公开(公告)号：US20110172958A1

公开(公告)日：2011-07-14

申请号：US12687145

申请日：2010-01-14

申请人： Charles Archie ,  Andrew Brendler ,  Dmitriy Shneyder ,  Eric Solecky

发明人： Charles Archie ,  Andrew Brendler ,  Dmitriy Shneyder ,  Eric Solecky

IPC分类号： G06F15/00 ,  G06F17/18

CPC分类号： G05B23/0237

摘要： A method for monitoring a fleet comprising a plurality of measurement tools includes collecting data for a current time interval from the fleet by a data collection module; and performing fleet measurement precision (FMP)/tool matching precision (TMP) analysis on the collected data by a FMP/TMP analysis module, wherein FMP/TMP analysis comprises determining a TMP for each of the plurality of measurement tools using a static and a dynamic benchmark measuring system (BMS); and determining a FMP for the fleet using the static and the dynamic BMS; and determining if the FMP is above a predetermined threshold by a fleet improvement module, and in the event the FMP is above the predetermined threshold, identifying at least one tool of the plurality of tools as poorly performing based on the TMPs; and flagging the identified at least one tool for improvement.

摘要翻译： 一种用于监视包括多个测量工具的车队的方法，包括：通过数据采集模块从车队收集当前时间间隔的数据; 以及通过FMP / TMP分析模块对所收集的数据执行车队测量精度（FMP）/工具匹配精度（TMP）分析，其中FMP / TMP分析包括使用静态和静态的来确定多个测量工具中的每一个的TMP 动态基准测量系统（BMS）; 并使用静态和动态BMS确定船队的FMP; 以及通过车队改进模块确定所述FMP是否高于预定阈值，并且在所述FMP高于所述预定阈值的情况下，基于所述TMP将所述多个工具中的至少一个工具识别为差的性能; 并标记所识别的至少一个工具以进行改进。

公开(公告)号：US20070082417A1

公开(公告)日：2007-04-12

申请号：US11163229

申请日：2005-10-11

申请人： Alexander Martin ,  Eric Solecky

发明人： Alexander Martin ,  Eric Solecky

IPC分类号： H01L21/66 ,  G01R31/26

CPC分类号： H01L22/12

摘要： A method for reducing edge effect interference with critical dimension (CD) measurement of semiconductor via structures includes forming a test structure in a kerf region of a semiconductor wafer, the test structure including at least a via structure and a trench structure in contact with the via structure. The via structure is formed in accordance with a critical dimension associated with a corresponding via structure in a circuit region of the semiconductor wafer, and the trench structure is formed in accordance with a widened dimension with respect to a minimum ground rule dimension associated with a corresponding trench structure in a circuit region of the semiconductor wafer.

摘要翻译： 一种用于减少半导体通孔结构的临界尺寸（CD）测量的边缘效应干扰的方法包括在半导体晶片的切口区域中形成测试结构，测试结构至少包括通孔结构和与通孔接触的沟槽结构 结构体。 通孔结构根据与半导体晶片的电路区域中的对应的通孔结构相关联的临界尺寸形成，并且沟槽结构根据相对于与相应的相应的最小基准规则尺寸的加宽尺寸形成 半导体晶片的电路区域中的沟槽结构。

