公开(公告)号：US07409302B2

公开(公告)日：2008-08-05

申请号：US11226468

申请日：2005-09-15

申请人： Haico Victor Kok ,  Koen Kivits ,  Ron Van De Laak ,  Johannes Maria Kuiper ,  Gerbrand Van Der Zouw ,  Hoite Pieter Theodoor Tolsma

发明人： Haico Victor Kok ,  Koen Kivits ,  Ron Van De Laak ,  Johannes Maria Kuiper ,  Gerbrand Van Der Zouw ,  Hoite Pieter Theodoor Tolsma

IPC分类号： G01L7/00

CPC分类号： G03F7/70666 ,  G03F7/709 ,  G03F9/7096

摘要： The invention provides a method for determining vibration-related information by projecting an aerial image at an image position in a projection plane, mapping an intensity of the aerial image into an image map, the image map arranged for comprising values of coordinates of sampling locations and of the intensity sampled at each sampling location, and measuring intensity of the aerial image received through a slot pattern. The method further includes determining from the image map a detection position of a slope portion of the image map, at the detection position of the slope portion, measuring of a temporal intensity of the aerial image and measuring of relative positions of the slot pattern and the image position, the relative positions of the slot being measured as position-related data of the slot pattern and determining from the temporal intensity of the aerial image vibration-related information for said aerial image.

摘要翻译： 本发明提供了一种用于通过在投影平面中的图像位置处投射空中图像来确定振动相关信息的方法，将空间图像的强度映射到图像映射中，该图像映射被布置为包括采样位置的坐标值， 在每个采样位置采样的强度，以及测量通过槽模式接收的空间图像的强度。 该方法还包括从图像映射确定图像映射的斜率部分的检测位置，在斜率部分的检测位置处，测量空中图像的时间强度，以及测量狭槽图案的相对位置和 图像位置，将被测量的时隙的相对位置作为时隙图案的位置相关数据，并根据所述空间图像的空间图像振动相关信息的时间强度确定。

公开(公告)号：US20090051934A1

公开(公告)日：2009-02-26

申请号：US12216514

申请日：2008-07-07

申请人： Haico Victor Kok ,  Hoite Pieter Tolsma ,  Gerbrand Van Der Zouw ,  Koen Kivits ,  Ron Van De Laak ,  Johannes Maria Kuiper

发明人： Haico Victor Kok ,  Hoite Pieter Tolsma ,  Gerbrand Van Der Zouw ,  Koen Kivits ,  Ron Van De Laak ,  Johannes Maria Kuiper

IPC分类号： G01B11/14

CPC分类号： G03F7/70666 ,  G03F7/709 ,  G03F9/7096

摘要： The invention provides a method for determining vibration-related information by projecting an aerial image at an image position in a projection plane, mapping an intensity of the aerial image into an image map, the image map arranged for comprising values of coordinates of sampling locations and of the intensity sampled at each sampling location, and measuring intensity of the aerial image received through a slot pattern. The method further includes determining from the image map a detection position of a slope portion of the image map, at the detection position of the slope portion, measuring of a temporal intensity of the aerial image and measuring of relative positions of the slot pattern and the image position, the relative positions of the slot being measured as position-related data of the slot pattern and determining from the temporal intensity of the aerial image vibration-related information for said aerial image.

摘要翻译： 本发明提供了一种用于通过在投影平面中的图像位置处投射空中图像来确定振动相关信息的方法，将空间图像的强度映射到图像映射中，该图像映射被布置为包括采样位置的坐标值， 在每个采样位置采样的强度，以及测量通过槽模式接收的空间图像的强度。 该方法还包括从图像映射确定图像映射的斜率部分的检测位置，在斜率部分的检测位置处，测量空中图像的时间强度，以及测量狭槽图案的相对位置和 图像位置，将被测量的时隙的相对位置作为时隙图案的位置相关数据，并根据所述空间图像的空间图像振动相关信息的时间强度确定。

