公开(公告)号：US6024045A

公开(公告)日：2000-02-15

申请号：US178489

申请日：1998-10-26

申请人： Jun Kikuchi ,  Shuzo Fujimura ,  Masao Iga

发明人： Jun Kikuchi ,  Shuzo Fujimura ,  Masao Iga

IPC分类号： C23F4/00 ,  C23G5/00 ,  H01J37/32 ,  H01L21/02 ,  H01L21/302 ,  H01L21/304 ,  H01L21/306 ,  H01L21/3065 ,  C23C16/00

CPC分类号： H01L21/02054 ,  H01J37/32357 ,  H01L21/02046

摘要： A method for treating the surface of a semiconductor layer includes the step of removing an oxide from the surface of a semiconductor layer by adding fluorine or fluoride to hydrogen radicals separately from plasma atmosphere and thereafter exposing the semiconductor layer to the mixed gas and hydrogen-terminating the surface.

摘要翻译： 用于处理半导体层的表面的方法包括通过与等离子体气氛分开地向氢自由基中加入氟或氟化物，然后将半导体层暴露于混合气体和氢终止，从半导体层的表面除去氧化物的步骤 表面。

公开(公告)号：US20050183750A1

公开(公告)日：2005-08-25

申请号：US11069563

申请日：2005-03-02

申请人： Kousaku Matsuno ,  Masao Iga ,  Takeji Ueda ,  Jun Kanayasu ,  Satoshi Shikami

发明人： Kousaku Matsuno ,  Masao Iga ,  Takeji Ueda ,  Jun Kanayasu ,  Satoshi Shikami

IPC分类号： H01L21/683 ,  B08B3/04 ,  H01L21/00 ,  H01L21/304 ,  B08B3/00

CPC分类号： H01L21/67051 ,  B08B3/04 ,  Y10S134/902

摘要： A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.

公开(公告)号：US06743301B2

公开(公告)日：2004-06-01

申请号：US09742423

申请日：2000-12-22

申请人： Kousaku Matsuno ,  Masao Iga

发明人： Kousaku Matsuno ,  Masao Iga

IPC分类号： B08B300

CPC分类号： B08B3/12 ,  H05K3/26 ,  Y10S134/902 ,  Y10S438/905

摘要： A substrate treatment process is disclosed to remove organic matter existing on a substrate such as a wafer, glass substrate or ceramic. The process comprises treating the substrate with ozone water and then with hydrogen water, or treating the substrate with ozone-hydrogen water or treating the substrate with ozone water and hydrogen water at the same time.

摘要翻译： 公开了用于去除存在于诸如晶片，玻璃基板或陶瓷的基板上的有机物质的基板处理工艺。 该方法包括用臭氧水，然后用氢水处理底物，或用臭氧 - 氢水处理底物或同时用臭氧水和氢水处理底物。

公开(公告)号：US06983756B2

公开(公告)日：2006-01-10

申请号：US10827352

申请日：2004-04-20

申请人： Kousaku Matsuno ,  Masao Iga

发明人： Kousaku Matsuno ,  Masao Iga

IPC分类号： B08B3/00

CPC分类号： B08B3/12 ,  H05K3/26 ,  Y10S134/902 ,  Y10S438/905

摘要： A substrate treatment apparatus comprises a treatment vessel, a substrate holder for rotating the substrate in a horizontal plane in the treatment vessel, a nozzle unit arranged in an upper part of the treatment vessel such that a liquid is downwardly fed, a feed line for feeding the liquid to the nozzle unit, and a chamber enclosing therein the apparatus in its entirety. The nozzle unit is constructed in a form of a bar such that as viewed in plan, the liquid ejected from the nozzle unit reaches the substrate with an area range having a length not smaller than a diameter of the substrate and a width smaller than the diameter of the substrate.

