摘要:
A photopolymerizable or radiation polymerizable alkaline developing crosslinking curable resin composition possessing superior antiplating properties and a short stripping period, in which the stripped plate is not easily dissolved in the stripping fluid, and which is comprising:(a) 5-30 parts by weight of at least one compound possessing in one molecule on the average 1.5 or more (meth)acryloyloxy groups, which is obtained by reacting (meth)acrylic acid with a reaction product formed by adding, to a polyatomic alcohol possessing 3 or more OH groups in one molecule, an alkylene oxide containing propylene oxide in an amount of 67% molar or greater in an amount of 5-12 moles per mole of OH group in the aforementioned polyatomic alcohol,(b) 5-30 parts by weight of at least one crosslinkable monomer other than that stated above in (a) , possessing in one molecule 2 or more ethylenically unsaturated groups,(c) 45-75 parts by weight of a thermoplastic polymer for use as a binder, the thermoplastic polymer in turn being formed of 15-35 wt % of at least one .alpha., .beta.-unsaturated carboxyl group containing a monomer having 3-15 carbon atoms, and 65-85 wt % of another copolymerizable monomer, and(d) 0-10 parts by weight of a photopolymerization initiator.
摘要:
A photopolymerizing cross-linking hardenable resin composition is disclosed which is comprised of a binder resin, cross-linking monomer and photopolymerization initiator. The composition of each of the above mentioned components is such that dry film resist incorporating the resin composition of the present invention and used in processes for selective etching and plating of printed circuit boards can be developed in weak aqueous alkaline solution after selective exposure to light. In this way, the efficient and economical manufacture of high definition printed circuit boards is made possible. Additionally, dry film resist incorporating the photopolymerizing cross-linking hardenable resin composition of the present invention lends to easy handling and storage characteristics.
摘要:
Disclosed is a liquid photosensitive resin composition comprising(a) an at least partially carboxyl-modified multifunctional epoxy acrylate and/or multifunctional epoxy methacrylate having an average acid value of 4 to 150 and a number average molecular weight of not greater than 5,000,(b) an acrylic and/or methacrylic cross-linking monomer and/or oligomer other than the epoxy acrylate and/or epoxy methacrylate,(c) an acrylic and/or methacrylic monoethylenically vinyl monomer,(d) an inorganic filler, and(e) a photo-initiator and/or photosensitizer.This liquid photosensitive resin composition has excellent alkali developability, yields a cured coating film having good adhesion and good electrical insulating properties under high-humidity conditions, and is suitable for use as a solder resist in the fabrication of printed circuit boards.
摘要:
The invention relates to a process for producing a powder of a cationic polymer by spreading on a moveable carrier a layer of an aqueous solution of a vinyl monomer, carrying out continuous polymerization followed by peeling off hydrous polymer from the carrier in a hot state, and cutting said hydrous polymer in a hot state by a shearing stress.
摘要:
A flame-resistant, photo-curing resin composition of the present invention consists of:(a) 35 to 65 parts by weight of an acrylic thermoplastic polymer, the acrylic thermoplastic polymer being 15 to 30% by weight copolymerized with at least one of monomer containing an alpha, beta-unsaturated carboxyl group,(b) 5 to 30 parts by weight of a bromine-substituted monomer represented by a general formula [I]: ##STR1## wherein R.sub.1 is H or CH.sub.3,A is ##STR2## wherein R.sub.2 is an alkylene group containing two or three carbon atoms,n is an integer between 1 and 4, andX.sub.1, X.sub.2, and X.sub.3 are Br or H, under a condition that at least two of the X.sub.1, X.sub.2, and X.sub.3 are Br,(c) 0 to 10 parts by weight of antimony trioxide particles with an average diameter of 0.1 .mu.m or smaller,(d) 20 to 50 parts by weight of a vinyl monomer, excluding component (b), and(e) 0.01 to 10 parts by weight of a photo-polymerizing initiator, wherein a total amount of the component (a), (b), (c), (d), and(e) is 100 parts by weight.
摘要:
Disclosed is a flame-retardant liquid photosensitive resin composition consisting essentially of(a) a (meth)acrylate obtained by the reaction of a compound having two or more epoxy groups in the molecule with (meth)acryalic acid and a dibasic acid or its anhydride, the (meth)acrylate having an average acid value of 4 to 150 and a number average molecular weight of 300 to 5,000;(b) a monomer having at least one (meth)acryloxyloxy group and containing not less than 20% by weight of bromine;(c) a monomer having two or more (meth)acryloxyloxy groups in the molecule;(d) a monomer having one (meth)acryloyloxy group in the molecule;(e) at least one inorganic filler; and(f) at least one photopolymerization catalyst selected from the group consisting of photo-initiators and photosensitizers,wherein the content of bromine in the total composition is in the range of 0.5 to 28% by weight.This flame-retardant liquid photosensitive resin composition has excellent homogeneity and alkali developability, yields a cured coating film having good adhesion, solvent resistance, thermal resistance, electrical insulating properties and flame retardancy, and is suitable for use as a solder resist in the fabrication of printed circuit boards.
摘要:
A crosslinking-curable resin composition suitable for use in dry film resists, consisting essentially of(a) 40 to 70 parts by weight of a thermoplastic polymer binder obtained by copolymerizing four specific polymerizable substances in specific proportions;(b) 20 to 50 parts by weight of a crosslinkable monomer having one or more ethylenically unsaturated groups in the molecule and containing 51 to 100% by weight of a compound of the general formula ##STR1## where R.sub.2 is an alkylene group of 3 to 6 carbon atoms, R.sub.3 and R.sub.4 are hydrogen or methyl, and n is a positive whole number of 5 to 9; and(c) 0 to 10 parts by weight of a photopolymerization initiator;the combined amount of components (a) to (c) being 100 parts by weight.