摘要:
Disclosed is a method of booting a user device including a nonvolatile random access memory (RAM) and a mode register. The method includes reading a Basic Input/Output System (BIOS) refresh setting during a booting operation, and setting the mode register to a refresh timing mode of the nonvolatile RAM according to the BIOS refresh setting. The refresh timing mode selectively includes a refresh inactivation mode for inactivating a refresh operation of the nonvolatile RAM or a refresh execution mode of multiple refresh execution modes having corresponding different refresh periods for activating the refresh operation of the nonvolatile RAM.
摘要:
Semiconductor devices having vertical channel transistors are provided. The semiconductor device includes an insulation layer on a substrate and a buried bit line on the insulation layer. The buried bit line extends in a first direction. An active pillar is disposed on the buried bit line. The active pillar includes a lower dopant region, a channel region having a first sidewall and an upper dopant region vertically stacked on the buried bit line. A contact gate electrode is disposed to be adjacent to the first sidewall of the channel region. A word line is electrically connected to the contact gate electrode. The word line extends in a second direction intersecting the first direction. A string body connector is electrically connected to the channel region. Related methods are also provided.
摘要:
A semiconductor memory device may include a common source region on a substrate, an active pattern between the substrate and the common source region, a gate pattern facing a sidewall of the active pattern, a gate dielectric pattern between the gate pattern and the active pattern, a variable resistance pattern between the common source region and the active pattern, and an interconnection line.
摘要:
According to example embodiments, a semiconductor device includes a plurality of active pillars protruding from a substrate. Each active pillar includes a channel region between upper and lower doped regions. A contact gate electrode faces the channel region and is connected to a word line. The word line extends in a first direction. A bit line is connected to the lower doped region and extends in a second direction. The semiconductor device further includes a string body connection portion that connects the channel region of at least two adjacent active pillars of the plurality of active pillars.
摘要:
According to example embodiments, a semiconductor device includes a plurality of active pillars protruding from a substrate. Each active pillar includes a channel region between upper and lower doped regions. A contact gate electrode faces the channel region and is connected to a word line. The word line extends in a first direction. A bit line is connected to the lower doped region and extends in a second direction. The semiconductor device further includes a string body connection portion that connects the channel region of at least two adjacent active pillars of the plurality of active pillars.
摘要:
Semiconductor devices having vertical channel transistors are provided. The semiconductor device includes an insulation layer on a substrate and a buried bit line on the insulation layer. The buried bit line extends in a first direction. An active pillar is disposed on the buried bit line. The active pillar includes a lower dopant region, a channel region having a first sidewall and an upper dopant region vertically stacked on the buried bit line. A contact gate electrode is disposed to be adjacent to the first sidewall of the channel region. A word line is electrically connected to the contact gate electrode. The word line extends in a second direction intersecting the first direction. A string body connector is electrically connected to the channel region. Related methods are also provided.
摘要:
A semiconductor memory device may include a common source region on a substrate, an active pattern between the substrate and the common source region, a gate pattern facing a sidewall of the active pattern, a gate dielectric pattern between the gate pattern and the active pattern, a variable resistance pattern between the common source region and the active pattern, and an interconnection line.