公开(公告)号：US08207470B2

公开(公告)日：2012-06-26

申请号：US12547163

申请日：2009-08-25

Applicant: Hyeong-Tag Jeon ,  Sang-Hyun Woo ,  Hyung-Chul Kim ,  Chin-Wook Chung

Inventor： Hyeong-Tag Jeon ,  Sang-Hyun Woo ,  Hyung-Chul Kim ,  Chin-Wook Chung

IPC: B23K10/00

CPC classification number: H01J37/32532 ,  H01J37/32082 ,  H01J37/32357

Abstract: Provided is an apparatus for generating remote plasma, which can improve thin-film quality by preventing an arc at a bias electrode. The apparatus includes a radio frequency (RF) electrode installed inside an upper portion of a chamber, a bias electrode installed apart from the RF electrode, and including a plurality of through holes through which plasma passes, wherein a bias power is supplied to the bias electrode, a plasma generating unit formed between the RF electrode and the bias electrode, wherein a plasma gas is supplied to the plasma generating unit, and a ground electrode installed under and spaced apart from the bias electrode, and including plasma through holes corresponding to the through holes of the bias electrode, wherein a pulsed DC bias of a second voltage level, which has a first voltage level periodically, is applied to the bias electrode.

Abstract translation: 提供一种用于产生远程等离子体的装置，其可以通过防止偏置电极处的电弧来提高薄膜质量。 该装置包括安装在室的上部内的射频（RF）电极，与RF电极分开安装的偏置电极，并且包括多个通过等离子体通过的通孔，其中偏置功率被提供给偏置 电极，形成在RF电极和偏置电极之间的等离子体产生单元，其中等离子体气体被供应到等离子体产生单元，以及接地电极，安装在偏置电极之下并与偏置电极隔开，并且包括对应于等离子体的等离子体通孔 偏置电极的通孔，其中周期性地具有第一电压电平的第二电压电平的脉冲DC偏压施加到偏置电极。

公开(公告)号：US20080265903A1

公开(公告)日：2008-10-30

申请号：US12114043

申请日：2008-05-02

Applicant: Chin-Wook Chung ,  Min-Hyung Lee ,  Sung-Ho Jang

Inventor： Chin-Wook Chung ,  Min-Hyung Lee ,  Sung-Ho Jang

IPC: G01N27/62

CPC classification number: H05H1/0081

Abstract: Provided is a plasma diagnostic apparatus includes a probe unit, which is inserted into a plasma or disposed at boundary of a plasma, the apparatus includes: a signal supplying unit having a signal supplying source; a current detecting/voltage converting unit for applying a periodic voltage signal applied from the signal supplying unit to the probe unit, detecting the magnitude of the current flowing through the probe unit, and converting the detected current into a voltage; and a by-frequency measurement unit for computing the magnitude and phase of individual frequency components of the current flowing through the probe unit by receiving the voltage output from the current detecting/voltage converting unit as an input.

Abstract translation: 提供了一种等离子体诊断装置，包括插入等离子体中或设置在等离子体边界处的探针单元，该装置包括：具有信号提供源的信号提供单元; 电流检测/电压转换单元，用于将从信号提供单元施加的周期性电压信号施加到探针单元，检测流过探针单元的电流的大小，并将检测到的电流转换成电压; 以及逐频测量单元，用于通过接收从电流检测/电压转换单元输出的电压作为输入来计算流过探针单元的电流的各个频率分量的幅度和相位。

公开(公告)号：US20080017317A1

公开(公告)日：2008-01-24

申请号：US11735549

申请日：2007-04-16

Applicant: Sang Jean JEON ,  Chin Wook Chung ,  Guen Suk Lee ,  Seung Yuop Sa ,  Hyung Chul Cho

Inventor： Sang Jean JEON ,  Chin Wook Chung ,  Guen Suk Lee ,  Seung Yuop Sa ,  Hyung Chul Cho

IPC: C23F1/00 ,  C23C16/00

CPC classification number: C23C16/507 ,  H01J37/321 ,  H05H1/46

Abstract: A substrate processing apparatus. The substrate processing apparatus includes a vacuum chamber having a reaction space to generate plasma in which a target substrate is located, a low frequency antenna unit located outside the reaction space to generate plasma in the reaction space, a low frequency power supply to apply low frequency power to the low frequency antenna unit, a high frequency antenna unit located outside the reaction space to generate plasma in the reaction space, and a high frequency power supply to apply high frequency power to the high frequency antenna unit. The apparatus allows the ignition of plasma to be performed efficiently via the high frequency antenna unit, and improves efficiency of inductive coupling between plasma and a low frequency antenna via the low frequency antenna unit, thereby improving plasma generation efficiency.

