公开(公告)号：US5587060A

公开(公告)日：1996-12-24

申请号：US527206

申请日：1995-09-12

申请人： Naoki Abe ,  Koji Mizuno ,  Masayuki Sumiyoshi ,  Katsuya Murakami ,  Kojiro Murayama ,  Koichi Sugiura ,  Fumio Kawahara ,  Mitsuru Tomono ,  Heijiro Ojima

发明人： Naoki Abe ,  Koji Mizuno ,  Masayuki Sumiyoshi ,  Katsuya Murakami ,  Kojiro Murayama ,  Koichi Sugiura ,  Fumio Kawahara ,  Mitsuru Tomono ,  Heijiro Ojima

IPC分类号： B01D21/01 ,  B01D17/06 ,  B01D21/00 ,  B01D21/28 ,  B01F17/00 ,  B01F17/22 ,  B01F17/38 ,  B01F17/42 ,  B03C5/00 ,  B03C5/02 ,  C02F1/465 ,  C02F1/48 ,  C02F1/68 ,  C02F9/00 ,  C09K3/00 ,  C22B3/02 ,  C22B3/20 ,  C22B3/44

CPC分类号： B01D21/283 ,  B01D17/06 ,  B01D21/0009 ,  B01D21/0018 ,  B01D21/01 ,  B01D21/2433 ,  B01F17/0042 ,  B01F17/0057 ,  C02F1/465 ,  C02F1/487 ,  C02F1/547 ,  C02F1/683 ,  C02F9/00 ,  C22B3/02 ,  C22B3/205 ,  C22B3/44 ,  C02F2101/20 ,  C02F2305/04 ,  Y02P10/234 ,  Y10S204/13

摘要： Disclosed herein is a technique of removing metal contained in a solution through chelation, which makes it possible to preclude undesired aggregation and permit effective aggregation through an aggregating process. A surface active agent containing a hydrophobic group, a hydrophilic group and a chelating group is added to the solution to be processed, and subsequently an aggregating process is carried out. The chelating group chelates metal, the hydrophilic group prevents undesired aggregation, and the hydrophobic group is effectively aggregated in the aggregating process. Various uses are possible by selecting the charge of ligand.

摘要翻译： 本文公开了通过螯合除去溶液中所含金属的技术，这使得可以排除不期望的聚集并允许通过聚集过程的有效聚集。 将含有疏水基团，亲水基团和螯合基团的表面活性剂加入待处理的溶液中，随后进行聚集过程。 螯合基团螯合金属，亲水基团防止不希望的聚集，并且疏水基团在聚集过程中有效聚集。 可以通过选择配体的电荷来进行各种用途。

公开(公告)号：US06852678B2

公开(公告)日：2005-02-08

申请号：US09988401

申请日：2001-11-19

申请人： Heijiro Ojima ,  Masahiko Takeuchi ,  Fumio Ikesue ,  Noritoshi Kaskimura ,  Fumio Kawahara ,  Mitsuru Tomono

发明人： Heijiro Ojima ,  Masahiko Takeuchi ,  Fumio Ikesue ,  Noritoshi Kaskimura ,  Fumio Kawahara ,  Mitsuru Tomono

IPC分类号： C10M135/18 ,  C10M159/18 ,  C10M173/02 ,  C01M135/00

CPC分类号： C10M159/18 ,  C10M135/18 ,  C10M173/02 ,  C10M2201/02 ,  C10M2207/09 ,  C10M2219/068 ,  C10M2227/09 ,  C10N2210/02 ,  C10N2210/04 ,  C10N2210/05 ,  C10N2210/06 ,  C10N2210/07 ,  C10N2210/08 ,  C10N2240/40 ,  C10N2240/402 ,  C10N2240/403 ,  C10N2240/404 ,  C10N2240/405 ,  C10N2240/406 ,  C10N2240/407 ,  C10N2240/408 ,  C10N2240/409 ,  C10N2250/02

摘要： An aqueous lubricant is provided which by simple application onto metal surfaces forms lubricating films required for heavy working of metals, and which contains no oil. The aqueous lubricant is prepared by suspending or dispersing a metal chelate compound in water with a surfactant or the like. The metal chelate compound has a polydentate or multidentate chelate ligand, in which at least one of the coordinating atoms is sulfur, coordinated to the coordination site of at least one metal species selected from among zinc, manganese, iron, molybdenum, tin and antimony. When applied onto metal surfaces, the aqueous lubricant forms effective lubricating films on the metal surfaces. The lubricating films contain sulfur as coordinating atoms and therefore, extreme pressure produces sulfur radicals through decomposition by tribo-chemical reactions. The sulfur radicals are highly reactive and react rapidly with the metal surface to produce metal sulfides with a lubricating effect. The sulfur radicals also react with metal ions produced by decomposition of the metal chelate compound, also producing metal sulfides with a lubricating effect. The aqueous lubricants thus exhibit a satisfactory lubricating effect.

