摘要:
A photomask manufacturing method which includes generating data of a main pattern to be transferred onto a substrate, and data of an assist pattern which is arranged adjacent to the main pattern and which assists the transfer of the main pattern without being transferred onto the substrate; performing an optical proximity effect correction to the generated data of the main pattern; correcting shapes of the main pattern and the assist pattern on the basis of a shape change caused at an edge of the main pattern facing the assist pattern by the optical proximity effect correction; and forming a photomask by using the data of the main pattern and of the assist pattern which have been corrected.
摘要:
A laser diode capable of reducing a radiating angle θ⊥ in the vertical direction, an optical pickup device, an optical disk apparatus, and optical communications equipment, all equipped with the laser diode which increases optical coupling efficiency. It has a first cladding layer of the first conductive type formed on a substrate, with an active layer on top of the first cladding layer and a second cladding layer of the second conductive type on top of the active layer. In at least the first or second cladding layer, it is formed of at least one optical guide layer having a higher refractive index than the first or second cladding layer and operating to expand a beam waist in the waveguide. This operation contributes to widening a region in which to shut up light, enabling a radiating angle θ⊥ in the vertical direction to be reduced.
摘要:
A photomask manufacturing method which includes generating data of a main pattern to be transferred onto a substrate, and data of an assist pattern which is arranged adjacent to the main pattern and which assists the transfer of the main pattern without being transferred onto the substrate; performing an optical proximity effect correction to the generated data of the main pattern; correcting shapes of the main pattern and the assist pattern on the basis of a shape change caused at an edge of the main pattern facing the assist pattern by the optical proximity effect correction; and forming a photomask by using the data of the main pattern and of the assist pattern which have been corrected.
摘要:
An electric power steering device includes an output shaft connected to a steering mechanism of a steering system for power assisting the steering operation. The EPS includes a motor and a control circuit accommodated in a common motor housing. The motor housing comprises an end frame and a cup-shaped motor case hermetically covering the motor and the control circuit. The end frame is secured to a rack housing accommodating the steering mechanism, so that heat generated by the motor and the control circuit is transmitted to the rack housing.
摘要:
A control apparatus for a brushless dc motor comprises: a parallel connection circuit including a plurality of series circuits connected in parallel; each series circuit having one armature coil and one field-effect transistor, one end of the parallel connection circuit being connected to one end of a dc power source; a free-wheeling diode connected across the parallel connection circuit; first semiconductor switch means connected between the other end of the parallel connection circuit and the other end of the dc power source; a plurality of second semiconductor switch means connected between respective gates of the field-effect transistors; and the one end of the dc power source; a plurality of reverse current blocking elements for preventing reverse currents from flowing into the second semiconductor switch means from the gates of the field-effect transistors; a plurality of comparators for detecting induced voltages developed across the armature coils; a drive circuit responsive to detection output signals from the comparators for sequentially driving the second semiconductor switch means so that the field-effect transistors are turned on and off to sequentially control the energization of the armature coils; and a rotor comprising a permanent magnet having a plurality of magnetic poles which is driven by magnetic fields produced by the sequential energization of the armature coils.
摘要:
An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating a first electron-beam exposure pattern based on the differential data, generating a reticle based on the reticle exposure pattern, performing an optical exposure process with respect to a resist by use of the reticle, and performing an electron-beam exposure process with respect to the resist based on the first electron-beam exposure pattern.
摘要:
A laser diode capable of reducing a radiating angle θ⊥ in the vertical direction, an optical pickup device, an optical disk apparatus, and optical communications equipment, all equipped with the laser diode which increases optical coupling efficiency. It has a first cladding layer of the first conductive type formed on a substrate, with an active layer on top of the first cladding layer and a second cladding layer of the second conductive type on top of the active layer. In at least the first or second cladding layer, it is formed of at least one optical guide layer having a higher refractive index than the first or second cladding layer and operating to expand a beam waist in the waveguide. This operation contributes to widening a region in which to shut up light, enabling a radiating angle θ⊥ in the vertical direction to be reduced.
摘要:
In a control device for a small-scale series-type hybrid automobile using an electric motor and an internal combustion engine as power sources, energy generated by the drive motor is applied to a motor/generator through a generator inverter so that the motor/generator drives the internal combustion engine to apply a braking force thereto. In this way, energy generated during regenerative braking which cannot be absorbed by a saturated battery (for example, when the vehicle is travelling downhill) can be used to help brake the vehicle.
摘要:
A torque detection apparatus for measuring a torque applied between a drive shaft and an output shaft which is applicable to an electric power steering system of a motor vehicle. The torque detection apparatus is provided between the drive and output shafts and comprises first and second rotating bodies which are respectively at one end portions coupled fixedly to the drive and output shafts, the first rotating body being rotatable in accordance with rotation of the drive shaft and the second rotating body being rotatable in accordance with rotation of said output shaft. The first and second rotating bodies are shaped cylindrically and the first rotating body has on its outer circumferential surface magnetic toothed portions and the second rotating body has on its inner circumferential surface magnetic toothed portions. The first and second rotating bodies are disposed coaxially so that the magnetic toothed portions are magnetically engaged with each other so as to form a first magnetic flux path and a second magnetic flux path. The torque between the drive and output shafts is measured on the basis of the difference between the amounts of the magnetic fluxes passing through the first and second magnetic flux paths.
摘要:
An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating a first electron-beam exposure pattern based on the differential data, generating a reticle based on the reticle exposure pattern, performing an optical exposure process with respect to a resist by use of the reticle, and performing an electron-beam exposure process with respect to the resist based on the first electron-beam exposure pattern.