Abstract translation: 基板处理装置。 基板处理装置包括具有反应空间以产生目标基板的等离子体的真空室，位于反应空间外侧的低频天线单元，用于在反应空间中产生等离子体;低频电源，以施加低频 低频天线单元的功率，位于反应空间外部的高频天线单元，以在反应空间中产生等离子体;以及高频电源，向高频天线单元施加高频功率。 该装置允许通过高频天线单元有效地执行等离子体的点火，并且通过低频天线单元提高等离子体和低频天线之间的电感耦合的效率，从而提高等离子体产生效率。

公开(公告)号：US09837825B2

公开(公告)日：2017-12-05

申请号：US14386764

申请日：2013-03-18

Applicant: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ,  Chin-Wook Chung ,  Jin-Young Bang

Inventor： Chin-Wook Chung ,  Jin-Young Bang

IPC: H02J5/00 ,  H04B5/00 ,  H01F38/14

CPC classification number: H02J5/005 ,  H01F38/14 ,  H02J7/025 ,  H02J50/12 ,  H04B5/0037 ,  H04B5/0075

Abstract: A transmitter for transmitting wireless power and a wireless power transmitting system having the same in the present invention includes at least one helical or spiral type coil in which one end thereof is in a grounded state and the other end is in the air, wherein the coil wirelessly transmits the power by resonance. The present invention has simpler structure and operates with low frequencies as compared with the existing wireless power transmitting scheme using magnetic resonance, thereby to enhance the efficiency of the power transfer, to reduce the cost for system building, and to easily implement a transmitting section with the multi-channel.

公开(公告)号：US20150069851A1

公开(公告)日：2015-03-12

申请号：US14386764

申请日：2013-03-18

Applicant: Chin-Wook CHUNG ,  Jin-Young BANG ,  INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY

Inventor： Chin-Wook Chung ,  Jin-Young Bang

IPC: H02J5/00

CPC classification number: H02J5/005 ,  H01F38/14 ,  H02J7/025 ,  H02J50/12 ,  H04B5/0037 ,  H04B5/0075

Abstract: A transmitter for transmitting wireless power and a wireless power transmitting system having the same in the present invention includes at least one helical or spiral type coil in which one end thereof is in a grounded state and the other end is in the air, wherein the coil wirelessly transmits the power by resonance. The present invention has simpler structure and operates with low frequencies as compared with the existing wireless power transmitting scheme using magnetic resonance, thereby to enhance the efficiency of the power transfer, to reduce the cost for system building, and to easily implement a transmitting section with the multi-channel.

Abstract translation: 本发明的用于发送无线电力的发射机和具有该发射机的无线电力传输系统包括至少一个螺旋或螺旋型线圈，其一端处于接地状态，另一端在空中，其中线圈 通过共振无线传输电力。 与现有的使用磁共振的无线电力发送方案相比，本发明的结构更简单，低频率地运行，从而提高了电力传送的效率，降低了系统构建的成本，并且容易地实现具有 多渠道。

公开(公告)号：US20100282711A1

公开(公告)日：2010-11-11

申请号：US12744723

申请日：2008-12-12

Applicant: Chin-Wook Chung ,  Minhyong Lee ,  Sung-Ho Jang ,  Ik-Jin Choi ,  Jung-Hyung Kim ,  Yong-Hyeon Shin

Inventor： Chin-Wook Chung ,  Minhyong Lee ,  Sung-Ho Jang ,  Ik-Jin Choi ,  Jung-Hyung Kim ,  Yong-Hyeon Shin

IPC: C23F1/08 ,  C23C16/52 ,  C23F1/00

CPC classification number: H01J37/32935

Abstract: Provided are a process monitoring apparatus and method. The process monitoring apparatus includes a process chamber in which a process is performed, a probe assembly disposed on the process chamber, and comprising a probe electrode, a plasma generator generating plasma around the probe assembly, and a drive processor applying an alternating current (AC) voltage having at least 2 fundamental frequencies to the probe assembly, and extracting process monitoring parameters.

