公开(公告)号：US20120292801A1

公开(公告)日：2012-11-22

申请号：US13469829

申请日：2012-05-11

申请人： Hironori Maeda ,  Seiya Miura ,  Kazuhiko Mishima ,  Ken Minoda

发明人： Hironori Maeda ,  Seiya Miura ,  Kazuhiko Mishima ,  Ken Minoda

IPC分类号： B29C59/02

CPC分类号： G03F9/7042 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7088

摘要： An imprint apparatus, which is configured to transfer a pattern to an imprint material supplied on a substrate by using a mold having the pattern formed thereon, includes a light-receiving element, a detection system configured to illuminate a mark formed on the substrate and a mark formed on the mold, and guide light reflected from the mark formed on the substrate and the mark formed on the mold to the light-receiving element, and a relay optical system. The relay optical system is configured to form images of the light reflected from the mark formed on the substrate and the mark formed on the mold between the relay optical system and the detection system. The detection system is configured to guide the light image-formed by the relay optical system to the light-receiving element.

摘要翻译： 一种压印装置，其被配置为通过使用其上形成有图案的模具将图案转印到提供在基板上的压印材料，包括光接收元件，被配置为照亮形成在基板上的标记的检测系统和 形成在模具上的标记，以及将形成在基板上的标记和模具上形成的标记反射的光引导到光接收元件，以及中继光学系统。 中继光学系统被配置为形成从形成在基板上的标记反射的光和在中继光学系统和检测系统之间形成在模具上的标记的图像。 检测系统被配置为将由中继光学系统形成的光引导到光接收元件。

公开(公告)号：US20110033790A1

公开(公告)日：2011-02-10

申请号：US12853705

申请日：2010-08-10

申请人： Kazuhiko MISHIMA

发明人： Kazuhiko MISHIMA

IPC分类号： G01B11/14 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/7085 ,  G03B27/42 ,  G03F7/70575 ,  G03F7/70633 ,  G03F9/7065 ,  G03F9/7084

摘要： The present invention provides a detection apparatus which detects an upper-surface mark and lower-surface mark formed on an upper surface and lower surface, respectively, of a substrate, the apparatus including an optical system configured to form an image of the lower-surface mark on a light-receiving surface of a photoelectric conversion device using a first light, with a wavelength which is transmitted through the substrate, which is emitted by a light source, applied to the lower-surface mark from the upper surface of the substrate, and reflected by the lower-surface mark, and to form an image of the upper-surface mark on the light-receiving surface of the photoelectric conversion device using a second light, with a wavelength which is not transmitted through the substrate, which is emitted by the light source, applied to the upper-surface mark from the upper surface of the substrate, and reflected by the upper-surface mark.

摘要翻译： 本发明提供一种检测装置，其检测分别形成在基板的上表面和下表面上的上表面标记和下表面标记，该装置包括被配置为形成下表面的图像的光学系统 使用第一光的光电转换装置的光接收表面上标记有从基板的上表面施加到下表面标记的由光源发射的穿过基板的波长， 并由下表面标记反射，并且使用第二光在光电转换装置的受光面上形成上表面标记的图像，其中波长不透射通过基板的波长，其被发射 通过光源，从基板的上表面施加到上表面标记，并被上表面标记反射。

公开(公告)号：US07450249B2

公开(公告)日：2008-11-11

申请号：US11871610

申请日：2007-10-12

申请人： Hiroshi Sato ,  Kazuhiko Mishima

发明人： Hiroshi Sato ,  Kazuhiko Mishima

IPC分类号： G01B11/14

CPC分类号： G03F9/7096 ,  G03F9/7088

摘要： A position detecting apparatus for detecting position of an object disposed in a first space by receiving light from the object with a light receiving element disposed outside said first space, said position detecting apparatus includes an optical system for directing light from the object to the light receiving element, and a first optical element transmitting light from the object, disposed in a partitioning member for partitioning said first space and space outside said first space, wherein said first optical element is located on a position on or near a pupil plane or a plane conjugate to the pupil plane of said optical system.

摘要翻译： 一种位置检测装置，用于通过用设置在所述第一空间外部的光接收元件接收来自所述物体的光来检测设置在第一空间中的物体的位置，所述位置检测装置包括用于将来自物体的光引导到光接收的光学系统 元件，以及第一光学元件，其从所述物体透射光，所述第一光学元件设置在用于将所述第一空间和所述第一空间之外的空间分隔的分隔构件中，其中所述第一光学元件位于瞳孔平面上或附近的位置， 到所述光学系统的光瞳平面。

公开(公告)号：US07019836B2

公开(公告)日：2006-03-28

申请号：US10231279

申请日：2002-08-30

申请人： Kazuhiko Mishima

发明人： Kazuhiko Mishima

IPC分类号： G01B11/00 ,  G01B9/00 ,  G03B27/42 ,  G03B27/52 ,  G01N21/86

CPC分类号： G03F9/7092 ,  G03F9/7084

摘要： A position detection method of illuminating an object to be observed with an illumination system having a variable illumination condition to detect a position of the object to be observed by a position detection system, including the steps of measuring each of mark spacings between a plurality of alignment marks arranged on the object to be observed, and selecting the illumination condition on the basis of mark spacing information obtained as the measurement result.

