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公开(公告)号：US08573750B2
公开(公告)日：2013-11-05
申请号：US12607778
申请日：2009-10-28
CPC分类号： B41J2/14233 , B41J2002/14241 , B41J2002/14403 , B41J2002/14491 , B41J2202/12 , H01H85/046 , H01H85/10
摘要： Systems and apparatus for ejecting fluid. A fluid injection apparatus includes a fluid ejector unit for ejecting a droplet of fluid, an integrated circuit, and a conductive trace electrically coupling the fluid ejector unit and the integrated circuit. A portion of the conductive trace includes a fuse.
摘要翻译： 用于喷射流体的系统和装置。 流体注射装置包括用于喷射液滴的流体喷射器单元，集成电路和电耦合流体喷射器单元和集成电路的导电迹线。 导电迹线的一部分包括保险丝。
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公开(公告)号：US08534807B2
公开(公告)日：2013-09-17
申请号：US12991591
申请日：2009-05-21
IPC分类号： B41J2/17
CPC分类号： B41J2/14 , B41J2/14233 , B41J2002/14241 , B41J2002/14266 , B41J2002/14459 , B41J2002/14491 , B41J2202/11 , B41J2202/12
摘要： A system for ejecting droplets of a fluid is described. The system includes a substrate having a flow path body that includes a fluid pumping chamber, a descender fluidically connected to the fluid pumping chamber, and a nozzle fluidically connected to the descender. The nozzle is arranged to eject droplets of fluid through an outlet formed in an outer substrate surface. The flow path body also includes a recirculation passage fluidically connected to the descender. The system for ejecting droplets of a fluid also includes a fluid supply tank fluidically connected to the fluid pumping chamber, a fluid return tank fluidically connected to the recirculation passage, and a pump fluidically connecting the fluid return tank and the fluid supply tank. In some implementations, a flow of fluid through the flow path body is at a flow rate sufficient to force air bubbles or contaminants through the flow path body.
摘要翻译： 描述了用于喷射液体的液滴的系统。 该系统包括具有流路主体的基板，该流路主体包括流体泵送室，与流体泵送室流体连接的下降器以及与下降器流体连接的喷嘴。 喷嘴被布置成通过形成在外部基板表面中的出口喷射流体液滴。 流路主体还包括与下降器流体连接的再循环通道。 用于喷射流体液滴的系统还包括流体连接到流体泵送室的流体供应罐，流体连接到再循环通道的流体回流罐和流体连接流体回流罐和流体供应罐的泵。 在一些实施方式中，通过流路主体的流体流是足以迫使气泡或污染物通过流路主体的流速。
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公开(公告)号：US08133362B2
公开(公告)日：2012-03-13
申请号：US12714409
申请日：2010-02-26
申请人： Jeffrey Birkmeyer , Youming Li , Steve Deming , Mats G. Ottosson
发明人： Jeffrey Birkmeyer , Youming Li , Steve Deming , Mats G. Ottosson
IPC分类号： C23C14/34
CPC分类号： C23C14/3407 , C23C14/50 , H01J37/32495 , H01J37/32697 , H01J37/32715 , H01J37/32724 , H01J37/34 , H01J37/3405
摘要： A physical vapor deposition apparatus includes a vacuum chamber having side walls, a cathode inside the vacuum chamber, wherein the cathode is configured to include a sputtering target, a radio frequency power supply configured to apply power to the cathode, an anode inside and electrically connected to the side walls of the vacuum chamber, a chuck inside and electrically isolated from the side walls of the vacuum chamber, the chuck configured to support a substrate, a clamp configured to hold the substrate to the chuck, wherein the clamp is electrically conductive, and a plurality of conductive electrodes attached to the clamp, each electrode configured to compress when contacted by the substrate.