Abstract translation: 提供了一种过程监控装置和方法。 过程监控装置包括处理室，其中进行处理，设置在处理室上的探针组件，并且包括探针电极，在探针组件周围产生等离子体的等离子体发生器，以及施加交流电的驱动处理器 ）电压，其具有至少2个基本频率到探针组件，以及提取过程监控参数。

公开(公告)号：US20100096367A1

公开(公告)日：2010-04-22

申请号：US12547163

申请日：2009-08-25

Applicant: Hyeong-Tag JEON ,  Sang-Hyun Woo ,  Hyung-Chul Kim ,  Chin-Wook Chung

Inventor： Hyeong-Tag JEON ,  Sang-Hyun Woo ,  Hyung-Chul Kim ,  Chin-Wook Chung

IPC: H05H1/34

CPC classification number: H01J37/32532 ,  H01J37/32082 ,  H01J37/32357

Abstract: Provided is an apparatus for generating remote plasma, which can improve thin-film quality by preventing an arc at a bias electrode. The apparatus includes a radio frequency (RF) electrode installed inside an upper portion of a chamber, a bias electrode installed apart from the RF electrode, and including a plurality of through holes through which plasma passes, wherein a bias power is supplied to the bias electrode, a plasma generating unit formed between the RF electrode and the bias electrode, wherein a plasma gas is supplied to the plasma generating unit, and a ground electrode installed under and spaced apart from the bias electrode, and including plasma through holes corresponding to the through holes of the bias electrode, wherein a pulsed DC bias of a second voltage level, which has a first voltage level periodically, is applied to the bias electrode.

Abstract translation: 提供一种用于产生远程等离子体的装置，其可以通过防止偏置电极处的电弧来提高薄膜质量。 该装置包括安装在室的上部内的射频（RF）电极，与RF电极分开设置的偏置电极，并且包括多个通过等离子体通过的通孔，其中偏置功率被提供给偏置 电极，形成在RF电极和偏置电极之间的等离子体产生单元，其中等离子体气体被供应到等离子体产生单元，以及接地电极，安装在偏置电极之下并与偏置电极隔开，并且包括对应于等离子体的等离子体通孔 偏置电极的通孔，其中周期性地具有第一电压电平的第二电压电平的脉冲DC偏压施加到偏置电极。

公开(公告)号：US08343309B2

公开(公告)日：2013-01-01

申请号：US11735549

申请日：2007-04-16

Applicant: Sang Jean Jeon ,  Chin Wook Chung ,  Guen Suk Lee ,  Seung Yuop Sa ,  Hyung Chul Cho

Inventor： Sang Jean Jeon ,  Chin Wook Chung ,  Guen Suk Lee ,  Seung Yuop Sa ,  Hyung Chul Cho

IPC: H01L21/306 ,  C23C16/00

CPC classification number: C23C16/507 ,  H01J37/321 ,  H05H1/46

Abstract: A substrate processing apparatus. The substrate processing apparatus includes a vacuum chamber having a reaction space to generate plasma in which a target substrate is located, a low frequency antenna unit located outside the reaction space to generate plasma in the reaction space, a low frequency power supply to apply low frequency power to the low frequency antenna unit, a high frequency antenna unit located outside the reaction space to generate plasma in the reaction space, and a high frequency power supply to apply high frequency power to the high frequency antenna unit. The apparatus allows the ignition of plasma to be performed efficiently via the high frequency antenna unit, and improves efficiency of inductive coupling between plasma and a low frequency antenna via the low frequency antenna unit, thereby improving plasma generation efficiency.