摘要翻译： 一种利用具有可变照明条件的照明系统照亮待观察物体的位置检测方法，以检测由位置检测系统观测的物体的位置，包括以下步骤：测量多个对准中的每个标记间隔 设置在要观察的物体上的标记，并且基于作为测量结果获得的标记间隔信息来选择照明条件。

公开(公告)号：US08842294B2

公开(公告)日：2014-09-23

申请号：US13523717

申请日：2012-06-14

申请人： Ken Minoda ,  Yoshihiro Shiode ,  Kazuhiko Mishima ,  Hironori Maeda

发明人： Ken Minoda ,  Yoshihiro Shiode ,  Kazuhiko Mishima ,  Hironori Maeda

IPC分类号： G01B11/14 ,  G03F7/00 ,  G03F9/00 ,  G01D5/38

CPC分类号： B29D11/00769 ,  B29L2011/00 ,  B82Y10/00 ,  B82Y40/00 ,  G01D5/38 ,  G02B5/18 ,  G03F7/0002 ,  G03F9/7038 ,  G03F9/7049 ,  G03F9/7069 ,  G03F9/7076 ,  Y10T29/49769

摘要： A position detection apparatus includes an illumination optical system for illuminating a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence, and a detection optical system for detecting diffracted light from the first diffraction grating and the second diffraction grating, wherein a relative position of the first diffraction grating and the second diffraction grating is detected based on the detected diffracted light, and wherein the illumination optical system includes a plurality of light intensity distributions in the first direction except for on an optical axis of the detection optical system, in a pupil plane thereof.

摘要翻译： 位置检测装置包括照明光学系统，用于照亮具有与第一方向不同的第一方向和第二方向的周期的第一衍射光栅，以及第二衍射光栅，其周期与第二方向的周期不同 第一衍射光栅在第二方向上以倾斜入射，以及检测光学系统，用于检测来自第一衍射光栅和第二衍射光栅的衍射光，其中检测第一衍射光栅和第二衍射光栅的相对位置 基于所检测的衍射光，并且其中所述照明光学系统在其瞳面中包括除了所述检测光学系统的光轴之外的第一方向上的多个光强度分布。

公开(公告)号：US20120328725A1

公开(公告)日：2012-12-27

申请号：US13523717

申请日：2012-06-14

申请人： Ken Minoda ,  Yoshihiro Shiode ,  Kazuhiko Mishima ,  Hironori Maeda

发明人： Ken Minoda ,  Yoshihiro Shiode ,  Kazuhiko Mishima ,  Hironori Maeda

IPC分类号： B29C59/02 ,  B23Q17/00 ,  G01B11/14

CPC分类号： B29D11/00769 ,  B29L2011/00 ,  B82Y10/00 ,  B82Y40/00 ,  G01D5/38 ,  G02B5/18 ,  G03F7/0002 ,  G03F9/7038 ,  G03F9/7049 ,  G03F9/7069 ,  G03F9/7076 ,  Y10T29/49769

摘要： A position detection apparatus includes an illumination optical system for illuminating a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence, and a detection optical system for detecting diffracted light from the first diffraction grating and the second diffraction grating, wherein a relative position of the first diffraction grating and the second diffraction grating is detected based on the detected diffracted light, and wherein the illumination optical system includes a plurality of light intensity distributions in the first direction except for on an optical axis of the detection optical system, in a pupil plane thereof.

摘要翻译： 位置检测装置包括照明光学系统，用于照亮具有与第一方向不同的第一方向和第二方向的周期的第一衍射光栅，以及第二衍射光栅，其周期与第二方向的周期不同 第一衍射光栅在第二方向上以倾斜入射，以及检测光学系统，用于检测来自第一衍射光栅和第二衍射光栅的衍射光，其中检测第一衍射光栅和第二衍射光栅的相对位置 基于所检测的衍射光，并且其中所述照明光学系统在其瞳面中包括除了所述检测光学系统的光轴之外的第一方向上的多个光强度分布。

公开(公告)号：US07986396B2

公开(公告)日：2011-07-26

申请号：US11840453

申请日：2007-08-17

申请人： Kazuhiko Mishima

发明人： Kazuhiko Mishima

IPC分类号： G01B11/00 ,  G03B27/32 ,  G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F9/7088 ,  G03F9/7076

摘要： An exposure apparatus includes a projection optical system that projects a pattern image of an original onto a substrate, an original stage that holds and drives the original, a substrate stage that holds and drives the substrate, and a position detecting system that detects the relative positional relationship between position detection marks formed on the original or the original stage and fiducial marks formed on the substrate stage. The position detection marks form a plurality of mark groups arranged in a first direction. Each of the plurality of mark groups has a first mark for measuring the position in the first direction and a second mark for measuring the position in a second direction perpendicular to the first direction. The position detecting system has a plurality of photoelectric conversion elements, which simultaneously detect a plurality of the first marks or a plurality of the second marks.