摘要翻译： 物理气相沉积装置包括具有侧壁的真空室，真空室内部的阴极，其中阴极被配置为包括溅射靶，配置为向阴极施加电力的射频电源，内部并电连接的阳极 到真空室的侧壁，卡盘位于真空室的侧壁内并与真空室的侧壁电隔离，卡盘被配置为支撑基板，夹具被配置为将基板保持在卡盘上，其中夹具是导电的， 以及附接到所述夹具的多个导电电极，每个电极构造成当与所述基板接触时被压缩。
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公开(公告)号：US09070861B2
公开(公告)日：2015-06-30
申请号：US13396141
申请日：2012-02-14
IPC分类号： H01L41/08 , B06B1/06 , G10K11/32 , H01L41/316
CPC分类号： B06B1/0622 , B06B1/0207 , B06B1/0637 , B06B1/0644 , B06B2201/76 , G10K11/32 , H01L41/04 , H01L41/047 , H01L41/0805 , H01L41/09 , H01L41/098 , H01L41/316
摘要： An ultrasonic piezoelectric transducer device includes a transducer array consisting of an array of vibrating elements, and a base to which the array of vibrating elements in the transducer array are attached. The base include integrated electrical interconnects for carrying driving signals and sensed signals between the vibrating elements and an external control circuit. The base can be an ASIC wafer that includes integrated circuitry for controlling the driving and processing the sensed signals. The interconnects and control circuits in the base fit substantially within an area below the array of multiple vibrating elements.
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公开(公告)号：US20120001966A1
公开(公告)日：2012-01-05
申请号：US12829288
申请日：2010-07-01
IPC分类号： B41J29/38
CPC分类号： B41J2/2142 , B41J2/0451 , B41J2/04581 , B41J2/16579 , B41J2002/14354
摘要： A method of determining whether a flow path is ready for ejection includes supplying liquid to the flow path, which includes a pumping chamber and a nozzle, after supplying fluid to the flow path, applying energy to an actuator adjacent to the pumping chamber, measuring an electrical characteristic of the actuator to obtain a measured value, and comparing the measured value to a threshold value to determine if the flow path is ready for ejection.
摘要翻译： 确定流动路径是否准备好用于喷射的方法包括在向流路供应流体之后向包括泵送室和喷嘴的流路供应液体，向靠近泵送室的致动器施加能量，测量 执行器的电特性以获得测量值，并将测量值与阈值进行比较，以确定流动路径是否准备好用于喷射。
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公开(公告)号：US20110209984A1
公开(公告)日：2011-09-01
申请号：US12714409
申请日：2010-02-26
申请人： Jeffrey Birkmeyer , Youming Li , Steve Deming , Mats G. Ottosson
发明人： Jeffrey Birkmeyer , Youming Li , Steve Deming , Mats G. Ottosson
IPC分类号： C23C14/34
CPC分类号： C23C14/3407 , C23C14/50 , H01J37/32495 , H01J37/32697 , H01J37/32715 , H01J37/32724 , H01J37/34 , H01J37/3405
摘要： A physical vapor deposition apparatus includes a vacuum chamber having side walls, a cathode inside the vacuum chamber, wherein the cathode is configured to include a sputtering target, a radio frequency power supply configured to apply power to the cathode, an anode inside and electrically connected to the side walls of the vacuum chamber, a chuck inside and electrically isolated from the side walls of the vacuum chamber, the chuck configured to support a substrate, a clamp configured to hold the substrate to the chuck, wherein the clamp is electrically conductive, and a plurality of conductive electrodes attached to the clamp, each electrode configured to compress when contacted by the substrate.