公开(公告)号：US20060293778A1

公开(公告)日：2006-12-28

申请号：US11407543

申请日：2006-04-19

申请人： Sarah Kay ,  Eric Solecky ,  Lin Zhou

发明人： Sarah Kay ,  Eric Solecky ,  Lin Zhou

IPC分类号： G06F19/00

CPC分类号： G05B19/41875 ,  G05B2219/32222 ,  G05B2219/45031 ,  Y02P90/20 ,  Y02P90/22

摘要： A method of identifying failures in a metrology tool system used to measure desired dimensions in microelectronic features. Each metrology tool in the system runs a plurality of recipes for measuring desired dimensions in microelectronic features, with each recipe comprising a set of instructions for measuring at least one dimension in a microelectronic feature. The system includes an error log having stored thereon failures in measurement of microelectronic feature dimensions. The method includes determining normalized number of errors for the recipes used by the metrology tool from the failures stored in the error log, identifying one or more recipes having the greatest normalized number of errors in the error log, identifying, in a list of jobs to be performed by the metrology tool, the one or more identified recipes having the greatest normalized number of errors, and from the identified one or more recipes having the greatest normalized number of errors, determining the cause of the errors in the one or more recipes. The method then includes effecting a change in the one or more identified recipes having the greatest normalized number of errors to correct the errors therein and tracking a metrology tool job having the one or more recipes in which a change has been effected to determine whether the cause of errors has been corrected.

公开(公告)号：US20070192056A1

公开(公告)日：2007-08-16

申请号：US11307640

申请日：2006-02-15

申请人： Ejaj Ahmed ,  Charles Archie ,  Stephen Goodrich ,  Eric Solecky ,  Georgios Vakas ,  Erwin Weissmann ,  Lin Zhou

发明人： Ejaj Ahmed ,  Charles Archie ,  Stephen Goodrich ,  Eric Solecky ,  Georgios Vakas ,  Erwin Weissmann ,  Lin Zhou

IPC分类号： G06F15/00

CPC分类号： G05B19/41865 ,  G05B2219/31459 ,  G05B2219/45031 ,  Y02P90/20

摘要： A method of preparing recipes for operating a metrology tool, each recipe including a set of instructions for measuring dimensions in a microelectronic feature. A database includes a plurality of known instructions with best known methods for measuring different feature dimensions by creating a summary of a recipes used by the tool, and adding categorization attributes to identify the summary for retrieval from the database. There is provided a desired recipe having instructions for measuring desired dimensions, including a summary of parameters relating to tool function for the feature dimension to be measured. The method includes comparing the instructions in the desired recipe with the instructions in the database, identifying differences there between, modifying the desired recipe instructions to conform to the database instructions, verifying the desired recipe prior to using the modified desired recipe by the tool, and using the desired recipe to execute a feature measurement on the tool.

摘要翻译： 一种制备用于操作计量工具的配方的方法，每个配方包括用于测量微电子特征中的尺寸的一组指令。 数据库包括多个已知指令，其具有用于通过创建工具使用的配方的摘要来测量不同特征尺寸的最为已知的方法，并且添加分类属性以识别用于从数据库检索的摘要。 提供了具有用于测量所需尺寸的指令的期望配方，包括与要测量的特征尺寸的工具功能相关的参数的总结。 该方法包括将所需配方中的指令与数据库中的指令进行比较，识别其间的差异，修改所需配方指令以符合数据库指令，在使用工具进行修改的所需配方之前验证所需的配方;以及 使用所需的配方在工具上执行功能测量。

公开(公告)号：US20080033692A1

公开(公告)日：2008-02-07

申请号：US11865797

申请日：2007-10-02

申请人： Charles Archie ,  George Banke ,  Eric Solecky

发明人： Charles Archie ,  George Banke ,  Eric Solecky

IPC分类号： G06F17/18

CPC分类号： G03F7/70516 ,  G01D18/00 ,  G03F7/70616

摘要： Methods, systems and program products are disclosed for determining whether a measurement system under test (MSUT) matches a fleet including at least one other measurement system. The invention implements realistic parameters for analyzing a matching problem including single tool precision, tool-to-tool non-linearities and tool-to-tool offsets. A bottom-line tool matching precision metric that combines these parameters into a single value is then implemented. The invention also includes methods for determining a root cause of a matching problem, and for determining a fleet measurement precision metric.