Abstract translation: 基板处理装置。 基板处理装置包括具有反应空间以产生目标基板的等离子体的真空室，位于反应空间外侧的低频天线单元，用于在反应空间中产生等离子体;低频电源，以施加低频 低频天线单元的功率，位于反应空间外部的高频天线单元，以在反应空间中产生等离子体;以及高频电源，向高频天线单元施加高频功率。 该装置允许通过高频天线单元有效地执行等离子体的点火，并且通过低频天线单元提高等离子体和低频天线之间的电感耦合的效率，从而提高等离子体产生效率。

公开(公告)号：US07696758B2

公开(公告)日：2010-04-13

申请号：US12114043

申请日：2008-05-02

Applicant: Chin-Wook Chung ,  Min-Hyung Lee ,  Sung-Ho Jang

Inventor： Chin-Wook Chung ,  Min-Hyung Lee ,  Sung-Ho Jang

IPC: G01N27/62

CPC classification number: H05H1/0081

Abstract: Provided is a plasma diagnostic apparatus having a probe unit, which is inserted into a plasma or disposed at boundary of a plasma, the apparatus including: a signal supplying unit having a signal supplying source; a current detecting/voltage converting unit for applying a periodic voltage signal applied from the signal supplying unit to the probe unit, detecting the magnitude of the current flowing through the probe unit, and converting the detected current into a voltage; and a by-frequency measurement unit for computing the magnitude and phase of individual frequency components of the current flowing through the probe unit by receiving the voltage output from the current detecting/voltage converting unit as an input.

Abstract translation: 本发明提供一种等离子体诊断装置，其具有被插入等离子体中或设置在等离子体的边界的探针单元，该装置包括：信号供给单元，具有信号供给源; 电流检测/电压转换单元，用于将从信号提供单元施加的周期性电压信号施加到探针单元，检测流过探针单元的电流的大小，并将检测到的电流转换成电压; 以及逐频测量单元，用于通过接收从电流检测/电压转换单元输出的电压作为输入来计算流过探针单元的电流的各个频率分量的幅度和相位。

公开(公告)号：US20070193515A1

公开(公告)日：2007-08-23

申请号：US11703621

申请日：2007-02-07

Applicant: Hyeong-Tag Jeon ,  In-Hoe Kim ,  Seok-Hoon Kim ,  Chin-Wook Chung ,  Sahng-Kyoo Lee

Inventor： Hyeong-Tag Jeon ,  In-Hoe Kim ,  Seok-Hoon Kim ,  Chin-Wook Chung ,  Sahng-Kyoo Lee

IPC: C23F1/00 ,  C23C16/00

CPC classification number: H05H1/46 ,  H01J37/3211 ,  H01J37/32357 ,  H01J37/3244

Abstract: Provided is an apparatus for generating remote plasma. The apparatus includes an RF antenna disposed in regard to a chamber, a plasma generating unit formed in an uppermost portion of the chamber, wherein a plurality of plasma generation gas introduction pipes are communicated with the plasma generating unit, a first shower head disposed below the plasma generating unit, and having a plurality of first plasma guide holes, a second shower head disposed below the first shower head, and having a plurality of source/purge gas guide holes and a plurality of second plasma guide holes directly connected to the respective first plasma guide holes, and a source/purge gas introduction unit disposed between the first and second shower heads, wherein a plurality of source/purge gas introduction pipes are uniformly communicated with the source/purge gas introduction unit.

Abstract translation: 提供了一种用于产生远程等离子体的装置。 该装置包括：关于腔室设置的RF天线，形成在腔室的最上部的等离子体产生单元，其中多个等离子体产生气体导入管与等离子体产生单元连通;第一淋浴喷头， 等离子体发生单元，并具有多个第一等离子体引导孔，设置在第一喷淋头下方的第二喷淋头，并且具有多个源/吹扫气体引导孔和多个第二等离子体引导孔，其直接连接到相应的第一等离子体引导孔 等离子体引导孔和设置在第一和第二喷淋头之间的源/净化气体引入单元，其中多个源/净化气体引入管与源/净化气体导入单元均匀地连通。