摘要:
A method and apparatus for generating an elemental image by an integral image technique are provided. The method includes normalizing coordinates of dots in a frustum formed in perspective projection by mapping the dots in the frustum into a cube; reversing a grade of depth of the cube viewed from a particular viewpoint; and generating a two-dimensional (2D) elemental image necessary for three-dimensional (3D) display from dots in the cube whose grade of depth is reversed.
摘要:
The present invention relates to a method of manufacturing magnesium alloy processing materials capable of improving low cycle fatigue life. The manufacturing method for magnesium alloy processing materials with improved low cycle fatigue life comprises pre-straining a magnesium alloy processing material which is processed.
摘要:
Disclosed is a method for manufacturing bio-composites, in which biodegradable poly(lactic acid) (PLA) fibers are mixed, optionally along with general-purpose polypropylene fibers, using a carding process, and compression molded into bio-composites which overcome the problems of the PLA bio-composites manufactured by injection molding, and the PLA bio-composites manufactured thereby.
摘要:
A method and apparatus for generating an elemental image by an integral image technique are provided. The method includes normalizing coordinates of dots in a frustum formed in perspective projection by mapping the dots in the frustum into a cube; reversing a grade of depth of the cube viewed from a particular viewpoint; and generating a two-dimensional (2D) elemental image necessary for three-dimensional (3D) display from dots in the cube whose grade of depth is reversed.
摘要:
A light is irradiated on a wafer including a plurality of pixels. Image information corresponding to each pixel is measured by sensing the light reflected by the wafer surface. A raw datum is calculated by subtracting the image information of a corresponding pixel from the image information of a target pixel. The target pixel is a subject pixel for detecting a defect. The corresponding pixel is a pixel located in a first device unit and corresponds to the target pixel. The first device unit is located adjacent to a second device unit that includes the target pixel. The threshold region is preset to have at least one pair of upper and lower limits. The target pixel is marked as a defective pixel when the raw datum thereof is included in the threshold region. Accordingly, the killer defect can be detected separate from the non-killer defects that are usually detected together with the killer defects.
摘要:
An oxidizing gas pressurization system capable of supplying protective cooling water into an oxidizing gas pressurization unit such that the protective cooling water serves as a protective film against strong oxidizing power and cools the heat generated in the pressurization unit is disclosed. The oxidizing gas pressurization system for pressurizing and supplying an oxidizing gas such as ozone and chlorine includes an oxidizing gas storage unit, an oxidizing gas pressurization unit for pressurizing the oxidizing gas supplied from the oxidizing gas storage unit at a high pressure and discharging the oxidizing gas, and a cooling water supply unit for supplying protective cooling water serving as a protective film against the oxidizing pas supplied into the oxidizing gas pressurization unit.
摘要:
The present invention relates to a method of manufacturing magnesium alloy processing materials capable of improving low cycle fatigue life. The manufacturing method for magnesium alloy processing materials with improved low cycle fatigue life comprises pre-straining a magnesium alloy processing material which is processed.
摘要:
A method for selecting reference images, a method and an apparatus for inspecting patterns on a wafer, and a method for dividing a wafer into application regions. In a method for inspecting patterns according to at least one exemplary embodiment of the present invention, a plurality of reference dies may be selected and a difference in gray levels of images of the references dies may be determined. The reference dies may include a first die substantially centrally located on the wafer and at least one second die located at an edge portion of the wafer. One reference image is selected if the difference in gray levels is within a permitted tolerance and more than one reference image may be selected if the difference in gray levels is not within the permitted tolerance. A pattern inspection may be performed using the reference images.
摘要:
An image processing method is disclosed. The method comprises capturing a plurality of images of a sample using a scanning electron microscope (SEM). The method further comprising computing a mean value for each pixel location in the plurality of images and forming an integrated image with the mean values. The method further comprises filtering the integrated image using a median filter.