摘要翻译： 物理气相沉积装置包括具有侧壁的真空室，真空室内部的阴极，其中阴极被配置为包括溅射靶，配置为向阴极施加电力的射频电源，内部并电连接的阳极 到真空室的侧壁，卡盘位于真空室的侧壁内并与真空室的侧壁电隔离，卡盘被配置为支撑基板，夹具被配置为将基板保持在卡盘上，其中夹具是导电的， 以及附接到所述夹具的多个导电电极，每个电极构造成当与所述基板接触时被压缩。
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7.发明申请Apparatus for Reducing Crosstalk in the Supply and Return Channels During Fluid Droplet Ejecting 有权用于减少液滴喷射期间供应和返回通道中的串扰的装置公开(公告)号：US20100214380A1
公开(公告)日：2010-08-26
申请号：US12712614
申请日：2010-02-25
IPC分类号： B41J2/175
CPC分类号： B41J2/19 , B41J2/055 , B41J2/14233 , B41J2202/12
摘要： A fluid droplet ejection apparatus includes a substrate having a fluid inlet passage, a plurality of nozzles, and a plurality of flow paths each fluidically connecting the fluid inlet passage to an associated nozzle of the plurality of nozzles. Each flow path includes a pumping chamber connected to the associated nozzle and an ascender fluidically connected between the fluid inlet passage and the pumping chamber. The ascender is located proximate to an outside edge of the fluid inlet passage.
摘要翻译： 流体液滴喷射装置包括具有流体入口通道，多个喷嘴和多个流路的基板，每个流路将流体入口通道流体连接到多个喷嘴的相关喷嘴。 每个流动路径包括连接到相关联的喷嘴的泵送室和流体连接在流体入口通道和泵送室之间的上升器。 上升件位于靠近流体入口通道的外边缘的位置。
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公开(公告)号：US08657420B2
公开(公告)日：2014-02-25
申请号：US12980295
申请日：2010-12-28
IPC分类号： B41J2/175
CPC分类号： B41J2/175 , B41J2/14233 , B41J2002/14419 , B41J2002/14459 , B41J2202/12
摘要： A fluid ejection apparatus includes a fluid distribution layer between a fluid manifold and a substrate. The fluid distribution layer includes fluid supply channels and fluid return channels. Each fluid supply channel receives fluid from the fluid supply chamber and circulates a fraction of the received fluid back to the fluid return chamber through a return-side bypass. The substrate include a plurality of flow paths, each flow path includes a nozzle for ejecting fluid droplets. Each flow path receives fluid from a respective fluid supply channel, and channel un-ejected fluid into a respective fluid return channel. Each fluid return channel can collect the un-ejected fluid from one or more flow paths and a supply-side bypass, and return the collected fluid back to the fluid supply chamber.
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公开(公告)号：US08556364B2
公开(公告)日：2013-10-15
申请号：US12829288
申请日：2010-07-01
IPC分类号： B41J29/38
CPC分类号： B41J2/2142 , B41J2/0451 , B41J2/04581 , B41J2/16579 , B41J2002/14354
摘要： A method of determining whether a flow path is ready for ejection includes supplying liquid to the flow path, which includes a pumping chamber and a nozzle, after supplying fluid to the flow path, applying energy to an actuator adjacent to the pumping chamber, measuring an electrical characteristic of the actuator to obtain a measured value, and comparing the measured value to a threshold value to determine if the flow path is ready for ejection.
摘要翻译： 确定流动路径是否准备好用于喷射的方法包括在向流路供应流体之后向包括泵送室和喷嘴的流路供应液体，向靠近泵送室的致动器施加能量，测量 执行器的电特性以获得测量值，并将测量值与阈值进行比较，以确定流动路径是否准备好用于喷射。
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公开(公告)号：US6047600A
公开(公告)日：2000-04-11
申请号：US143126
申请日：1998-08-28
申请人： Mats G. Ottosson , Karen Hong
发明人： Mats G. Ottosson , Karen Hong
CPC分类号： G01N29/28 , G01N29/0618 , G01N29/2456 , G01N2291/011 , G01N2291/0423 , G01N2291/2632 , Y10S73/01 , Y10S73/04
摘要： The present invention relates to methods for determining the uniformity of the piezoelectric effect throughout a piezoelectric material using the time-of-flight of an acoustic wave through the material as a gauge of that uniformity.
摘要翻译： 本发明涉及使用通过材料的声波的飞行时间作为该均匀性的量度来确定整个压电材料的压电效应的均匀性的方法。
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