提供用户自主性和透明度的多媒体训练和呈现系统中执行编辑的方法。 该方法包括输入多媒体同步训练系统中使用的基本设置。 接下来，输入多媒体同步训练系统中使用的课程，然后输入多媒体教学信息。 在输入重点之后，教学信息和重点都同步化。 最后，在多媒体同步训练系统中进行各种设定。

公开(公告)号：US20070024835A1

公开(公告)日：2007-02-01

申请号：US11195269

申请日：2005-08-01

Applicant: Kuo-Chun Huang ,  Benjamin Lin ,  Te-Hung Wu

Inventor： Kuo-Chun Huang ,  Benjamin Lin ,  Te-Hung Wu

IPC: G03B27/54

CPC classification number: G03F7/70291 ,  G03F7/70191 ,  G03F7/70283 ,  G03F7/70308

Abstract: A method for improving illumination uniformity in an exposure process is described, wherein a light source, a reticle and a projection system are used to expose a substrate in the exposure process. A realtime adjustable gray filter like a gray LCD panel is placed in the light path between the light source and the exposed substrate to compensate the illumination nonuniformity on the substrate in real time.

Abstract translation: 描述了一种用于改善曝光过程中的照明均匀性的方法，其中在曝光过程中使用光源，掩模版和投影系统来曝光基板。 像灰色LCD面板这样的实时可调灰度滤光片被放置在光源和曝光的基板之间的光路中，以实时补偿基板上的照明不均匀性。

公开(公告)号：US06211875B1

公开(公告)日：2001-04-03

申请号：US09115742

申请日：1998-07-15

Applicant: Benjamin Lin ,  Ming-Shing Su ,  Chung-Chih Lin ,  Chien-Hung Yang

Inventor： Benjamin Lin ,  Ming-Shing Su ,  Chung-Chih Lin ,  Chien-Hung Yang

IPC: G09G500

CPC classification number: G09B5/00

Abstract: A display template setting method in a multimedia synchronous system is disclosed. The method includes, first, displaying predetermined display template models, each including various areas; and selecting one of the predetermined display template models. Next, at least one projecting area having three-dimensional characteristics is set in the predetermined display template model. The positions and scales of the various areas corresponding to the selected display template model are calculated; and the various areas are displayed according to the calculated positions and scales and the setting of the projecting area.

Abstract translation: 公开了一种多媒体同步系统中的显示模板设定方法。 该方法包括：首先显示各自包括各种区域的预定显示模板模型; 以及选择预定显示模板模型之一。 接下来，在预定显示模板模型中设置至少一个具有三维特征的投影区域。 计算与所选择的显示模板模型相对应的各个区域的位置和比例; 并根据计算的位置和尺度以及投影区域的设置显示各个区域。