IMAGE DISPLAY APPARATUS AND METHOD THEREOF
    1.
    发明申请
    IMAGE DISPLAY APPARATUS AND METHOD THEREOF 审中-公开
    图像显示装置及其方法

    公开(公告)号:US20100201713A1

    公开(公告)日:2010-08-12

    申请号:US12548330

    申请日:2009-08-26

    申请人: I-Min Lu

    发明人: I-Min Lu

    IPC分类号: G09G5/373

    摘要: The present invention discloses an image display apparatus and a method thereof. The image display apparatus having an output picture includes a receiver module and an operation module. The receiver module receives at least one image having a display proportion. The operation module splits the output picture to generate a plurality of display areas according to the display proportion, wherein the image is displayed in the plurality of display areas.

    摘要翻译: 本发明公开了一种图像显示装置及其方法。 具有输出图像的图像显示装置包括接收器模块和操作模块。 接收器模块接收具有显示比例的至少一个图像。 操作模块根据显示比例分割输出图像以生成多个显示区域,其中图像显示在多个显示区域中。

    Window shutter for laser annealing
    2.
    发明授权
    Window shutter for laser annealing 有权
    用于激光退火的窗帘

    公开(公告)号:US6087277A

    公开(公告)日:2000-07-11

    申请号:US431137

    申请日:1999-11-01

    摘要: A laser scanning system suitable for annealing applications is described. The problem of keeping the window (through which the laser shines into the system) clean, even though the laser ejects a considerable amount of debris, has been solved by inserting a moveable shutter close to the window between it and the substrate. The center portion of the shutter is an insert of optical quality quartz that is just large enough to allow the laser beam to pass through unimpeded and undiverted. By moving the beam and the shutter in concert it is ensured that the beam always passes through the insert. Most of the debris ejected by the laser as a side effect of its operation is trapped on the shutter. Relatively little material ends up on the quartz insert but when sufficient has accumulated there, the insert can be replaced at much lower cost than replacing the window. By moving the beam back and forth together with movement of the substrate, the entire area of the film on the substrate may be scanned by the beam. In a second embodiment, the quartz insert is omitted and an open slit left in its place. With this arrangement debris will eventually accumulate on the window but at a greatly reduced rate relative to an unprotected window.

    摘要翻译: 描述适用于退火应用的激光扫描系统。 通过将可移动的快门插入其与基板之间的窗口,已经解决了将激光照射到系统中的窗口(即激光喷射到系统中)清洁的问题,即使激光喷出相当大量的碎屑。 快门的中心部分是光学质量石英的插入物,其刚好足够大以允许激光束通过无阻碍和未流出。 通过一起移动光束和快门,确保光束始终通过插入件。 作为其操作的副作用的激光喷射的大多数碎屑被捕获在快门上。 相对较少的材料最终在石英插入物上,但是当足够的积累在那里时,可以以比更换窗户低得多的成本替换插入件。 通过与基板的移动一起来回移动光束,可以通过光束扫描基板上的膜的整个区域。 在第二实施例中,省略了石英插入件,并且在其位置处留有开口狭缝。 通过这种布置,碎片将最终积聚在窗户上,但是相对于未受保护的窗口以大大降低的速率。

    Method of forming a liquid crystal display
    3.
    发明授权
    Method of forming a liquid crystal display 有权
    形成液晶显示器的方法

    公开(公告)号:US06924874B2

    公开(公告)日:2005-08-02

    申请号:US10250122

    申请日:2003-06-05

    摘要: The present invention provides a method of forming a liquid crystal display (LCD). Active layers of N-type and P-type low temperature polysilicon thin film transistors and a bottom electrode of a storage capacitor are formed first. Then a N-type source/drain is formed and the bottom electrode is doped with dopants. A gate insulator, a gate electrode, a capacitor dielectric, and a top electrode are thereafter formed. After that, a P-type source/drain is formed. Finally, a source interconnect, a drain interconnect, and a pixel electrode of the liquid crystal display are formed.

    摘要翻译: 本发明提供一种形成液晶显示器(LCD)的方法。 首先形成N型和P型低温多晶硅薄膜晶体管的有源层和存储电容器的底部电极。 然后形成N型源极/漏极,并且底部电极掺杂有掺杂剂。 此后形成栅极绝缘体,栅极电极,电容器电介质和顶部电极。 之后,形成P型源极/漏极。 最后,形成液晶显示器的源极互连,漏极互连以及像素电极。

    Method of fabricating polysilicon film by excimer laser annealing process
    4.
    发明授权
    Method of fabricating polysilicon film by excimer laser annealing process 失效
    通过准分子激光退火工艺制造多晶硅膜的方法

    公开(公告)号:US06740569B2

    公开(公告)日:2004-05-25

    申请号:US10248361

    申请日:2003-01-14

    IPC分类号: H01L2100

    摘要: A method of fabricating a polysilicon film by an excimer laser annealing process is introduced. First, an amorphous silicon film is deposited on a substrate composed of glass. The amorphous silicon film includes a first region, which is located in the center, with a first thickness, and a second region, which is located in the periphery, with a slant sidewall. The thickness of the amorphous silicon film is measured so as to obtain the profile of the sidewall in the second region. According to the profile of the sidewall, a pre-cursor region is determined for performing an excimer laser annealing process wherein a second thickness in the boundary of the pre-curser regionis smaller than the first thickness so as to increase area of produced polysilicon film.

