Photomask manufacturing method, photomask manufacturing apparatus and photomask
    1.
    发明授权
    Photomask manufacturing method, photomask manufacturing apparatus and photomask 有权
    光掩模制造方法,光掩模制造装置和光掩模

    公开(公告)号:US08101324B2

    公开(公告)日:2012-01-24

    申请号:US12330734

    申请日:2008-12-09

    申请人: Kanji Takeuchi

    发明人: Kanji Takeuchi

    IPC分类号: G03F1/00

    CPC分类号: G03F1/36

    摘要: A photomask manufacturing method which includes generating data of a main pattern to be transferred onto a substrate, and data of an assist pattern which is arranged adjacent to the main pattern and which assists the transfer of the main pattern without being transferred onto the substrate; performing an optical proximity effect correction to the generated data of the main pattern; correcting shapes of the main pattern and the assist pattern on the basis of a shape change caused at an edge of the main pattern facing the assist pattern by the optical proximity effect correction; and forming a photomask by using the data of the main pattern and of the assist pattern which have been corrected.

    摘要翻译: 一种光掩模制造方法,其包括生成要转印到基板上的主图案的数据,以及辅助图案的数据,该辅助图案布置在与主图案相邻并且有助于主图案的转印而不被转印到基板上; 对所述主图案的生成数据执行光学邻近效应校正; 基于通过光学邻近效应校正在与主动图案对置的主图案的边缘处的形状变化来校正主图案和辅助图案的形状; 以及通过使用已被校正的主图案和辅助图案的数据形成光掩模。

    Laser diode, optical pickup device, optical disk apparatus, and optical communications equipment
    2.
    发明授权
    Laser diode, optical pickup device, optical disk apparatus, and optical communications equipment 有权
    激光二极管,光学拾取装置,光盘装置和光通信设备

    公开(公告)号:US07580435B2

    公开(公告)日:2009-08-25

    申请号:US11087797

    申请日:2005-03-23

    IPC分类号: H01S5/00

    摘要: A laser diode capable of reducing a radiating angle θ⊥ in the vertical direction, an optical pickup device, an optical disk apparatus, and optical communications equipment, all equipped with the laser diode which increases optical coupling efficiency. It has a first cladding layer of the first conductive type formed on a substrate, with an active layer on top of the first cladding layer and a second cladding layer of the second conductive type on top of the active layer. In at least the first or second cladding layer, it is formed of at least one optical guide layer having a higher refractive index than the first or second cladding layer and operating to expand a beam waist in the waveguide. This operation contributes to widening a region in which to shut up light, enabling a radiating angle θ⊥ in the vertical direction to be reduced.

    摘要翻译: 能够减小垂直方向上的辐射角度θ⊥的激光二极管,光学拾取装置,光盘装置和光通信设备,其全都配备有提高光耦合效率的激光二极管。 它具有形成在基板上的第一导电类型的第一包覆层,在第一覆层的顶部具有有源层,在有源层顶部具有第二导电类型的第二覆层。 在至少第一或第二包覆层中,由至少一个具有比第一或第二覆层更高的折射率的光导层形成,并且在波导中扩展束腰。 该操作有助于加宽闭合光的区域,从而能够减小垂直方向的照射角度θ⊥。

    PHOTOMASK MANUFACTURING METHOD, PHOTOMASK MANUFACTURING APPARATUS AND PHOTOMASK
    3.
    发明申请
    PHOTOMASK MANUFACTURING METHOD, PHOTOMASK MANUFACTURING APPARATUS AND PHOTOMASK 有权
    光电制造方法,光电制造设备和光电

    公开(公告)号:US20090202923A1

    公开(公告)日:2009-08-13

    申请号:US12330734

    申请日:2008-12-09

    申请人: Kanji TAKEUCHI

    发明人: Kanji TAKEUCHI

    IPC分类号: G03F1/00

    CPC分类号: G03F1/36

    摘要: A photomask manufacturing method which includes generating data of a main pattern to be transferred onto a substrate, and data of an assist pattern which is arranged adjacent to the main pattern and which assists the transfer of the main pattern without being transferred onto the substrate; performing an optical proximity effect correction to the generated data of the main pattern; correcting shapes of the main pattern and the assist pattern on the basis of a shape change caused at an edge of the main pattern facing the assist pattern by the optical proximity effect correction; and forming a photomask by using the data of the main pattern and of the assist pattern which have been corrected.

