公开(公告)号：US20070222956A1

公开(公告)日：2007-09-27

申请号：US11798710

申请日：2007-05-16

申请人： Levinus Bakker ,  Marcel Marie Dierichs ,  Johannes Freriks ,  Frank Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Box

发明人： Levinus Bakker ,  Marcel Marie Dierichs ,  Johannes Freriks ,  Frank Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Box

IPC分类号： G03B27/52

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.

摘要翻译： 被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎屑的污染屏障。 污染屏障包括支撑结构，布置在支撑结构上并沿着径向方向从支撑结构的轴线延伸的多个板构件以及被构造成阻挡支撑结构的至少一部分被辐射撞击的屏蔽 或来自辐射源的碎片。

公开(公告)号：US20060138602A1

公开(公告)日：2006-06-29

申请号：US11022935

申请日：2004-12-28

申请人： Johannes Mulkens ,  Marcel Marie Dierichs

发明人： Johannes Mulkens ,  Marcel Marie Dierichs

IPC分类号： H01L21/42

CPC分类号： G03F7/70341 ,  G03F7/11 ,  Y10S977/773 ,  Y10S977/778 ,  Y10S977/779 ,  Y10T428/25 ,  Y10T428/261 ,  Y10T428/31504

摘要： In immersion lithography, to avoid internal reflections in the final element of the projection system, immersion fluid and topcoat, the thicknesses, dl, dtc and dr, and refractive indices, nl, ntc and nr, of the immersion fluid, topcoat and resist may meet the following criteria: nl≦ntc≦nr dl>˜5.λ dtc≦˜5λ

摘要翻译： 在浸没式光刻中，为了避免在投影系统的最终元件，浸没流体和面漆中的内部反射，厚度d 1，t 2和d 2 浸渍流体，面漆和抗蚀剂的折射率n 1，n 2，n 2和n 2的折射率可以满足 以下标准：<？in-line-formula description =“In-line Formulas”end =“lead”？> n <= N <= N _{r <？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> d 〜5.lambda <？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“在线公式 “end =”lead“？> d <=〜5lambda <？in-line-formula description =”In-line Formulas“end =”tail“？>}

公开(公告)号：US20050134818A1

公开(公告)日：2005-06-23

申请号：US10738129

申请日：2003-12-18

申请人： Antonius Van Dijsseldonk ,  Marcel Marie Dierichs ,  Harm-Jan Voorma

发明人： Antonius Van Dijsseldonk ,  Marcel Marie Dierichs ,  Harm-Jan Voorma

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70216 ,  G03F7/70275 ,  G03F7/70308

摘要： A lithographic apparatus including a radiation attenuator or a variable aperture system, such as masking blades, arranged in or near an intermediate focus of the projection system. Besides a radiation attenuator or a variable aperture system, a measuring system may be arranged in the intermediate focus. By placing one or more of such systems in the intermediate focus of the projection system, instead of near the reticle in the illumination system, fewer design restrictions occur because of more space available, resulting in a lower design cost.

摘要翻译： 包括布置在投影系统的中间焦点中或其附近的辐射衰减器或可变孔径系统（例如掩模刀片）的光刻设备。 除了辐射衰减器或可变孔径系统之外，测量系统可以布置在中间焦点中。 通过将一个或多个这样的系统放置在投影系统的中间焦点中，而不是靠近照明系统中的掩模版，由于更多的可用空间而发生较少的设计限制，导致较低的设计成本。

公开(公告)号：US20060091324A1

公开(公告)日：2006-05-04

申请号：US10976158

申请日：2004-10-29

申请人： Marcel Marie Dierichs

发明人： Marcel Marie Dierichs

IPC分类号： G03F7/20

CPC分类号： G03F7/70958 ,  G02B27/58 ,  G03F7/70258 ,  G03F7/70308

摘要： A method of correcting apodization in an optical system includes determining effects of apodization on an intensity distribution of a beam of radiation in a predetermined plane of the optical system; determining a more desirable intensity distribution of the beam of radiation in the predetermined plane such that apodization is corrected for; and absorbing portions of the beam of radiation in the predetermined plane as a function of location such that downstream from the predetermined plane the beam of radiation shows the more desirable intensity distribution. An optical component includes one or more absorbing layers designed to perform the absorption as a function of the location. The optical component may located in the pupil plane of the optical system.

摘要翻译： 校正光学系统中的变迹的方法包括确定变迹对光学系统的预定平面中的辐射束的强度分布的影响; 确定所述预定平面中辐射束的更期望的强度分布，使得对所述变迹进行校正; 以及作为位置的函数吸收预定平面中的辐射束的部分，使得在预定平面的下游，辐射束表现出更期望的强度分布。 光学部件包括一个或多个设计成根据位置的函数执行吸收的吸收层。 光学部件可以位于光学系统的光瞳平面中。