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公开(公告)号：US11630394B2
公开(公告)日：2023-04-18
申请号：US17471740
申请日：2021-09-10
Applicant: Karlsruhe Institute of Technology
Inventor： Christian Koos , Tobias Hoose , Philipp Dietrich , Matthias Blaicher , Maria Laura Gödecke , Nicole Lindenmann
Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.
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公开(公告)号：US11143966B2
公开(公告)日：2021-10-12
申请号：US16263461
申请日：2019-01-31
Applicant: Karlsruhe Institute of Technology
Inventor： Christian Koos , Tobias Hoose , Philipp Dietrich , Matthias Blaicher , Maria Laura Gödecke , Nicole Lindenmann
Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.
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3.发明授权公开(公告)号：US10888237B2
公开(公告)日：2021-01-12
申请号：US16111092
申请日：2018-08-23
Applicant: Karlsruhe Institute of Technology
Inventor： Tobias Oesterlein , Olaf Dössel , Daniel Frisch , Axel Loewe , Gustavo Lenis , Nicolas Pilia
IPC: A61B5/04 , A61B5/0456 , A61B5/042 , A61B5/00 , A61B5/1455 , A61B5/0452
Abstract: A computer system for determining Ventricular Far Field contribution in atrial electrograms of a patient. The system includes an interface module configured to receive a plurality of electrical signals generated by a plurality of sensors wherein the plurality of electrical signals relate to a plurality of locations in an atrium of the patient; a reference module configured to determine a reference signal reflecting electrical excitation of the patient's ventricles; and a data processing module. The data processing module is configured to select from the plurality of the received electrical signals such electrical signals which are recorded a number of conditions. The data processing module is further configured to determine a spatio-temporal distribution of the Ventricular Far Field inside the atrium by approximating the spatio-temporal distribution (VFFc) based on signal data of the selected signals by using an approximation model.
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公开(公告)号：US20180143813A1
公开(公告)日：2018-05-24
申请号：US15875553
申请日：2018-01-19
Applicant: Karlsruhe Institute of Technology
Inventor： Johannes Meyer , Oliver Oey , Timo Stripf , Jürgen Becker
IPC: G06F8/41
CPC classification number: G06F8/443 , G06F8/433 , G06F8/4432 , G06F8/4434 , G06F8/4441 , G06F8/456 , G06F8/457 , G06F8/52 , G06F9/445
Abstract: A compiler system, computer-implemented method and computer program product for optimizing a program for multi-processor system execution. The compiler includes an interface component configured to load from a storage component program code to be executed by one or more processors (P1 to Pn) of a multi-processor system. The compiler further includes a static analysis component configured to determine data dependencies) within the program code, and further determines all basic blocks of the control flow graph providing potential insertion positions along paths where communication statements can be inserted to enable data flow between different processors at runtime. An evaluation function component of the compiler is configured to evaluate each potential insertion position with regards to its impact on program execution on the multi-processor system at runtime by using a predefined execution evaluation function.
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公开(公告)号：US20160364010A1
公开(公告)日：2016-12-15
申请号：US15246639
申请日：2016-08-25
Applicant: Karlsruhe Institute of Technology
Inventor： Christoph Amma , Tanja M. Schultz
IPC: G06F3/01
CPC classification number: G06F3/017 , G06K9/00355 , G06K9/00496
Abstract: In general, a system can include an interface component configured to receive measurement data from a motion sensor unit physically coupled with a movable part of a body of a user. The measurement data can include sensor data of a sensor of the motion sensor unit that corresponds to a second derivation in time of a trajectory of the motion sensor unit. A data storage component can store technical profiles associated with characters and can include at least a plurality of predefined acceleration profiles. Each acceleration profile can include acceleration data characterizing a movement associated with a specific portion of a potential trajectory of the motion sensor unit in the context of at least a previous or subsequent portion of the potential trajectory. A decoding component can compare the received sensor data with the plurality of predefined acceleration profiles to identify a sequence of portions of the trajectory.
Abstract translation: 通常，系统可以包括被配置为从与用户的身体的可移动部分物理耦合的运动传感器单元接收测量数据的接口部件。 测量数据可以包括运动传感器单元的传感器的传感器数据，其对应于运动传感器单元的轨迹的时间的第二推导。 数据存储组件可以存储与字符相关联的技术简档，并且可以包括至少多个预定加速度分布。 每个加速度分布可以包括在潜在轨迹的至少前一个或后续部分的上下文中表征与运动传感器单元的潜在轨迹的特定部分相关联的运动的加速度数据。 解码组件可以将所接收的传感器数据与多个预定加速度分布进行比较，以识别轨迹的一部分序列。
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Patent Agency Ranking
公开(公告)号：US20150048312A1
公开(公告)日：2015-02-19
申请号：US14496048
申请日：2014-09-25
Applicant: International Business Machines Corporation , Taiwan Bluestone Technology Ltd. , Karlsruhe Institute of Technology
Inventor： Phaedon Avouris , Christos Dimitrakopoulos , Damon B. Farmer , Mathias B. Steiner , Michael Engel , Ralph Krupke , Yu-Ming Lin
CPC classification number: H01L29/0669 , B82Y10/00 , B82Y40/00 , H01L21/02376 , H01L29/0673 , H01L29/1606 , H01L29/413 , H01L29/45 , H01L51/0048 , H01L51/0512 , H01L51/102 , Y10S977/742
Abstract: A semiconductor device includes a substrate having at least one electrically insulating portion. A first graphene electrode is formed on a surface of the substrate such that the electrically insulating portion is interposed between a bulk portion of the substrate and the first graphene electrode. A second graphene electrode formed on the surface of the substrate. The electrically insulating portion of the substrate is interposed between the bulk portion of the substrate and the second graphene electrode. The second graphene electrode is disposed opposite the first graphene electrode to define an exposed substrate area therebetween.
