公开(公告)号：US20250162900A1

公开(公告)日：2025-05-22

申请号：US18824778

申请日：2024-09-04

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Taegon OH ,  Jaeeun YOON ,  Seong Chan KIM ,  Hyo Jin LEE ,  Albert LEE ,  Seon Joon KIM ,  Seung Sang HWANG ,  Chong Min KOO

IPC: C01G23/00

Abstract: The present invention provides a halogen-free MXene represented by the following formula (1), that has no halogen in its surface functional group by performing an etching process to generate MXene from a MAX Phase material, and after the etching process, performing an impurity removal treatment process of etching and removing impurities using a halogen-free etchant and a halogen-free post-treatment agent, respectively. Mn+1XnTx  [Formula 1] wherein, M is a transition metal element selected from the group consisting of Sc, Ti, V, Cr, Mn, Y, Zr, Nb, Mo, Hf, and Ta, X is at least one of carbon and nitrogen, and n is an integer from 1 to 4, and Tx is a functional group selected from the group consisting of oxygen, alkoxide of 1 to 5 carbon atoms, alkyl, carboxylate, hydroxide, hydride, oxide, sub-oxide, nitride, sub-nitride, sulfide, sulfonate, thiol, and epoxide.

公开(公告)号：US20250129469A1

公开(公告)日：2025-04-24

申请号：US18794977

申请日：2024-08-05

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Han KIM ,  Ji-Soo JANG ,  Sunghoon HUR ,  Hyun-Cheol SONG ,  Seung Hyub BAEK ,  Ji-Won CHOI ,  Jin Sang KIM ,  Chong Yun KANG ,  Seong Keun KIM

IPC: C23C16/04 ,  C23C16/06

Abstract: The present invention relates to a method for area-selective growth of a noble metal thin film using atomic layer deposition, which can increase the growth thickness of a thin film with a high selectivity by inducing the generation of volatile noble metal oxides and suppressing the growth of the thin film in non-growth areas in depositing a noble metal thin film on the growth area of a substrate using nucleation delay.

公开(公告)号：US12283031B2

公开(公告)日：2025-04-22

申请号：US17742027

申请日：2022-05-11

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Sungwook Yang ,  Eunchan Kim

IPC: G06T5/80 ,  G02B6/06 ,  G06T3/40

Abstract: Provided are an apparatus and method for honeycomb artifacts removal for removing honeycomb artifacts in images received from an optical fiber imaging device through a honeycomb artifact removal model. The honeycomb artifact removal apparatus according to an embodiment includes a control unit configured to create a training dataset, build the honeycomb artifact removal model with the created training data, remove a honeycomb artifact in an input image through the built honeycomb artifact removal model and output a corrected image, wherein the control unit is configured to perform preprocessing of a raw image, acquire a honeycomb artifact image through the optical fiber imaging device, and synthesize the preprocessed raw image with the honeycomb artifact image to generate a honeycomb artifact synthesized image, and the training dataset is created by mapping the honeycomb artifact synthesized image as input data and the preprocessed raw image as output data.

公开(公告)号：US12276912B2

公开(公告)日：2025-04-15

申请号：US17384200

申请日：2021-07-23

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Seung Sang Hwang ,  Soon Man Hong ,  Kyung Youl Baek ,  Chong Min Koo ,  Albert Lee ,  Seon Joon Kim ,  You Mee Choi

IPC: G03F7/075 ,  C08G77/04 ,  C08G77/18 ,  C08G77/20 ,  C08G77/28 ,  H01B3/30

Abstract: The present disclosure relates to a UV- and heat-curable ladder-like polysilsesquioxane copolymer and a method for preparing the same. Since a controlled functionality can be provided only on a desired region via a thiol-ene click reaction without an additional additive, an insulating layer having a low dielectric constant and a microcircuit pattern can be formed without an additional etching process.

公开(公告)号：US20250114281A1

公开(公告)日：2025-04-10

申请号：US18730010

申请日：2023-01-09

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： HOJEONG JEON ,  KYUNGWOO LEE ,  SANGMIN SONG ,  SEUNG-HOON UM ,  HYUNG-SEOP HAN ,  HYOJIN LEE ,  WONRYUNG LEE ,  MYOUNG-RYUL OK ,  YU CHAN KIM ,  DAE HYEOK KWON

IPC: A61K6/838 ,  A61K6/84 ,  A61K6/898 ,  C01B25/32 ,  C01B25/34 ,  C01B25/37 ,  C01B25/45

Abstract: An apatite for a filler includes an apatite that contains metal. The metal entirely or partially replaces the calcium of the apatite. A filler composition includes the apatite and hyaluronic acid. The metal may be magnesium (Mg), zinc (Zn), and/or strontium (Sr). The metal of the apatite replaces the calcium of the apatite in a solution using a laser.