摘要翻译： 基板处理装置包括处理容器，用于在处理容器中的水平面旋转基板的基板保持器，布置在处理容器的上部以使得液体向下供给的喷嘴单元，用于进给的进给线 到喷嘴单元的液体，以及在其中整体包围装置的室。 喷嘴单元构造成杆的形式，使得从平面图看，从喷嘴单元喷出的液体到达基板的区域范围具有不小于基板的直径的长度，并且宽度小于直径 的基底。

公开(公告)号：US20050183749A1

公开(公告)日：2005-08-25

申请号：US11069561

申请日：2005-03-02

申请人： Kousaku Matsuno ,  Masao Iga ,  Takeji Ueda ,  Jun Kanayasu ,  Satoshi Shikami

发明人： Kousaku Matsuno ,  Masao Iga ,  Takeji Ueda ,  Jun Kanayasu ,  Satoshi Shikami

IPC分类号： H01L21/683 ,  B08B3/04 ,  H01L21/00 ,  H01L21/304 ,  B08B3/00

CPC分类号： H01L21/67051 ,  B08B3/04 ,  Y10S134/902

摘要： A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.

公开(公告)号：US20050150530A1

公开(公告)日：2005-07-14

申请号：US11069562

申请日：2005-03-02

申请人： Kousaku Matsuno ,  Masao Iga ,  Takeji Ueda ,  Jun Kanayasu ,  Satoshi Shikami

发明人： Kousaku Matsuno ,  Masao Iga ,  Takeji Ueda ,  Jun Kanayasu ,  Satoshi Shikami

IPC分类号： H01L21/683 ,  B08B3/04 ,  H01L21/00 ,  H01L21/304 ,  B08B3/00

CPC分类号： H01L21/67051 ,  B08B3/04 ,  Y10S134/902

摘要： A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.

公开(公告)号：US06874516B2

公开(公告)日：2005-04-05

申请号：US10157155

申请日：2002-05-30

申请人： Kousaku Matsuno ,  Masao Iga ,  Takeji Ueda ,  Jun Kanayasu ,  Satoshi Shikami

发明人： Kousaku Matsuno ,  Masao Iga ,  Takeji Ueda ,  Jun Kanayasu ,  Satoshi Shikami

IPC分类号： H01L21/683 ,  B08B3/04 ,  H01L21/00 ,  H01L21/304 ,  B08B3/02

CPC分类号： H01L21/67051 ,  B08B3/04 ,  Y10S134/902

摘要： A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.

摘要翻译： 一种基板清洗装置，包括一个外壳，外壳被选择性地可打开或可气密地封闭以形成密封空间，内壳封闭在外壳内并具有用于保持基板的保持件，以及用于进给的分配器单元 气体和液体中的至少一种进入内壳。 在由外壳形成的密封空间内，通过内壳形成高度气密的空间，以允许在高度气密的空间内清洗基板。 还公开了适合于与基板清洗装置一起使用的分配器，基板保持机构和基板清洁室，以及分别利用这些分配器，基板保持机构和基板清洁室的基板清洁处理。

公开(公告)号：US5919336A

公开(公告)日：1999-07-06

申请号：US971569

申请日：1997-11-17

申请人： Jun Kikuchi ,  Shuzo Fujimura ,  Masao Iga

发明人： Jun Kikuchi ,  Shuzo Fujimura ,  Masao Iga

IPC分类号： C23F4/00 ,  C23G5/00 ,  H01J37/32 ,  H01L21/02 ,  H01L21/302 ,  H01L21/304 ,  H01L21/306 ,  H01L21/3065 ,  B65C3/26

CPC分类号： H01L21/02054 ,  H01J37/32357 ,  H01L21/02046

摘要： A method for treating the surface of a semiconductor layer includes the step of removing an oxide from the surface of a semiconductor layer by adding fluorine or fluoride to hydrogen radicals separately from plasma atmosphere and thereafter exposing the semiconductor layer to the mixed gas and hydrogen-terminating the surface.