    摘要翻译: 引入了通过准分子激光退火工艺制造多晶硅膜的方法。 首先,将非晶硅膜沉积在由玻璃构成的基板上。 非晶硅膜包括位于中心的第一厚度的第一区域和位于周边的具有倾斜侧壁的第二区域。 测量非晶硅膜的厚度,以获得第二区域中侧壁的轮廓。 根据侧壁的轮廓,确定用于进行准分子激光退火处理的前置区域,其中预卷曲区域的边界中的第二厚度小于第一厚度,从而增加产生的多晶硅膜的面积。

    Method for fabricating liquid crystal display
    5.
    发明授权
    Method for fabricating liquid crystal display 有权
    制造液晶显示器的方法

    公开(公告)号:US06731352B2

    公开(公告)日:2004-05-04

    申请号:US10161301

    申请日:2002-06-03

    IPC分类号: G02F1136

    CPC分类号: G02F1/136227 G02F2202/104

    摘要: A six mask-steps method for fabricating liquid crystal display is described. A driving area and a pixel area are defined by a first mask step. Gates on the driving/pixel area and upper electrodes of capacitors on the pixel area are defined by a second mask step. Then, using the gates and the upper electrodes as a mask, a source/drain, channel region and lower electrode are formed in the driving/pixel area by an ion-doping process. A second insulation layer is formed and covers the insulation substrate. A plurality of first openings is formed by the third mask step and the gate and the source/drain are exposed. A second conductive layer is formed and covers the second insulation layer and the first opening is filled. Then, the second conductive layer is patterned, and a source/drain line is formed and contacts electrically with the source/drain by the fourth mask step. A dielectric layer is formed and covers the second insulation layer and the second conductive layer; the dielectric layer has a planar surface. A second opening is formed by the fifth mask step and the drain line on the pixel area is exposed. Finally, a pixel electrode is defined by the sixth mask step and contacts electrically with the drain line.

    摘要翻译: 描述了用于制造液晶显示器的六个掩模步骤方法。 驱动区域和像素区域由第一掩模步骤限定。 通过第二掩模步骤限定像素区域上的驱动/像素区域和电容器的上部电极。 然后,使用栅极和上部电极作为掩模,通过离子掺杂工艺在驱动/像素区域中形成源极/漏极,沟道区域和下部电极。 形成第二绝缘层并覆盖绝缘基板。 通过第三掩模步骤形成多个第一开口,露出栅极和源极/漏极。 形成第二导电层并覆盖第二绝缘层,并填充第一开口。 然后,对第二导电层进行构图,并且通过第四掩模步骤形成源极/漏极线并与源极/漏极电接触。 形成介电层并覆盖第二绝缘层和第二导电层; 电介质层具有平坦表面。 通过第五掩模步骤形成第二开口,并且暴露像素区域上的漏极线。 最后,像素电极由第六掩模步骤限定,并与漏极线电接触。

    Thin film transistor device
    6.
    发明授权
    Thin film transistor device 有权
    薄膜晶体管器件

    公开(公告)号:US06552361B1

    公开(公告)日:2003-04-22

    申请号:US09680935

    申请日:2000-10-10

    申请人: I-Min Lu Jr-Hong Chen

    发明人: I-Min Lu Jr-Hong Chen

    IPC分类号: H01L2904

    CPC分类号: H01L29/78636

    摘要: A thin film transistor (TFT) and method of fabricating the same. A planarization layer of polymer is formed on the interlayer to reduce short-circuit. The planarization layer further reduces the capacitance of the crossover capacitor and the delay time of the LCD panel using the TFT is therefor minimized. A gate thereof can be design under the data line to increase aperture ratio.

    摘要翻译: 薄膜晶体管(TFT)及其制造方法。 在中间层上形成聚合物的平坦化层以减少短路。 平坦化层进一步降低了交叉电容器的电容,并且使用TFT的LCD面板的延迟时间被最小化。 其栅极可以在数据线下设计以增加开口率。

    TFT process with high transmittance
    7.
    发明授权
    TFT process with high transmittance 有权
    TFT工艺透光率高

    公开(公告)号:US06291255B1

    公开(公告)日:2001-09-18

    申请号:US09577358

    申请日:2000-05-22

    IPC分类号: H01L2184

    CPC分类号: H01L27/1259 H01L27/1214

    摘要: A method for manufacturing TFT (Thin Film Transistor) panel with high transmittance includes an intermediate-layer process. After the intermediate-layer process has been executed, the TFT panel is etched to remove the silicon nitride layer without coverage of the source conductive pattern and the drain conductive pattern. The transmittance of the portion of the TFT without shield of the source conductive pattern and the drain conductive pattern is thus higher than that of the portion of the TFT with the shield of the source conductive pattern and the drain conductive pattern. The intermediate-layer process in the preferred embodiment of the present invention has three aspects. In the first aspect, the first step is to bake the TFT panel. The second step is to form the contact hole in the insulating layer of the TFT panel. The third step is to form the source conductive pattern and the drain conductive pattern. In the second aspect, the first step is to form the contact hole in the insulating layer of the TFT panel, then form the source conductive pattern and the drain conductive pattern are formed, followed by the baking of the TFT panel including the source conductive pattern and the drain conductive pattern. In the third aspect, the first step is to form the contact hole in the insulating layer of the TFT panel, then sputtering a metallic layer on the TFT panel followed by a baking step.