摘要翻译： 提供了一种水性润滑剂，其通过简单地施加到金属表面上形成金属重加工所需的润滑膜，并且不含油。 通过用表面活性剂等将金属螯合物悬浮或分散在水中来制备水性润滑剂。 金属螯合物具有多齿或多齿螯合配体，其中至少一个配位原子是硫，与选自锌，锰，铁，钼，锡和锑中的至少一种金属物质的配位部位配位。 当应用于金属表面时，水性润滑剂在金属表面上形成有效的润滑膜。 润滑膜含有硫作为配位原子，因此极压通过摩擦化学反应分解产生硫自由基。 硫自由基具有高反应性，并与金属表面迅速反应，产生具有润滑作用的金属硫化物。 硫自由基也与由金属螯合物分解产生的金属离子反应，同时也产生具有润滑作用的金属硫化物。 因此，含水润滑剂表现出令人满意的润滑效果。

公开(公告)号：US06858568B2

公开(公告)日：2005-02-22

申请号：US09990857

申请日：2001-11-15

申请人： Heijiro Ojima ,  Fumio Kawahara ,  Mitsuru Tomono

发明人： Heijiro Ojima ,  Fumio Kawahara ,  Mitsuru Tomono

IPC分类号： C10M107/54 ,  C10M159/18 ,  C10M173/02 ,  C10N10/02 ,  C10N10/04 ,  C10N10/08 ,  C10N10/10 ,  C10N10/12 ,  C10N10/14 ,  C10N10/16 ,  C10N40/24 ,  C07F3/06

CPC分类号： C10M173/02 ,  C10M159/18

摘要： Lubricants are taught that can quickly and easily form a lubricating layer on a metal surface of a metal before plastic processing. Such lubricants preferably include a primary lubricating agent or component having a bridge complex that satisfies the following conditions: (1) the complex contains at least two central metal atoms; (2) at least one first multidentate ligand forms a bridge between two central metal atoms; and (3) at least one second multidentate ligand is bound to at least one central metal atom and has at least one coordinating atom that can coordinate with metal atoms, but which is not coordinated with any of the central metal atoms or is only partially coordinated with at least one of those central metal atoms. A third multidentate ligand is preferably also bound to one of the central metal atoms and may preferably include at least two sulfur atoms that are coordinated to the central metal atom.

摘要翻译： 教导了在塑料加工之前可以快速且容易地在金属的金属表面上形成润滑层的润滑剂。 这种润滑剂优选包括具有满足以下条件的桥络合物的主要润滑剂或组分：（1）所述络合物含有至少两个中心金属原子; （2）至少一个第一多齿配体在两个中心金属原子之间形成桥; 和（3）至少一个第二多齿配体结合至少一个中心金属原子并且具有至少一个可与金属原子配位的配位原子，但不与任何中心金属原子配位或仅部分协调 与至少一个这些中心金属原子。 第三多齿配体优选还与一个中心金属原子结合，并且可以优选包括与中心金属原子配位的至少两个硫原子。

公开(公告)号：US5665243A

公开(公告)日：1997-09-09

申请号：US705674

申请日：1996-08-30

申请人： Naoki Abe ,  Koji Mizuno ,  Masayuki Sumiyoshi ,  Katsuya Murakami ,  Kojiro Murayama ,  Koichi Sugiura ,  Fumio Kawahara ,  Mitsuru Tomoto ,  Heijiro Ojima

发明人： Naoki Abe ,  Koji Mizuno ,  Masayuki Sumiyoshi ,  Katsuya Murakami ,  Kojiro Murayama ,  Koichi Sugiura ,  Fumio Kawahara ,  Mitsuru Tomoto ,  Heijiro Ojima