Abstract translation: 半导体器件包括具有至少一个电绝缘部分的衬底。 第一石墨烯电极形成在基板的表面上，使得电绝缘部分插入在基板的主体部分和第一石墨烯电极之间。 形成在基板表面上的第二个石墨烯电极。 基板的电绝缘部分插入在基板的主体部分和第二石墨烯电极之间。 第二石墨烯电极与第一石墨烯电极相对设置，以限定其间的暴露的基板区域。
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公开(公告)号：US12189301B2
公开(公告)日：2025-01-07
申请号：US17487582
申请日：2021-09-28
Applicant: Karlsruhe Institute of Technology
Inventor： Philipp-Immanuel Dietrich , Christian Koos , Matthias Blaicher , Ingo Reuter , Yilin Xu
IPC: G03F7/20 , B29C59/16 , G02B6/30 , G02B6/32 , G02B6/42 , G02B27/09 , G03F7/00 , G02B6/12 , G02B6/138
Abstract: An optical system and a method for producing it is disclosed. The optical system has at least two separate optical components and an optical connection between them. In the inventive method, first and second optical component are provided, each having respective beam profiles. An arrangement of the first and second optical components and the form and target position of at least one beam-shaping element are specified. The beam-shaping element is produced using a three-dimensional direct-writing lithography method in situ at the target position to thereby obtain an optical component supplemented by the beam-shaping element. The supplemented optical component is placed and fixed on common base plate to thereby obtain the optical system. The optical systems produced with the present method can be used in optical data transfer, measurement technology and sensors, life sciences and medical technology, or optical signal processing.
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公开(公告)号：US09090828B2
公开(公告)日：2015-07-28
申请号：US13847975
申请日：2013-03-20
Applicant: Karlsruhe Institute of Technology
Inventor： Nicolaus Dahmen , Andrea Kruse , Mathias Pagel , Hubert Goldacker , Jens Zimmermann
CPC classification number: C10B49/14 , B01J3/008 , B01J19/30 , B01J19/32 , B01J2219/00123 , B01J2219/30203 , B01J2219/30215 , B01J2219/30265 , B01J2219/30408 , B01J2219/30475 , B01J2219/32466 , B01J2219/32475 , C10J3/57 , C10J3/78 , C10J2300/0916 , C10J2300/0923 , C10J2300/0979 , C12P5/023 , Y02E50/343 , Y02P20/145 , Y02P20/544
Abstract: A device for converting biomass with a water content of at least 50% to gaseous products includes a reactor filled at least partially with a packing including at least one filler body for accommodating supercritical water and a hydrothermal molten salt. A heater is arranged to heat up the reactor and its content. A first feeding pipe is coupled to the reactor to feed water and salt solution into the reactor. A second feeding pipe is coupled to the reactor to feed to biomass into the reactor. A discharge pipe is coupled to the reactor to discharge gaseous products from the reactor. An outlet is proved in the bottom of the reactor for removing portions of the molten salt.
Abstract translation: 用于将水含量至少为50％的生物质转化为气态产物的装置包括至少部分填充有包含至少一个用于容纳超临界水和水热熔盐的填料体的填料的反应器。 布置有加热器以加热反应器及其内容物。 将第一进料管连接到反应器以将水和盐溶液进料到反应器中。 第二进料管连接到反应器以将生物质进料到反应器中。 排放管连接到反应器以从反应器排出气态产物。 在反应器的底部证明了一个出口，用于去除部分熔融盐。
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公开(公告)号：US20210405537A1
公开(公告)日：2021-12-30
申请号：US17471740
申请日：2021-09-10
Applicant: Karlsruhe Institute of Technology
Inventor： Christian Koos , Tobias Hoose , Philipp Dietrich , Matthias Blaicher , Maria Laura Gödecke , Nicole Lindenmann
Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.
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公开(公告)号：US11109788B2
公开(公告)日：2021-09-07
申请号：US15651888
申请日：2017-07-17
Inventor： Markus Rottmann , Olaf Dössel , Meir Bar-Tal , Yaniv Ben Zrihem
Abstract: A catheter has a mapping assembly having a plurality of splines mounted at its distal portion. The splines each have a proximal end disposed at the distal portion of the catheter body and a distal end and configured as a Fibonacci spiral arm that diverges outwardly from the proximal end. The splines have a support arm with shape memory, a non-conductive covering in surrounding relation to the support arm, at least one location sensor mounted at or near the distal end, a plurality of electrodes mounted in surrounding relation to the non-conductive covering, and a plurality of electrode lead wires extending within the non-conductive covering. Each electrode lead wire is attached to a corresponding one of the electrodes.
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