公开(公告)号：US20110178785A1

公开(公告)日：2011-07-21

申请号：US12973248

申请日：2010-12-20

申请人： Patricius Aloysius Jacobus TINNEMANS ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

发明人： Patricius Aloysius Jacobus TINNEMANS ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

IPC分类号： G06F17/10

CPC分类号： G01N21/93 ,  G01N21/4785 ,  G01N21/4788

摘要： Calibration of an angularly resolved scatterometer is performed by measuring a target in two or more different arrangements. The different arrangements cause radiation being measured in an outgoing direction to be different combinations of radiation illuminating the target from ingoing directions. A reference mirror measurement may also be performed. The measurements and modeling of the difference between the first and second arrangements is used to estimate separately properties of the ingoing and outgoing optical systems. The modeling may account for symmetry of the respective periodic target. The modeling typically accounts for polarizing effects of the ingoing optical elements, the outgoing optical elements and the respective periodic target. The polarizing effects may be described in the modeling by Jones calculus or Mueller calculus. The modeling may include a parameterization in terms of basis functions such as Zernike polynomials.

摘要翻译： 角度分辨散射仪的校准是通过以两种或多种不同布置测量目标进行的。 不同的布置导致在输出方向上测量的辐射是将目标与入射方向照射的辐射的不同组合。 还可以执行参考镜测量。 使用第一和第二布置之间的差异的测量和建模来分别估计输入和输出光学系统的特性。 建模可以考虑相应周期性目标的对称性。 该模型通常考虑入射光学元件，输出光学元件和相应周期性靶的偏振效应。 极化效应可以在由琼斯微积分或米勒微积分建模中描述。 该建模可以包括基于诸如Zernike多项式的基函数的参数化。

公开(公告)号：US06891598B2

公开(公告)日：2005-05-10

申请号：US10776640

申请日：2004-02-12

申请人： Gerbrand Van Der Zouw

发明人： Gerbrand Van Der Zouw

IPC分类号： G03F9/00 ,  H01L21/027 ,  G03B27/54 ,  G03B27/42

CPC分类号： G03F9/7088 ,  G03F9/7034 ,  G03F9/7046 ,  G03F9/7049

摘要： A wafer or substrate alignment system for a lithographic apparatus, capable of exhibiting reduced tilt sensitivity, is presented herein. In particular, the substrate alignment system detects a position of a substrate relative to a position of a patterning device and includes a source configured to generate an incoming optical beam, at least one grating, provided on the substrate, having a diffracting length, in which the at least one grating is configured to generate at least one diffraction order of constituent diffracted beams based on an interaction with the incoming optical beam over the diffracting length. The system further includes an optical device, configured to image the at least one diffracted order on a sensor device, and includes aperture at a predetermined location to allow the constituent diffracted beams to pass through. The optical device is arranged to broaden the constituent diffracted beams such that a beam diameter of the constituent diffracted beams is larger than a diameter of the aperture, in order to reduce the sensitivity to tilt.

摘要翻译： 本文给出了能够显示降低的倾斜灵敏度的用于光刻设备的晶片或衬底对准系统。 特别地，衬底对准系统相对于图案形成装置的位置检测衬底的位置，并且包括被配置为产生入射光束的源，设置在衬底上的具有衍射长度的至少一个栅格，其中， 所述至少一个光栅被配置为基于与衍射长度上的入射光束的相互作用来产生构成衍射光束的至少一个衍射级。 该系统还包括光学装置，其配置成对传感器装置上的至少一个衍射级进行成像，并且在预定位置包括允许构成衍射光束通过的孔。 光学装置被布置成使构成的衍射光束变宽，使得构成衍射光束的光束直径大于光圈的直径，以便降低对倾斜的灵敏度。

公开(公告)号：US08553218B2

公开(公告)日：2013-10-08

申请号：US12973248

申请日：2010-12-20

申请人： Patricius Aloysius Jacobus Tinnemans ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

发明人： Patricius Aloysius Jacobus Tinnemans ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