摘要翻译： 公开了方法，系统和程序产品，用于确定被测量的测量系统（MSUT）是否匹配包括至少一个其他测量系统的机组。 本发明实现了用于分析匹配问题的现实参数，包括单个刀具精度，刀具对刀具非线性和刀具到刀具补偿。 然后实现将这些参数组合成单个值的底线工具匹配精度度量。 本发明还包括用于确定匹配问题的根本原因以及用于确定船队测量精度度量的方法。

公开(公告)号：US20060259279A1

公开(公告)日：2006-11-16

申请号：US10908422

申请日：2005-05-11

申请人： Javier Ayala ,  Marc Postiglione ,  Eric Solecky

发明人： Javier Ayala ,  Marc Postiglione ,  Eric Solecky

IPC分类号： G06F15/00

CPC分类号： G05B19/41875 ,  G05B2219/31459 ,  G05B2219/45031 ,  Y02P90/20 ,  Y02P90/22

摘要： A system and method for optimizing and implementing a metrology sampling plan. A system is provided that includes a system for collecting historical metrology data from a metrology tool; and a reduction analysis system that compares an initial capability calculated from the historical metrology data with a recalculated capability for a reduced data set, wherein the reduced data set is obtained by removing a subset of data from the historical metrology data.

摘要翻译： 一种优化和实施计量抽样计划的系统和方法。 提供了一种系统，其包括用于从计量工具收集历史计量数据的系统; 以及减少分析系统，其将从历史计量数据计算的初始能力与用于简化数据集的重新计算的能力进行比较，其中通过从历史计量数据中去除数据子集来获得所述简化数据集。

公开(公告)号：US20060252197A1

公开(公告)日：2006-11-09

申请号：US11482419

申请日：2006-07-07

申请人： Bachir Dirahoui ,  Renee Mo ,  Ravikumar Ramachandran ,  Eric Solecky

发明人： Bachir Dirahoui ,  Renee Mo ,  Ravikumar Ramachandran ,  Eric Solecky

IPC分类号： H01L21/8238

CPC分类号： H01L22/12

摘要： A process implementing steps for determining encroachment of a spacer structure in a semiconductor device having thick and thin spacer regions, including a transition region formed therebetween. The method steps comprise: obtaining a line width roughness (LWR) measurement at at least one location along each thick, thin and transition spacer regions; determining a threshold LWR measurement value based on the LWR measurements; defining a region of interest (ROI) and obtaining a further LWR measurement in the ROI; comparing the LWR measurement in the ROI against the threshold LWR measurement value; and, notifying a user that either encroachment of the spacer structure is present when the LWR measurement in the ROI is below the threshold LWR measurement value, or that no encroachment of the spacer structure is present when the LWR measurement in the ROI is above the threshold LWR measurement value.

公开(公告)号：US08467993B2

公开(公告)日：2013-06-18

申请号：US12687145

申请日：2010-01-14

申请人： Charles Archie ,  Andrew Brendler ,  Dmitriy Shneyder ,  Eric Solecky

发明人： Charles Archie ,  Andrew Brendler ,  Dmitriy Shneyder ,  Eric Solecky

IPC分类号： G06F17/18 ,  G06F19/00

CPC分类号： G05B23/0237

摘要： A method for monitoring a fleet comprising a plurality of measurement tools includes collecting data for a current time interval from the fleet by a data collection module; and performing fleet measurement precision (FMP)/tool matching precision (TMP) analysis on the collected data by a FMP/TMP analysis module, wherein FMP/TMP analysis comprises determining a TMP for each of the plurality of measurement tools using a static and a dynamic benchmark measuring system (BMS); and determining a FMP for the fleet using the static and the dynamic BMS; and determining if the FMP is above a predetermined threshold by a fleet improvement module, and in the event the FMP is above the predetermined threshold, identifying at least one tool of the plurality of tools as poorly performing based on the TMPs; and flagging the identified at least one tool for improvement.

