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1.
公开(公告)号:US08986789B2
公开(公告)日:2015-03-24
申请号:US13124349
申请日:2009-10-01
CPC分类号: H01L24/05 , C23C18/1601 , C23C18/1651 , C23C18/18 , C23C18/36 , C23C18/44 , C23C18/54 , H01L24/03 , H01L2224/0401 , H01L2224/05124 , H01L2224/05147 , H01L2224/05164 , H01L2224/05644 , H01L2224/05664 , H01L2924/01005 , H01L2924/01006 , H01L2924/01011 , H01L2924/01012 , H01L2924/01013 , H01L2924/01015 , H01L2924/01016 , H01L2924/01019 , H01L2924/01022 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/0105 , H01L2924/01051 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/15747 , Y10T428/1275 , Y10T428/12889 , H01L2924/00014 , H01L2924/00
摘要: The invention relates to a substrate having a bondable metal coating comprising, in this order, on an Al or Cu surface: (a) a Ni—P layer, (b) a Pd layer and, optionally, (c) an Au layer, wherein the thickness of the Ni—P layer (a) is 0.2 to 10 m, the thickness of the Pd layer (b) is 0.05 to 1.0 m and the thickness of the optional Au layer (c) is 0.01 to 0.5 m, and wherein the Ni—P layer (a) has a P content of 10.5 to 14 wt.-%. The deposit internal stress of the resulting Ni—P/Pd stack is not higher than 34.48M−Pa (5,000 psi). Further, a process for the preparation of such a substrate is described.
摘要翻译: 本发明涉及一种具有可粘合金属涂层的基底,其依次包括在Al或Cu表面上:(a)Ni-P层,(b)Pd层和(c)Au层, 其中Ni-P层(a)的厚度为0.2〜10μm,Pd层(b)的厚度为0.05〜1.0μm,任选的Au层(c)的厚度为0.01〜0.5μm, 其中Ni-P层(a)的P含量为10.5〜14重量%。 所得Ni-P / Pd叠层的沉积物内应力不高于34.48M-Pa(5,000psi)。 此外,描述了制备这种基材的方法。
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公开(公告)号:US20110200842A1
公开(公告)日:2011-08-18
申请号:US13124349
申请日:2009-10-01
CPC分类号: H01L24/05 , C23C18/1601 , C23C18/1651 , C23C18/18 , C23C18/36 , C23C18/44 , C23C18/54 , H01L24/03 , H01L2224/0401 , H01L2224/05124 , H01L2224/05147 , H01L2224/05164 , H01L2224/05644 , H01L2224/05664 , H01L2924/01005 , H01L2924/01006 , H01L2924/01011 , H01L2924/01012 , H01L2924/01013 , H01L2924/01015 , H01L2924/01016 , H01L2924/01019 , H01L2924/01022 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/0105 , H01L2924/01051 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/15747 , Y10T428/1275 , Y10T428/12889 , H01L2924/00014 , H01L2924/00
摘要: The invention relates to a substrate having a bondable metal coating comprising, in this order, on an Al or Cu surface: (a) a Ni—P layer, (b) a Pd layer and, optionally, (c) an Au layer, wherein the thickness of the Ni—P layer (a) is 0.2 to 10 m, the thickness of the Pd layer (b) is 0.05 to 1.0 m and the thickness of the optional Au layer (c) is 0.01 to 0.5 m, and wherein the Ni—P layer (a) has a P content of 10.5 to 14 wt.-%. The deposit internal stress of the resulting Ni—P/Pd stack is not higher than 34.48 M−Pa (5,000 psi). Further, a process for the preparation of such a substrate is described.
摘要翻译: 本发明涉及一种具有可粘合金属涂层的基底,其依次包括在Al或Cu表面上:(a)Ni-P层,(b)Pd层和(c)Au层, 其中Ni-P层(a)的厚度为0.2〜10μm,Pd层(b)的厚度为0.05〜1.0μm,任选的Au层(c)的厚度为0.01〜0.5μm, 其中Ni-P层(a)的P含量为10.5〜14重量%。 所得Ni-P / Pd叠层的沉积物内应力不高于34.48MPa(5,000psi)。 此外,描述了制备这种基材的方法。
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