摘要翻译： 曝光装置包括将原稿的图案图像投影到基板上的投影光学系统，保持并驱动原稿的原稿台，保持并驱动基板的基板台，以及检测相对位置的位置检测系统 在原稿台或原稿台上形成的位置检测标记与基板台上形成的基准标记之间的关系。 位置检测标记形成沿第一方向布置的多个标记组。 多个标记组中的每一个具有用于测量第一方向上的位置的第一标记和用于测量与第一方向垂直的第二方向上的位置的第二标记。 位置检测系统具有多个光电转换元件，其同时检测多个第一标记或多个第二标记。

公开(公告)号：US20090263735A1

公开(公告)日：2009-10-22

申请号：US12427595

申请日：2009-04-21

申请人： Kazuhiko Mishima

发明人： Kazuhiko Mishima

IPC分类号： G03F7/20 ,  G03B27/42 ,  G06F19/00

CPC分类号： G03F7/70991 ,  G03B27/42 ,  G03F7/70516 ,  G03F7/70525 ,  G03F7/70633 ,  G03F9/7011 ,  G03F9/7019

摘要： An exposure apparatus includes a plurality of module each of which is configured to expose a pattern of an original onto the substrate using light from a light source, each module including a projection optical system configured to project the pattern of the original onto the substrate and designed to have an identical structure, and a controller configured to control exposures of the plurality of modules using a correction value that is set for each module and configured to correct a scatter of an imaging characteristic of the pattern of the original to be exposure onto the substrate, the controller obtaining the correction value from an inspection result obtained by sequentially mounting an inspection original onto each module.

摘要翻译： 曝光装置包括多个模块，每个模块被配置为使用来自光源的光将原稿的图案曝光到基板上，每个模块包括投影光学系统，该投影光学系统被配置为将原稿的图案投影到基板上并设计 具有相同的结构，以及控制器，其被配置为使用针对每个模块设置的校正值来控制多个模块的曝光，并且被配置为校正要被曝光的原稿的图案的成像特征的散射到基板上 控制器从通过将检查原件依次安装在每个模块上获得的检查结果获得校正值。

公开(公告)号：US20090040489A1

公开(公告)日：2009-02-12

申请号：US12203249

申请日：2008-09-03

申请人： Hiroshi SATO ,  Kazuhiko MISHIMA

发明人： Hiroshi SATO ,  Kazuhiko MISHIMA

IPC分类号： G03B27/52 ,  G01B11/14

CPC分类号： G03F9/7096 ,  G03F9/7088

摘要： A position detecting apparatus for detecting position of an object disposed in a first space by receiving light from the object with a light receiving element disposed outside said first space, said position detecting apparatus includes an optical system for directing light from the object to the light receiving element, and a first optical element transmitting light from the object, disposed in a partitioning member for partitioning said first space and space outside said first space, wherein said first optical element is located on a position on or near a pupil plane or a plane conjugate to the pupil plane of said optical system.

摘要翻译： 一种位置检测装置，用于通过用设置在所述第一空间外部的光接收元件接收来自所述物体的光来检测设置在第一空间中的物体的位置，所述位置检测装置包括用于将来自物体的光引导到光接收的光学系统 元件，以及第一光学元件，其从所述物体透射光，所述第一光学元件设置在用于将所述第一空间和所述第一空间之外的空间分隔的分隔构件中，其中所述第一光学元件位于瞳孔平面上或附近的位置， 到所述光学系统的光瞳平面。

公开(公告)号：US20080094641A1

公开(公告)日：2008-04-24

申请号：US11871610

申请日：2007-10-12

申请人： HIROSHI SATO ,  KAZUHIKO MISHIMA

发明人： HIROSHI SATO ,  KAZUHIKO MISHIMA

IPC分类号： G01B11/14

CPC分类号： G03F9/7096 ,  G03F9/7088

摘要： A position detecting apparatus for detecting position of an object disposed in a first space by receiving light from the object with a light receiving element disposed outside said first space, said position detecting apparatus includes an optical system for directing light from the object to the light receiving element, and a first optical element transmitting light from the object, disposed in a partitioning member for partitioning said first space and space outside said first space, wherein said first optical element is located on a position on or near a pupil plane or a plane conjugate to the pupil plane of said optical system.

摘要翻译： 一种位置检测装置，用于通过用设置在所述第一空间外部的光接收元件接收来自所述物体的光来检测设置在第一空间中的物体的位置，所述位置检测装置包括用于将来自物体的光引导到光接收的光学系统 元件，以及第一光学元件，其从所述物体透射光，所述第一光学元件设置在用于将所述第一空间和所述第一空间之外的空间分隔的分隔构件中，其中所述第一光学元件位于瞳孔平面上或附近的位置， 到所述光学系统的光瞳平面。