    摘要翻译: 具有高透射率的TFT(薄膜晶体管)面板的制造方法包括中间层工艺。 在执行中间层处理之后,蚀刻TFT面板以去除氮化硅层而不覆盖源极导电图案和漏极导电图案。 因此,没有源极导体图案和漏极导电图案的屏蔽层的TFT的部分的透射率因此高于具有源极导电图案和漏极导电图案的屏蔽的TFT的部分的透射率。 本发明优选实施方案中的中间层方法具有三个方面。 在第一方面,第一步是烘烤TFT面板。 第二步是在TFT面板的绝缘层中形成接触孔。 第三步是形成源极导电图案和漏极导电图案。 在第二方面中,第一步骤是在TFT面板的绝缘层中形成接触孔,然后形成源极导电图案,形成漏极导电图案,然后烘烤包括源极导电图案的TFT面板 和漏极导电图案。 在第三方面中,第一步骤是在TFT面板的绝缘层中形成接触孔,然后在TFT面板上溅射金属层,随后进行烘烤步骤。

    Window shutter for laser annealing

    公开(公告)号:US6008144A

    公开(公告)日:1999-12-28

    申请号:US17133

    申请日:1998-02-02

    摘要: A laser scanning system suitable for annealing applications is described. The problem of keeping the window (through which the laser shines into the system) clean, even though the laser ejects a considerable amount of debris, has been solved by inserting a moveable shutter close to the window between it and the substrate. The center portion of the shutter is an insert of optical quality quartz that is just large enough to allow the laser beam to pass through unimpeded and undiverted. By moving the beam and the shutter in concert it is ensured that the beam always passes through the insert. Most of the debris ejected by the laser as a side effect of its operation is trapped on the shutter. Relatively little material ends up on the quartz insert but when sufficient has accumulated there, the insert can be replaced at much lower cost than replacing the window. By moving the beam back and forth together with movement of the substrate, the entire area of the film on the substrate may be scanned by the beam. In a second embodiment, the quartz insert is omitted and an open slit left in its place. With this arrangement debris will eventually accumulate on the window but at a greatly reduced rate relative to an unprotected window.

    Method of forming a liquid crystal display
    9.
    发明授权
    Method of forming a liquid crystal display 有权
    形成液晶显示器的方法

    公开(公告)号:US07112458B2

    公开(公告)日:2006-09-26

    申请号:US10605499

    申请日:2003-10-02

    IPC分类号: H01L21/302

    CPC分类号: H01L27/1288 H01L27/1255

    摘要: An active layer of a P-type low temperature polysilicon thin film transistor and a bottom electrode of a storage capacitor are first formed. Then, a P-type source/drain is formed and the bottom electrode is doped with dopants. A gate insulator, a gate electrode, a capacitor dielectric, and a top electrode are thereafter formed. Finally, a source interconnect, a drain interconnect, and a pixel electrode of the liquid crystal display are formed.

    摘要翻译: 首先形成P型低温多晶硅薄膜晶体管的有源层和存储电容器的底部电极。 然后,形成P型源极/漏极,并且底部电极掺杂有掺杂剂。 此后形成栅极绝缘体,栅极电极,电容器电介质和顶部电极。 最后,形成液晶显示器的源极互连,漏极互连以及像素电极。

    METHOD OF FORMING A LIQUID CRYSTAL DISPLAY
    10.
    发明申请
    METHOD OF FORMING A LIQUID CRYSTAL DISPLAY 有权
    形成液晶显示的方法

    公开(公告)号:US20050072754A1

    公开(公告)日:2005-04-07

    申请号:US10605499

    申请日:2003-10-02

    IPC分类号: C30B33/00

    CPC分类号: H01L27/1288 H01L27/1255

    摘要: An active layer of a P-type low temperature polysilicon thin film transistor and a bottom electrode of a storage capacitor are first formed. Then, a P-type source/drain is formed and the bottom electrode is doped with dopants. A gate insulator, a gate electrode, a capacitor dielectric, and a top electrode are thereafter formed. Finally, a source interconnect, a drain interconnect, and a pixel electrode of the liquid crystal display are formed.

    摘要翻译: 首先形成P型低温多晶硅薄膜晶体管的有源层和存储电容器的底部电极。 然后,形成P型源极/漏极,并且底部电极掺杂有掺杂剂。 此后形成栅极绝缘体,栅极电极,电容器电介质和顶部电极。 最后,形成液晶显示器的源极互连,漏极互连和像素电极。