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9 条记录 (耗时 0.012 秒)

    METHOD OF FORMING A TRENCH ISOLATION
    1.
    发明申请
    METHOD OF FORMING A TRENCH ISOLATION 有权
    形成TRENCH分离的方法

    公开(公告)号：US20110053340A1

    公开(公告)日：2011-03-03

    申请号：US12865808

    申请日：2009-01-30

    申请人： Seitarou Hattori ,  Manabu Sekiguchi ,  Terukazu Kokubo ,  Kentaro Tamaki ,  Tsuyoshi Furukawa ,  Taichi Matsumoto ,  Chiaki Miyamoto

    发明人： Seitarou Hattori ,  Manabu Sekiguchi ,  Terukazu Kokubo ,  Kentaro Tamaki ,  Tsuyoshi Furukawa ,  Taichi Matsumoto ,  Chiaki Miyamoto

    IPC分类号： H01L21/762

    CPC分类号： H01L21/312 ,  C08G77/12 ,  C08G77/80 ,  C08L2203/20 ,  C09D183/04 ,  H01L21/02164 ,  H01L21/02205 ,  H01L21/02282 ,  H01L21/316 ,  H01L21/76224

    摘要： A method of forming a trench isolation, comprising the steps of: applying a silicone resin composition comprising a silicone resin which is represented by the following rational formula (1) and is solid at 120° C.: (H2SiO)n(HSiO1.5)m(SiO2)k  (1) (wherein n, m and k are each a number, with the proviso that when n+m+k=1, n is 0 to 0.8, m is 0 to 1.0, and k is 0 to 0.2) and an organic solvent to a substrate having trenches in such a manner that the trenches of the substrate are filled with the silicone resin composition so as to form a coating film; and carrying out the step of bringing the coating film into contact with at least one selected from the group consisting of water, an alcohol and hydrogen peroxide and the step of subjecting the coating film to at least one treatment selected from the group consisting of a heat treatment and an optical treatment.

    摘要翻译： 一种形成沟槽隔离的方法，包括以下步骤：施加包含由以下合理式（1）表示的有机硅树脂的有机硅树脂组合物，并在120℃下为固体：（H2SiO）n（HSiO1.5 ）m（SiO 2）k（1）（其中n，m和k各自为数，条件是当n + m + k = 1时，n为0至0.8，m为0至1.0，k为0 至0.2）和有机溶剂涂布到具有沟槽的基板上，使得基板的沟槽填充有硅树脂组合物以形成涂膜; 并且进行使所述涂膜与选自水，醇和过氧化氢中的至少一种接触的步骤，以及对所述涂膜进行至少一种处理的步骤，所述处理选自热， 治疗和光学治疗。

    Method of forming a trench isolation
    3.
    发明授权
    Method of forming a trench isolation 有权
    形成沟槽隔离的方法

    公开(公告)号：US08318582B2

    公开(公告)日：2012-11-27

    申请号：US12865808

    申请日：2009-01-30

    申请人： Seitarou Hattori ,  Manabu Sekiguchi ,  Terukazu Kokubo ,  Kentaro Tamaki ,  Tsuyoshi Furukawa ,  Taichi Matsumoto ,  Chiaki Miyamoto

    发明人： Seitarou Hattori ,  Manabu Sekiguchi ,  Terukazu Kokubo ,  Kentaro Tamaki ,  Tsuyoshi Furukawa ,  Taichi Matsumoto ,  Chiaki Miyamoto

    IPC分类号： H01L21/76

    CPC分类号： H01L21/312 ,  C08G77/12 ,  C08G77/80 ,  C08L2203/20 ,  C09D183/04 ,  H01L21/02164 ,  H01L21/02205 ,  H01L21/02282 ,  H01L21/316 ,  H01L21/76224

    摘要： A method of forming a trench isolation, comprising the steps of: applying a silicone resin composition comprising a silicone resin which is represented by the following rational formula (1) and is solid at 120° C.: (H2SiO)n(HSiO1.5)m(SiO2)k  (1) (wherein n, m and k are each a number, with the proviso that when n+m+k=1, n is 0 to 0.8, m is 0 to 1.0, and k is 0 to 0.2) and an organic solvent to a substrate having trenches in such a manner that the trenches of the substrate are filled with the silicone resin composition so as to form a coating film; and carrying out the step of bringing the coating film into contact with at least one selected from the group consisting of water, an alcohol and hydrogen peroxide and the step of subjecting the coating film to at least one treatment selected from the group consisting of a heat treatment and an optical treatment.

    摘要翻译： 一种形成沟槽隔离的方法，包括以下步骤：施加包含由以下合理式（1）表示的有机硅树脂的有机硅树脂组合物，并在120℃下为固体：（H2SiO）n（HSiO1.5 ）m（SiO 2）k（1）（其中n，m和k各自为数，条件是当n + m + k = 1时，n为0至0.8，m为0至1.0，k为0 至0.2）和有机溶剂涂布到具有沟槽的基板上，使得基板的沟槽填充有硅树脂组合物以形成涂膜; 并且进行使所述涂膜与选自水，醇和过氧化氢中的至少一种接触的步骤，以及对所述涂膜进行至少一种处理的步骤，所述处理选自热， 治疗和光学治疗。

    2-Amino-1,2,3,4-tetrahydronaphthalene derivatives
    5.
    发明授权
    2-Amino-1,2,3,4-tetrahydronaphthalene derivatives 失效
    2-氨基-1,2,3,4-四氢萘衍生物

    公开(公告)号：US3969468A

    公开(公告)日：1976-07-13

    申请号：US410443

    申请日：1973-10-29

    申请人： Kentaro Tamaki ,  Kyoichi Fujii ,  Seiichi Yada ,  Shiro Kudo

    发明人： Kentaro Tamaki ,  Kyoichi Fujii ,  Seiichi Yada ,  Shiro Kudo

    IPC分类号： C07D211/70 ,  C07D221/26 ,  C07C93/14

    CPC分类号： C07D221/26 ,  C07D211/70

    摘要： 6,7-Benzomorphan derivatives, which are useful as unaddictive analgesics, are prepared from aromatic aminoketones through several steps of reactions. Most of the intermediates are new compounds. Process for preparing 2-benzyl-1,2,5,6-tetrahydropyridine derivatives which are known as intermediates for the preparation of 6,7-benzomorphan derivatives is also disclosed.

    摘要翻译： 通过几个反应步骤，通过芳香族氨基酮制备6,7-苯并恶唑衍生物，其可用作无痛止痛剂。 大多数中间体是新化合物。 还公开了作为制备6,7-苯并山茚衍生物的中间体的2-苄基-1,2,5,6-四氢吡啶衍生物的制备方法。