    摘要翻译: 一种光掩模制造方法,其包括生成要转印到基板上的主图案的数据,以及辅助图案的数据,该辅助图案布置在与主图案相邻并且有助于主图案的转印而不被转印到基板上; 对所述主图案的生成数据执行光学邻近效应校正; 基于通过光学邻近效应校正在与主动图案对置的主图案的边缘处的形状变化来校正主图案和辅助图案的形状; 以及通过使用已被校正的主图案和辅助图案的数据形成光掩模。

    Control apparatus for brushless dc motors
    5.
    发明授权
    Control apparatus for brushless dc motors 失效
    无刷直流电机控制装置

    公开(公告)号:US4740734A

    公开(公告)日:1988-04-26

    申请号:US93757

    申请日:1987-09-08

    IPC分类号: H02P6/08 H02P6/18 H02P6/02

    CPC分类号: H02P6/08

    摘要: A control apparatus for a brushless dc motor comprises: a parallel connection circuit including a plurality of series circuits connected in parallel; each series circuit having one armature coil and one field-effect transistor, one end of the parallel connection circuit being connected to one end of a dc power source; a free-wheeling diode connected across the parallel connection circuit; first semiconductor switch means connected between the other end of the parallel connection circuit and the other end of the dc power source; a plurality of second semiconductor switch means connected between respective gates of the field-effect transistors; and the one end of the dc power source; a plurality of reverse current blocking elements for preventing reverse currents from flowing into the second semiconductor switch means from the gates of the field-effect transistors; a plurality of comparators for detecting induced voltages developed across the armature coils; a drive circuit responsive to detection output signals from the comparators for sequentially driving the second semiconductor switch means so that the field-effect transistors are turned on and off to sequentially control the energization of the armature coils; and a rotor comprising a permanent magnet having a plurality of magnetic poles which is driven by magnetic fields produced by the sequential energization of the armature coils.

    摘要翻译: 一种用于无刷直流电动机的控制装置,包括:并联连接的多个串联电路的并联电路, 每个串联电路具有一个电枢线圈和一个场效应晶体管,并联电路的一端连接到直流电源的一端; 跨并联连接电路连接的续流二极管; 连接在并联电路的另一端和直流电源的另一端之间的第一半导体开关装置; 连接在场效应晶体管的各个栅极之间的多个第二半导体开关装置; 和直流电源的一端; 多个反向电流阻挡元件,用于防止反向电流从场效应晶体管的栅极流入第二半导体开关装置; 用于检测跨越电枢线圈的感应电压的多个比较器; 响应于来自比较器的检测输出信号的驱动电路,用于顺序地驱动第二半导体开关装置,使得场效应晶体管导通和截止以顺序地控制电枢线圈的通电; 以及转子,其包括具有多个磁极的永磁体,所述多个磁极由所述电枢线圈的顺序通电产生的磁场驱动。

    Exposure method and method of making a semiconductor device
    6.
    发明授权
    Exposure method and method of making a semiconductor device 有权
    制造半导体器件的曝光方法和方法

    公开(公告)号:US08298732B2

    公开(公告)日:2012-10-30

    申请号:US13017615

    申请日:2011-01-31

    IPC分类号: G03C5/00

    摘要: An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating a first electron-beam exposure pattern based on the differential data, generating a reticle based on the reticle exposure pattern, performing an optical exposure process with respect to a resist by use of the reticle, and performing an electron-beam exposure process with respect to the resist based on the first electron-beam exposure pattern.

    摘要翻译: 曝光方法包括基于目标图案生成掩模版曝光图案,基于掩模版曝光图案执行光刻模拟,以产生模拟通过掩模版曝光形成的抗蚀剂图案的模拟图案,产生目标图案与模拟之间的差分数据 基于差分数据产生第一电子束曝光图案,基于掩模版曝光图案生成掩模版,通过使用掩模版执行关于抗蚀剂的光学曝光处理,并且执行电子束曝光处理 相对于基于第一电子束曝光图案的抗蚀剂。

    Laser Diode, Optical Pickup Device, Optical Disk Apparatus, and Optical Communications Equipment
    7.
    发明申请
    Laser Diode, Optical Pickup Device, Optical Disk Apparatus, and Optical Communications Equipment 有权
    激光二极管,光学拾取装置,光盘装置和光通信设备

    公开(公告)号:US20090304037A1

    公开(公告)日:2009-12-10

    申请号:US12533840

    申请日:2009-07-31

    IPC分类号: H01S5/00

    摘要: A laser diode capable of reducing a radiating angle θ⊥ in the vertical direction, an optical pickup device, an optical disk apparatus, and optical communications equipment, all equipped with the laser diode which increases optical coupling efficiency. It has a first cladding layer of the first conductive type formed on a substrate, with an active layer on top of the first cladding layer and a second cladding layer of the second conductive type on top of the active layer. In at least the first or second cladding layer, it is formed of at least one optical guide layer having a higher refractive index than the first or second cladding layer and operating to expand a beam waist in the waveguide. This operation contributes to widening a region in which to shut up light, enabling a radiating angle θ⊥ in the vertical direction to be reduced.