IPC分类号： G01N21/00

CPC分类号： G01N21/93 ,  G01N21/4785 ,  G01N21/4788

摘要： Calibration of an angularly resolved scatterometer is performed by measuring a target in two or more different arrangements. The different arrangements cause radiation being measured in an outgoing direction to be different combinations of radiation illuminating the target from ingoing directions. A reference mirror measurement may also be performed. The measurements and modeling of the difference between the first and second arrangements is used to estimate separately properties of the ingoing and outgoing optical systems. The modeling may account for symmetry of the respective periodic target. The modeling typically accounts for polarizing effects of the ingoing optical elements, the outgoing optical elements and the respective periodic target. The polarizing effects may be described in the modeling by Jones calculus or Mueller calculus. The modeling may include a parameterization in terms of basis functions such as Zernike polynomials.

摘要翻译： 角度分辨散射仪的校准是通过以两种或多种不同布置测量目标进行的。 不同的布置导致在输出方向上测量的辐射是将目标与入射方向照射的辐射的不同组合。 还可以执行参考镜测量。 使用第一和第二布置之间的差异的测量和建模来分别估计输入和输出光学系统的特性。 建模可以考虑相应周期性目标的对称性。 该模型通常考虑入射光学元件，输出光学元件和相应周期性靶的偏振效应。 极化效应可以在由琼斯微积分或米勒微积分建模中描述。 该建模可以包括基于诸如Zernike多项式的基函数的参数化。

公开(公告)号：US08384881B2

公开(公告)日：2013-02-26

申请号：US12238964

申请日：2008-09-26

申请人： Joost Jeroen Ottens ,  Dirk-Jan Bijvoet ,  Gerbrand Van Der Zouw ,  Frederik Eduard De Jong

发明人： Joost Jeroen Ottens ,  Dirk-Jan Bijvoet ,  Gerbrand Van Der Zouw ,  Frederik Eduard De Jong

IPC分类号： G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70725 ,  G03F7/70783 ,  G03F9/7003

摘要： A lithographic apparatus is described, the apparatus comprising an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck constructed to hold the substrate table; a positioning device for, in use, displacing the chuck; a control unit configured to control the positioning device, wherein the control unit is arranged to drive the positioning device to excite the chuck by a substantially dynamic force to enable deformation of the chuck, prior to aligning the patterning device.

摘要翻译： 描述了光刻设备，该设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上;卡盘，被构造成夹持所述基板台; 用于在使用中移动卡盘的定位装置; 控制单元，被配置为控制所述定位装置，其中所述控制单元布置成驱动所述定位装置，以在对准所述图案形成装置之前通过基本上动态的力来激励所述卡盘以使卡盘变形。

公开(公告)号：US20090086180A1

公开(公告)日：2009-04-02

申请号：US12238964

申请日：2008-09-26

申请人： Joost Jeroen OTTENS ,  Dirk-Jan Bijvoet ,  Gerbrand Van Der Zouw ,  Frederik Eduard De Jong

发明人： Joost Jeroen OTTENS ,  Dirk-Jan Bijvoet ,  Gerbrand Van Der Zouw ,  Frederik Eduard De Jong

IPC分类号： G03B27/42 ,  G03B27/62 ,  G03B27/32

CPC分类号： G03F7/70725 ,  G03F7/70783 ,  G03F9/7003

摘要： A lithographic apparatus is described, the apparatus comprising an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck constructed to hold the substrate table; a positioning device for, in use, displacing the chuck; a control unit configured to control the positioning device, wherein the control unit is arranged to drive the positioning device to excite the chuck by a substantially dynamic force to enable deformation of the chuck, prior to aligning the patterning device.

摘要翻译： 描述了光刻设备，该设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上;卡盘，被构造成夹持所述基板台; 用于在使用中移动卡盘的定位装置; 控制单元，被配置为控制所述定位装置，其中所述控制单元布置成驱动所述定位装置，以在对准所述图案形成装置之前通过基本上动态的力来激励所述卡盘，以使卡盘变形。