摘要:
A process for the production of a protective layer or a relief image on a substrate, wherein a radiation-sensitive layer, consisting of a solid film-forming epoxy resin containing a photoinitiator, which can be activated by radiation, for the polyaddition reaction, is transferred from a support to a substrate, then exposed directly or under a photomask and hardened by the action of heat, after which, if appropriate, the unexposed parts are developed with a solvent. The process is suitable, for example, for the production of printed circuits, solder resist masks and offset printing plates.
摘要:
Thioxanthone carboxylic acid esters, thioesters and amides with reactive functional groups of the formula ##STR1## in which X, Y, Z, n and Q are as defined in the patent claim and Q is, for example, --OCH.dbd.CH.sub.2, --OCH.sub.2 CH.dbd.CH.sub.2, --SCH.sub.2 CH.dbd.CH.sub.2 or --NHCH.sub.2 CH.dbd.CH.sub.2 (n=1), --OH, --SH, --NH.sub.2, --COOH, --COCl or --OCO--C(R").dbd.CH.sub.2, in which R" is methyl or hydrogen (n=2), are suitable for the preparation of polymers with thioxanthone radicals in side chains. The compounds (I) and also the polymers which can be prepared therefrom can be employed as sensitizers for photocrosslinkable polymers or as initiators, if desired in a mixture with amines, for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefines.
摘要:
Novel tetrasubstituted phthalic acid derivatives of the formula ##STR1## are described, in which Y.sub.1 and Y.sub.2 are oxygen and Y is ##STR2## or --O--, or one of Y.sub.1 and Y.sub.2 is oxygen and the other is .dbd.N--R" and Y is --O--, and m, n, X, R, R' and R" are as defined in claim 1. The compounds (I) are suitable as sensitizers for photocrosslinkable polymers or as initiators for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefins.
摘要:
Thioxanthonecarboxylic acid esters, thioesters or amides of the formula I ##STR1## in which X and Z are hydrogen or one of the substituents defined in more detail in claim 1 and Y is --OR.sub.1, --SR.sub.1 or --N(R.sub.1)(R.sub.2), in which R.sub.1 is C.sub.1-24 alkyl and R.sub.2 is H or R.sub.1, are suitable, if desired together with amines, as initiators for the photopolymerization of ethylenically unsaturated compounds or for photochemical crosslinking of polyolefines. They are also used an sensitizers for photocrosslinkable polymers. They can be prepared by methods known per se, for example by cyclization of phenylthio-phthalic, -isophthalic or -terephthalic acids, which can be correspondingly substituted, and subsequent reaction with suitable alcohols, thiols or amines.
摘要:
A draw roller for pulling web-shaped material with at least one pull ring arranged on at least one part of the circumference of the roller. The at least one pull ring can be displaced on the draw roller.
摘要:
A hardenable composition containing:a) a material polymerizable by free radical or cationic polymerization,b) at least one iron compound of the formula I ##EQU1## wherein a is 1 or 2 and q is 1, 2 or 3,L is a divalent to heptavalent metal or non-metal,Q is a halogen atom,m is an integer corresponding to the sum of the values of L and q,R.sup.1 is an unsubstituted or substituted .eta..sup.6 -benzene andR.sup.2 is an unsubstituted or substituted cyclopentadienyl anion, andc) at least one sensitizer for the compound of the formula I,and, in the case of materials polymerizable by free radical polymerization, also d) an electron acceptor as an oxidizing agent, which is also advantageously used concomitantly for the material polymerizable by cationic polymerization. The composition is suitable for the production of protective layers and photographic images.
摘要:
Anhydrides of formula V ##STR1## where A" is --OCH.sub.2 -- with the oxygen atom bonded to the aromatic ring and R and R.sub.1 independently of one another are hydrogen, halogen, alkyl having 1 to 4 carbon atoms or methoxy are valuable intermediates for the preparation of tricyclic imidyl derivatives. These imidyl derivatives form photocrosslinkable polymers useful for making printing plates and photoresists.
摘要:
Novel tricyclic imidyl derivatives, for example those of the formula ##STR1## [n=1 or 2, Y=a bridge member and X=a functional group] are described. The novel tricyclic imidyl derivatives are suitable for the preparation of photocrosslinkable polymers by incorporation into existing polymer chains or by building up the polymer chain from tricyclic imidyl derivatives, according to the definition, with suitable functional groups X by polymerization or polycondensation. The photocrosslinkable polymers obtained by this means can be used, for example, to produce printing plates for the offset printing process and especially as pohtoresists.
摘要:
Photo-crosslinkable, novel polymers with side tricyclic imidyl groups, for example those of the formula ##STR1## are described. The novel photo-crosslinkable polymers are suitable for photo-mechanical applications, for example for the production of printing plates for the offset printing process and especially as photo-resists. They have high UV absorption and ensure a high rate of crosslinking even without the addition of photosensitizers.
摘要:
Novel tricyclic imidyl derivatives, for example those of the formula ##STR1## [n=1 or 2, Y=a bridge member and X=a functional group] are described. The novel tricyclic imidyl derivatives are suitable for the preparation of photocrosslinkable polymers by incorporation into existing polymer chains or by building up the polymer chain from tricyclic imidyl derivatives, according to the definition, with suitable functional groups X by polymerization or polycondensation. The photocrosslinkable polymers obtained by this means can be used, for example, to produce printing plates for the offset printing process and especially as photoresists.