    摘要翻译: 能够减小垂直方向上的辐射角度θ⊥的激光二极管,光学拾取装置,光盘装置和光通信设备,其全都配备有提高光耦合效率的激光二极管。 它具有形成在基板上的第一导电类型的第一包覆层,在第一覆层的顶部具有有源层,在有源层顶部具有第二导电类型的第二覆层。 在至少第一或第二包覆层中,由至少一个具有比第一或第二覆层更高的折射率的光导层形成,并且在波导中扩展束腰。 该操作有助于加宽闭合光的区域,从而能够减小垂直方向的照射角度θ⊥。

    Torque detection apparatus
    9.
    发明授权
    Torque detection apparatus 失效
    扭矩检测装置

    公开(公告)号:US4881414A

    公开(公告)日:1989-11-21

    申请号:US192187

    申请日:1988-05-10

    摘要: A torque detection apparatus for measuring a torque applied between a drive shaft and an output shaft which is applicable to an electric power steering system of a motor vehicle. The torque detection apparatus is provided between the drive and output shafts and comprises first and second rotating bodies which are respectively at one end portions coupled fixedly to the drive and output shafts, the first rotating body being rotatable in accordance with rotation of the drive shaft and the second rotating body being rotatable in accordance with rotation of said output shaft. The first and second rotating bodies are shaped cylindrically and the first rotating body has on its outer circumferential surface magnetic toothed portions and the second rotating body has on its inner circumferential surface magnetic toothed portions. The first and second rotating bodies are disposed coaxially so that the magnetic toothed portions are magnetically engaged with each other so as to form a first magnetic flux path and a second magnetic flux path. The torque between the drive and output shafts is measured on the basis of the difference between the amounts of the magnetic fluxes passing through the first and second magnetic flux paths.

    摘要翻译: 一种扭矩检测装置,用于测量施加在可应用于机动车辆的电动助力转向系统的驱动轴和输出轴之间的转矩。 转矩检测装置设置在驱动和输出轴之间,并且包括分别在固定地连接到驱动和输出轴的一个端部处的第一和第二旋转体,第一旋转体可根据驱动轴的旋转而旋转, 所述第二旋转体可根据所述输出轴的旋转而旋转。 第一旋转体和第二旋转体成圆筒状,第一旋转体的外周面具有磁性齿部,第二旋转体在其内周面具有磁性齿部。 第一和第二旋转体同轴地设置,使得磁齿部彼此磁性地接合,以形成第一磁通路径和第二磁通路径。 基于通过第一和第二磁通路径的磁通量的差异来测量驱动和输出轴之间的扭矩。

    EXPOSURE METHOD AND METHOD OF MAKING A SEMICONDUCTOR DEVICE
    10.
    发明申请
    EXPOSURE METHOD AND METHOD OF MAKING A SEMICONDUCTOR DEVICE 有权
    曝光方法及制作半导体器件的方法

    公开(公告)号:US20110207053A1

    公开(公告)日:2011-08-25

    申请号:US13017615

    申请日:2011-01-31

    IPC分类号: G03F7/20 G21K5/10

    摘要: An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating a first electron-beam exposure pattern based on the differential data, generating a reticle based on the reticle exposure pattern, performing an optical exposure process with respect to a resist by use of the reticle, and performing an electron-beam exposure process with respect to the resist based on the first electron-beam exposure pattern.

    摘要翻译: 曝光方法包括基于目标图案生成掩模版曝光图案,基于掩模版曝光图案执行光刻模拟,以产生模拟通过掩模版曝光形成的抗蚀剂图案的模拟图案,产生目标图案与模拟之间的差分数据 基于差分数据产生第一电子束曝光图案,基于掩模版曝光图案生成掩模版,通过使用掩模版执行关于抗蚀剂的光学曝光处理,并且执行电子束曝光处理 相对于基于第一电子束曝光图案的抗蚀剂。