TVS Diode and Assembly Having Asymmetric Breakdown Voltage

    公开(公告)号:US20210175224A1

    公开(公告)日:2021-06-10

    申请号:US17111690

    申请日:2020-12-04

    Abstract: In one embodiment, an asymmetric TVS device may include a semiconductor substrate, comprising an inner region, the inner region having a first polarity, and a first surface region, disposed on a first surface of the semiconductor substrate, the first surface region comprising a second polarity, opposite the first polarity. The asymmetric TVS device may also include a second surface region, comprising the second polarity, and disposed on a second surface of the semiconductor substrate, opposite the first surface, wherein the first surface region comprises a first dopant concentration, and wherein the second surface region comprises a second dopant concentration, greater than the first dopant concentration.

    SEMICONDUCTOR MESA DEVICE FORMATION METHOD

    公开(公告)号:US20220310821A1

    公开(公告)日:2022-09-29

    申请号:US17706008

    申请日:2022-03-28

    Inventor: Jianfei Zeng

    Abstract: A method of forming a semiconductor device may include providing a semiconductor substrate, the semiconductor substrate comprising an inner region of a first polarity, and a surface layer, disposed on the inner region, wherein the surface layer comprises a second polarity, opposite the first polarity. The method may further include removing a surface portion of the semiconductor substrate using a saw, wherein a trench region is formed within the semiconductor substrate, and cleaning the trench region using a chemical process, wherein at least one mesa structure is formed within the semiconductor substrate.

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