公开(公告)号：US20250101023A1

公开(公告)日：2025-03-27

申请号：US18730491

申请日：2023-01-19

Applicant: IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) ,  KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Gu KONG ,  Ratnakar Reddy KUCHUKULLA ,  Su Min KIM ,  So Jeong MOON ,  Woo Young HUR ,  In Jeong HWANG

IPC: C07D473/34 ,  A61K31/52 ,  A61K31/5377 ,  A61P35/00 ,  C07D473/16 ,  C07D473/40

Abstract: The present invention relates to a heteroaryl derivative, a stereoisomer thereof, a hydrate thereof, a solvate thereof, or a pharmaceutically acceptable salt thereof, a method for preparing the same, and a pharmaceutical composition for preventing or treating cancer comprising the same as an active ingredient. The heteroaryl derivative of the present invention exhibits high inhibitory activity against overexpressed HER2, and thus, a pharmaceutical composition containing the same as an active ingredient can be usefully used for preventing or treating HER-2 positive cancer.

公开(公告)号：US12251914B2

公开(公告)日：2025-03-18

申请号：US18467610

申请日：2023-09-14

Applicant: Korea Institute of Science and Technology

Inventor： Seungjun Chung ,  Jun Chan Choi ,  Hoon Yeub Jeong ,  Phillip Lee ,  Jeong Gon Son ,  Heesuk Kim

IPC: B32B3/12 ,  B32B7/022 ,  B32B37/14

Abstract: Provided is a method of manufacturing a stretchable substrate having improved thickness deformation uniformity through control of a spatial crosslinking degree according to various embodiments of the present disclosure to implement the above object. The method includes forming a substrate part of an elastic material, forming an auxetic including a plurality of unit structures on the substrate part, and forming a fixing part on the substrate part on which the auxetic is formed, wherein the fixing part has a different vertical crosslinking density at each position.

公开(公告)号：US12251235B2

公开(公告)日：2025-03-18

申请号：US17507811

申请日：2021-10-22

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Hyunjung Yi ,  Seongjin Park ,  Wonseop Hwang

IPC: A61B5/00 ,  A61B10/00 ,  A61F13/15 ,  A61F13/53

Abstract: A perspiration mapping patch according to the present disclosure is attached to skin of a user to absorb sweat, and includes: a sweat absorbing layer in which a plurality of opening units is arranged; a first support layer which is stacked on a first surface of the sweat absorbing layer and includes an opening opened to correspond to each of the plurality of opening units; and a second support layer stacked on a second surface facing an opposite side of the first surface of the sweat absorbing layer.

公开(公告)号：US20250084516A1

公开(公告)日：2025-03-13

申请号：US18958505

申请日：2024-11-25

Applicant: Hyundai Steel Company ,  Korea University Research and Business Foundation ,  Korea Institute of Science and Technology

Inventor： Jun Ho Chung ,  Tae Hyung Kim

IPC: C22C38/32 ,  C21D8/02 ,  C21D8/06 ,  C22C38/00 ,  C22C38/02 ,  C22C38/04 ,  C22C38/20 ,  C22C38/24 ,  C22C38/26 ,  C22C38/28 ,  C22C38/40

Abstract: Provided is a steel reinforcement including an amount of 0.07 to 0.43 wt % of carbon (C), an amount of 0.5 to 2.0 wt % of manganese (Mn), an amount of 0.05 to 0.5 wt % of silicon (Si), an amount greater than 0 and less than or equal to 0.5 wt % of chromium (Cr), an amount greater than 0 and less than or equal to 4.5 wt % of copper (Cu), an amount greater than 0 and less than or equal to 0.003 wt % of boron (B), an amount greater than 0 and less than or equal to 0.25 wt % of vanadium (V), an amount greater than 0 and less than or equal to 0.012 wt % of nitrogen (N), an amount greater than 0 and less than or equal to 0.03 wt % of phosphorus (P), an amount greater than 0 and less than or equal to 0.03 wt % of sulfur(S), an amount of 0.01 to 0.5 wt % of the sum of one or more of nickel (Ni), niobium (Nb) and titanium (Ti), the balance of iron (Fe), and other inevitable impurities. A final microstructure includes ferrite, bainite, pearlite, retained austenite, and precipitates comprising copper.

公开(公告)号：US20250051608A1

公开(公告)日：2025-02-13

申请号：US18627147

申请日：2024-04-04

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Myoung-Woon MOON ,  Seong Jin KIM ,  Young A LEE ,  CHAN YOUNG OH ,  Sang-Jin PARK

IPC: C09D179/04

Abstract: Provided is a polydopamine composite material according to the concept of the present invention, wherein the polydopamine composite material includes a substrate with first nano-protrusions formed on a surface thereof, and a polydopamine layer on the surface of the substrate. The polydopamine layer includes second nano-protrusions protruding in a direction perpendicular to the surface of the substrate.