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    Cushioning Material for a Polishing Pad
    1.
    发明申请
    Cushioning Material for a Polishing Pad 有权
    抛光垫用缓冲材料

    公开(公告)号：US20090011221A1

    公开(公告)日：2009-01-08

    申请号：US11815900

    申请日：2006-02-10

    申请人： Hiromasa Kawaguchi ,  Toshiaki Kimura ,  Takeshi Kawakami

    发明人： Hiromasa Kawaguchi ,  Toshiaki Kimura ,  Takeshi Kawakami

    IPC分类号： C08J9/35 ,  B32B3/26

    CPC分类号： B24B37/24 ,  Y10T428/249989 ,  Y10T428/249991 ,  Y10T428/249992

    摘要： Disclosed is a cushioning material for a polishing pad, which hardly suffers swelling deformation caused by water because it is extremely low in water-absorbing characteristics and water-swelling characteristics. The cushioning material for a polishing pad includes a polyurethane foam capable of polishing even a semiconductor wafer having an undulated surface or a wafer having a local step that is formed during circuit forming process so that the undulation or step becomes smaller by uniformly polishing an entire surface of the wafer along the undulation or step. The cushioning material for a polishing pad is characterized by including a polyurethane foam obtained by reacting polyol and polyisocyanate with each other, the polyurethane foam having a contact angle with water of 90° or more. The polyurethane foam is preferably made by using hydrophobic polyol, and preferably has a self-skin layer formed thereon.

    摘要翻译： 公开了一种用于抛光垫的缓冲材料，由于其吸水特性和水溶胀特性极低，几乎不会由于水引起的溶胀变形。 用于抛光垫的缓冲材料包括能够抛光甚至具有波状表面的半导体晶片的聚氨酯泡沫或具有在电路形成过程期间形成的局部台阶的晶片，从而通过均匀抛光整个表面使波动或阶梯变小 沿着起伏或阶跃的晶片。 用于抛光垫的缓冲材料的特征在于包括通过使多元醇和多异氰酸酯彼此反应获得的聚氨酯泡沫，聚氨酯泡沫与水的接触角为90°以上。 聚氨酯泡沫优选通过使用疏水性多元醇制成，优选在其上形成自体表层。

    Cushioning material for a polishing pad
    2.
    发明授权
    Cushioning material for a polishing pad 有权
    用于抛光垫的缓冲材料

    公开(公告)号：US07749599B2

    公开(公告)日：2010-07-06

    申请号：US11815900

    申请日：2006-02-10

    申请人： Hiromasa Kawaguchi ,  Toshiaki Kimura ,  Takeshi Kawakami

    发明人： Hiromasa Kawaguchi ,  Toshiaki Kimura ,  Takeshi Kawakami

    IPC分类号： B32B27/08 ,  B32B5/20

    CPC分类号： B24B37/24 ,  Y10T428/249989 ,  Y10T428/249991 ,  Y10T428/249992

    摘要： Disclosed is a cushioning material for a polishing pad, which hardly suffers swelling deformation caused by water because it is extremely low in water-absorbing characteristics and water-swelling characteristics. The cushioning material for a polishing pad includes a polyurethane foam capable of polishing even a semiconductor wafer having an undulated surface or a wafer having a local step that is formed during circuit forming process so that the undulation or step becomes smaller by uniformly polishing an entire surface of the wafer along the undulation or step. The cushioning material for a polishing pad is characterized by including a polyurethane foam obtained by reacting polyol and polyisocyanate with each other, the polyurethane foam having a contact angle with water of 90° or more. The polyurethane foam is preferably made by using hydrophobic polyol, and preferably has a self-skin layer formed thereon.

    摘要翻译： 公开了一种用于抛光垫的缓冲材料，由于其吸水特性和水溶胀特性极低，几乎不会由于水引起的溶胀变形。 用于抛光垫的缓冲材料包括能够抛光甚至具有波状表面的半导体晶片的聚氨酯泡沫或具有在电路形成过程期间形成的局部台阶的晶片，从而通过均匀抛光整个表面使波动或阶梯变小 沿着起伏或阶跃的晶片。 用于抛光垫的缓冲材料的特征在于包括通过使多元醇和多异氰酸酯彼此反应获得的聚氨酯泡沫，聚氨酯泡沫与水的接触角为90°以上。 聚氨酯泡沫优选通过使用疏水性多元醇制成，优选在其上形成自体表层。

    Flexographic printing plate mounting sheet
    5.
    发明授权
    Flexographic printing plate mounting sheet 失效
    柔版印版安装板

    公开(公告)号：US06948429B2

    公开(公告)日：2005-09-27

    申请号：US10793473

    申请日：2004-03-04

    申请人： Hiromasa Kawaguchi ,  Hideo Ikoma ,  Takako Yuzawa

    发明人： Hiromasa Kawaguchi ,  Hideo Ikoma ,  Takako Yuzawa

    IPC分类号： B32B5/18 ,  B32B27/36 ,  B32B27/40 ,  B41F27/12 ,  B41N6/00 ,  B41N1/00

    CPC分类号： B41F27/1275 ,  B41N6/02

    摘要： A flexographic printing plate mounting sheet is provided which improves the printing accuracy by its high level of thickness accuracy and ease of installation in the correct position, which makes it possible to peel a flexographic printing plate off without damaging a foamed substrate, and which maintains appropriate cushioning properties. The foamed substrate of the flexographic printing plate mounting sheet has an adhesive layer on one side and a polyethylene terephthalate film on the other side. The polyethylene terephthalate film has on its remaining side an adhesive layer that is protected by release paper. The foamed substrate and the polyethylene terephthalate film are unitarily formed. The foamed substrate is made of urethane foam having a density of 0.3 to 0.6 g/cm3. The polyethylene terephthalate film is 12 to 50 μm in thickness.

    摘要翻译： 提供了一种柔性印版安装片，其通过其高水平的厚度精度和易于安装在正确位置来提高打印精度，这使得可以剥离柔版印刷版而不损坏发泡基底，并且其保持适当 缓冲性能。 柔性版印版安装片的发泡基板在一侧具有粘合剂层，另一侧具有聚对苯二甲酸乙二醇酯膜。 聚对苯二甲酸乙二醇酯膜在其剩余侧上具有被剥离纸保护的粘合剂层。 发泡基材和聚对苯二甲酸乙二醇酯膜一体形成。 发泡基材由密度为0.3至0.6g / cm 3的聚氨酯泡沫制成。 聚对苯二甲酸乙二醇酯膜的厚度为12〜50μm。