摘要翻译： 一种用于监视包括多个测量工具的车队的方法，包括：通过数据采集模块从车队收集当前时间间隔的数据; 以及通过FMP / TMP分析模块对所收集的数据执行车队测量精度（FMP）/工具匹配精度（TMP）分析，其中FMP / TMP分析包括使用静态和静态的来确定多个测量工具中的每一个的TMP 动态基准测量系统（BMS）; 并使用静态和动态BMS确定船队的FMP; 以及通过车队改进模块确定所述FMP是否高于预定阈值，并且在所述FMP高于所述预定阈值的情况下，基于所述TMP将所述多个工具中的至少一个工具识别为差的性能; 并标记所识别的至少一个工具以进行改进。

公开(公告)号：US20080065696A1

公开(公告)日：2008-03-13

申请号：US11936971

申请日：2007-11-08

申请人： Ejaj Ahmed ,  Charles Archie ,  Stephen Goodrich ,  Eric Solecky ,  Georgios Vakas ,  Erwin Weissman ,  Lin Zhou

发明人： Ejaj Ahmed ,  Charles Archie ,  Stephen Goodrich ,  Eric Solecky ,  Georgios Vakas ,  Erwin Weissman ,  Lin Zhou

IPC分类号： G06F17/30 ,  G06F19/00

CPC分类号： G05B19/41865 ,  G05B2219/31459 ,  G05B2219/45031 ,  Y02P90/20

摘要： A method of preparing recipes for operating a metrology tool, wherein each recipe comprises a set of instructions for measuring at least one dimension in a microelectronic feature. A database includes a plurality of known instructions with best known methods for measuring different dimensions in a microelectronic feature by creating a summary of a recipes used by the metrology tool, and adding to the summary categorization attributes to identify the recipe summary for retrieval from the database. There is provided a desired recipe having instructions for measuring one or more desired dimensions, the desired recipe or portion thereof including a summary of parameters relating to metrology tool function with respect to the microelectronic feature dimension to be measured. The method includes comparing the instructions in the desired recipe with the instructions in the database, identifying differences between the instructions in the desired recipe and the instructions in the database, modifying the instructions in the desired recipe to conform to the instructions in the database, Verifying the desired recipe prior to using the modified desired recipe by the metrology tool, and using the desired recipe to execute a microelectronic feature measurement on the metrology tool.

摘要翻译： 一种制备用于操作计量工具的配方的方法，其中每个配方包括用于测量微电子特征中的至少一个维度的一组指令。 数据库包括多个已知的指令，其具有用于通过创建由计量工具使用的配方的概要来测量微电子特征中的不同维度的最为已知的方法，并且添加到摘要分类属性以识别用于从数据库检索的配方摘要 。 提供了具有用于测量一个或多个期望尺寸的指令的期望配方，所需的配方或其部分包括与待测量的微电子特征尺寸有关的计量工具功能的参数的总结。 该方法包括将所需配方中的指令与数据库中的指令进行比较，识别所需配方中的指令与数据库中的指令之间的差异，修改所需配方中的指令以符合数据库中的指令，验证 在由计量工具使用修改的所需配方之前使用期望的配方，并且使用期望的配方在计量工具上执行微电子特征测量。

公开(公告)号：US20070192049A1

公开(公告)日：2007-08-16

申请号：US11307641

申请日：2006-02-15

申请人： Charles Archie ,  George Banke ,  Eric Solecky

发明人： Charles Archie ,  George Banke ,  Eric Solecky

IPC分类号： G01R35/00 ,  G06F19/00

CPC分类号： G01D18/00

摘要： Optimizing a measurement system under test (MSUT) is disclosed. In one embodiment, a method includes selecting a first set of adjustable parameters of the MSUT that affect a quality metric for the MSUT, calculating the quality metric over a range of values of each adjustable parameter in the first set of adjustable parameters, generating a first multidimensional response space based on the calculating step, and determining which value of each adjustable parameter optimizes the quality metric based on the first multidimensional response space. The multidimensional response space may be stored for later recall for other optimization exercises.

摘要翻译： 公开了优化测试系统（MSUT）。 在一个实施例中，一种方法包括：选择影响MSUT的质量度量的MSUT的第一组可调参数，在第一组可调参数中的每个可调参数的值的范围内计算质量度量，生成第一 基于所述计算步骤的多维响应空间，以及基于所述第一多维响应空间来确定每个可调参数的哪个值优化所述质量度量。 可以存储多维响应空间用于以后的召回用于其他优化练习。