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    Lithographic apparatus, source, source controller and control method
    2.
    发明申请
    Lithographic apparatus, source, source controller and control method 有权
    光刻设备，源，源控制器和控制方法

    公开(公告)号：US20080036991A1

    公开(公告)日：2008-02-14

    申请号：US11501912

    申请日：2006-08-10

    申请人： Johannes Heintze ,  Erik Petrus Buurman ,  Mark Trentelman

    发明人： Johannes Heintze ,  Erik Petrus Buurman ,  Mark Trentelman

    IPC分类号： G03B27/72

    CPC分类号： G03F7/7005 ,  G03F7/70041

    摘要： A lithographic apparatus is disclosed that has a plurality of control circuits, each control circuit arranged to be connected to an associated radiation source of a plurality of radiation sources configured to generate pulses of radiation for projection onto a substrate and each control circuit arranged to control the energy of radiation pulses generated by that associated radiation source.

    摘要翻译： 公开了一种光刻设备，其具有多个控制电路，每个控制电路被布置成连接到被配置为产生用于投影到衬底上的辐射脉冲的多个辐射源的相关联的辐射源，并且每个控制电路被布置成控制 由相关辐射源产生的辐射脉冲的能量。

    Lithographic apparatus, source, source controller and control method
    4.
    发明授权
    Lithographic apparatus, source, source controller and control method 有权
    光刻设备，源，源控制器和控制方法

    公开(公告)号：US07868999B2

    公开(公告)日：2011-01-11

    申请号：US11501912

    申请日：2006-08-10

    申请人： Johannes Heintze ,  Erik Petrus Buurman ,  Mark Trentelman

    发明人： Johannes Heintze ,  Erik Petrus Buurman ,  Mark Trentelman

    IPC分类号： G03B27/54

    CPC分类号： G03F7/7005 ,  G03F7/70041

    摘要： A lithographic apparatus is disclosed that has a plurality of control circuits, each control circuit arranged to be connected to an associated radiation source of a plurality of radiation sources configured to generate pulses of radiation for projection onto a substrate and each control circuit arranged to control the energy of radiation pulses generated by that associated radiation source.

    摘要翻译： 公开了一种光刻设备，其具有多个控制电路，每个控制电路被布置成连接到被配置为产生用于投影到衬底上的辐射脉冲的多个辐射源的相关联的辐射源，并且每个控制电路被布置成控制 由相关辐射源产生的辐射脉冲的能量。

    Lithographic apparatus, illumination system, illumination controller and control method
    5.
    发明授权
    Lithographic apparatus, illumination system, illumination controller and control method 有权
    光刻设备，照明系统，照明控制器和控制方法

    公开(公告)号：US07297911B2

    公开(公告)日：2007-11-20

    申请号：US11184066

    申请日：2005-07-19

    申请人： Stefan Geerte Kruijswijk ,  Johannes Heintze ,  Paul Van Der Veen

    发明人： Stefan Geerte Kruijswijk ,  Johannes Heintze ,  Paul Van Der Veen

    IPC分类号： G03B27/52

    CPC分类号： G01J1/32 ,  G01J2001/4238 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/708

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam. The illumination system includes a pulsed source of radiation and a controller to control an output of the pulsed source of radiation. The controller includes a dose sensor to measure a dose of a pulse of the source of radiation. The dose sensor includes a dose sensor output to provide a dose signal representative of the measured dose. An integrator unit is connected to the dose sensor output. The integrator unit integrates the dose signal at least twice, an output of the integrator unit provides an integrator output signal including the at least twice integrated dose signal. The output of the integrator unit drives a driving input of the source of radiation with the integrator output signal.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统。 照明系统包括脉冲辐射源和控制脉冲辐射源的输出的控制器。 控制器包括用于测量辐射源的脉冲的剂量的剂量传感器。 剂量传感器包括剂量传感器输出以提供表示测量剂量的剂量信号。 积分器单元连接到剂量传感器输出。 积分器单元将剂量信号整合至少两次，积分器单元的输出提供包括至少两次积分的剂量信号的积分器输出信号。 积分器单元的输出通过积分器输出信号驱动辐射源的驱动输入。

    Lithographic apparatus, device manufacturing method, performance measuring method, calibration method and computer program
    6.
    发明授权
    Lithographic apparatus, device manufacturing method, performance measuring method, calibration method and computer program 有权

    公开(公告)号：US07057705B2

    公开(公告)日：2006-06-06

    申请号：US10431583

    申请日：2003-05-08

    申请人： Johannes Heintze

    发明人： Johannes Heintze

    IPC分类号： G03D27/42

    CPC分类号： G03F7/70041 ,  G03F7/70558 ,  H01S3/09702 ,  H01S3/134 ,  H01S3/225

    摘要： A controller for a pulsed radiation source is a closed-loop controller of minimum order, preferably first, to effect dead beat control. Performance indicators for a pulsed radiation source in a lithographic apparatus are based on moving averages (MA) and moving standard deviations (MSD) of the error between target and actual pulse energies. The normalized indicators are given by: MA E , n ⁡ ( x k ) = 1 ∑ i = k - ( N slit - e - 1 ) k ⁢ ⁢ Ep ref ⁡ ( i ) · ∑ i = k - ( N slit - e - 1 ) k ⁢ ⁢ Ep err ⁡ ( i ) ⁢ ⁢ ( k = N slit - e ⁢ ⁢ … ⁢ ⁢ N scan ) , wherein Epref(i) and Eperr(i) indicate reference energy per pulse and energy error per pulse for point i and MSD E , n ⁡ ( x k ) = 1 N slit - e - 1 ⁢ ∑ i = k - ( N slit - e - 1 ) k ⁢ [ Ep err ⁡ ( i ) Ep ref ⁡ ( i ) - MA E , n ⁡ ( x k ) ] 2 ⁢ ⁢ ( k = N slit - e ⁢ ⁢ … ⁢ ⁢ N scan ) .