IPC分类号： B01D21/01 ,  B01D17/06 ,  B01D21/00 ,  B01D21/28 ,  B01F17/00 ,  B01F17/22 ,  B01F17/38 ,  B01F17/42 ,  B03C5/00 ,  B03C5/02 ,  C02F1/465 ,  C02F1/48 ,  C02F1/68 ,  C02F9/00 ,  C09K3/00 ,  C22B3/02 ,  C22B3/20 ,  C22B3/44 ,  C02F5/10

CPC分类号： B01D21/283 ,  B01D17/06 ,  B01D21/0009 ,  B01D21/0018 ,  B01D21/01 ,  B01D21/2433 ,  B01F17/0042 ,  B01F17/0057 ,  C02F1/465 ,  C02F1/487 ,  C02F1/547 ,  C02F1/683 ,  C02F9/00 ,  C22B3/02 ,  C22B3/205 ,  C22B3/44 ,  C02F2101/20 ,  C02F2305/04 ,  Y02P10/234 ,  Y10S204/13

摘要： Disclosed herein is a technique of removing metal contained in a solution through chelation, which makes it possible to preclude undesired aggregation and permit effective aggregation through an aggregating process. A surface active agent containing a hydrophobic group, a hydrophilic group and a chelating group is added to the solution to be processed, and subsequently an aggregating process is carried out. The chelating group chelates metal, the hydrophilic group prevents undesired aggregation, and the hydrophobic group is effectively aggregated in the aggregating process. Various uses are possible by selecting the charge of ligand.

摘要翻译： 本文公开了通过螯合除去溶液中所含金属的技术，这使得可以排除不期望的聚集并允许通过聚集过程的有效聚集。 将含有疏水基团，亲水基团和螯合基团的表面活性剂加入待处理的溶液中，随后进行聚集过程。 螯合基团螯合金属，亲水基团防止不希望的聚集，并且疏水基团在聚集过程中有效聚集。 可以通过选择配体的电荷来进行各种用途。

公开(公告)号：US5650056A

公开(公告)日：1997-07-22

申请号：US705675

申请日：1996-08-30

申请人： Naoki Abe ,  Koji Mizuno ,  Masayuki Sumiyoshi ,  Katsuya Murakami ,  Kojiro Murayama ,  Koichi Sugiura ,  Fumio Kawahara ,  Mitsuru Tomono ,  Heijiro Ojima

发明人： Naoki Abe ,  Koji Mizuno ,  Masayuki Sumiyoshi ,  Katsuya Murakami ,  Kojiro Murayama ,  Koichi Sugiura ,  Fumio Kawahara ,  Mitsuru Tomono ,  Heijiro Ojima

IPC分类号： B01D21/01 ,  B01D17/06 ,  B01D21/00 ,  B01D21/28 ,  B01F17/00 ,  B01F17/22 ,  B01F17/38 ,  B01F17/42 ,  B03C5/00 ,  B03C5/02 ,  C02F1/465 ,  C02F1/48 ,  C02F1/68 ,  C02F9/00 ,  C09K3/00 ,  C22B3/02 ,  C22B3/20 ,  C22B3/44 ,  C25B9/00 ,  C25B15/00

CPC分类号： B01D21/283 ,  B01D17/06 ,  B01D21/0009 ,  B01D21/0018 ,  B01D21/01 ,  B01D21/2433 ,  B01F17/0042 ,  B01F17/0057 ,  C02F1/465 ,  C02F1/487 ,  C02F1/547 ,  C02F1/683 ,  C02F9/00 ,  C22B3/02 ,  C22B3/205 ,  C22B3/44 ,  C02F2101/20 ,  C02F2305/04 ,  Y02P10/234 ,  Y10S204/13

摘要： An apparatus for removing metal contained in a solution through chelation which includes a means for adding a surface active agent containing a hydrophobic group, a hydrophilic group and a chelating group to a metal containing solution held within a metal solution accommodating means. An electric field applying means is adapted to apply an electric field to the solution containing means and further means is provided for separating an aggregate from the metal contained solution.

摘要翻译： 一种通过螯合除去包含在溶液中的金属的装置，其包括将含有疏水基团，亲水基团和螯合基团的表面活性剂添加到保持在金属溶液容纳装置内的含金属溶液的装置。 电场施加装置适于将电场施加到溶液容纳装置，并且提供另外的装置用于从聚集的金属溶液中分离聚集体。